JP2016517026A5 - - Google Patents

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Publication number
JP2016517026A5
JP2016517026A5 JP2015562015A JP2015562015A JP2016517026A5 JP 2016517026 A5 JP2016517026 A5 JP 2016517026A5 JP 2015562015 A JP2015562015 A JP 2015562015A JP 2015562015 A JP2015562015 A JP 2015562015A JP 2016517026 A5 JP2016517026 A5 JP 2016517026A5
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JP2015562015A
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JP2016517026A (ja
JP6410741B2 (ja
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Priority claimed from PCT/EP2014/054042 external-priority patent/WO2014139814A1/en
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Publication of JP2016517026A5 publication Critical patent/JP2016517026A5/ja
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JP2015562015A 2013-03-14 2014-03-03 投影リソグラフィのための照明光学ユニット Active JP6410741B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361781154P 2013-03-14 2013-03-14
DE102013204429 2013-03-14
DE102013204429.1 2013-03-14
US61/781,154 2013-03-14
PCT/EP2014/054042 WO2014139814A1 (en) 2013-03-14 2014-03-03 Illumination optical unit for projection lithography

Publications (3)

Publication Number Publication Date
JP2016517026A JP2016517026A (ja) 2016-06-09
JP2016517026A5 true JP2016517026A5 (enExample) 2018-09-27
JP6410741B2 JP6410741B2 (ja) 2018-10-24

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JP2015562015A Active JP6410741B2 (ja) 2013-03-14 2014-03-03 投影リソグラフィのための照明光学ユニット

Country Status (3)

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US (1) US9746779B2 (enExample)
JP (1) JP6410741B2 (enExample)
WO (1) WO2014139814A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013212613B4 (de) * 2013-06-28 2015-07-23 Carl Zeiss Sms Gmbh Beleuchtungsoptik für ein Metrologiesystem sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US6195201B1 (en) 1999-01-27 2001-02-27 Svg Lithography Systems, Inc. Reflective fly's eye condenser for EUV lithography
JP3652296B2 (ja) * 2001-10-26 2005-05-25 キヤノン株式会社 光学装置
JP5436853B2 (ja) * 2005-04-20 2014-03-05 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影露光系及び偏光光学素子
DE102008007449A1 (de) 2008-02-01 2009-08-13 Carl Zeiss Smt Ag Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie
CN101946190B (zh) 2008-02-15 2013-06-19 卡尔蔡司Smt有限责任公司 微光刻的投射曝光设备使用的分面镜
DE102008002749A1 (de) * 2008-06-27 2009-12-31 Carl Zeiss Smt Ag Beleuchtungsoptik für die Mikrolithografie
WO2010049076A2 (de) 2008-10-20 2010-05-06 Carl Zeiss Smt Ag Optische baugruppe zur führung eines strahlungsbündels
JP2011077142A (ja) * 2009-09-29 2011-04-14 Nikon Corp 照明光学装置、露光装置及びデバイス製造方法
DE102010001336B3 (de) * 2010-01-28 2011-07-28 Carl Zeiss SMT GmbH, 73447 Anordnung und Verfahren zur Charakterisierung der Polarisationseigenschaften eines optischen Systems
DE102011004615A1 (de) * 2010-03-17 2011-09-22 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
JP6137179B2 (ja) * 2011-07-26 2017-05-31 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の光学系及びマイクロリソグラフィ露光方法

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