JP2016157879A5 - - Google Patents

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Publication number
JP2016157879A5
JP2016157879A5 JP2015035939A JP2015035939A JP2016157879A5 JP 2016157879 A5 JP2016157879 A5 JP 2016157879A5 JP 2015035939 A JP2015035939 A JP 2015035939A JP 2015035939 A JP2015035939 A JP 2015035939A JP 2016157879 A5 JP2016157879 A5 JP 2016157879A5
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JP
Japan
Prior art keywords
oxide semiconductor
crystalline oxide
semiconductor film
film
film according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2015035939A
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English (en)
Japanese (ja)
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JP2016157879A (ja
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Publication date
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Priority to JP2015035939A priority Critical patent/JP2016157879A/ja
Priority claimed from JP2015035939A external-priority patent/JP2016157879A/ja
Publication of JP2016157879A publication Critical patent/JP2016157879A/ja
Publication of JP2016157879A5 publication Critical patent/JP2016157879A5/ja
Priority to JP2019227437A priority patent/JP6980183B2/ja
Pending legal-status Critical Current

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JP2015035939A 2015-02-25 2015-02-25 結晶性酸化物半導体膜、半導体装置 Pending JP2016157879A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2015035939A JP2016157879A (ja) 2015-02-25 2015-02-25 結晶性酸化物半導体膜、半導体装置
JP2019227437A JP6980183B2 (ja) 2015-02-25 2019-12-17 結晶性酸化物半導体膜、半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015035939A JP2016157879A (ja) 2015-02-25 2015-02-25 結晶性酸化物半導体膜、半導体装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019227437A Division JP6980183B2 (ja) 2015-02-25 2019-12-17 結晶性酸化物半導体膜、半導体装置

Publications (2)

Publication Number Publication Date
JP2016157879A JP2016157879A (ja) 2016-09-01
JP2016157879A5 true JP2016157879A5 (cg-RX-API-DMAC10.html) 2018-04-19

Family

ID=56826703

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015035939A Pending JP2016157879A (ja) 2015-02-25 2015-02-25 結晶性酸化物半導体膜、半導体装置

Country Status (1)

Country Link
JP (1) JP2016157879A (cg-RX-API-DMAC10.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113677833B (zh) * 2019-04-24 2024-08-23 日本碍子株式会社 半导体膜
JP6925548B1 (ja) * 2020-07-08 2021-08-25 信越化学工業株式会社 酸化ガリウム半導体膜の製造方法及び成膜装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0714771A (ja) * 1993-06-26 1995-01-17 Taiyo Yuden Co Ltd 薄膜形成方法及び装置
JP6142358B2 (ja) * 2011-09-08 2017-06-07 株式会社タムラ製作所 Ｇａ２Ｏ３系半導体素子
JP6152514B2 (ja) * 2013-10-17 2017-06-28 株式会社Flosfia 半導体装置及びその製造方法、並びに結晶及びその製造方法

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