JP2016087780A5 - - Google Patents
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- Publication number
- JP2016087780A5 JP2016087780A5 JP2015168088A JP2015168088A JP2016087780A5 JP 2016087780 A5 JP2016087780 A5 JP 2016087780A5 JP 2015168088 A JP2015168088 A JP 2015168088A JP 2015168088 A JP2015168088 A JP 2015168088A JP 2016087780 A5 JP2016087780 A5 JP 2016087780A5
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- temperature sensor
- polishing pad
- pad
- eddy current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 claims description 65
- 239000000758 substrate Substances 0.000 claims description 12
- 229910000859 α-Fe Inorganic materials 0.000 claims 3
- 239000007788 liquid Substances 0.000 description 5
- 239000004020 conductor Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/925,063 US20160121452A1 (en) | 2014-10-31 | 2015-10-28 | Polishing apparatus and polishing method |
SG10201508881RA SG10201508881RA (en) | 2014-10-31 | 2015-10-28 | Polishing Apparatus And Polishing Method |
SG10201801305PA SG10201801305PA (en) | 2014-10-31 | 2015-10-28 | Polishing Apparatus And Polishing Method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014223293 | 2014-10-31 | ||
JP2014223293 | 2014-10-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016087780A JP2016087780A (ja) | 2016-05-23 |
JP2016087780A5 true JP2016087780A5 (enrdf_load_stackoverflow) | 2018-09-13 |
Family
ID=56015959
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015168088A Pending JP2016087780A (ja) | 2014-10-31 | 2015-08-27 | 研磨装置および研磨方法 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2016087780A (enrdf_load_stackoverflow) |
SG (2) | SG10201801305PA (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017064899A (ja) * | 2015-10-01 | 2017-04-06 | 株式会社荏原製作所 | 研磨装置 |
JP6779633B2 (ja) * | 2016-02-23 | 2020-11-04 | 株式会社荏原製作所 | 研磨装置 |
CN113714934B (zh) * | 2016-10-21 | 2024-04-26 | 应用材料公司 | 用于原位电磁感应监测系统的芯配置 |
JP7227909B2 (ja) * | 2017-01-13 | 2023-02-22 | アプライド マテリアルズ インコーポレイテッド | インシトゥ監視からの測定値の、抵抗率に基づく調整 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001041828A (ja) * | 1999-07-27 | 2001-02-16 | Tokyo Gas Co Ltd | 温度測定装置及びそれを利用した測定方法 |
TWI273947B (en) * | 2002-02-06 | 2007-02-21 | Applied Materials Inc | Method and apparatus of eddy current monitoring for chemical mechanical polishing |
JP2004014999A (ja) * | 2002-06-11 | 2004-01-15 | Hitachi Chem Co Ltd | Cmp研磨装置及び研磨方法 |
KR100506942B1 (ko) * | 2003-09-03 | 2005-08-05 | 삼성전자주식회사 | 화학적 기계적 연마장치 |
JP4451111B2 (ja) * | 2003-10-20 | 2010-04-14 | 株式会社荏原製作所 | 渦電流センサ |
JP2009125825A (ja) * | 2007-11-20 | 2009-06-11 | Ebara Corp | 電解複合研磨方法及び電解複合研磨装置 |
US8523429B2 (en) * | 2009-10-19 | 2013-09-03 | Tsi Technologies Llc | Eddy current thermometer |
-
2015
- 2015-08-27 JP JP2015168088A patent/JP2016087780A/ja active Pending
- 2015-10-28 SG SG10201801305PA patent/SG10201801305PA/en unknown
- 2015-10-28 SG SG10201508881RA patent/SG10201508881RA/en unknown