JP2016523157A5 - - Google Patents

Download PDF

Info

Publication number
JP2016523157A5
JP2016523157A5 JP2016522531A JP2016522531A JP2016523157A5 JP 2016523157 A5 JP2016523157 A5 JP 2016523157A5 JP 2016522531 A JP2016522531 A JP 2016522531A JP 2016522531 A JP2016522531 A JP 2016522531A JP 2016523157 A5 JP2016523157 A5 JP 2016523157A5
Authority
JP
Japan
Prior art keywords
ray
calibration
diffraction grating
filter
grating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016522531A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016523157A (ja
JP6261730B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2014/063679 external-priority patent/WO2014207193A1/en
Publication of JP2016523157A publication Critical patent/JP2016523157A/ja
Publication of JP2016523157A5 publication Critical patent/JP2016523157A5/ja
Application granted granted Critical
Publication of JP6261730B2 publication Critical patent/JP6261730B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2016522531A 2013-06-28 2014-06-27 スリット走査位相コントラストイメージングにおける補正 Expired - Fee Related JP6261730B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP13174345 2013-06-28
EP13174345.2 2013-06-28
PCT/EP2014/063679 WO2014207193A1 (en) 2013-06-28 2014-06-27 Correction in slit-scanning phase contrast imaging

Publications (3)

Publication Number Publication Date
JP2016523157A JP2016523157A (ja) 2016-08-08
JP2016523157A5 true JP2016523157A5 (OSRAM) 2017-08-10
JP6261730B2 JP6261730B2 (ja) 2018-01-17

Family

ID=48699640

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016522531A Expired - Fee Related JP6261730B2 (ja) 2013-06-28 2014-06-27 スリット走査位相コントラストイメージングにおける補正

Country Status (5)

Country Link
US (1) US9839407B2 (OSRAM)
EP (1) EP3013233B1 (OSRAM)
JP (1) JP6261730B2 (OSRAM)
CN (1) CN105338901B (OSRAM)
WO (1) WO2014207193A1 (OSRAM)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3137925A1 (en) * 2014-05-02 2017-03-08 Koninklijke Philips N.V. Method to calibrate a photon detector, absorption filter assembly and imaging apparatus
US10458926B2 (en) * 2014-05-27 2019-10-29 Koninklijke Philips N.V. Calibration hardware phantom for differential phase contrast imaging
JP6451400B2 (ja) * 2015-02-26 2019-01-16 コニカミノルタ株式会社 画像処理システム及び画像処理装置
EP3383273B1 (en) * 2015-12-01 2021-05-12 Koninklijke Philips N.V. Apparatus for x-ray imaging an object
US10660595B2 (en) * 2016-06-16 2020-05-26 Koninklijke Philips N.V. Apparatus for x-ray imaging an object
CN107543835B (zh) * 2016-06-27 2021-05-14 上海一影信息科技有限公司 多能成像方法、装置及其系统
US10507004B2 (en) * 2016-12-22 2019-12-17 Koninklijke Philips N.V. Phantom device, dark field imaging system and method for acquiring a dark field image
US11073487B2 (en) * 2017-05-11 2021-07-27 Kla-Tencor Corporation Methods and systems for characterization of an x-ray beam with high spatial resolution
JP6844461B2 (ja) * 2017-07-20 2021-03-17 株式会社島津製作所 Ｘ線位相イメージング装置および情報取得手法
EP3459461A1 (en) * 2017-09-25 2019-03-27 Koninklijke Philips N.V. X-ray imaging reference scan
EP3498170A1 (en) * 2017-12-12 2019-06-19 Koninklijke Philips N.V. Device and method for aligning an x-ray grating to an x-ray radiation source, and x-ray image acquisition system
US10816486B2 (en) * 2018-03-28 2020-10-27 Kla-Tencor Corporation Multilayer targets for calibration and alignment of X-ray based measurement systems
JP2021156578A (ja) * 2018-06-27 2021-10-07 株式会社ニコン Ｘ線装置、ｘ線画像生成方法および構造物の製造方法
CN111096761B (zh) * 2018-10-29 2024-03-08 上海西门子医疗器械有限公司 修正楔形滤波器散射的方法、装置和相关设备
EP3821810A1 (en) * 2019-11-13 2021-05-19 Koninklijke Philips N.V. Active gratings position tracking in gratings-based phase-contrast and dark-field imaging
CN115768353A (zh) * 2020-06-10 2023-03-07 上海西门子医疗器械有限公司 确定单槽准直板的目标位置的方法、装置和准直器组件
EP4029451A1 (en) * 2021-01-19 2022-07-20 Koninklijke Philips N.V. An x-ray imaging system and method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010146503A1 (en) 2009-06-16 2010-12-23 Koninklijke Philips Electronics N. V. Correction method for differential phase contrast imaging
WO2011070488A1 (en) * 2009-12-10 2011-06-16 Koninklijke Philips Electronics N.V. Phase contrast imaging
CN102651994A (zh) 2009-12-10 2012-08-29 皇家飞利浦电子股份有限公司 微分相位对比成像系统的校准
JP2012090944A (ja) 2010-03-30 2012-05-17 Fujifilm Corp 放射線撮影システム及び放射線撮影方法
CN102221565B (zh) * 2010-04-19 2013-06-12 清华大学 X射线源光栅步进成像系统与成像方法
CN103261878B (zh) * 2010-12-13 2016-03-30 皇家飞利浦电子股份有限公司 用于使用x射线分析在对象中的受关注区域的方法和设备
JP2012143549A (ja) 2010-12-21 2012-08-02 Fujifilm Corp 放射線画像生成方法および放射線画像撮影装置
EP2729069B1 (en) 2011-07-04 2019-09-18 Koninklijke Philips N.V. Phase contrast imaging apparatus

Similar Documents

Publication Publication Date Title
JP2016523157A5 (OSRAM)
JP6261730B2 (ja) スリット走査位相コントラストイメージングにおける補正
US10485492B2 (en) Source-detector arrangement
EP2400891B1 (en) Low dose single step grating based x-ray phase contrast imaging
JP6004411B2 (ja) 非破壊検査装置
JP2018526055A5 (OSRAM)
JP2016501630A5 (OSRAM)
JP2017521170A5 (OSRAM)
JP5111528B2 (ja) Ｘ線撮像装置およびｘ線撮像方法
JP2013138836A5 (OSRAM)
CN107072621A (zh) 双能量微分相衬成像
JP5665834B2 (ja) Ｘ線撮像装置
JP6058860B2 (ja) Ｘ線撮像装置及びｘ線撮像方法
US20160146744A1 (en) Coded-aperture x-ray imaging
JP2016017966A5 (OSRAM)
JP2013031784A5 (ja) Ｘ線撮像装置
JP2013042983A (ja) トモシンセシス撮像装置及びトモシンセシス画像の撮像方法
JP2011083499A5 (OSRAM)
JP2009156788A5 (ja) Ｘ線検査装置
JP6270215B2 (ja) Ｘ線分析装置の光軸調整装置
JP2015064280A5 (OSRAM)
US20150153290A1 (en) X-ray apparatus and method of measuring x-rays
JP6619268B2 (ja) 放射線画像生成装置
WO2019171920A1 (ja) 放射線位相撮像装置
JP5610885B2 (ja) Ｘ線撮像装置および撮像方法