JP2016125895A5 - - Google Patents
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- JP2016125895A5 JP2016125895A5 JP2014266374A JP2014266374A JP2016125895A5 JP 2016125895 A5 JP2016125895 A5 JP 2016125895A5 JP 2014266374 A JP2014266374 A JP 2014266374A JP 2014266374 A JP2014266374 A JP 2014266374A JP 2016125895 A5 JP2016125895 A5 JP 2016125895A5
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- JP
- Japan
- Prior art keywords
- wavefront
- distortion amount
- wavefront distortion
- modulator
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000005259 measurement Methods 0.000 claims 30
- 230000003287 optical effect Effects 0.000 claims 19
- 238000000034 method Methods 0.000 claims 17
- 238000009826 distribution Methods 0.000 claims 12
- 230000005284 excitation Effects 0.000 claims 10
- 238000004364 calculation method Methods 0.000 claims 7
- 210000001747 pupil Anatomy 0.000 claims 6
- 238000001514 detection method Methods 0.000 claims 5
- 230000001939 inductive effect Effects 0.000 claims 2
- 238000004590 computer program Methods 0.000 claims 1
- 238000000691 measurement method Methods 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014266374A JP6379031B2 (ja) | 2014-12-26 | 2014-12-26 | 波面歪み量測定装置、波面補償装置、光学測定装置、および方法 |
| PCT/JP2015/084955 WO2016104223A1 (ja) | 2014-12-26 | 2015-12-14 | 波面歪み量測定装置、波面補償装置、光学測定装置、および方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014266374A JP6379031B2 (ja) | 2014-12-26 | 2014-12-26 | 波面歪み量測定装置、波面補償装置、光学測定装置、および方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016125895A JP2016125895A (ja) | 2016-07-11 |
| JP2016125895A5 true JP2016125895A5 (enExample) | 2018-01-18 |
| JP6379031B2 JP6379031B2 (ja) | 2018-08-22 |
Family
ID=56150250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014266374A Active JP6379031B2 (ja) | 2014-12-26 | 2014-12-26 | 波面歪み量測定装置、波面補償装置、光学測定装置、および方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6379031B2 (enExample) |
| WO (1) | WO2016104223A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107978209B (zh) * | 2017-12-08 | 2024-01-05 | 中国科学院西安光学精密机械研究所 | 远程傅里叶望远镜成像演示系统 |
| TWI794416B (zh) * | 2018-02-28 | 2023-03-01 | 美商賽格股份有限公司 | 多層堆疊結構之計量方法及干涉儀系統 |
| DE102019218664B4 (de) * | 2019-12-02 | 2025-12-31 | Carl Zeiss Microscopy Gmbh | Verfahren und Vorrichtung zur Abbildung von Proben mittels manipulierter Anregungsstrahlung |
| JP7411913B2 (ja) * | 2020-06-03 | 2024-01-12 | パナソニックＩｐマネジメント株式会社 | Ｏｃｔ計測装置及びｏｃｔ計測方法 |
| CN116391118A (zh) * | 2020-10-15 | 2023-07-04 | 应用材料公司 | 用于光学装置的透视计量系统、设备及方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11230833A (ja) * | 1998-02-17 | 1999-08-27 | Ricoh Co Ltd | 位相分布の測定方法及び装置 |
| US7423766B1 (en) * | 2003-12-17 | 2008-09-09 | Chian Chiu Li | Interferometric optical profiler |
| JP5350178B2 (ja) * | 2009-10-23 | 2013-11-27 | キヤノン株式会社 | 補償光学装置、補償光学装置を備える撮像装置、補償光学方法 |
| JP2011232243A (ja) * | 2010-04-28 | 2011-11-17 | Canon Inc | 計測装置 |
-
2014
- 2014-12-26 JP JP2014266374A patent/JP6379031B2/ja active Active
-
2015
- 2015-12-14 WO PCT/JP2015/084955 patent/WO2016104223A1/ja not_active Ceased
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