JP2016207409A5 - - Google Patents
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- Publication number
- JP2016207409A5 JP2016207409A5 JP2015086682A JP2015086682A JP2016207409A5 JP 2016207409 A5 JP2016207409 A5 JP 2016207409A5 JP 2015086682 A JP2015086682 A JP 2015086682A JP 2015086682 A JP2015086682 A JP 2015086682A JP 2016207409 A5 JP2016207409 A5 JP 2016207409A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- pipe
- processing chamber
- mass flow
- flow controller
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 230000002123 temporal effect Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015086682A JP6541406B2 (ja) | 2015-04-21 | 2015-04-21 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015086682A JP6541406B2 (ja) | 2015-04-21 | 2015-04-21 | プラズマ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016207409A JP2016207409A (ja) | 2016-12-08 |
| JP2016207409A5 true JP2016207409A5 (https=) | 2018-02-01 |
| JP6541406B2 JP6541406B2 (ja) | 2019-07-10 |
Family
ID=57490144
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015086682A Active JP6541406B2 (ja) | 2015-04-21 | 2015-04-21 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6541406B2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7296854B2 (ja) * | 2019-11-07 | 2023-06-23 | 東京エレクトロン株式会社 | ガス供給方法及び基板処理装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070066038A1 (en) * | 2004-04-30 | 2007-03-22 | Lam Research Corporation | Fast gas switching plasma processing apparatus |
| JP4782585B2 (ja) * | 2006-02-28 | 2011-09-28 | 株式会社日立ハイテクノロジーズ | プラズマエッチング装置及び方法 |
| JP5235293B2 (ja) * | 2006-10-02 | 2013-07-10 | 東京エレクトロン株式会社 | 処理ガス供給機構および処理ガス供給方法ならびにガス処理装置 |
| JP5442413B2 (ja) * | 2009-12-03 | 2014-03-12 | ルネサスエレクトロニクス株式会社 | 半導体製造装置および流量制御装置 |
| JP6027490B2 (ja) * | 2013-05-13 | 2016-11-16 | 東京エレクトロン株式会社 | ガスを供給する方法、及びプラズマ処理装置 |
-
2015
- 2015-04-21 JP JP2015086682A patent/JP6541406B2/ja active Active
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