JP2016157884A - シリコン含有膜の成膜方法 - Google Patents
シリコン含有膜の成膜方法 Download PDFInfo
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- JP2016157884A JP2016157884A JP2015036142A JP2015036142A JP2016157884A JP 2016157884 A JP2016157884 A JP 2016157884A JP 2015036142 A JP2015036142 A JP 2015036142A JP 2015036142 A JP2015036142 A JP 2015036142A JP 2016157884 A JP2016157884 A JP 2016157884A
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- 238000000034 method Methods 0.000 title claims abstract description 218
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 101
- 239000010703 silicon Substances 0.000 title claims abstract description 101
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 100
- 230000008021 deposition Effects 0.000 title abstract description 9
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 52
- 229910052796 boron Inorganic materials 0.000 claims abstract description 50
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 48
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 43
- 229910000077 silane Inorganic materials 0.000 claims abstract description 43
- 239000000758 substrate Substances 0.000 claims abstract description 38
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000007789 gas Substances 0.000 claims description 380
- 238000012545 processing Methods 0.000 claims description 132
- 238000000926 separation method Methods 0.000 claims description 112
- 238000010926 purge Methods 0.000 claims description 24
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- 239000003054 catalyst Substances 0.000 claims description 17
- BIVNKSDKIFWKFA-UHFFFAOYSA-N N-propan-2-yl-N-silylpropan-2-amine Chemical compound CC(C)N([SiH3])C(C)C BIVNKSDKIFWKFA-UHFFFAOYSA-N 0.000 claims description 13
- 238000005121 nitriding Methods 0.000 claims description 12
- 230000003197 catalytic effect Effects 0.000 claims description 7
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 7
- 238000011144 upstream manufacturing Methods 0.000 claims description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 3
- 230000008569 process Effects 0.000 abstract description 85
- 239000000463 material Substances 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 272
- 235000012431 wafers Nutrition 0.000 description 132
- 239000010410 layer Substances 0.000 description 84
- 230000000052 comparative effect Effects 0.000 description 50
- 238000010586 diagram Methods 0.000 description 30
- 239000012495 reaction gas Substances 0.000 description 22
- 229910052581 Si3N4 Inorganic materials 0.000 description 15
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 15
- 238000005137 deposition process Methods 0.000 description 14
- 230000003746 surface roughness Effects 0.000 description 13
- 238000011534 incubation Methods 0.000 description 12
- 230000002093 peripheral effect Effects 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 10
- 238000012546 transfer Methods 0.000 description 10
- 238000005259 measurement Methods 0.000 description 9
- 238000000231 atomic layer deposition Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 230000006870 function Effects 0.000 description 5
- 239000012528 membrane Substances 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 229910003697 SiBN Inorganic materials 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- -1 nitride radical Chemical class 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000012535 impurity Substances 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- ZOCHARZZJNPSEU-UHFFFAOYSA-N diboron Chemical compound B#B ZOCHARZZJNPSEU-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 150000002831 nitrogen free-radicals Chemical class 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 101000735417 Homo sapiens Protein PAPPAS Proteins 0.000 description 1
- 102100034919 Protein PAPPAS Human genes 0.000 description 1
- 229910008045 Si-Si Inorganic materials 0.000 description 1
- 229910006411 Si—Si Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002052 molecular layer Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/45523—Pulsed gas flow or change of composition over time
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Abstract
Description
前記回転テーブルを回転させながら前記第1の処理ガス供給手段から前記基板にアミノシランガスを所定期間供給し、前記基板の表面にシード層を形成するシード層形成工程と、
該シード層形成工程終了後に、前記回転テーブルを回転させながら前記第1の処理ガス供給手段から触媒ガスとしてホウ素含有ガスを前記基板の表面に供給する触媒供給工程と、
前記回転テーブルを回転させながら前記第2の処理ガス供給手段から原料ガスとしてシラン系ガスを前記基板の表面に供給し、前記ホウ素含有ガスの触媒作用により前記シラン系ガスに含まれるシリコン同士の結合を前記基板の表面上で発生させる原料ガス供給工程と、を有する。
図9は、本発明の第1の実施形態に係るシリコン含有膜の成膜方法の処理フローを説明するための図である。図9(a)は、本発明の第1の実施形態に係るシリコン含有膜の成膜方法を実施するための成膜装置の供給ガスの平面配置の一例を示した図であり、図9(b)は、本発明の第1の実施形態に係るシリコン含有膜の成膜方法の一例のタイミングチャートを示した図である。なお、図9(b)においては、従来のシード層を形成しない成膜方法も比較態様として示しており、上段のタイミングチャートが従来の成膜方法である。図9(b)の下段に示されたタイミングチャートが第1の実施形態に係る成膜方法の処理フローである。
次に、第1の実施形態に係るシリコン含有膜の成膜方法を実施した実施例について説明する。
図15は、本発明の第2の実施形態に係るシリコン含有膜の成膜方法の一例を説明するための図である。第2の実施形態に係るシリコン含有膜の成膜方法では、シリコンの単膜ではなく、窒化シリコン膜(SiN)を成膜する方法を説明する。なお、窒化シリコン膜は、ホウ素(B)も微量ではあるが含有されているので、厳密にはSiBN膜の成膜方法となる。
図16は、本発明の第4の実施例に係るシリコン含有膜の成膜方法の実施結果を示した図である。図16においては、サイクルタイムと膜厚との関係の実施結果が示されている。図16では、各例の成膜速度が示されており、傾きが大きい程、成膜速度が高く、生産性が高いことを意味する。また、回転テーブル2の回転速度は2rpmであった。
2 回転テーブル
15 搬送口
24 凹部
31〜33 処理ガスノズル
41〜43 分離ガスノズル
80 プラズマ発生器
D 分離領域
P1〜P3 処理領域
W ウエハ
Claims (13)
- 処理室内に基板を載置可能な回転テーブルと、該回転テーブルの回転方向に沿って互いに離間して設けられた第1及び第2の処理領域と、該第1の処理領域内で前記基板に第1の処理ガスを供給可能な第1の処理ガス供給手段と、前記第2の処理領域内で前記基板に第2の処理ガスを供給可能な第2の処理ガス供給手段と有する成膜装置を用いたシリコン含有膜の成膜方法であって、
前記回転テーブルを回転させながら前記第1の処理ガス供給手段から前記基板にアミノシランガスを所定期間供給し、前記基板の表面にシード層を形成するシード層形成工程と、
該シード層形成工程終了後に、前記回転テーブルを回転させながら前記第1の処理ガス供給手段から触媒ガスとしてホウ素含有ガスを前記基板の表面に供給する触媒供給工程と、
前記回転テーブルを回転させながら前記第2の処理ガス供給手段から原料ガスとしてシラン系ガスを前記基板の表面に供給し、前記ホウ素含有ガスの触媒作用により前記シラン系ガスに含まれるシリコン同士の結合を前記基板の表面上で発生させる原料ガス供給工程と、を有するシリコン含有膜の成膜方法。 - 前記触媒供給工程及び前記原料ガス供給工程は、前記基板の表面上に所定の膜厚を有するシリコン含有膜が堆積されるまで繰り返される請求項1に記載のシリコン含有膜の成膜方法。
- 前記基板を200〜350℃の範囲に加熱した状態で、前記シード層形成工程、前記触媒供給工程、前記原料ガス供給工程及を行う請求項1又は2に記載のシリコン含有膜の成膜方法。
- 前記基板を250〜350℃の範囲に加熱した状態で、前記シード層形成工程、前記触媒供給工程、前記原料ガス供給工程及を行う請求項3に記載のシリコン含有膜の成膜方法。
- 前記シード層形成工程と前記触媒供給工程との間に、前記分離領域から前記分離ガスを供給するパージ工程を更に有する請求項2乃至4のいずれか一項に記載のシリコン含有膜の成膜方法。
- 前記シード層形成工程は、3〜7分間行われる請求項1乃至5のいずれか一項に記載のシリコン含有膜の成膜方法。
- 前記アミノシランガスは、ジイソプロピルアミノシランガスである請求項1乃至6のいずれか一項に記載のシリコン含有膜の成膜方法。
- 前記ホウ素含有ガスは、BH3、B2H6、B(CH3)3、B(C2H5)3又はBCl3を含む請求項1乃至7のいずれか一項に記載のシリコン含有膜の成膜方法。
- 前記シラン系ガスは、SiH4、Si2H6又はSi3H8を含む請求項1乃至8のいずれか一項に記載のシリコン含有膜の成膜方法。
- 前記第1の処理領域の前記回転テーブルの回転方向上流側及び前記第1の処理領域と前記第2の処理領域との間には、前記第1の処理ガスと前記第2の処理ガスとを分離する分離ガスが供給可能な分離領域が設けられ、
前記触媒供給工程の前と、前記触媒供給工程と前記原料ガス供給工程との間には、前記回転テーブルを回転させながら前記基板に分離ガスを供給する第1及び第2の分離工程が更に設けられた請求項1乃至9のいずれか一項に記載シリコン含有膜の成膜方法。 - 前記成膜装置は、前記回転テーブルの前記回転方向下流側に前記第2の処理領域と離間して設けられた第3の処理領域と、
該第3の処理領域内で前記基板の表面に第3の処理ガスを供給する第3の処理ガス供給手段と、
該第3の処理ガスから供給された前記第3の処理ガスをプラズマ化するプラズマ発生器と、を更に有し、
前記原料ガス供給工程の後、前記回転テーブルを回転させながら前記第3の処理領域で窒化プラズマを前記基板の表面に供給する窒化工程を更に有する請求項1乃至10のいずれか一項に記載のシリコン含有膜の成膜方法。 - 前記第3の処理ガスは、窒素ガス又はアンモニアガスであり、
前記窒化プラズマは、N2プラズマ又はNH3プラズマである請求項11に記載のシリコン含有膜の成膜方法。 - 前記第2の領域と前記第3の領域との間には、前記第2の処理ガスと前記第3の処理ガスとを分離する分離ガスが供給可能な第3の分離領域が設けられ、
前記触媒供給工程と前記原料ガス供給工程との間に、前記回転テーブルを回転させながら前記基板に分離ガスを供給する第3の分離工程が更に設けられた請求項11又は12に記載シリコン含有膜の成膜方法。
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