JP2016504738A - カーボンナノチューブ透明複合電極の製作方法 - Google Patents
カーボンナノチューブ透明複合電極の製作方法 Download PDFInfo
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- JP2016504738A JP2016504738A JP2015551963A JP2015551963A JP2016504738A JP 2016504738 A JP2016504738 A JP 2016504738A JP 2015551963 A JP2015551963 A JP 2015551963A JP 2015551963 A JP2015551963 A JP 2015551963A JP 2016504738 A JP2016504738 A JP 2016504738A
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 94
- 239000002041 carbon nanotube Substances 0.000 title claims abstract description 91
- 229910021393 carbon nanotube Inorganic materials 0.000 title claims abstract description 91
- 239000002131 composite material Substances 0.000 title claims abstract description 38
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 239000010409 thin film Substances 0.000 claims abstract description 59
- 239000000758 substrate Substances 0.000 claims abstract description 40
- 238000000034 method Methods 0.000 claims abstract description 34
- 229920001940 conductive polymer Polymers 0.000 claims abstract description 22
- 239000010408 film Substances 0.000 claims description 26
- 229920000642 polymer Polymers 0.000 claims description 19
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 9
- 239000007864 aqueous solution Substances 0.000 claims description 9
- 150000003839 salts Chemical class 0.000 claims description 9
- 239000000243 solution Substances 0.000 claims description 8
- 239000002238 carbon nanotube film Substances 0.000 claims description 7
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- MIOPJNTWMNEORI-GMSGAONNSA-N (S)-camphorsulfonic acid Chemical compound C1C[C@@]2(CS(O)(=O)=O)C(=O)C[C@@H]1C2(C)C MIOPJNTWMNEORI-GMSGAONNSA-N 0.000 claims description 3
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 claims description 3
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 claims description 3
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 claims description 3
- 229920000144 PEDOT:PSS Polymers 0.000 claims description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 3
- 239000006184 cosolvent Substances 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 claims description 3
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- SSILHZFTFWOUJR-UHFFFAOYSA-N hexadecane-1-sulfonic acid Chemical compound CCCCCCCCCCCCCCCCS(O)(=O)=O SSILHZFTFWOUJR-UHFFFAOYSA-N 0.000 claims description 3
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 claims description 3
- 229920001467 poly(styrenesulfonates) Polymers 0.000 claims description 3
- 229920001197 polyacetylene Polymers 0.000 claims description 3
- 229920000767 polyaniline Polymers 0.000 claims description 3
- 229920000128 polypyrrole Polymers 0.000 claims description 3
- 229960002796 polystyrene sulfonate Drugs 0.000 claims description 3
- 239000011970 polystyrene sulfonate Substances 0.000 claims description 3
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 claims description 3
- 239000000600 sorbitol Substances 0.000 claims description 3
- 230000003746 surface roughness Effects 0.000 claims description 3
- 238000003698 laser cutting Methods 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 5
- 238000010297 mechanical methods and process Methods 0.000 abstract 1
- 230000005226 mechanical processes and functions Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 15
- 238000003825 pressing Methods 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 239000000443 aerosol Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000001308 synthesis method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000011112 process operation Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000021615 conjugation Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005274 electronic transitions Effects 0.000 description 1
- 238000001962 electrophoresis Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000002048 multi walled nanotube Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000003828 vacuum filtration Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Human Computer Interaction (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Electric Cables (AREA)
- Non-Insulated Conductors (AREA)
- Carbon And Carbon Compounds (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
湿法合成は、主にカーボンナノチューブ粉末を溶液に均一に分散させて薄膜製作を行うことを指し、非特許文献1の真空ろ過転移法、非特許文献2のスプレー塗布法、非特許文献3の回転塗布法、非特許文献4の引き上げ法、非特許文献5のLB法、非特許文献6の電気泳動法等を含む。乾法製作は、非特許文献7のエアロゾル直接合成法、非特許文献8の超アレイ引き上げ法等を含む。
例えば、導電性高分子水溶液が1.8%のPEDOT:PSS水溶液であり、
Claims (7)
- 高分子の透明基板と透明基板の表面に形成されるCNT複合薄膜とを含み、前記CNT複合薄膜がCNT薄膜及び導電性高分子膜によって構成されるカーボンナノチューブ透明複合電極の製作方法であって、
高分子の透明基板に超連続的に配列するカーボンナノチューブ薄膜を敷設する際に、Siシート上で成長させた超連続的に配列するカーボンナノチューブに対して辺縁から膜引き部材によって所定の幅のカーボンナノチューブ膜層を抜出すことにより所定区域を満たすように前記膜層を高分子の透明基板の表面に敷設し、レーザカット方法またはエタノール収縮方法を使用してカーボンナノチューブ薄膜を切断するステップ(1)と、
カーボンナノチューブ薄膜が敷設された基板を相対して回転する一対のローラの間に通過させ、1つまたは2つの前記ローラの表面に導電性高分子水溶液が塗布されることでカーボンナノチューブ薄膜の表面に1層の導電性高分子膜を粘着させるステップ(2)とを含むカーボンナノチューブ透明複合電極の製作方法。 - 前記ローラの表面粗さRaが0.02〜0.01μmである請求項1に記載のカーボンナノチューブ透明複合電極。
- 前記ローラ間の挟持する隙間の最小距離が基板の厚さである請求項1に記載のカーボンナノチューブ透明複合電極。
- 前記導電性高分子水溶液の粘度が1〜10×10−3Pa・sである請求項1に記載のカーボンナノチューブ透明複合電極。
- 前記導電性高分子水溶液の主要組成成分は、1)ポリアニリン、ポリ3,4−エチレンジオキシチオフェン、ポリアセチレンまたは/及びポリピロール、2)助溶剤:ポリスチレンスルホン酸塩、カンファースルホン酸、ドデシルベンゼンスルホン酸及びその塩、パルミチルスルホン酸及びその塩または/及びナフタレンスルホン酸及びその塩、3)改質助剤:プロパンジオール、ソルビトール、ジメチルスルホキシドまたは/及びN,N−ジメチルホルムアミド、エチレングリコール、4)残量が水である請求項1に記載のカーボンナノチューブ透明複合電極。
- 前記導電性高分子水溶液が1.8%のPEDOT:PSS水溶液であり、その具体的な組成は、
- 前記ローラの内部には加熱部材が設けられる請求項1に記載のカーボンナノチューブ透明複合電極。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310012106.9A CN103928637B (zh) | 2013-01-14 | 2013-01-14 | 碳纳米管透明复合电极的制备方法 |
CN201310012106.9 | 2013-01-14 | ||
PCT/CN2013/089463 WO2014108015A1 (zh) | 2013-01-14 | 2013-12-14 | 碳纳米管透明复合电极的制备方法 |
Publications (2)
Publication Number | Publication Date |
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JP2016504738A true JP2016504738A (ja) | 2016-02-12 |
JP5965554B2 JP5965554B2 (ja) | 2016-08-10 |
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JP2015551963A Expired - Fee Related JP5965554B2 (ja) | 2013-01-14 | 2013-12-14 | カーボンナノチューブ透明複合電極の製作方法 |
Country Status (7)
Country | Link |
---|---|
JP (1) | JP5965554B2 (ja) |
KR (1) | KR101693774B1 (ja) |
CN (1) | CN103928637B (ja) |
DE (1) | DE112013006416T5 (ja) |
HK (1) | HK1196996A1 (ja) |
TW (1) | TWI553662B (ja) |
WO (1) | WO2014108015A1 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
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CN105321592B (zh) * | 2014-08-01 | 2017-03-22 | 广东阿格蕾雅光电材料有限公司 | 碳纳米管‑高分子层状复合透明柔性电极及其制备方法 |
CN105361977B (zh) * | 2014-08-26 | 2018-08-10 | 中国科学院苏州纳米技术与纳米仿生研究所 | 电阻式柔性透明关节部位电子皮肤及其制备方法和应用 |
CN104465993A (zh) * | 2014-10-28 | 2015-03-25 | 南昌大学 | 一种碳基复合透明电极及制备方法 |
CN104576321A (zh) * | 2015-01-30 | 2015-04-29 | 京东方科技集团股份有限公司 | 一种电极结构、其制作方法、显示基板及显示装置 |
CN104616838B (zh) | 2015-02-10 | 2018-02-06 | 京东方科技集团股份有限公司 | 一种电子器件的制作方法及电子器件 |
CN107249880B (zh) * | 2015-02-23 | 2020-08-04 | 琳得科美国股份有限公司 | 粘合片 |
CN105024015B (zh) * | 2015-06-24 | 2017-12-22 | 复旦大学 | 一种可拼接的钙钛矿太阳能电池及其制备方法 |
CN106601329B (zh) * | 2016-08-18 | 2019-04-16 | 北京纳米能源与系统研究所 | 一种柔性纳米摩擦发电机、制备方法及制成的传感器 |
CN106782774A (zh) * | 2017-01-10 | 2017-05-31 | 京东方科技集团股份有限公司 | 透明导电薄膜、其制备方法及装置 |
CN109428006B (zh) | 2017-08-30 | 2020-01-07 | 清华大学 | 有机发光二极管 |
CN109428009B (zh) | 2017-08-30 | 2020-05-15 | 清华大学 | 有机发光二极管的制备方法 |
CN109427982B (zh) * | 2017-08-30 | 2020-01-03 | 清华大学 | 有机发光二极管 |
Family Cites Families (7)
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KR100992154B1 (ko) * | 2008-09-19 | 2010-11-05 | 한국전자통신연구원 | 탄소나노튜브를 이용한 투명 전도성 박막 및 그 제조 방법 |
CN102086035B (zh) | 2009-12-03 | 2013-06-19 | 北京富纳特创新科技有限公司 | 碳纳米管膜及其制备方法 |
JP5554552B2 (ja) * | 2009-12-09 | 2014-07-23 | アルプス電気株式会社 | 透明導電膜及びその製造方法 |
CN101923912B (zh) * | 2010-06-18 | 2013-12-11 | 北京富纳特创新科技有限公司 | 碳纳米管膜及基于该碳纳米管膜的复合膜 |
KR101272483B1 (ko) * | 2010-12-09 | 2013-06-10 | 한국과학기술원 | 탄소나노튜브와 전도성 고분자를 이용한 다층 구조의 투명 전도성 판재의 제조방법 |
CN102321323B (zh) * | 2011-05-27 | 2013-08-28 | 清华大学 | 透明碳纳米管复合膜的制备方法 |
JP2015067483A (ja) | 2013-09-30 | 2015-04-13 | 日立造船株式会社 | 繊維状カーボン材料の製造方法 |
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2013
- 2013-01-14 CN CN201310012106.9A patent/CN103928637B/zh not_active Expired - Fee Related
- 2013-12-14 KR KR1020157017465A patent/KR101693774B1/ko active IP Right Grant
- 2013-12-14 WO PCT/CN2013/089463 patent/WO2014108015A1/zh active Application Filing
- 2013-12-14 DE DE112013006416.2T patent/DE112013006416T5/de not_active Withdrawn
- 2013-12-14 JP JP2015551963A patent/JP5965554B2/ja not_active Expired - Fee Related
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2014
- 2014-01-10 TW TW103100887A patent/TWI553662B/zh not_active IP Right Cessation
- 2014-10-16 HK HK14110367.8A patent/HK1196996A1/zh not_active IP Right Cessation
Non-Patent Citations (1)
Title |
---|
JPN6016024550; Feng C, Liu K, Wu J S, et al.: 'Flexible, Stretchable, Transparent Conducting Films Made from Superaligned Carbon Nanotubes' J. Adv. Funct. Mater. Volume 20,Issue 6, 20100225, p.885-p.891, WILEY InterScience * |
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Publication number | Publication date |
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TWI553662B (zh) | 2016-10-11 |
WO2014108015A1 (zh) | 2014-07-17 |
TW201432718A (zh) | 2014-08-16 |
DE112013006416T5 (de) | 2015-10-15 |
HK1196996A1 (zh) | 2014-12-24 |
KR101693774B1 (ko) | 2017-01-06 |
CN103928637B (zh) | 2016-05-04 |
KR20150118583A (ko) | 2015-10-22 |
JP5965554B2 (ja) | 2016-08-10 |
CN103928637A (zh) | 2014-07-16 |
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