JP2016211917A5 - - Google Patents

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Publication number
JP2016211917A5
JP2016211917A5 JP2015094219A JP2015094219A JP2016211917A5 JP 2016211917 A5 JP2016211917 A5 JP 2016211917A5 JP 2015094219 A JP2015094219 A JP 2015094219A JP 2015094219 A JP2015094219 A JP 2015094219A JP 2016211917 A5 JP2016211917 A5 JP 2016211917A5
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JP
Japan
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substrate
semiconductor chip
semiconductor
tsv
tsvs
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JP2015094219A
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Japanese (ja)
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JP6570055B2 (ja
JP2016211917A (ja
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Publication of JP2016211917A5 publication Critical patent/JP2016211917A5/ja
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JP2015094219A 2015-05-01 2015-05-01 半導体チップ、半導体装置及び半導体検査システム Active JP6570055B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2015094219A JP6570055B2 (ja) 2015-05-01 2015-05-01 半導体チップ、半導体装置及び半導体検査システム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015094219A JP6570055B2 (ja) 2015-05-01 2015-05-01 半導体チップ、半導体装置及び半導体検査システム

Publications (3)

Publication Number Publication Date
JP2016211917A JP2016211917A (ja) 2016-12-15
JP2016211917A5 true JP2016211917A5 (enrdf_load_stackoverflow) 2018-06-14
JP6570055B2 JP6570055B2 (ja) 2019-09-04

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ID=57551651

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JP2015094219A Active JP6570055B2 (ja) 2015-05-01 2015-05-01 半導体チップ、半導体装置及び半導体検査システム

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JP (1) JP6570055B2 (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201838094A (zh) * 2017-02-16 2018-10-16 學校法人慶應義塾 層疊半導體積體電路裝置
KR102726176B1 (ko) * 2020-09-01 2024-11-06 에스케이하이닉스 주식회사 반도체 장치 및 그의 동작 방법
JP7558424B2 (ja) 2021-10-26 2024-09-30 三菱電機株式会社 半導体集積回路装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2892474B2 (ja) * 1990-09-07 1999-05-17 新光電気工業株式会社 セラミック基板のビア検査方法
JP4982543B2 (ja) * 2002-12-27 2012-07-25 日置電機株式会社 多層基板のスルーホール断線検出方法
WO2009147717A1 (ja) * 2008-06-02 2009-12-10 株式会社アドバンテスト プローブウエハ、プローブ装置および試験システム
JP2010219425A (ja) * 2009-03-18 2010-09-30 Toshiba Corp 半導体装置
JP2012083262A (ja) * 2010-10-13 2012-04-26 Advantest Corp 試験装置および試験方法
JP5967713B2 (ja) * 2012-12-13 2016-08-10 国立研究開発法人産業技術総合研究所 積層型lsiチップの絶縁膜の検査方法及び積層型lsiチップの製造方法
JP6259254B2 (ja) * 2013-10-18 2018-01-10 株式会社日本マイクロニクス 検査装置および検査方法

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