SG11201509621VA - Device and method for coating a substrate - Google Patents

Device and method for coating a substrate

Info

Publication number
SG11201509621VA
SG11201509621VA SG11201509621VA SG11201509621VA SG11201509621VA SG 11201509621V A SG11201509621V A SG 11201509621VA SG 11201509621V A SG11201509621V A SG 11201509621VA SG 11201509621V A SG11201509621V A SG 11201509621VA SG 11201509621V A SG11201509621V A SG 11201509621VA
Authority
SG
Singapore
Prior art keywords
coating
substrate
Prior art date
Application number
SG11201509621VA
Inventor
Christoph Mayr
Original Assignee
Ev Group E Thallner Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ev Group E Thallner Gmbh filed Critical Ev Group E Thallner Gmbh
Publication of SG11201509621VA publication Critical patent/SG11201509621VA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B9/00—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour
    • B05B9/002—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour incorporating means for heating or cooling, e.g. the material to be sprayed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0466—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas
    • B05D3/048—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas for cooling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0486—Operating the coating or treatment in a controlled atmosphere
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0493—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/002—Pretreatement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0406—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being air
    • B05D3/0426—Cooling with air

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
  • Coating Apparatus (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG11201509621VA 2013-05-23 2014-04-01 Device and method for coating a substrate SG11201509621VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102013105320.3A DE102013105320A1 (en) 2013-05-23 2013-05-23 Apparatus and method for coating a substrate
PCT/EP2014/056539 WO2014187600A1 (en) 2013-05-23 2014-04-01 Device and method for coating a substrate

Publications (1)

Publication Number Publication Date
SG11201509621VA true SG11201509621VA (en) 2015-12-30

Family

ID=50424250

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201509621VA SG11201509621VA (en) 2013-05-23 2014-04-01 Device and method for coating a substrate

Country Status (9)

Country Link
US (1) US9962721B2 (en)
JP (1) JP6360160B2 (en)
KR (1) KR102160846B1 (en)
CN (1) CN105377452B (en)
AT (1) AT520565B1 (en)
DE (1) DE102013105320A1 (en)
SG (1) SG11201509621VA (en)
TW (1) TWI668052B (en)
WO (1) WO2014187600A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3054338A1 (en) * 2015-02-04 2016-08-10 Georg-August-Universität Göttingen Stiftung Öffentlichen Rechts Mounting device for a sample and method for removing a sample
EP3690926B1 (en) * 2016-09-29 2022-08-17 EV Group E. Thallner GmbH Apparatus and method for bonding of two substrates
CN106423734B (en) * 2016-10-26 2022-05-10 广东工业大学 Spraying and glue dispensing device and technology
KR102125141B1 (en) * 2017-09-22 2020-06-19 가부시키가이샤 스크린 홀딩스 Substrate processing method and substrate processing apparatus
US10994300B2 (en) * 2018-11-27 2021-05-04 Service Support Specialties, Inc Method and/or system for coating a substrate
CN113926603A (en) * 2021-11-19 2022-01-14 刘常青 Furniture paint atomizing and coating device

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3069762B2 (en) * 1993-03-25 2000-07-24 東京エレクトロン株式会社 Method and apparatus for forming coating film
US6383289B2 (en) * 1997-12-16 2002-05-07 The University Of North Carolina At Chapel Hill Apparatus for liquid carbon dioxide systems
US6350316B1 (en) * 1998-11-04 2002-02-26 Tokyo Electron Limited Apparatus for forming coating film
KR100321712B1 (en) * 1998-12-22 2002-03-08 박종섭 A method for forming polymer dielectric film with ultra low permeability
DE19941760A1 (en) * 1999-09-02 2001-03-22 Duerr Systems Gmbh Cooling zone of a painting system and method for operating such a cooling zone
US6695922B2 (en) * 1999-12-15 2004-02-24 Tokyo Electron Limited Film forming unit
WO2003039765A1 (en) 2001-11-02 2003-05-15 Bbi Enterprises, L.P. Electrostatic application of loose fiber to substrates
US20040048002A1 (en) * 2002-09-11 2004-03-11 Shifflette J. Michael Method for coating objects
JP4379053B2 (en) 2002-12-16 2009-12-09 株式会社デンソー Electric actuator system
JP2005342641A (en) * 2004-06-04 2005-12-15 Matsushita Electric Ind Co Ltd Apparatus and method for applying liquid
KR100575139B1 (en) 2004-11-12 2006-05-03 (주)태광테크 Cold spray apparatus with gas cooling apparatus
US20080035306A1 (en) * 2006-08-08 2008-02-14 White John M Heating and cooling of substrate support
JP4680149B2 (en) * 2006-08-23 2011-05-11 東京エレクトロン株式会社 Coating processing method, program, computer-readable recording medium, and coating processing apparatus
JP2008096503A (en) * 2006-10-06 2008-04-24 Toshiba Corp Method for manufacturing powdery photosensitive composition, photosensitive composition and optical recording medium formed from this photosensitive composition
FR2926466B1 (en) 2008-01-23 2010-11-12 Dbv Tech METHOD FOR MANUFACTURING PATCHES BY ELECTROSPRAY
JP5189417B2 (en) 2008-06-25 2013-04-24 三ツ星ベルト株式会社 Electrostatic flocking pile diffusion nozzle
JP5390956B2 (en) * 2009-06-25 2014-01-15 大日本スクリーン製造株式会社 Wiring forming apparatus and wiring forming method
JP4920115B2 (en) * 2011-04-04 2012-04-18 芝浦メカトロニクス株式会社 Solution coating apparatus and coating method
DE202011000789U1 (en) 2011-04-04 2011-06-09 Hellmuth, Felix, 96268 Apparatus for electrostatic flocking

Also Published As

Publication number Publication date
AT520565A5 (en) 2019-05-15
DE102013105320A1 (en) 2014-11-27
JP2016526292A (en) 2016-09-01
US20160082453A1 (en) 2016-03-24
KR102160846B1 (en) 2020-09-29
KR20160016774A (en) 2016-02-15
AT520565B1 (en) 2019-06-15
US9962721B2 (en) 2018-05-08
WO2014187600A1 (en) 2014-11-27
CN105377452A (en) 2016-03-02
CN105377452B (en) 2018-09-25
TWI668052B (en) 2019-08-11
TW201501806A (en) 2015-01-16
JP6360160B2 (en) 2018-07-18

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