JP2016133927A - Temperature control device, lithography device, and method for manufacturing product - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a technology which is advantageous for controlling a temperature difference in a plurality of spaces with high accuracy.SOLUTION: A temperature control device for controlling the temperatures of a first space and a second space includes: a first control part for controlling the temperature of the first space; a second control part for controlling the temperature of the second space; a first container arranged in the first space whose internal pressure changes in accordance with the temperature of the first space; a second container arranged in the second space whose internal pressure changes in accordance with the temperature of the second space; and a detection part connected to the inside of the first container and the inside of the second container for detecting the pressure difference. The second control part controls the temperature of the second space by using a conversion value obtained by converting the pressure difference detected by the detection part into a temperature difference between the first space and the second space such that the temperature difference between the first space and the second space becomes a target temperature difference.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a temperature control device, a lithographic apparatus, and an article manufacturing method.

  In a lithographic apparatus used for manufacturing a semiconductor device or the like, it is required to control the temperature of the internal space of the lithographic apparatus with high accuracy as the pattern formed on the substrate becomes finer. In the lithographic apparatus, for example, a control unit that controls the temperature of the internal space based on the output of a temperature sensor (resistor) whose resistance value changes according to temperature can be provided. Patent Document 1 proposes a method of reducing an error included in a detection result in a detection circuit that detects a temperature based on an output of a temperature sensor.

JP 2010-243354 A

  In the lithography apparatus, for example, a temperature sensor is provided for each of a plurality of locations (plural spaces) in the internal space, and the temperature of each location is controlled by the control unit based on the output of the temperature sensor provided for each location. It can be controlled individually. However, the magnitudes of errors that occur in the output of each temperature sensor may differ from each other due to individual differences in temperature sensors provided for each of a plurality of locations and changes over time. In this case, if the temperature of each location is controlled based on the output of each temperature sensor, the temperature difference at multiple locations will deviate from the target temperature difference, and the temperature of the internal space of the lithographic apparatus can be set with high accuracy. It can be difficult to control.

  Therefore, an object of the present invention is to provide an advantageous technique for controlling temperature differences in a plurality of spaces with high accuracy.

  In order to achieve the above object, a temperature control device according to one aspect of the present invention is a temperature control device that controls the temperature of a first space and a second space, and is a first device that controls the temperature of the first space. A control unit; a second control unit that controls the temperature of the second space; a first container that is disposed in the first space and has an internal pressure that changes according to the temperature of the first space; A second container that is disposed in the space and whose internal pressure changes according to the temperature of the second space, and is connected to the inside of the first container and the inside of the second container to detect the pressure difference between them. The pressure difference detected by the detection unit such that a temperature difference between the first space and the second space becomes a target temperature difference. Using a converted value converted into a temperature difference between the first space and the second space. Controlling the temperature of the second space, characterized in that.

  Further objects and other aspects of the present invention will become apparent from the preferred embodiments described below with reference to the accompanying drawings.

  According to the present invention, for example, it is possible to provide an advantageous technique for controlling temperature differences in a plurality of spaces with high accuracy.

It is the schematic which shows the structure of the temperature control apparatus of 1st Embodiment. It is a figure which shows the example of the change with respect to passage of time of the error which arises in each of two temperature sensors. It is a figure which shows the structural example of a detection part. It is a figure which shows the structural example of a differential pressure sensor. It is a figure which shows the structural example of the detection part which has a heat insulating material. It is a figure which shows the control block in the temperature control apparatus of 1st Embodiment. It is a figure which shows the structural example of a detection part. It is a figure which shows the structural example of a detection part. It is a figure which shows the control block which added the function which correct | amends the output of a detection part. It is a figure which shows the control block in the temperature control apparatus of 3rd Embodiment. It is a figure which shows the structural example of the temperature control apparatus using three control systems. It is a figure which shows the control block of the temperature measuring device which measures the temperature in each of several space. It is the schematic which shows exposure apparatus.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, preferred embodiments of the invention will be described with reference to the accompanying drawings. In addition, in each figure, the same reference number is attached | subjected about the same member thru | or element, and the overlapping description is abbreviate | omitted.

<First Embodiment>
A temperature control apparatus 100a according to a first embodiment of the present invention will be described. FIG. 1 is a schematic diagram illustrating a configuration of a temperature control apparatus 100a according to the first embodiment. The temperature control apparatus 100a of the first embodiment is used, for example, to control the temperature of an internal space of a lithography apparatus that forms a pattern on a substrate (for example, a space in a chamber where a process for forming a pattern on the substrate is performed). Can be. The temperature control apparatus 100a can include, for example, a plurality of control systems that respectively control the temperature of the internal space of the lithography apparatus. In the temperature control apparatus 100a of the first embodiment, an example in which two control systems of the first control system 1a and the second control system 1b are used will be described.

  The first control system 1a can include a first supply unit 2a, a first temperature sensor 5a, a first control unit 7a, and a first temperature controller 8a. The first supply unit 2a has a first space 6a through which a temperature-controlled fluid 3 (for example, air) is sent through a duct 4, and the temperature-controlled fluid 3 is supplied by a blower (not shown) or the like. The first space 6a is supplied to the internal space of the lithographic apparatus via a filter 9a. The first temperature sensor 5a includes, for example, a resistor (such as a platinum resistor) whose resistance value changes according to the temperature, and can be provided in the first space 6a in the first supply unit 2a. The first controller 7a controls the temperature of the fluid 3 sent to the first space 6a by controlling the first temperature controller 8a (for example, a heater) provided in the duct 4 based on the output of the first temperature sensor 5a, for example. By adjusting the temperature, the temperature of the first space 6a is controlled to be the target temperature.

  On the other hand, the 2nd control system 1b can contain the 2nd supply part 2b, the 2nd temperature sensor 5b, the 2nd control part 7b, and the 2nd temperature controller 8b like the 1st control system 1a. . The second supply unit 2b has a second space 6b through which a temperature-controlled fluid 3 (for example, air) is sent through the duct 4, and the temperature-controlled fluid 3 is supplied by a blower (not shown) or the like. The second space 6b is supplied to the internal space of the lithographic apparatus via a filter 9b. The second temperature sensor 5b includes, for example, a resistor (such as a platinum resistor) whose resistance value changes according to the temperature, and can be provided in the second space 6b in the second supply unit 2b. The second controller 7b controls the temperature of the fluid 3 sent to the second space 6b by controlling a second temperature controller 8b (for example, a heater) provided in the duct 4 based on the output of the second temperature sensor 5b, for example. By adjusting the temperature, the temperature of the second space 6b is controlled to be the target temperature.

  The first control system 1a and the second control system 1b configured as described above individually control the temperature of the first space 6a in the first supply unit 2a and the temperature of the second space 6b in the second supply unit 2b. Thus, the temperature of the internal space of the lithographic apparatus is controlled. However, in the first temperature sensor 5a provided in the first space 6a and the second temperature sensor 5b provided in the second space 6b, an error caused in the output of each temperature sensor due to individual differences or changes over time. May be different in size. FIG. 2B is a diagram illustrating an example of a change in an error occurring in each of the two temperature sensors (the first temperature sensor 5a and the second temperature sensor 5b) with time. For example, when each of the first temperature sensor 5a and the second temperature sensor 5b includes a platinum resistor, a resistor used in a circuit that detects the resistance value of platinum, a connection portion between platinum and a lead wire, or a platinum resistor. The physical properties such as can change over time. As a result, errors may occur in the output of the first temperature sensor 5a and the output of the second temperature sensor 5b. In the first temperature sensor 5a in the example shown in FIG. 2B, the error increases in the plus direction as time passes, and in the second temperature sensor, the error increases in the minus direction as time passes. As described above, since the magnitude of the error generated in the output of the temperature sensor can be different for each temperature sensor, it is difficult to predict the error. Therefore, if the temperature of the first space 6a and the temperature of the second space 6b are controlled based on the output of the first temperature sensor 5a and the output of the second temperature sensor 5b in which different errors are generated, The temperature difference from the second space 6b may deviate from the target temperature difference. As a result, it can be difficult to control the temperature of the internal space of the lithographic apparatus with high accuracy.

  Therefore, the temperature control device 100a of the first embodiment is provided with a detection unit 10 having a first container 11a and a second container 11b as shown in FIG. The detection unit 10 includes a first container 11a disposed in the first space 6a and a second container 11b disposed in the second space 6b, and includes an inside of the first container 11a and an inside of the second container 11b. The pressure difference of is detected. The first container 11a is configured such that the internal pressure changes according to the temperature of the first space 6a, and the second container 11b is configured so that the internal pressure changes according to the temperature of the second space 6b. Has been. Further, the second control unit 7b of the second control system 1b converts the pressure difference detected by the detection unit 10 into a temperature difference between the first space 6a and the second space 6b. And the temperature of 2nd space 6b is controlled based on the value which correct | amended the deviation of the target temperature of 2nd space 6b, and the output of the 2nd temperature sensor 5b with the converted value (converted value). Here, in the first container 11a and the second container 11b, when the temperature difference between the first space 6a and the second space 6b is zero, the pressure difference between the inside of the first container and the inside of the second container becomes zero. It is good to be configured as follows.

[About Configuration of Detection Unit 10]
Next, a detailed mechanism of the detection unit 10 will be described with reference to FIGS. 3 and 4A. FIG. 3 is a diagram illustrating a configuration example of the detection unit 10. The detection unit 10 may include a first container 11a disposed in the first space 6a, a second container 11b disposed in the second space 6b, and a differential pressure sensor 13. The differential pressure sensor 13 includes a first chamber 16a that communicates with the inside of the first container 11a via the first pipe 12a, and a second chamber 16b that communicates with the inside of the second container 11b via the second pipe 12b. In addition, the first chamber 16 a and the second chamber 16 b are partitioned by a diaphragm 17. In each of the first container 11a and the second container 11b, an amount of liquid 14 smaller than the maximum volume can be sealed, for example, in a state where the inside of each of the first container 11a and the second container 11b is evacuated. When the first container 11a and the second container 11b are configured in this manner, the interiors of the first container 11a and the second container 11b are filled with the liquid 14 and the vapor 15 of the liquid, and the interiors of the pipes 12a and 12b. Is also filled with the liquid vapor 15. Here, the amount of the liquid may be an amount in which the liquid 14 and the vapor 15 are always in a gas-liquid equilibrium state in the temperature range of the space in which the first container 11a and the second container 11b are arranged. At this time, the pressure inside each of the first container 11a and the second container 11b in the vapor-liquid equilibrium state can be obtained by the Clausius-Clapeyron equation expressed by the equation (1). In equation (1), L is the heat of vaporization, R is the gas constant, P is the vapor pressure [Pa], T is the temperature [K], and C is the integral constant.
ln (P) = − L / (RT) + C (1)

  According to equation (1), the vapor pressure P is uniquely determined by the type and temperature of the liquid 14. That is, the pressure inside the first container 11a becomes the vapor pressure (P1) of the liquid 14 corresponding to the temperature of the first space 6a in which the first container 11a is arranged, and the pressure inside the second container 11b is The vapor pressure (P2) of the liquid corresponds to the temperature of the second space 6b in which the two containers 11b are arranged.

  Here, the configuration of the differential pressure sensor 13 will be described with reference to FIG. FIGS. 4A and 4B are diagrams showing examples of the configuration of the differential pressure sensor 13, respectively. The differential pressure sensor 13 shown in FIG. 4A includes a first chamber 16a that communicates with the piping 12a and a second chamber 16b that communicates with the piping 12b. The first chamber 16a and the second chamber 16b are separated by a diaphragm 17. It is partitioned. Therefore, when a pressure difference occurs between the inside of the first container 11a and the inside of the second container 11b, the diaphragm 17 is distorted according to the pressure difference. The differential pressure sensor 13 measures the distortion of the diaphragm 17 with a measuring instrument such as an interferometer, and obtains the pressure difference between the inside of the first container 11a and the inside of the second container 11b from the measurement result. it can. On the other hand, the differential pressure sensor 13 shown in FIG. 4B can include a third chamber 18 communicated with the pressure regulator 19 between the first chamber 16a and the second chamber 16b. The pressure regulator 19 can adjust the pressure inside the third chamber 18 so as to approach the pressure inside the first chamber 16a or the second chamber 16b, narrowing the detection range of the differential pressure sensor 13, The resolution of the differential pressure sensor 13 can be improved. When the resolution of the differential pressure sensor 13 is sufficient, the pressure regulator 19 may be omitted, and the third chamber 18 may be filled with the atmosphere or may be evacuated.

  Moreover, the detection part 10 can contain the heat insulating material 20 which covers the 1st piping 12a and the 2nd piping 12b, as shown in FIG. When the first pipe 12a is not arranged in the first space 6a, heat transfer occurs between the first pipe 12a and the atmosphere in which the first pipe 12a is arranged, and the vapor pressure in the first pipe 12a changes. There is. Similarly, when the second pipe 12b is not arranged in the second space 6b, heat transfer occurs between the second pipe 12b and the atmosphere in which the second pipe 12b is arranged, and the vapor pressure inside the second pipe 12b is increased. May change. As a result, an error may occur in the pressure difference between the inside of the first container 11a and the inside of the second container 11b detected by the differential pressure sensor 13. Therefore, by covering the first pipe 12 a and the second pipe 12 b with the heat insulating material 20, it is possible to suppress an error in the pressure difference detected by the differential pressure sensor 13.

[Temperature control]
Next, control of the temperature of the first space 6a and the second space 6b by the temperature control device 100a of the first embodiment will be described with reference to FIG. FIG. 6 is a diagram illustrating a control block in the temperature control apparatus 100a of the first embodiment. In the first embodiment, a case will be described in which the target temperature difference is zero, that is, the target temperature of the first space 6a and the target temperature of the second space 6a are the same.

In the first control system 1a, the output of the first temperature sensor 5a that is disposed in the first space 6a of the first supply unit 2a is supplied to a subtracter 7a ₁ of the first control unit 7a, first by subtractor 7a ₁ A deviation between the target temperature SP1 of the space 6a and the output of the first temperature sensor 5a is obtained. The compensator 7a ₂ (for example, a PID compensator) obtains a power value to be supplied to the first temperature controller 8a so that the deviation obtained by the subtractor 7a ₁ falls within an allowable range, and the driver 7a ₃ supplying power to the first temperature controller 8a on the basis of the power value obtained by 7a _2. Thus, the feedback control of the temperature of the first space 6a is performed by the first control system 1a.

In the second control system 1b, in terms of unit 7b ₄ of the second control unit 7b is a pressure difference _{P 21} detected by the detector 10 is converted into a temperature difference between the first space 6a and the second space 6b . For example, when Novec7000 (registered trademark), which is hydrofluoroether (hereinafter referred to as HFE), is used as the liquid 14, the vapor pressure P inside the second container 11 b and the temperature T of the second space 6 b are calculated using the equation (1). Is expressed by the equation (2). At this time, the converter 7b ₄ converts the output (temperature t ₂ [° C.]) of the second temperature sensor 5b into the unit [K] and converts the converted value P ₂ ′ related to the vapor pressure inside the second container 11b. Can be obtained by equation (3).
ln (P) = − 3548.6 / T + 22.978 (2)
P ₂ ′ = exp (−3548.6 / (t + 273.15) +22.978) (3)

Convert unit 7b ₄ is a corresponding value P _{2 'about} the vapor pressure inside the second container 11b, by adding the pressure difference P ₂₁ detected by the detector 10, to the interior of the vapor pressure of the first container 11a Find the conversion value. Then, the converted value related to the internal vapor pressure of the first container 11a, the predicted temperature _{t 1} [° C.] of the first space 6a obtained by equation (4). Thereby, the converter 7b ₄ has a difference Δt () between the output (temperature t ₂ [° C.]) of the second temperature sensor 5b and the predicted temperature t ₁ [° C.] of the first space 6a obtained by the equation (4). The conversion value regarding the temperature difference between the first space and the second space is obtained by the equation (5). The difference Δt obtained by the converter 7b ₄ is supplied to the subtractor 7b ₁ of the second controller 7b.
t ₁ = 3548.6 / (22.987-ln (P ₂ '+ P ₂₁ ))-273.15 (4)
Δt = t ₂ −t ₁ (5)

The output of the second temperature sensor 5b arranged in the second space 6b of the second supply portion 2b is supplied to the subtracter 7b _1. Then, the subtracter 7b _1, together with a deviation between the target temperature SP2 of the second space 6b and the output of the second temperature sensor 5b, for correcting the deviation in the difference Δt obtained from the translation device 7b _4. As a result, as shown in FIG. 2A, an error that occurs in a value obtained by correcting the output of the second temperature sensor 5b with the difference Δt can be brought close to an error that occurs in the output of the first temperature sensor 5a. The value obtained by the subtractor 7b ₁ is supplied to a compensator 7b ₂ (for example, a PID compensator). The compensator 7b ₂ obtains a power value to be supplied to the second temperature controller 8b so that the value obtained by the subtractor 7b ₁ is within the allowable range, and the driver 7b ₃ is obtained by the compensator 7b ₂ . Electric power is supplied to the second temperature controller 8b based on the electric power value. Thereby, feedback control of the temperature of the second space 6b is performed by the second control system 1b so that the actual temperature difference between the first space 6a and the second space 6b becomes the target temperature difference (zero in the first embodiment). It can be performed. In the first embodiment, in terms of units by the difference Δt determined by 7b ₄ and the target temperature SP2 has been corrected deviation between the output of the second temperature sensor 5b, for example, by the difference Δt of the second temperature sensor 5b The output or target temperature SP2 may be corrected.

  As described above, the temperature control device 100a of the first embodiment calculates the pressure difference between the inside of the first container 11a arranged in the first space 6a and the inside of the second container 11b arranged in the second space 6b. The detection part 10 to detect is included. Then, the temperature control device 100a converts the pressure difference detected by the detection unit 10 into a temperature difference between the first space 6a and the second space 6b, and the converted value of the temperature difference and the output of the second temperature sensor 5b. Based on the above, the temperature of the second space 6b is controlled. Thereby, the temperature difference between the first space 6a and the second space 6b can be brought close to the target temperature difference, and for example, the temperature of the internal space of the lithography apparatus can be controlled with high accuracy. Further, in the temperature control device 100a of the first embodiment, for example, even if calibration of temperature control of the space is not performed for all of the plurality of control systems, all is performed only for at least one control system among the plurality of control systems. In this control system, the temperature of the space can be controlled with high accuracy.

Second Embodiment
A temperature control device according to a second embodiment of the present invention will be described. The temperature control device of the second embodiment differs from the temperature control device 100a of the first embodiment in the configuration of the detection unit 10. FIGS. 7A and 7B are diagrams each illustrating a configuration example of the detection unit 10 in the temperature control apparatus of the second embodiment. In the differential pressure sensor 13 in the detection unit 10, there is an error in the detection result of the detection unit 10 due to, for example, an irreversible distortion generated in the diaphragm 17 or a change over time of a circuit that obtains a pressure difference based on the distortion of the diaphragm 17. May occur. In this case, it may be difficult to accurately detect the pressure difference between the inside of the first container 11a and the inside of the second container 11b. Therefore, the detection unit 10 of the second embodiment is provided with a bypass pipe 22 for communicating the inside of the first container 11a and the inside of the second container 11b, and the bypass pipe 22 is provided with a valve 21. It has been. For example, while the temperature of the first space 6a and the second space 6b is controlled to be the same, the valve 21 is opened, and the inside of the first container 11a and the second container 11b are bypassed 22. Communicate with the interior of the. That is, the pressure inside the first container 11a is made equal to the pressure inside the second container 11b. At this time, the pressure difference detected by the detection unit 10 becomes an error generated in the detection result of the detection unit 10. That is, the pressure difference detected by the detection unit 10 in a state where the valve 21 is opened and the inside of the first container 11a and the inside of the second container 11b are communicated is output from the detection unit 10 in the state where the valve 21 is closed. Can be used as a correction value for correcting.

  The detection unit 10 shown in FIG. 7A is configured to include a bypass pipe 22 that communicates the inside of the first pipe 12a and the inside of the second pipe 12b, and one valve 21. FIG. The detection unit 10 shown in b) is configured to include a bypass pipe 22 and two valves 21. Further, as shown in FIGS. 8A and 8B, the boiling point is higher than that of the liquid 14 sealed in each of the first container 11 a and the second container 11 b inside the first pipe 12 a and the second pipe 12 b. Each of the liquids 23 may be filled. The liquid 23 filled in the first pipe 12a and the second pipe 12b respectively has a vapor pressure of 1/100 or less of the liquid 14 sealed in the first container 11a and the second container 11b. preferable. In this way, by filling the first pipe 12a and the second pipe 12b with the liquid 23, the heat insulating material 20 that covers the first pipe 12a and the second pipe 12b can be omitted. In FIG. 8A, a film 24 for preventing the liquid 23 filled in the pipe from contacting the vapor of the liquid 14 in the container is provided. In FIG. 8B, the film 24 is not provided. In this case, the diameters of the first pipe 12a and the second pipe 12b may be set so that the liquid 23 remains inside the pipe due to surface tension.

FIG. 9 is a diagram illustrating a control block to which a function for correcting the output of the detection unit 10 is added. In the control block shown in FIG. 9, a corrector 7b ₅ is provided. The corrector 7b ₅ supplies the converter 7b ₄ with a value obtained by correcting the pressure difference detected by the detector 10 with the correction value. The converter 7b ₄ converts the value supplied from the corrector 7b ₅ into a temperature difference between the first space 6a and the second space 6b. Here, the process of acquiring the correction value will be described. It is preferable that this process is automatically performed periodically, for example, once a day. For example, the corrector 7b ₅ outputs (the first container) of the detection unit 10 in a state in which the valve 21 is closed while the temperatures of the first space 6a and the second space 6b are controlled to be the same. The pressure difference between the inside of 11a and the inside of the second container 11b is maintained. Further, the corrector 7b ₅ opens the valve 21 while the temperature of the first space 6a and the second space 6b is controlled to be equal to each other, and the bypass pipe 22 causes the inside of the first container 11a to The inside of the 2nd container 11b is made into the state connected. At this time, the corrector 7b ₅ causes the detection unit 10 to detect the pressure difference between the inside of the first container 11a and the inside of the second container 11b, and stores the pressure difference obtained thereby as a correction value. The corrector 7b ₅ closes the valve 21 and then releases the holding of the output of the detection unit 10 after a certain time has elapsed, and corrects the correction unit 7b ₅ using the correction value detected and stored by the detection unit 10, thereby converting the converter 7b. ₄ is supplied.

<Third Embodiment>
A temperature control apparatus according to a third embodiment of the present invention will be described. In the first embodiment, an example in which the target temperature of the first space 6a and the target temperature of the second space 6b are the same, that is, an example in which the target temperature difference between the first space 6a and the second space 6b is zero. explained. In the third embodiment, the target temperature of the first space 6a is different from the target temperature of the second space 6b, that is, the target temperature difference between the first space 6a and the second space 6b is a value other than zero. Will be described. Here, in the temperature control device of the third embodiment, the device configuration is the same as that of the temperature control device 100a of the first embodiment, and thus the description of the device configuration is omitted here.

  FIG. 10 is a diagram illustrating a control block in the temperature control apparatus of the third embodiment. In FIG. 10, the target temperature SP1 of the first space 6a and the target temperature SP2 of the second space 6b are different values. By controlling the temperature of the first space 6a and the temperature of the second space 6b using the control block shown in FIG. 10, the actual temperature difference between the first space 6a and the second space 6b is set to the target temperature difference (first temperature difference). Difference between the target temperature SP1 of the space 6a and the target temperature SP2 of the second space 6b). Since the configuration of the second controller 7b is different from that of the temperature controller 100a of the first embodiment, the temperature controller of the third embodiment will be described below with respect to the configuration of the second controller 7b.

The second control unit 7b uses the first calculator 7b ₆ which calculates the pressure value inside the first container 11a from the output of the first temperature sensor 5a using Equation (1), the equation (1) the 2 includes a second calculator 7b ₇ that calculates the pressure value inside the second container 11b from the output of the temperature sensor 5b. Pressure value calculated by the first pressure value calculated by the calculator 7b ₆ and the second calculator 7b ₇ is supplied to the subtracter 7b _8, the pressure calculated by the subtracter 7b ₈ in the first calculator 7b ₆ The difference between the value and the pressure value calculated by the second calculator 7b ₇ is obtained. Further, the subtractor 7b ₉ subtracts the value obtained by the subtractor 7b ₈ from the pressure difference detected by the detection unit 10, and the converter 7b ₄ obtains the value obtained by the subtractor 7b ₉ . It converts into the shift | offset | difference with respect to the target temperature difference of the temperature difference of 1 space 6a and 2nd space 6b. Then, the subtracter 7b _1, together with a deviation between the target temperature SP2 of the second space 6b and the output of the second temperature sensor 5b, in deviation of the temperature difference which is converted by the conversion unit 7b ₁ corrects the deviation. Value determined by the subtracter 7b ₁ is supplied to the compensator 7b 2 _(e.g. PID compensator), compensator 7b _2, the second temperature control so that the value obtained by the subtracter 7b ₁ falls within the allowable range The electric power value supplied to the device 8b is obtained. The driver 7b ₃ supplies power to the second temperature controller 8b based on the power value obtained by the compensator 7b ₂ . Thereby, the feedback control of the temperature of the second space 6b can be performed by the second control system 1b so that the actual temperature difference between the first space 6a and the second space 6b becomes the target temperature difference. In the third embodiment, although the terms unit 7b value obtained by ₄ (shift of temperature difference) obtained by correcting the deviation between the target temperature SP2 and the output of the second temperature sensor 5b, for example, the second temperature sensor The output of 5b or the target temperature SP2 may be corrected.

<Fourth embodiment>
A temperature control device 100b according to a fourth embodiment of the present invention will be described. In the fourth embodiment, a configuration example of a temperature control device 100b using three control systems will be described. FIG. 11 is a diagram illustrating a configuration example of a temperature control device 100b using three control systems. The temperature control apparatus 100b of the fourth embodiment can be used to control the temperature inside the chamber 50 in which the lithographic apparatus is arranged. In the example shown in FIG. 11, a substrate stage 56 configured to hold and move the substrate 55 is provided inside the chamber 50 as a part of the lithography apparatus.

  The first control system 1a includes a first supply unit 2a, a first temperature sensor 5a, a first control unit 7a, and a first temperature controller 8a, and the temperature of the first space 6a in the first supply unit 2a. Is controlled to reach the target temperature. The second control system 1b includes a second supply unit 2b, a second temperature sensor 5b, a second control unit 7b, and a second temperature controller 8b, and the temperature of the second space 6b in the second supply unit 2b. Is controlled to reach the target temperature. The third control system 1c includes a third supply unit 2c, a third temperature sensor 5c, a third control unit 7c, and a third temperature controller 8c, and the temperature of the third space 6c in the third supply unit 2c. Is controlled to reach the target temperature.

  Moreover, the temperature control apparatus 100b of 4th Embodiment can contain the 1st detection part 10a and the 2nd detection part 10b. The first detection unit 10a may include a first container 11a provided in the first space 6a, a second container 11b provided in the second space 6b, and a differential pressure sensor 13a. The differential pressure sensor 13a of the first detection unit 10a is connected to the first container 11a and the second container 11b via the first pipe 12a and the second pipe 12b, respectively, and the inside of the first container 11a and the second container 11b It is configured to detect a pressure difference from the inside. Then, as described in the above embodiment, the second control unit 7b uses the pressure difference detected by the first detection unit 10a to change the temperature difference between the first space 6a and the second space 6b to the target temperature. The temperature of the 2nd space 6b is controlled so that it may become a difference. Similarly, the second detection unit 10b can include a third container 11c provided in the second space 6b, a fourth container 11d provided in the third space, and a differential pressure sensor 13b. The differential pressure sensor 13b of the second detector 10b is connected to the third container 11c and the fourth container 11d via the third pipe 12c and the fourth pipe 12d, respectively, and the inside of the third container 11c and the fourth container 11d It is configured to detect a pressure difference from the inside. Then, as described in the above embodiment, the third control unit 7c uses the pressure difference detected by the second detection unit 10b to change the temperature difference between the second space 6b and the third space 6c to the target temperature. The temperature of the third space 6c is controlled so as to make a difference.

  By configuring the temperature control device 100b as described above, for example, even if calibration of temperature control of the space is not performed for all of the plurality of control systems, only the first control system 1a is performed, and each control system has high accuracy. It is possible to control the temperature of the space. Here, in FIG. 11, the 3rd container 11c is arrange | positioned in the 2nd space 6b, and the 2nd detection part 10b is arrange | positioned inside the 3rd container 11c arrange | positioned in the 2nd space 6b, and the 3rd space 6c. The pressure difference with the inside of the made fourth container 11d is detected. However, it is not limited to that. For example, the third container 11c is disposed in the first space 6a, and the second detection unit 10b includes the inside of the third container 11c disposed in the first space 6a and the fourth container 11d disposed in the third space 6c. It may be configured to detect a pressure difference from the inside.

<Embodiment of Temperature Measuring Device>
In the following, an embodiment of a temperature measuring device that measures the temperature in each of a plurality of spaces will be described with reference to FIG. FIG. 12 is a diagram illustrating a control block of a temperature measurement device that measures the temperature in each of a plurality of spaces. In the present embodiment, an example in which the temperatures of the first space and the second space are measured will be described.

  The temperature measurement device may include a first temperature sensor 5 a that measures the temperature of the first space, a second temperature sensor 5 b that measures the temperature of the second space, the detection unit 10, and the control unit 7. The detection unit 10 can include a first container 11 a disposed in the first space, a second container 11 b disposed in the second space, and a differential pressure sensor 13. The differential pressure sensor 13 is connected to the inside of the first container 11a and the second container 11b via the first pipe 12a and the second pipe 12b, respectively, and the pressure between the inside of the first container 11a and the inside of the second container 11b. It is configured to detect the difference.

Control unit 7 includes a first calculator 7b ₆ which calculates the pressure value inside the first container 11a from the output of the first temperature sensor 5a using Equation (1), the second temperature using equation (1) And a second calculator 7b ₇ for calculating a pressure value inside the second container 11b from the output of the sensor 5b. Pressure value calculated by the first pressure value calculated by the calculator 7b ₆ and the second calculator 7b ₇ is supplied to the subtracter 7b _8, the pressure calculated by the subtracter 7b ₈ in the first calculator 7b ₆ The difference between the value and the pressure value calculated by the second calculator 7b ₇ is obtained. Further, the subtractor 7b ₉ subtracts the value obtained by the subtractor 7b ₈ from the pressure difference detected by the detection unit 10, and the converter 7b ₄ obtains the value obtained by the subtractor 7b ₉ . It converts into the shift | offset | difference with respect to the target temperature difference of the temperature difference of 1 space and 2nd space. The subtractor 7b ₁ subtracts the temperature difference shift converted by the converter 7b ₄ from the output of the second temperature sensor 5b. Thus, the control unit 7 causes the error generated in the output of the first temperature sensor 5a and the error generated in the output of the second temperature sensor 5b to approach each other, and the second space when the temperature of the first space is used as a reference. Temperature (temperature information) can be obtained.

<Embodiment of Lithographic Apparatus>
An example in which the temperature control apparatus 100 according to any one of the first to fourth embodiments is applied to a lithography apparatus that forms a pattern on a substrate will be described. The lithography apparatus is, for example, an exposure apparatus that exposes a substrate to transfer a mask pattern onto the substrate, an imprint apparatus that forms an imprint material on the substrate using a mold, and a substrate that is irradiated with charged particle beams. A drawing apparatus for forming a pattern may be included. Hereinafter, an example in which the temperature control apparatus 100 according to any one of the first to fourth embodiments is used in an exposure apparatus as a lithography apparatus will be described.

  FIG. 13 is a schematic view showing the exposure apparatus 200. The exposure apparatus 200 includes, for example, a chamber 50 in which a unit for forming a pattern on the substrate 55 is disposed. The unit includes, for example, an illumination optical system 51, a projection optical system 52, a mask stage 54 configured to be movable while holding a mask 53, and a substrate stage 56 configured to be movable while holding a substrate 55. Can be included. Further, the exposure apparatus 200 can include a control unit 57. The control unit 57 includes, for example, a CPU and a memory, and controls each unit of the exposure apparatus 200b (controls exposure processing). Here, the exposure apparatus 200 is required to control the temperature of the internal space of the chamber 50 with high accuracy as the pattern formed on the substrate 55 becomes finer. Therefore, the exposure apparatus 200 can be provided with the temperature control apparatus 100 of any one of the first to fourth embodiments in order to control the temperature at a plurality of locations in the internal space of the chamber 50 with high accuracy.

  The mask 53 and the substrate 55 are held by a mask stage 54 and a substrate stage 56, respectively, and are optically conjugate positions (object plane and image plane positions of the projection optical system 52) via the projection optical system 52. Be placed. The projection optical system 52 has a predetermined projection magnification (for example, 1/2 times), and projects the pattern formed on the mask 53 onto the substrate 55 using the light emitted from the illumination optical system 51. At that time, the mask stage 54 and the substrate stage 56 move relatively in a direction (for example, Y direction) perpendicular to the optical axis of the projection optical system 52 at a speed ratio corresponding to the projection magnification of the projection optical system 52. Thereby, the pattern formed on the mask 53 can be transferred to the substrate 55.

<Embodiment of Method for Manufacturing Article>
The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing an article such as a microdevice such as a semiconductor device or an element having a fine structure. The method for manufacturing an article according to the present embodiment includes a step of forming a pattern on a substrate using the above-described lithography apparatus (exposure apparatus) (step of exposing the substrate), and processing the substrate on which the pattern is formed in the step (for example, Development). Further, the manufacturing method includes other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, and the like). The method for manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

  As mentioned above, although preferred embodiment of this invention was described, it cannot be overemphasized that this invention is not limited to these embodiment, A various deformation | transformation and change are possible within the range of the summary.

1a: 1st control system, 1b: 2nd control system, 5a: 1st temperature sensor, 5b: 2nd temperature sensor, 6a: 1st space, 6b: 2nd space, 7a: 1st control part, 7b: 1st 2 control unit, 10: detection unit

Claims (13)

A temperature control device for controlling the temperature of the first space and the second space,
A first controller for controlling the temperature of the first space;
A second control unit for controlling the temperature of the second space;
A first container disposed in the first space and having an internal pressure that varies in accordance with the temperature of the first space, and an internal pressure that is disposed in the second space and varies in accordance with the temperature of the second space. A detection unit having a second container to be connected, and a sensor connected to the inside of the first container and the inside of the second container to detect a pressure difference between them,
Including
The second control unit determines the pressure difference detected by the detection unit between the first space and the second space so that a temperature difference between the first space and the second space becomes a target temperature difference. A temperature control device, wherein the temperature of the second space is controlled using a converted value converted into a temperature difference of.   The second control unit outputs an output of a temperature sensor provided in the second space, a target temperature of the second space, or a deviation between an output of the temperature sensor and a target temperature of the second space according to the converted value. The temperature control apparatus according to claim 1, wherein the temperature of the second space is controlled based on the corrected value.   The first container and the second container are configured such that the pressure difference becomes zero when the temperature difference between the first space and the second space is zero. The temperature control apparatus according to 1 or 2.   The temperature control device according to claim 1, wherein the first container and the second container have the same volume.   5. The temperature control device according to claim 1, wherein each of the first container and the second container is filled with an amount of liquid smaller than an internal volume.   The sensor of the detection unit includes a first chamber communicating with the inside of the first space via a first pipe, a second chamber communicating with the inside of the second space via a second pipe, and the first The temperature control according to any one of claims 1 to 5, further comprising: a diaphragm that partitions the chamber and the second chamber, and detecting the pressure difference by measuring distortion of the diaphragm. apparatus.   The temperature control apparatus according to claim 6, wherein the first pipe and the second pipe are covered with a heat insulating material.   The liquid according to claim 6 or 7, wherein the first pipe and the second pipe are filled with a liquid having a boiling point higher than that of the liquid enclosed in each of the first container and the second container. The temperature control device described.   While the temperature of the first space and the second space is controlled to be equal to each other, the detection unit communicates the inside of the first container and the inside of the second container with the pressure. The temperature control apparatus according to any one of claims 6 to 8, further comprising a bypass pipe for correcting an error occurring in the difference detection result.   The temperature control device according to any one of claims 1 to 8, wherein the first space and the second space communicate with each other. The first control unit controls the temperature of the first space by adjusting the temperature of the fluid supplied to the first space based on the output of the first temperature sensor disposed in the first space,
The second control unit controls the temperature of the second space by adjusting the temperature of the fluid supplied to the second space based on the output of the second temperature sensor disposed in the second space. The temperature control apparatus according to any one of claims 1 to 10, wherein A lithographic apparatus for forming a pattern on a substrate,
A unit for forming a pattern on the substrate;
A temperature control device according to any one of claims 1 to 11,
Including
The lithographic apparatus, wherein the temperature control device controls temperatures of a first space and a second space communicating with a space in which the unit is disposed. Forming a pattern on a substrate using the lithographic apparatus according to claim 12;
Processing the substrate on which the pattern is formed in the step;
A method for producing an article comprising:

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