JP2016519208A5 - - Google Patents

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Publication number
JP2016519208A5
JP2016519208A5 JP2016500273A JP2016500273A JP2016519208A5 JP 2016519208 A5 JP2016519208 A5 JP 2016519208A5 JP 2016500273 A JP2016500273 A JP 2016500273A JP 2016500273 A JP2016500273 A JP 2016500273A JP 2016519208 A5 JP2016519208 A5 JP 2016519208A5
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JP
Japan
Prior art keywords
support shaft
refractive element
process chamber
support
solid disk
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JP2016500273A
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English (en)
Japanese (ja)
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JP6396409B2 (ja
JP2016519208A (ja
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Priority claimed from PCT/US2014/016608 external-priority patent/WO2014143499A1/en
Publication of JP2016519208A publication Critical patent/JP2016519208A/ja
Publication of JP2016519208A5 publication Critical patent/JP2016519208A5/ja
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Publication of JP6396409B2 publication Critical patent/JP6396409B2/ja
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JP2016500273A 2013-03-15 2014-02-14 Ｅｐｉプロセスのための均一性調整レンズを有するサセプタ支持シャフト Active JP6396409B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361798503P 2013-03-15 2013-03-15
US61/798,503 2013-03-15
PCT/US2014/016608 WO2014143499A1 (en) 2013-03-15 2014-02-14 Susceptor support shaft with uniformity tuning lenses for epi process

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018159892A Division JP6577104B2 (ja) 2013-03-15 2018-08-29 Ｅｐｉプロセスのための均一性調整レンズを有するサセプタ支持シャフト

Publications (3)

Publication Number Publication Date
JP2016519208A JP2016519208A (ja) 2016-06-30
JP2016519208A5 true JP2016519208A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2017-03-23
JP6396409B2 JP6396409B2 (ja) 2018-09-26

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ID=51522909

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JP2016500273A Active JP6396409B2 (ja) 2013-03-15 2014-02-14 Ｅｐｉプロセスのための均一性調整レンズを有するサセプタ支持シャフト
JP2018159892A Active JP6577104B2 (ja) 2013-03-15 2018-08-29 Ｅｐｉプロセスのための均一性調整レンズを有するサセプタ支持シャフト

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JP2018159892A Active JP6577104B2 (ja) 2013-03-15 2018-08-29 Ｅｐｉプロセスのための均一性調整レンズを有するサセプタ支持シャフト

Country Status (7)

Country Link
US (1) US9532401B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (2) JP6396409B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR101819095B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CN (1) CN105027275B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE112014001376T5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TW (1) TWI598936B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
WO (1) WO2014143499A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

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US20220210872A1 (en) * 2020-12-31 2022-06-30 Globalwafers Co., Ltd. System and methods for a radiant heat cap in a semiconductor wafer reactor
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US12134835B2 (en) 2021-09-01 2024-11-05 Applied Materials, Inc. Quartz susceptor for accurate non-contact temperature measurement
KR20230122477A (ko) * 2022-02-14 2023-08-22 주성엔지니어링(주) 기판 처리 장치
EP4523250A1 (en) * 2022-05-12 2025-03-19 Watlow Electric Manufacturing Company Hybrid shaft assembly for thermal control in heated semiconductor pedestals
US12308207B2 (en) * 2022-08-18 2025-05-20 Applied Materials Israel Ltd. Enhanced deposition rate by thermal isolation cover for GIS manipulator
CN117821947A (zh) * 2022-09-29 2024-04-05 中微半导体设备(上海)股份有限公司 一种石英部件及其制作方法以及基片处理设备
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