JP2016521314A5 - - Google Patents

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Publication number
JP2016521314A5
JP2016521314A5 JP2016507952A JP2016507952A JP2016521314A5 JP 2016521314 A5 JP2016521314 A5 JP 2016521314A5 JP 2016507952 A JP2016507952 A JP 2016507952A JP 2016507952 A JP2016507952 A JP 2016507952A JP 2016521314 A5 JP2016521314 A5 JP 2016521314A5
Authority
JP
Japan
Prior art keywords
target
arc
source according
yoke
evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016507952A
Other languages
English (en)
Japanese (ja)
Other versions
JP6374948B2 (ja
JP2016521314A (ja
Filing date
Publication date
Priority claimed from ATGM131/2013U external-priority patent/AT13830U1/de
Application filed filed Critical
Publication of JP2016521314A publication Critical patent/JP2016521314A/ja
Publication of JP2016521314A5 publication Critical patent/JP2016521314A5/ja
Application granted granted Critical
Publication of JP6374948B2 publication Critical patent/JP6374948B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2016507952A 2013-04-22 2014-04-17 永久磁石を有するアーク蒸着源 Expired - Fee Related JP6374948B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
ATGM131/2013U AT13830U1 (de) 2013-04-22 2013-04-22 Lichtbogenverdampfungs-Beschichtungsquelle
ATGM131/2013 2013-04-22
PCT/AT2014/000078 WO2014172722A1 (de) 2013-04-22 2014-04-17 Lichtbogenverdampfungs-beschichtungsquelle mit permanentmagnet

Publications (3)

Publication Number Publication Date
JP2016521314A JP2016521314A (ja) 2016-07-21
JP2016521314A5 true JP2016521314A5 (enExample) 2017-05-18
JP6374948B2 JP6374948B2 (ja) 2018-08-15

Family

ID=51492675

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016507952A Expired - Fee Related JP6374948B2 (ja) 2013-04-22 2014-04-17 永久磁石を有するアーク蒸着源

Country Status (7)

Country Link
US (1) US20160099134A1 (enExample)
EP (1) EP2989654B1 (enExample)
JP (1) JP6374948B2 (enExample)
KR (1) KR102167854B1 (enExample)
AT (1) AT13830U1 (enExample)
CA (1) CA2907804A1 (enExample)
WO (1) WO2014172722A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE1650144A1 (en) * 2016-02-05 2017-08-06 Impact Coatings Ab Device for a physical vapor deposition (pvd) process
MY203523A (en) * 2017-10-03 2024-07-02 Oerlikon Surface Solutions Ag Pfffikon Arc source
SE542687C2 (en) * 2018-06-27 2020-06-23 Impact Coatings Ab Publ Arc source system for a cathode

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US4622452A (en) * 1983-07-21 1986-11-11 Multi-Arc Vacuum Systems, Inc. Electric arc vapor deposition electrode apparatus
DE4017111C2 (de) * 1990-05-28 1998-01-29 Hauzer Holding Lichtbogen-Magnetron-Vorrichtung
US5298136A (en) * 1987-08-18 1994-03-29 Regents Of The University Of Minnesota Steered arc coating with thick targets
DE4237517A1 (de) * 1992-11-06 1994-05-11 Leybold Ag Vorrichtung zum Beschichten eines Substrats, insbesondere mit elektrisch nichtleitenden Schichten
US5656091A (en) * 1995-11-02 1997-08-12 Vacuum Plating Technology Corporation Electric arc vapor deposition apparatus and method
US5736019A (en) * 1996-03-07 1998-04-07 Bernick; Mark A. Sputtering cathode
AU9410498A (en) * 1997-11-26 1999-06-17 Vapor Technologies, Inc. Apparatus for sputtering or arc evaporation
US6843891B2 (en) * 1998-05-14 2005-01-18 Kaufman & Robinson, Inc. Apparatus for sputter deposition
JP3993388B2 (ja) * 2001-01-16 2007-10-17 株式会社神戸製鋼所 真空アーク蒸発源
DE10234856A1 (de) * 2002-07-31 2004-02-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Einrichtung zum Beschichten durch Magnetron-Sputtern
US20040126492A1 (en) * 2002-12-30 2004-07-01 Weaver Scott Andrew Method and apparatus for using ion plasma deposition to produce coating
US7575088B2 (en) * 2005-07-01 2009-08-18 Chrysler Group Llc Powertrain mounting system
JP2011127138A (ja) * 2009-12-15 2011-06-30 Mitsubishi Materials Corp 円筒型スパッタリングターゲット製造方法
AT12021U1 (de) * 2010-04-14 2011-09-15 Plansee Se Beschichtungsquelle und verfahren zu deren herstellung

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