JP2016511441A5 - - Google Patents
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- JP2016511441A5 JP2016511441A5 JP2015562035A JP2015562035A JP2016511441A5 JP 2016511441 A5 JP2016511441 A5 JP 2016511441A5 JP 2015562035 A JP2015562035 A JP 2015562035A JP 2015562035 A JP2015562035 A JP 2015562035A JP 2016511441 A5 JP2016511441 A5 JP 2016511441A5
- Authority
- JP
- Japan
- Prior art keywords
- facet mirror
- illumination
- pupil
- field
- pupil facet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 210000001747 pupil Anatomy 0.000 claims description 294
- 238000005286 illumination Methods 0.000 claims description 272
- 230000010287 polarization Effects 0.000 claims description 132
- 230000003287 optical effect Effects 0.000 claims description 109
- 230000007935 neutral effect Effects 0.000 claims description 60
- 238000003384 imaging method Methods 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 9
- 238000001459 lithography Methods 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 238000012546 transfer Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 2
- 230000005855 radiation Effects 0.000 description 17
- 238000006073 displacement reaction Methods 0.000 description 16
- 238000010586 diagram Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000003491 array Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000005405 multipole Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361781179P | 2013-03-14 | 2013-03-14 | |
| DE102013204431 | 2013-03-14 | ||
| DE102013204431.3 | 2013-03-14 | ||
| US61/781179 | 2013-03-14 | ||
| PCT/EP2014/054422 WO2014139872A1 (en) | 2013-03-14 | 2014-03-07 | Illumination optical unit for projection lithography |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016511441A JP2016511441A (ja) | 2016-04-14 |
| JP2016511441A5 true JP2016511441A5 (enExample) | 2018-09-20 |
| JP6453251B2 JP6453251B2 (ja) | 2019-01-16 |
Family
ID=51535890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015562035A Active JP6453251B2 (ja) | 2013-03-14 | 2014-03-07 | 投影リソグラフィのための照明光学ユニット |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9766553B2 (enExample) |
| JP (1) | JP6453251B2 (enExample) |
| TW (1) | TWI612391B (enExample) |
| WO (1) | WO2014139872A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102006020734A1 (de) * | 2006-05-04 | 2007-11-15 | Carl Zeiss Smt Ag | Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem |
| DE102012220465A1 (de) * | 2012-11-09 | 2014-05-15 | Carl Zeiss Smt Gmbh | EUV-Kollektor |
| DE102017220586A1 (de) * | 2017-11-17 | 2019-05-23 | Carl Zeiss Smt Gmbh | Pupillenfacettenspiegel, Beleuchtungsoptik und optisches System für eine Projek-tionsbelichtungsanlage |
| DE102018200167A1 (de) | 2018-01-08 | 2019-07-11 | Carl Zeiss Smt Gmbh | Pupillenfacettenspiegel, Beleuchtungsoptik und optisches System für eine Projektionsbelichtungsanlage |
| DE102019200193B3 (de) | 2019-01-09 | 2020-02-06 | Carl Zeiss Smt Gmbh | Optisches System für eine Projektionsbelichtungsanlage |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10138313A1 (de) | 2001-01-23 | 2002-07-25 | Zeiss Carl | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
| US6195201B1 (en) | 1999-01-27 | 2001-02-27 | Svg Lithography Systems, Inc. | Reflective fly's eye condenser for EUV lithography |
| US6741302B2 (en) * | 2001-06-20 | 2004-05-25 | International Business Machines Corporation | System and method for utilizing diffuse and specular radiation to overcome shadowed regions |
| JP3652296B2 (ja) * | 2001-10-26 | 2005-05-25 | キヤノン株式会社 | 光学装置 |
| JP2006156857A (ja) * | 2004-12-01 | 2006-06-15 | Canon Inc | Ｘ線発生装置及び露光装置 |
| DE102008007449A1 (de) | 2008-02-01 | 2009-08-13 | Carl Zeiss Smt Ag | Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie |
| CN101946190B (zh) | 2008-02-15 | 2013-06-19 | 卡尔蔡司Smt有限责任公司 | 微光刻的投射曝光设备使用的分面镜 |
| DE102008002749A1 (de) | 2008-06-27 | 2009-12-31 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die Mikrolithografie |
| WO2010049076A2 (de) | 2008-10-20 | 2010-05-06 | Carl Zeiss Smt Ag | Optische baugruppe zur führung eines strahlungsbündels |
| DE102010001336B3 (de) * | 2010-01-28 | 2011-07-28 | Carl Zeiss SMT GmbH, 73447 | Anordnung und Verfahren zur Charakterisierung der Polarisationseigenschaften eines optischen Systems |
| DE102011004615A1 (de) * | 2010-03-17 | 2011-09-22 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithografie |
| JP6137179B2 (ja) * | 2011-07-26 | 2017-05-31 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置の光学系及びマイクロリソグラフィ露光方法 |
-
2014
- 2014-03-07 WO PCT/EP2014/054422 patent/WO2014139872A1/en not_active Ceased
- 2014-03-07 JP JP2015562035A patent/JP6453251B2/ja active Active
- 2014-03-12 TW TW103108806A patent/TWI612391B/zh active
-
2015
- 2015-08-20 US US14/830,985 patent/US9766553B2/en active Active
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