KR101971813B1 - Temperature control apparatus, lithographic apparatus and article manufacturing method - Google Patents

Temperature control apparatus, lithographic apparatus and article manufacturing method Download PDF

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KR101971813B1
KR101971813B1 KR1020177022001A KR20177022001A KR101971813B1 KR 101971813 B1 KR101971813 B1 KR 101971813B1 KR 1020177022001 A KR1020177022001 A KR 1020177022001A KR 20177022001 A KR20177022001 A KR 20177022001A KR 101971813 B1 KR101971813 B1 KR 101971813B1
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space
temperature
container
control
difference
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도모히코 요시다
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/1927—Control of temperature characterised by the use of electric means using a plurality of sensors
    • G05D23/193—Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces
    • G05D23/1932—Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces to control the temperature of a plurality of spaces
    • G05D23/1934—Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces to control the temperature of a plurality of spaces each space being provided with one sensor acting on one or more control means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
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  • Control Of Temperature (AREA)

Abstract

The present invention provides a temperature control apparatus for controlling a temperature of a first space and a second space, the temperature control apparatus comprising: a first control unit configured to control a temperature of a first space; A first container disposed in the first space, a second container disposed in the first space, a second container disposed in the first space, a second container disposed in the second space, Wherein the second control unit includes a detection unit including a sensor configured to detect a pressure difference between the first space and the second space, wherein the second control unit uses the conversion value obtained by converting the detected pressure difference into a temperature difference between the first space and the second space, Temperature is controlled.

Figure 112017075705725-pct00006

Description

Temperature control apparatus, lithographic apparatus and article manufacturing method

The present invention relates to a temperature control apparatus, a lithographic apparatus, and a method of manufacturing an article.

A lithographic apparatus used for manufacturing a semiconductor device or the like needs to accurately control the temperature of the internal space of the lithographic apparatus as a fine pattern is formed on the substrate. The lithographic apparatus may be provided with a control unit for controlling the temperature of the internal space based on, for example, an output from a temperature sensor (resistance body) whose resistance value varies with temperature. Patent Document 1 proposes a method of reducing the error included in the detection result acquired by the detection circuit that detects the temperature based on the output from the temperature sensor.

The lithographic apparatus may be used, for example, to provide a temperature sensor in a plurality of portions (a plurality of spaces) of an inner space, and individually control the temperature of each portion by using a control unit based on an output from a temperature sensor provided in each portion . However, due to the individual differences and the aging changes of the temperature sensors provided in the plurality of portions, the errors generated at the output from each temperature sensor are sometimes of different sizes. In this case, if the temperature of each part is controlled based on the output from the corresponding temperature sensor, the temperature difference between the plurality of parts is deviated from the target temperature difference. This can make it difficult to accurately control the temperature in the interior space of the lithographic apparatus.

Japanese Patent Application Laid-Open No. 2010-243354

The present invention provides an advantageous technique for accurately controlling the temperature difference between a plurality of spaces.

According to one aspect of the present invention, there is provided a temperature control apparatus for controlling a temperature of a first space and a second space, the temperature control apparatus comprising: a first control unit configured to control a temperature of a first space; A second control unit configured to control a temperature of the second space; A first container disposed in the first space and having an internal pressure varying with the temperature of the first space, a second container disposed in the second space and having an internal pressure varying with the temperature of the second space, And a sensor connected to the interior of the first container and the interior of the second container and configured to detect a pressure difference between the first container and the second container, By using the conversion value obtained by converting the pressure difference detected by the detection unit to a temperature difference between the first space and the second space so as to set the temperature difference between the first space and the second space to the target temperature difference, Thereby controlling the temperature of the second space.

Other features of the present invention will become apparent from the following description of exemplary embodiments with reference to the attached drawings.

1 is a schematic view showing a configuration of a temperature control device according to the first embodiment.
FIG. 2A is a graph showing an example of a change in error generated in each of the two temperature sensors with passage of time. FIG.
FIG. 2B is a graph showing an example of a change in the error generated in each of the two temperature sensors with the lapse of time. FIG.
3 is a view showing an example of the arrangement of the detection unit.
4A is a diagram showing an example of the arrangement of the differential pressure sensor.
4B is a diagram showing an example of the arrangement of the differential pressure sensor.
5 is a view showing an arrangement example of a detection unit having a heat insulating material.
6 is a block diagram showing a control block of the temperature control device according to the first embodiment.
7A is a diagram showing an example of the arrangement of the detection unit.
7B is a diagram showing an example of the arrangement of the detection unit.
8A is a diagram showing an example of the arrangement of the detection unit.
8B is a diagram showing an example of the arrangement of the detection unit.
9 is a block diagram showing a control block additionally having a function of correcting the output from the detection unit.
10 is a block diagram showing a control block of the temperature control device according to the third embodiment.
11 is a view showing an example of the arrangement of a temperature control device using three control systems.
12 is a block diagram showing a control block of a temperature measuring apparatus for measuring the temperature of a plurality of spaces.
13 is a schematic view showing an exposure apparatus.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The same reference numerals denote the same members throughout the drawings, and a repeated explanation thereof is not given.

1st Example

The temperature control apparatus 100a according to the first embodiment of the present invention will be described. Fig. 1 is a schematic view showing a configuration of a temperature control device 100a according to the first embodiment. The temperature control apparatus 100a according to the first embodiment is configured to control the temperature of the internal space of the lithographic apparatus forming the pattern on the substrate (for example, the space in the chamber where the processing for forming the pattern on the substrate is performed) Can be used to control. The temperature control apparatus 100a may include a plurality of control systems each controlling the temperature of the interior space of the lithographic apparatus. The temperature control apparatus 100a according to the first embodiment will exemplify an apparatus using two control systems, that is, a first control system 1a and a second control system 1b.

The first control system 1a may include a first supply unit 2a, a first temperature sensor 5a, a first control unit 7a and a first temperature controller 8a. The first supply unit 2a has a first space 6a through which a temperature control fluid 3 (for example, air) is sent through the duct 4 and a temperature control fluid 3 is supplied into the internal space of the lithographic apparatus through the filter 9a using an air intake (not shown) or the like. The first temperature sensor 5a includes a resistor (such as a platinum resistor) whose resistance value changes according to temperature, and may be provided in the first space 6a of the first supply unit 2a. The first control unit 7a controls the first space 6a by controlling the first temperature regulator 8a (for example, a heater) provided in the duct 4 based on the output from the first temperature sensor 5a, And controls the temperature of the first space 6a to be the target temperature.

The second control system 1b includes a second supply unit 2b, a second temperature sensor 5b, a second control unit 7b, and a second temperature controller 8b, as in the first control system 1a. . ≪ / RTI > The second supply unit 2b has a second space 6b through which a temperature-regulated fluid 3 (for example, air) is sent through the duct 4, The fluid 3 is supplied to the inner space of the lithographic apparatus through the filter 9b using an air intake (not shown) or the like. The second temperature sensor 5b includes a resistor (such as a platinum resistor) whose resistance value changes according to temperature, and may be provided in the second space 6b of the second supply unit 2b. The second control unit 7b controls the second temperature regulator 8b (for example, the heater) provided in the duct 4 based on the output from the second temperature sensor 5b, And controls the temperature of the second space 6b to be the target temperature by controlling the temperature of the fluid 3 to be sent to the second space 6b.

The first control system 1a and the second control system 1b having the above-described configuration are arranged so that the temperature of the first space 6a of the first supply unit 2a and the temperature of the second space 6b of the second supply unit 2b To control the temperature of the interior space of the lithographic apparatus. However, the errors occurring in the output from the first temperature sensor 5a provided in the first space 6a and the second temperature sensor 5b provided in the second space 6b are different from each other due to their individual differences and aging The size may be different. FIG. 2B is a graph showing an example of a change in error occurring over time in two temperature sensors (the first temperature sensor 5a and the second temperature sensor 5b). For example, when the first temperature sensor 5a and the second temperature sensor 5b each include a platinum resistor, a connection portion between platinum or platinum and the lead wire, a resistor used in a circuit for detecting the resistance value of the platinum resistor, And the like may change with time. As a result, errors can be generated in the outputs from the first and second temperature sensors 5a and 5b, respectively. In the example shown in Fig. 2B, the error of the first temperature sensor 5a increases in the plus direction with the lapse of time, and the error of the second temperature sensor 5b increases in the minus direction with the lapse of time. As described above, since the magnitude of the error generated at the output from the temperature sensor may be different for each temperature sensor, it is difficult to predict such an error. For this reason, controlling the temperatures of the first and second spaces 6a and 6b based on the output from the first and second temperature sensors 5a and 5b in which different errors have occurred, 6a and 6b can be shifted from the target temperature difference. This can make it difficult to accurately control the temperature in the interior space of the lithographic apparatus.

As shown in Fig. 1, the temperature control device 100a according to the first embodiment includes a detection unit 10 having a first container 11a and a second container 11b. The detection unit 10 has a first container 11a disposed in the first space 6a and a second container 11b disposed in the second space 6b. 2 container 11b is detected. The first container 11a is configured to change the internal pressure according to the temperature of the first space 6a. The second container 11b is configured to change the internal pressure according to the temperature of the second space 6b. The second control unit 7b of the second control system 1b converts the pressure difference detected by the detection unit 10 into a temperature difference between the first space 6a and the second space 6b. The temperature of the second space 6b is obtained by correcting the deviation between the target temperature of the second space 6b and the output from the second temperature sensor 5b using a value obtained by conversion (conversion value) Value. In this case, when the temperature difference between the first space 6a and the second space 6b is 0, the first container 11a and the second container 11b are communicated with each other through the inside of the first container and the inside of the second container Lt; RTI ID = 0.0 > 0 < / RTI >

The arrangement of the detection unit 10

Next, the detailed mechanism of the detection unit 10 will be described with reference to Fig. Fig. 3 is a diagram showing an example of the arrangement of the detection unit 10. Fig. The detection unit 10 may include a first container 11a disposed in the first space 6a, a second container 11b disposed in the second space 6b, and a differential pressure sensor 13. The differential pressure sensor 13 is connected to the inside of the second container 11b through a first chamber 16a and a second pipe 12b which communicate with the inside of the first container 11a through the first pipe 12a, And a second chamber 16b. The diaphragm 17 separates between the first chamber 16a and the second chamber 16b. For example, while the inside of each of the first and second vessels 11a and 11b is set to vacuum, the amount of liquid (volume) smaller than the maximum volume of each of the first and second vessels 11a and 11b 14 may be sealed therein. The construction of the first and second vessels 11a and 11b in this manner will ensure that the interior of the first and second vessels 11a and 11b will be filled with liquid 14 and vapor 15 of liquid, , 12b will be filled with liquid vapor 15. In this case, the amount of the liquid may be an amount that sets the vapor-liquid equilibrium state in which the liquid 14 and the vapor 15 always coexist in the temperature range within the space in which the first and second vessels 11a and 11b are disposed. At this time, the internal pressure in the vapor-liquid equilibrium state of the first and second vessels 11a and 11b can be obtained by the Clausius Clapeyron equation expressed by equation (1). In the equation (1), L represents the heat of vaporization, R represents the gas constant, P represents the vapor pressure [Pa], T represents the temperature [K], and C represents the integral constant.

Figure 112017075705725-pct00001
... (One)

According to equation (1), the vapor pressure P is uniquely determined by the type and temperature of the liquid 14. That is, the internal pressure of the first container 11a is set to the vapor pressure P1 of the liquid 14 corresponding to the temperature of the first space 6a in which the first container 11a is disposed, 11b is set to the vapor pressure P2 of the liquid corresponding to the temperature of the second space 6b in which the second container 11b is disposed.

The configuration of the differential pressure sensor 13 will be described below with reference to Figs. 4A and 4B. Figs. 4A and 4B are respective sectional views showing an example of the arrangement of the differential pressure sensor 13. Fig. The differential pressure sensor 13 shown in Fig. 4A includes a first chamber 16a communicating with the first pipe 12a and a second chamber 16b communicating with the second pipe 12b. The diaphragm 17 separates between the first chamber 16a and the second chamber 16b. Therefore, when a pressure difference is generated between the inside of the first container 11a and the inside of the second container 11b, the diaphragm 17 is deformed in accordance with the pressure difference. The differential pressure sensor 13 measures the distortion of the diaphragm 17 using a measuring device such as an interferometer and obtains a pressure difference between the inside of the first container 11a and the inside of the second container 11b from the measurement result have. Meanwhile, the differential pressure sensor 13 shown in FIG. 4B may include a third chamber 18 communicating with the pressure regulator 19 between the first chamber 16a and the second chamber 16b. The pressure regulator 19 can adjust the internal pressure of the third chamber 18 to bring it closer to the internal pressure of the first or second chamber 16a or 16b and reduce the detection range of the differential pressure sensor 13, The resolution of the sensor 13 can be improved. Note that if the differential pressure sensor 13 has sufficient resolution, the pressure regulator 19 may be omitted and the third chamber 18 may be charged to the atmosphere or the third chamber 18 may be emptied.

5, the detection unit 10 may include a first pipe 12a and a heat insulating material 20 covering the second pipe 12b. When the first pipe 12a is not disposed in the first space 6a, heat is transferred between the first pipe 12a and the atmosphere in which the first pipe 12a is disposed, and the vapor pressure in the first pipe 12a changes have. Similarly, when the second pipe 12b is not disposed in the second space 6b, heat is transferred between the second pipe 12b and the atmosphere in which the second pipe 12b is disposed and the vapor pressure in the second pipe 12b is changed . As a result, an error may occur in the pressure difference between the inside of the first container 11a detected by the differential pressure sensor 13 and the inside of the second container 11b. Covering the first pipe 12a and the second pipe 12b with the heat insulating material 20 can suppress the occurrence of an error in the pressure difference detected by the pressure difference sensor 13. [

Temperature control

The temperature control in the first space 6a and the second space 6b by the temperature control device 100a according to the first embodiment will be described with reference to Fig. 6 is a block diagram showing a control block of the temperature control device 100a according to the first embodiment. The first embodiment will exemplify the case where the target temperature difference is 0, that is, the target temperature of the first space 6a is equal to the target temperature of the second space 6b.

In the first control system 1a, the output from the first temperature sensor 5a disposed in the first space 6a of the first supply unit 2a is supplied to the subtractor 7a 1 of the first control unit 7a . A subtracter (7a 1) acquires a deviation between the output from the first space (6a) the target temperature (SP1) and a first temperature sensor (5a) of the. Compensator (7a 2) (for example, PID compensator) obtains a power value supplied to the subtractor (7a 1) a first thermostat (8a) falls within the deviation is acceptable by the acquisition. Drive device (7a 3) provides power to the first thermostat (8a) on the basis of the power value obtained by the compensator (7a 2). In this manner, the first control system 1a performs the feedback control of the temperature of the first space 6a.

In addition, the second control in the unit (1b), the second control unit in terms of a group of (7b) (7b 4) has a first space to a pressure difference (P 21) detected by the detection unit (10) (6a) and the 2 space (6b). For example, when Novec 7000 TM, which is hydrofluoroether (hereinafter referred to as HFE), is used as the liquid 14, the equation (2) can be obtained by using the equation (1) P) and the temperature T of the second space 6b. In this case, in terms of group (7b 4) is the second from the acquired values by converting the output (temperature t 2 [℃]) with the formula (3) units [K] depending on from the second temperature sensor (5b) second container (11b (P < 2 >

Figure 112017075705725-pct00002
... (2)

Figure 112017075705725-pct00003
... (3)

Conversion group (7b 4) is a first container (11a) by adding the pressure difference (P 21), a second container (11b) in terms of value (P 2 ') on the vapor pressure of the interior is detected by the detection unit 10 Is obtained. The predicted temperature t 1 [占 폚] in the first space 6a is obtained from the conversion value concerning the vapor pressure inside the first container 11a according to the equation (4). With this operation, in terms of group (7b 4) is predicted temperature t 1 in the first output from the second temperature sensor (5b) (temperature t 2 [℃]) first area obtained by the equation (4) (6a) [ (The converted value with respect to the temperature difference between the first and second spaces) between the first space and the second space is obtained according to the equation (5). The difference Dt obtained by the converter 7b 4 is supplied to the subtractor 7b 1 of the second control unit 7b.

Figure 112017075705725-pct00004
... (4)

Figure 112017075705725-pct00005
... (5)

The output from the second temperature sensor 5b disposed in the second space 6b of the second supply unit 2b is supplied to the subtractor 7b 1 . A subtracter (7b 1) is the difference (Dt) obtained by the target temperature (SP2) and the obtaining the deviation between the output from the second temperature sensor (5b) and, in terms of group (7b 4) in the second space (6b) . As shown in Fig. 2A, by this operation, the error generated in the value obtained by correcting the output from the second temperature sensor 5b with the difference Dt is obtained from the output from the first temperature sensor 5a It is possible to approximate the generated error. The value obtained by the subtractor (7b 1) is supplied to the compensator (7b 2) (for example, PID compensator). A compensator (7b 2) is a subtractor (7b 1) the value falls within the allowable range obtaining a power value supplied to the second temperature controller (8b), and the drive device (7b 3) obtained by the compensator (7b 2) And supplies power to the second temperature regulator 8b based on the power value acquired by the second temperature regulator 8b. Thereby, the actual temperature difference between the first space 6a and the second space 6b is set to the target temperature difference (the first embodiment) by feedback-controlling the temperature of the second space 6b by using the second control system 1b, 0 "). In this case, in the first embodiment, in terms of group the difference between the output from the target temperature (SP2) and the second temperature sensor (5b) by the difference (Dt) obtained by the (7b 4) is corrected. However, the output from the second temperature sensor 5b or the target temperature SP2 can be corrected using the difference Dt.

As described above, the temperature control device 100a according to the first embodiment includes the first container 11a disposed in the first space 6a, the second container 11b disposed in the second space 6b, And a detection unit (10) for detecting a pressure difference between the inside of the chamber (10). The temperature control device 100a converts the pressure difference detected by the detection unit 10 into a temperature difference between the first space 6a and the second space 6b and outputs the converted value of the temperature difference and the second temperature sensor 5b And controls the temperature of the second space 6b based on the output from the second space 6b. This can bring the temperature difference between the first space 6a and the second space 6b close to the target temperature difference. For example, this makes it possible to accurately control the temperature in the interior space of the lithographic apparatus. The temperature control apparatus 100a according to the first embodiment performs control only on at least one control system among a plurality of control systems without performing calibration of the space temperature control for a plurality of control systems, Can be performed.

Second Example

A temperature control apparatus according to a second embodiment of the present invention will be described. The temperature control device according to the second embodiment differs from the temperature control device 100a according to the first embodiment in the configuration of the detection unit 10. 7A and 7B are diagrams showing an example of the arrangement of the detection unit 10 in the temperature control device according to the second embodiment. The differential pressure sensor 13 of the detection unit 10 detects the pressure difference between the detection result detected by the detection unit 10 and the detection result of the differential pressure sensor 13 based on, An error may occur in the detection result obtained by the unit 10. [ In this case, it may be difficult to accurately detect the pressure difference between the interior of the first container 11a and the interior of the second container 11b. Therefore, the detection unit 10 according to the second embodiment has the bypass pipe 22 for communicating the inside of the first container 11a and the inside of the second container 11b. The bypass pipe (22) is provided with a valve (21). The valve 21 is opened to allow the inside of the first container 11a to pass through the bypass pipe 22 while controlling the temperature of the first space 6a and the second space 6b to be equal to each other, To communicate with the interior of the second container (11b). That is, the internal pressures of the first and second containers 11a and 11b become equal. In this case, the pressure difference detected by the detection unit 10 is an error generated in the detection result obtained by the detection unit 10. [ That is, the pressure difference detected by the detection unit 10 while the interior of the first container 11a communicates with the interior of the second container 11b by opening of the valve 21 is a state in which the valve 21 is closed It can be used as a correction value for correcting the output from the detection unit 10. [

The detection unit 10 shown in Fig. 7A is configured to include a bypass pipe 22 and one valve 21 which communicate the inside of the first pipe 12a and the inside of the second pipe 12b. The detection unit 10 shown in Fig. 7B is configured to include a bypass pipe 22 and two valves 21. Fig. 8A and 8B, the first and second pipes 12a and 12b are connected to the first and second vessels 11a and 11b in such a manner that the liquid 14 having a higher boiling point than the liquid 14 sealed in the first and second vessels 11a and 11b 23). The liquid 23 filled in the first and second pipes 12a and 12b preferably has a vapor pressure of 1/100 or less of the liquid 14 sealed in the first and second vessels 11a and 11b. When the first and second pipes 12a and 12b are filled with the liquid 23 in this manner, the heat insulating material 20 covering the first and second pipes 12a and 12b can be omitted. Referring to Fig. 8A, a film 24 is provided to prevent contact between the liquid 23 filling each piping and the vapor of the liquid 14 in the corresponding vessel. 8B, the film 24 is not provided. In this case, it is preferable that the diameters of the first and second pipes 12a and 12b are set so that the liquid 23 stays in the pipe due to the surface tension.

Fig. 9 is a block diagram showing a control block obtained by adding a function of correcting the output from the detection unit 10. Fig. The control block shown in Figure 9 is provided with a correction device (7b 5). Correction device (7b 5) it is supplied to the detection unit 10, the group correction, in terms of the value obtained for the pressure difference to the correction value (7b 4) detected by the. Conversion group (7b 4) is in terms of the value supplied from the correction device (7b 5) to the temperature difference between the first space (6a) and a second space (6b). Hereinafter, the step of acquiring the correction value will be described. It is preferable to perform this step periodically, for example, automatically once a day. For example, the correction device (7b 5) is from the first and second spaces (6a, 6b) detection unit 10, while the valve 21 in a state of performing a control to match the temperature of the closure of the (A pressure difference between the inside of the first container 11a and the inside of the second container 11b). While the control is performed so that the temperatures of the first and second spaces 6a and 6b coincide with each other, the correction device 7b 5 corrects the inside of the first container 11a through the bypass pipe 22 2, the valve 21 is opened to communicate the inside of the container 11b. In this case, the correction device (7b 5) is a detection unit 10, the first internal and the cost to detect the pressure difference between the interior of the second container (11b), and the obtained pressure difference between the container (11a) as the correction value . When the predetermined time after the valve 21 is closed elapses, the correction device (7b 5) is correct it is turned off, the maintenance of output and detected by the detection unit 10 is stored in the correction value from the detection unit 10 and it delivers the result in terms of a value group (7b 4).

Third Example

A temperature control apparatus according to a third embodiment of the present invention will be described. The first embodiment is a case in which the target temperature difference between the first space 6a and the second space 6b is zero when the target temperature of the first space 6a is equal to the target temperature of the second space 6b . In the third embodiment, the target temperature of the first space 6a is different from the target temperature of the second space 6b, that is, the target temperature difference between the first space 6a and the second space 6b is greater than zero Value will be exemplified. In this case, since the temperature control device according to the third embodiment has the same configuration as the temperature control device 100a according to the first embodiment, the description of the device configuration will be omitted.

10 is a block diagram showing a control block of the temperature control apparatus according to the third embodiment. Referring to Fig. 10, the target temperature SP1 of the first space 6a is different from the target temperature SP2 of the second space 6b. By controlling the temperature of the first space 6a and the temperature of the second space 6b by using the control block shown in Fig. 10, the actual temperature difference between the first space 6a and the second space 6b (The difference between the target temperature SP1 in the first space 6a and the target temperature SP2 in the second space 6b). Since the temperature control device according to the third embodiment is different in the configuration of the temperature control device 100a and the second control unit 7b according to the first embodiment, the configuration of the second control unit 7b will be described below do.

A second control unit (7b) includes a first calculator for calculating a first container (11a) pressure of the internal from the output from the first temperature sensor (5a) by using the equation (1) (7b 6) and (1 And a second calculator 7b 7 for calculating the pressure value inside the second container 11b from the output from the second temperature sensor 5b using the second temperature sensor 5b. The pressure value calculated by the first calculator (7b 6) a pressure value and a second converter (7b 7) calculated by the subtractor is supplied to the (7b 8). A subtracter (7b 8) acquires the difference between the first converter (7b 6) The pressure value calculated by the second calculator (7b 7) to a pressure value by calculation. A subtracter (7b 9) is a detection unit (10) subtracting the value obtained by the pressure subtracter (7b 8) from the detection by, and in terms of group (7b 4) is the value obtained by the subtractor (7b 9) Is converted into deviation from the target temperature difference of the temperature difference between the first space (6a) and the second space (6b). The subtracter 7b 1 obtains the deviation between the target temperature SP2 of the second space 6b and the output from the second temperature sensor 5b and outputs the deviation as the deviation of the temperature difference converted by the subtractor 7b 1 . The value obtained by the subtractor (7b 1) is supplied to the compensator (7b 2) (for example, PID compensator). Compensator (7b 2) is deuldorok obtain a power value supplied to the second temperature controller (8b) within the value obtained by the subtractor (7b 1) the allowable range. Drive device (7b 3) provides power to a second temperature controller (8b) on the basis of the power value obtained by the compensator (7b 2). With this operation, the second control system 1b performs the feedback control of the temperature of the second space 6b so as to set the actual temperature difference between the first space 6a and the second space 6b to the target temperature difference . In this case, the third embodiment is to correct the deviation between the converted group (7b 4) acquired by the value of the target temperature by using the (deviation from the temperature difference) (SP2) and the second output from the temperature sensor (5b) . However, for example, the output from the second temperature sensor 5b or the target temperature SP2 can be corrected.

Fourth Example

The temperature control device 100b according to the fourth embodiment of the present invention will be described. The fourth embodiment illustrates an example of the configuration of the temperature control device 100b using three control systems. 11 is a diagram showing an example of the configuration of the temperature control device 100b using three control systems. The temperature control device 100b according to the fourth embodiment can be used for controlling the temperature inside the chamber 50 in which the lithographic apparatus is disposed. In the example shown in FIG. 11, a substrate stage 56 is provided as part of a lithographic apparatus, which is configured to move while holding a substrate 55 inside a chamber 50.

The first control system 1a includes a first supply unit 2a, a first temperature sensor 5a, a first control unit 7a, and a first temperature regulator 8a, Of the first space (6a) in the first space (6a). The second control system 1b includes a second supply device 2b, a second temperature sensor 5b, a second control unit 7b and a second temperature regulator 8b, The temperature of the second space 6b in the second space 6b is set as the target temperature. The third control system 1c includes a third supply unit 2c, a third temperature sensor 5c, a third control unit 7c, and a third temperature regulator 8c, and the third supply unit 2c, And the temperature of the third space 6c in the second space 6b is set as the target temperature.

In addition, the temperature control apparatus 100b according to the fourth embodiment may include a first detection unit 10a and a second detection unit 10b. The first detection unit 10a may include a first container 11a provided in the first space 6a, a second container 11b provided in the second space 6b, and a differential pressure sensor 13a. The differential pressure sensor 13a of the first detection unit 10a is connected to the first container 11a and the second container 11b through the first pipe 12a and the second pipe 12b, 11a and the interior of the second container 11b. As described in the above embodiment, the second control unit 7b calculates the temperature difference between the first space 6a and the second space 6b using the pressure difference detected by the first detection unit 10a, And controls the temperature of the second space 6b so as to set the temperature difference. Similarly, the second detection unit 10b may include a third container 11c provided in the second space 6b, a fourth container 11d provided in the third space, and a differential pressure sensor 13b. The differential pressure sensor 13b of the second detection unit 10b is connected to the third container 11c and the fourth container 11d via the third pipe 12c and the fourth pipe 12d, 11c and the interior of the fourth container 11d. The third control unit 7c can control the temperature difference between the second space 6b and the third space 6c by using the pressure difference detected by the second detection unit 10b, The temperature of the third space 6c is controlled so as to be set to the temperature.

By constituting the temperature control device 100b as described above, accurate spatial temperature control of each control system can be performed by calibrating the space temperature control only for the first control system 1a, not for all of the control plural control systems. 11, the third container 11c is disposed in the second space 6b, and the second detection unit 10b is disposed in the third space 11b disposed in the second space 6b. In this case, And a pressure difference between the inside of the fourth container 11d and the inside of the fourth container 11d disposed in the third space 6c. However, this is not comprehensive. For example, the third container 11c may be disposed in the first space 6a, and the second detection unit 10b may be disposed inside the third container 11c disposed in the first space 6a, 3 space 6c of the fourth container 11d.

Of the temperature measuring device Example

An embodiment of a temperature measuring apparatus for measuring the temperature of a plurality of spaces will be described below with reference to Fig. 12 is a block diagram showing a control block of a temperature measuring apparatus for measuring the temperature of a plurality of spaces. The present embodiment will exemplify the case of measuring the temperatures of the first and second spaces.

The temperature measuring apparatus includes a first temperature sensor 5a for measuring the temperature of the first space, a second temperature sensor 5b for measuring the temperature of the second space, a detecting unit 10, and a control unit 7 can do. The detection unit 10 may include a first container 11a disposed in a first space, a second container 11b disposed in a second space, and a differential pressure sensor 13. [ The differential pressure sensor 13 is connected to the inside of the first and second vessels 11a and 11b through the first and second pipes 12a and 12b and is connected to the inside of the first vessel 11a and the inside of the second vessel 11b Of the pressure difference between the inside and the outside of the apparatus.

A control unit (7) is formula (1) a first converter (7b 6) and formula (1) by calculating a pressure value inside the first container (11a) from the output from the first temperature sensor (5a) using the And a second calculator 7b 7 for calculating the pressure value inside the second container 11b from the output from the second temperature sensor 5b using the second temperature sensor 5b. The pressure value calculated by the first calculator (7b 6) a pressure value and a second converter (7b 7) calculated by the subtractor is supplied to the (7b 8). A subtracter (7b 8) acquires the difference between the first converter (7b 6) The pressure value calculated by the second calculator (7b 7) to a pressure value by calculation. A subtracter (7b 9) is a detection unit (10) subtracting the value obtained by the pressure subtracter (7b 8) from the detection by, and in terms of group (7b 4) is the value obtained by the subtractor (7b 9) Is converted into deviation from the target temperature difference of the temperature difference between the first space (6a) and the second space (6b). The subtracter 7b 1 subtracts the deviation of the temperature difference converted by the converter 7b 4 from the output from the second temperature sensor 5b. By this operation, the control unit 7 makes the error generated at the output from the first temperature sensor 5a close to the error generated at the output from the second temperature sensor 5b, and the temperature of the first space (Temperature information) of the second space with respect to the second space.

Lithography  Device Example

A case where one of the temperature control devices 100 according to the first to fourth embodiments is applied to a lithographic apparatus that forms a pattern on a substrate will be described. A lithographic apparatus includes, for example, an exposure apparatus that exposes a substrate to transfer a mask pattern onto a substrate, an imprint apparatus that forms an imprint material on the substrate using a mold, And an image forming apparatus for forming an image. A case where one of the temperature control apparatuses 100 according to the first to fourth embodiments is applied to an exposure apparatus as a lithography apparatus will be described.

FIG. 13 is a schematic view showing the exposure apparatus 200. FIG. The exposure apparatus 200 includes, for example, a chamber 50 in which a unit for forming a pattern on a substrate 55 is disposed. The unit includes a mask stage 54 configured to hold and move the illumination optical system 51, a projection optical system 52, a mask 53, (Not shown). The exposure apparatus 200 may also include a control unit 57. [ The control unit 57 includes, for example, a CPU and a memory, and controls each unit of the exposure apparatus 200b (controls the exposure process). In this case, since the fine pattern is formed on the substrate 55, the exposure apparatus 200 needs to accurately control the temperature of the inner space of the chamber 50. For this reason, the exposure apparatus 200 may be provided with one of the temperature control apparatuses 100 according to the first to fourth embodiments so as to accurately control the temperature at a plurality of portions of the internal space of the chamber 50 .

The mask 53 and the substrate 55 are held at the mask stage 54 and the substrate stage 56 respectively and are held at positions substantially optically conjugate with each other through the projection optical system 52 And the position of the curvature of the image surface). The projection optical system 52 projects a pattern formed on the mask 53 onto the substrate 55 using light emitted from the illumination optical system 51 having a predetermined projection magnification (for example, 1/2). In this case, the mask stage 54 and the substrate stage 56 are relatively moved in a direction (e.g., the Y direction) perpendicular to the optical axis of the projection optical system 52 at a speed ratio corresponding to the projection arrangement of the projection optical system 52 Move. Thus, the pattern formed on the mask 53 can be transferred to the substrate 55.

Of the article manufacturing method Example

The article manufacturing method according to the embodiment of the present invention is suitable for manufacturing an article such as a semiconductor device or a micro device having a fine structure. The present method for manufacturing an article according to the present embodiment includes the steps of forming a pattern on a substrate using the lithographic apparatus (exposure apparatus) (exposing a substrate) and processing a substrate on which a pattern is formed in a previous step , ≪ / RTI > development). The manufacturing method further includes other known steps (oxidation, deposition, deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.). The article manufacturing method according to this embodiment is superior to the conventional method in at least one of the article performance, quality, productivity, and production cost.

Other Example

The embodiment (s) of the present invention (control unit) may include a storage medium (which may be referred to more fully as a 'non-transitory computer readable storage medium') for performing one or more of the above- (E.g., an application-specific integrated circuit (e.g., a computer-readable storage medium) that reads and / or executes computer-executable instructions (e.g., one or more programs) ASIC), and / or by reading and executing computer-executable instructions from a storage medium to perform, for example, the functions of one or more of the above-described embodiments (s) and / May be realized by a method executed by a computer of the system or apparatus by controlling one or more circuits to perform one or more functions of the embodiment (s) There is also. A computer may include one or more processors (e.g., a central processing unit (CPU), microprocessing unit (MPU)) and may include a separate computer or a separate processor network for reading and executing computer- can do. The computer-executable instructions may be provided to the computer, for example, from a network or storage medium. The storage medium may be, for example, a hard disk, a random access memory (RAM), a read only memory (ROM), a storage of a distributed computing system, an optical disk (e.g., a compact disk (CD), a digital versatile disk Blu-ray Disc (BD) (TM)), a flash memory device, a memory card, and the like.

While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims is to be accorded the broadest interpretation so as to encompass all such modifications and equivalent structures and functions.

This application claims priority from Japanese Patent Application No. 2015-007191, filed January 16, 2015, the entirety of which is incorporated herein by reference.

Claims (14)

A temperature control device for controlling a temperature of a first space and a second space,
A first control unit configured to control a temperature of the first space;
A second control unit configured to control a temperature of the second space; And
A first container which is disposed in the first space and whose internal pressure changes in accordance with the temperature of the first space, a second container which is disposed in the second space and whose internal pressure changes in accordance with the temperature of the second space, And a sensor connected to the interior of the first container and the interior of the second container and configured to detect a pressure difference between the first container and the second container,
And the second control unit controls the temperature of the second space based on a pressure difference detected by the detection unit so as to set the temperature difference between the first space and the second space to a target temperature difference. The method according to claim 1,
And the second control unit controls the temperature of the second space by using the conversion value obtained by converting the pressure difference detected by the detection unit into the temperature difference. 3. The method of claim 2,
Further comprising a temperature sensor configured to measure a temperature of the second space,
The second control unit controls the temperature of the second space based on the value obtained by correcting the deviation between the output from the temperature sensor and the target temperature of the second space using the conversion value, Device. The method according to claim 1,
Wherein the first container and the second container are configured such that the pressure difference becomes zero when the temperature difference between the first space and the second space is zero. The method according to claim 1,
Wherein the first vessel has the same volume as the second vessel. The method according to claim 1,
Wherein a volume of liquid smaller than an internal volume of each of the first container and the second container is sealed in the inside thereof. The method according to claim 1,
Wherein the sensor of the detection unit comprises:
A first chamber communicating with the interior of the first vessel through a first pipe, a second chamber communicating with the interior of the second vessel through a second pipe, and a second chamber communicating with the first chamber and the second chamber Wherein the diaphragm comprises a diaphragm,
And the pressure difference is detected by measuring twist of the diaphragm. 8. The method of claim 7,
Wherein the first pipe and the second pipe are covered with a heat insulating material. 8. The method of claim 7,
Wherein each of the first pipe and the second pipe is filled with a liquid having a boiling point higher than that of the liquid enclosed in each of the first container and the second container. 8. The method of claim 7,
Wherein the detection unit generates in the detection result of the pressure difference by making the inside of the first container communicate with the inside of the second container while the control is performed to make the temperature of the first space and the second space coincide with each other And a bypass piping configured to correct an error that is caused by the temperature difference. The method according to claim 1,
And the first space communicates with the second space. The method according to claim 1,
The first control unit controls the temperature of the first space by controlling the temperature of the fluid supplied to the first space based on the output from the first temperature sensor disposed in the first space,
Wherein the second control unit is configured to control the temperature of the second space based on the pressure difference so that the fluid supplied to the second space based on the output from the second temperature sensor disposed in the second space And the temperature of the second space is controlled by adjusting the temperature. A lithographic apparatus for forming a pattern on a substrate,
A unit configured to form a pattern on the substrate; And
And a temperature control device configured to control a temperature of the first space and the second space in communication with the space in which the unit is disposed,
The temperature control device includes:
A first control unit configured to control a temperature of the first space;
A second control unit configured to control a temperature of the second space; And
A first container which is disposed in the first space and whose internal pressure changes in accordance with the temperature of the first space, a second container which is disposed in the second space and whose internal pressure changes in accordance with the temperature of the second space, And a sensor connected to the interior of the first container and the interior of the second container and configured to detect a pressure difference between the first container and the second container,
Wherein the second control unit controls the temperature of the second space based on a pressure difference detected by the detection unit to set a temperature difference between the first space and the second space to a target temperature difference. A method of manufacturing an article,
Forming a pattern on a substrate using a lithographic apparatus; And
And processing the substrate on which the pattern is formed to manufacture an article,
The lithographic apparatus comprising:
A unit configured to form a pattern on the substrate; And
And a temperature control device configured to control a temperature of the first space and the second space in communication with the space in which the unit is disposed,
The temperature control device includes:
A first control unit configured to control a temperature of the first space;
A second control unit configured to control a temperature of the second space; And
A first container which is disposed in the first space and whose internal pressure changes in accordance with the temperature of the first space, a second container which is disposed in the second space and whose internal pressure changes in accordance with the temperature of the second space, And a sensor connected to the interior of the first container and the interior of the second container and configured to detect a pressure difference between the first container and the second container,
Wherein the second control unit controls the temperature of the second space based on a pressure difference detected by the detection unit so as to set a temperature difference between the first space and the second space to a target temperature difference.
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