TWI612391B - 用於投影微影的照明光學單元 - Google Patents
用於投影微影的照明光學單元 Download PDFInfo
- Publication number
- TWI612391B TWI612391B TW103108806A TW103108806A TWI612391B TW I612391 B TWI612391 B TW I612391B TW 103108806 A TW103108806 A TW 103108806A TW 103108806 A TW103108806 A TW 103108806A TW I612391 B TWI612391 B TW I612391B
- Authority
- TW
- Taiwan
- Prior art keywords
- section
- pupil
- illumination
- mirror
- field
- Prior art date
Links
- 238000005286 illumination Methods 0.000 title claims abstract description 233
- 230000003287 optical effect Effects 0.000 title claims abstract description 102
- 238000001459 lithography Methods 0.000 title abstract description 6
- 210000001747 pupil Anatomy 0.000 claims abstract description 271
- 230000010287 polarization Effects 0.000 claims abstract description 83
- 238000012546 transfer Methods 0.000 claims abstract description 9
- 238000003384 imaging method Methods 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 230000008859 change Effects 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims 1
- 230000000149 penetrating effect Effects 0.000 claims 1
- 230000007935 neutral effect Effects 0.000 abstract description 42
- 238000006073 displacement reaction Methods 0.000 description 24
- 230000005855 radiation Effects 0.000 description 20
- 238000013461 design Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000004075 alteration Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 241000199995 Microdon <dipteran fly> Species 0.000 description 1
- 230000003044 adaptive effect Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229930182905 microdon Natural products 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0905—Dividing and/or superposing multiple light beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0977—Reflective elements
- G02B27/0983—Reflective elements being curved
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Microscoopes, Condenser (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013204431 | 2013-03-14 | ||
| ??102013204431.3 | 2013-03-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201502713A TW201502713A (zh) | 2015-01-16 |
| TWI612391B true TWI612391B (zh) | 2018-01-21 |
Family
ID=51535890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103108806A TWI612391B (zh) | 2013-03-14 | 2014-03-12 | 用於投影微影的照明光學單元 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9766553B2 (enExample) |
| JP (1) | JP6453251B2 (enExample) |
| TW (1) | TWI612391B (enExample) |
| WO (1) | WO2014139872A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102006020734A1 (de) * | 2006-05-04 | 2007-11-15 | Carl Zeiss Smt Ag | Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem |
| DE102012220465A1 (de) * | 2012-11-09 | 2014-05-15 | Carl Zeiss Smt Gmbh | EUV-Kollektor |
| DE102017220586A1 (de) * | 2017-11-17 | 2019-05-23 | Carl Zeiss Smt Gmbh | Pupillenfacettenspiegel, Beleuchtungsoptik und optisches System für eine Projek-tionsbelichtungsanlage |
| DE102018200167A1 (de) | 2018-01-08 | 2019-07-11 | Carl Zeiss Smt Gmbh | Pupillenfacettenspiegel, Beleuchtungsoptik und optisches System für eine Projektionsbelichtungsanlage |
| DE102019200193B3 (de) | 2019-01-09 | 2020-02-06 | Carl Zeiss Smt Gmbh | Optisches System für eine Projektionsbelichtungsanlage |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130021592A1 (en) * | 2010-01-28 | 2013-01-24 | Carl Zeiss Smt Gmbh | Arrangement for and method of characterising the polarisation properties of an optical system |
| WO2013013947A2 (en) * | 2011-07-26 | 2013-01-31 | Carl Zeiss Smt Gmbh | Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure method |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10138313A1 (de) | 2001-01-23 | 2002-07-25 | Zeiss Carl | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
| US6195201B1 (en) | 1999-01-27 | 2001-02-27 | Svg Lithography Systems, Inc. | Reflective fly's eye condenser for EUV lithography |
| US6741302B2 (en) * | 2001-06-20 | 2004-05-25 | International Business Machines Corporation | System and method for utilizing diffuse and specular radiation to overcome shadowed regions |
| JP3652296B2 (ja) * | 2001-10-26 | 2005-05-25 | キヤノン株式会社 | 光学装置 |
| JP2006156857A (ja) * | 2004-12-01 | 2006-06-15 | Canon Inc | Ｘ線発生装置及び露光装置 |
| DE102008007449A1 (de) | 2008-02-01 | 2009-08-13 | Carl Zeiss Smt Ag | Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie |
| CN101946190B (zh) | 2008-02-15 | 2013-06-19 | 卡尔蔡司Smt有限责任公司 | 微光刻的投射曝光设备使用的分面镜 |
| DE102008002749A1 (de) | 2008-06-27 | 2009-12-31 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die Mikrolithografie |
| WO2010049076A2 (de) | 2008-10-20 | 2010-05-06 | Carl Zeiss Smt Ag | Optische baugruppe zur führung eines strahlungsbündels |
| DE102011004615A1 (de) * | 2010-03-17 | 2011-09-22 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithografie |
-
2014
- 2014-03-07 WO PCT/EP2014/054422 patent/WO2014139872A1/en not_active Ceased
- 2014-03-07 JP JP2015562035A patent/JP6453251B2/ja active Active
- 2014-03-12 TW TW103108806A patent/TWI612391B/zh active
-
2015
- 2015-08-20 US US14/830,985 patent/US9766553B2/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130021592A1 (en) * | 2010-01-28 | 2013-01-24 | Carl Zeiss Smt Gmbh | Arrangement for and method of characterising the polarisation properties of an optical system |
| WO2013013947A2 (en) * | 2011-07-26 | 2013-01-31 | Carl Zeiss Smt Gmbh | Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure method |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201502713A (zh) | 2015-01-16 |
| WO2014139872A1 (en) | 2014-09-18 |
| US20150355555A1 (en) | 2015-12-10 |
| JP6453251B2 (ja) | 2019-01-16 |
| US9766553B2 (en) | 2017-09-19 |
| JP2016511441A (ja) | 2016-04-14 |
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