JP6453251B2 - 投影リソグラフィのための照明光学ユニット - Google Patents

投影リソグラフィのための照明光学ユニット Download PDF

Info

Publication number
JP6453251B2
JP6453251B2 JP2015562035A JP2015562035A JP6453251B2 JP 6453251 B2 JP6453251 B2 JP 6453251B2 JP 2015562035 A JP2015562035 A JP 2015562035A JP 2015562035 A JP2015562035 A JP 2015562035A JP 6453251 B2 JP6453251 B2 JP 6453251B2
Authority
JP
Japan
Prior art keywords
facet mirror
illumination
pupil
field
pupil facet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2015562035A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016511441A5 (enExample
JP2016511441A (ja
Inventor
マンフレッド マウル
マンフレッド マウル
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by カール・ツァイス・エスエムティー・ゲーエムベーハー filed Critical カール・ツァイス・エスエムティー・ゲーエムベーハー
Publication of JP2016511441A publication Critical patent/JP2016511441A/ja
Publication of JP2016511441A5 publication Critical patent/JP2016511441A5/ja
Application granted granted Critical
Publication of JP6453251B2 publication Critical patent/JP6453251B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0905—Dividing and/or superposing multiple light beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0977—Reflective elements
    • G02B27/0983—Reflective elements being curved

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Microscoopes, Condenser (AREA)
JP2015562035A 2013-03-14 2014-03-07 投影リソグラフィのための照明光学ユニット Active JP6453251B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361781179P 2013-03-14 2013-03-14
DE102013204431 2013-03-14
DE102013204431.3 2013-03-14
US61/781179 2013-03-14
PCT/EP2014/054422 WO2014139872A1 (en) 2013-03-14 2014-03-07 Illumination optical unit for projection lithography

Publications (3)

Publication Number Publication Date
JP2016511441A JP2016511441A (ja) 2016-04-14
JP2016511441A5 JP2016511441A5 (enExample) 2018-09-20
JP6453251B2 true JP6453251B2 (ja) 2019-01-16

Family

ID=51535890

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015562035A Active JP6453251B2 (ja) 2013-03-14 2014-03-07 投影リソグラフィのための照明光学ユニット

Country Status (4)

Country Link
US (1) US9766553B2 (enExample)
JP (1) JP6453251B2 (enExample)
TW (1) TWI612391B (enExample)
WO (1) WO2014139872A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006020734A1 (de) * 2006-05-04 2007-11-15 Carl Zeiss Smt Ag Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem
DE102012220465A1 (de) * 2012-11-09 2014-05-15 Carl Zeiss Smt Gmbh EUV-Kollektor
DE102017220586A1 (de) * 2017-11-17 2019-05-23 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel, Beleuchtungsoptik und optisches System für eine Projek-tionsbelichtungsanlage
DE102018200167A1 (de) 2018-01-08 2019-07-11 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel, Beleuchtungsoptik und optisches System für eine Projektionsbelichtungsanlage
DE102019200193B3 (de) 2019-01-09 2020-02-06 Carl Zeiss Smt Gmbh Optisches System für eine Projektionsbelichtungsanlage

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US6195201B1 (en) 1999-01-27 2001-02-27 Svg Lithography Systems, Inc. Reflective fly's eye condenser for EUV lithography
US6741302B2 (en) * 2001-06-20 2004-05-25 International Business Machines Corporation System and method for utilizing diffuse and specular radiation to overcome shadowed regions
JP3652296B2 (ja) * 2001-10-26 2005-05-25 キヤノン株式会社 光学装置
JP2006156857A (ja) * 2004-12-01 2006-06-15 Canon Inc Ｘ線発生装置及び露光装置
DE102008007449A1 (de) 2008-02-01 2009-08-13 Carl Zeiss Smt Ag Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie
CN101946190B (zh) 2008-02-15 2013-06-19 卡尔蔡司Smt有限责任公司 微光刻的投射曝光设备使用的分面镜
DE102008002749A1 (de) 2008-06-27 2009-12-31 Carl Zeiss Smt Ag Beleuchtungsoptik für die Mikrolithografie
WO2010049076A2 (de) 2008-10-20 2010-05-06 Carl Zeiss Smt Ag Optische baugruppe zur führung eines strahlungsbündels
DE102010001336B3 (de) * 2010-01-28 2011-07-28 Carl Zeiss SMT GmbH, 73447 Anordnung und Verfahren zur Charakterisierung der Polarisationseigenschaften eines optischen Systems
DE102011004615A1 (de) * 2010-03-17 2011-09-22 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
JP6137179B2 (ja) * 2011-07-26 2017-05-31 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の光学系及びマイクロリソグラフィ露光方法

Also Published As

Publication number Publication date
TWI612391B (zh) 2018-01-21
TW201502713A (zh) 2015-01-16
WO2014139872A1 (en) 2014-09-18
US20150355555A1 (en) 2015-12-10
US9766553B2 (en) 2017-09-19
JP2016511441A (ja) 2016-04-14

Similar Documents

Publication Publication Date Title
KR101736549B1 (ko) 마이크로리소그래픽 투영 노광 장치의 조명 시스템
JP5106692B2 (ja) 投影リソグラフィのための照明光学ユニット
JP5345132B2 (ja) マイクロリソグラフィ露光装置においてマスクを照明するための照明系
JP6253163B2 (ja) 投影リソグラフィのための照明光学ユニット
KR101813307B1 (ko) 마이크로리소그래픽 투영 노광 장치의 조명 시스템
JP6453251B2 (ja) 投影リソグラフィのための照明光学ユニット
JP2016511441A5 (enExample)
US9955563B2 (en) EUV light source for generating a usable output beam for a projection exposure apparatus
JP6410741B2 (ja) 投影リソグラフィのための照明光学ユニット
JP2016517026A5 (enExample)
JP2016035606A (ja) マイクロリソグラフィ投影露光装置においてマスクを照明するための照明システム
JP2014146814A (ja) マイクロリソグラフィ投影露光装置においてマスクを照明するための照明システム

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20151118

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20170306

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20180129

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180205

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20180418

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20180806

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20181112

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20181212

R150 Certificate of patent or registration of utility model

Ref document number: 6453251

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20190121

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250