JP2016125895A5 - - Google Patents

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Publication number
JP2016125895A5
JP2016125895A5 JP2014266374A JP2014266374A JP2016125895A5 JP 2016125895 A5 JP2016125895 A5 JP 2016125895A5 JP 2014266374 A JP2014266374 A JP 2014266374A JP 2014266374 A JP2014266374 A JP 2014266374A JP 2016125895 A5 JP2016125895 A5 JP 2016125895A5
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JP
Japan
Prior art keywords
wavefront
distortion amount
wavefront distortion
modulator
light
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JP2014266374A
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English (en)
Japanese (ja)
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JP6379031B2 (ja
JP2016125895A (ja
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Priority to JP2014266374A priority Critical patent/JP6379031B2/ja
Priority claimed from JP2014266374A external-priority patent/JP6379031B2/ja
Priority to PCT/JP2015/084955 priority patent/WO2016104223A1/ja
Publication of JP2016125895A publication Critical patent/JP2016125895A/ja
Publication of JP2016125895A5 publication Critical patent/JP2016125895A5/ja
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JP2014266374A 2014-12-26 2014-12-26 波面歪み量測定装置、波面補償装置、光学測定装置、および方法 Active JP6379031B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014266374A JP6379031B2 (ja) 2014-12-26 2014-12-26 波面歪み量測定装置、波面補償装置、光学測定装置、および方法
PCT/JP2015/084955 WO2016104223A1 (ja) 2014-12-26 2015-12-14 波面歪み量測定装置、波面補償装置、光学測定装置、および方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014266374A JP6379031B2 (ja) 2014-12-26 2014-12-26 波面歪み量測定装置、波面補償装置、光学測定装置、および方法

Publications (3)

Publication Number Publication Date
JP2016125895A JP2016125895A (ja) 2016-07-11
JP2016125895A5 true JP2016125895A5 (enExample) 2018-01-18
JP6379031B2 JP6379031B2 (ja) 2018-08-22

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ID=56150250

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JP2014266374A Active JP6379031B2 (ja) 2014-12-26 2014-12-26 波面歪み量測定装置、波面補償装置、光学測定装置、および方法

Country Status (2)

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JP (1) JP6379031B2 (enExample)
WO (1) WO2016104223A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107978209B (zh) * 2017-12-08 2024-01-05 中国科学院西安光学精密机械研究所 远程傅里叶望远镜成像演示系统
TWI794416B (zh) * 2018-02-28 2023-03-01 美商賽格股份有限公司 多層堆疊結構之計量方法及干涉儀系統
DE102019218664A1 (de) * 2019-12-02 2021-06-02 Carl Zeiss Microscopy Gmbh Verfahren und Vorrichtung zur Abbildung von Proben mittels manipulierter Anregungsstrahlung
JP7411913B2 (ja) * 2020-06-03 2024-01-12 パナソニックＩｐマネジメント株式会社 Ｏｃｔ計測装置及びｏｃｔ計測方法
EP4229385A4 (en) * 2020-10-15 2024-10-16 Applied Materials, Inc. TRANSPARENT METROLOGY SYSTEMS, APPARATUS AND METHODS FOR OPTICAL DEVICES

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11230833A (ja) * 1998-02-17 1999-08-27 Ricoh Co Ltd 位相分布の測定方法及び装置
US7423766B1 (en) * 2003-12-17 2008-09-09 Chian Chiu Li Interferometric optical profiler
JP5350178B2 (ja) * 2009-10-23 2013-11-27 キヤノン株式会社 補償光学装置、補償光学装置を備える撮像装置、補償光学方法
JP2011232243A (ja) * 2010-04-28 2011-11-17 Canon Inc 計測装置

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