JP2016083784A - Method for producing film-shaped mold, and transfer apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for producing a film-shaped mold, in which generation of a pattern defect due to an impact of a nip roll onto a transfer roll can be suppressed particularly as compared with the conventional method, and to provide a transfer apparatus.SOLUTION: The method for producing the film-shaped mold comprises: a press step of pressing nip rolls (108a, 108b) onto the transfer roll (107), on the outer peripheral surface of which a fine rugged pattern is formed, with a film-shaped mold base material (101) being interposed therebetween; and a transfer step of transferring the fine rugged pattern to the surface of the mold base material while feeding the mold base material interposed between the transfer roll and the nip rolls. At the press step, nip rolls are pressed onto the transfer roll by using an impact controlling means (112) capable of controlling the impact of the nip rolls (108a, 108b) onto the transfer roll (107).SELECTED DRAWING: Figure 2

Description

  The present invention relates to a method for manufacturing a film mold having a fine uneven pattern transferred to the surface and a transfer apparatus.

  Patent Document 1 discloses an invention relating to a method and apparatus for manufacturing a film structure. Patent Document 1 discloses a film structure manufacturing apparatus including a transfer roll, a backup roll provided in the vicinity of the transfer roll, a film feeding unit, and the like. A fine uneven pattern is formed on the peripheral surface of the transfer roll. Then, the transfer film is fed between the transfer roll and the backup roll, and the fine uneven pattern is transferred to the film side.

  Patent Document 2 also discloses a roll-to-roll apparatus including an uneven shape transfer roll and a backup roll.

JP 2008-183811 A JP 2009-220504 A

  By the way, when the nip roll is pressed against the transfer roll through the transfer film and the transfer film is sandwiched, the fine uneven pattern formed on the surface of the transfer roll is damaged by the impact of the nip roll on the transfer roll. It was. Thereby, the periodic unevenness | corrugation to a elongate direction arose in the fine concavo-convex pattern transferred with a transfer film.

  In both Patent Document 1 and Patent Document 2, there is no recognition of pattern defects on the transfer roll and transfer film based on the impact of the nip roll on the transfer roll, and therefore no means for solving it is presented.

  Therefore, the present invention has been made in view of the above-described problems, and in particular, compared with the conventional case, the production of a film mold that can suppress the occurrence of pattern defects due to the impact of the nip roll on the transfer roll. It is an object to provide a method and a transfer apparatus.

  The method for producing a film-shaped mold in the present invention includes a pressing step of pressing a nip roll against a transfer roll having a fine uneven pattern formed on an outer peripheral surface through a film-shaped mold substrate, the transfer roll and the nip roll. A transfer step of transferring the fine concavo-convex pattern to the surface of the mold base material while feeding the mold base material sandwiched therebetween, and in the pressing step, the nip roll is transferred to the transfer roll. The nip roll is pressed against by using an impact control means capable of controlling the impact.

  Thereby, compared with the past, the damage of the fine uneven | corrugated pattern of a transfer roll can be suppressed, As a result, the film-shaped mold with few generation | occurrence | production of a pattern defect can be manufactured.

In the present invention, the impact force of the nip roll to the transfer roll is preferably controlled to 0.05 to 0.2 kgf / cm ² .

  Moreover, in this invention, it is preferable to control the operating speed of the said nip roll to 5-10 mm / s.

  The transfer device according to the present invention includes a transfer roll having a fine uneven pattern formed on an outer peripheral surface, a nip roll for sandwiching a film-shaped mold base together with the transfer roll, and the nip roll via the mold base. And an impact control means for controlling the impact of the nip roll on the transfer roll when pressed against the roll.

  By using the transfer device of the present invention, it is possible to suppress the damage of the fine uneven pattern of the transfer roll as compared with the conventional case, and as a result, the film mold with less pattern defects (the fine unevenness on the mold substrate having the transfer layer). A pattern having been transferred).

In the impact control means in the present invention, it is preferable that the impact force of the nip roll to the transfer roll during pressing is controlled to 0.05 to 0.2 kgf / cm ² .

  In the present invention, it is preferable that the impact control means is composed of a pneumatic cylinder, a hydraulic cylinder, or an AC servo.

  In the present invention, it is preferable that a plurality of nip rolls are arranged with respect to the transfer roll, and the impact control means is controlled so that the nip rolls simultaneously contact the transfer roll.

  In the present invention, it is preferable that the impact control means has a cylinder that controls each nip roll independently and controls self-excited vibration of friction and slip.

  In the present invention, the surface hardness of the nip roll is preferably adjusted to a rubber hardness of 10 ° to 50 °.

  According to the present invention, it is possible to suppress the damage of the fine concavo-convex pattern of the transfer roll as compared with the conventional case, and as a result, it is possible to manufacture a film mold with less pattern defects.

It is the schematic of the transfer apparatus used for the manufacturing method of the 1st film-like mold concerning this embodiment, and is an explanatory view for explaining especially a pressing process. It is the schematic of the transfer apparatus used for the manufacturing method of the 1st film-shaped mold which concerns on this Embodiment, and is explanatory drawing for demonstrating especially a transfer process. It is the expansion conceptual diagram which expanded and showed the transfer roll shown in FIG. 2, and its peripheral part. It is the schematic which shows the transfer apparatus used for the duplication process of the 2nd film-shaped mold of the manufacturing method of the film-shaped mold which concerns on this Embodiment. It is explanatory drawing which shows the manufacturing method of the nth film mold which concerns on this Embodiment. It is a section schematic diagram of a film-like mold.

  Hereinafter, an embodiment of the present invention (hereinafter abbreviated as “embodiment”) will be described in detail. In addition, this invention is not limited to the following embodiment, It can implement by changing variously within the range of the meaning.

  In the present embodiment, the impact of the nip roll on the transfer roll, which has not been considered in the past, is mitigated.

  A fine concavo-convex pattern is formed on the outer peripheral surface of the transfer roll, and this fine concavo-convex pattern is transferred to the transfer layer of the mold substrate to produce a film mold. Here, the “film mold” refers to a film having a fine uneven pattern transferred to a transfer layer of a mold substrate. “Film” and “film shape” refer to a thin plate having flexibility, and do not limit the thickness, material, or the like.

  By the way, the nip roll is supported so as to be able to come into contact with and separate from the transfer roll. After the mold base is passed through the outer peripheral surface of the transfer roll with the nip roll separated from the transfer roll, the nip roll is moved in the direction of the transfer roll. Press against the transfer roll.

  Conventionally, the impact of the nip roll on the transfer roll during the pressing has not been particularly taken into consideration, and this impact causes a problem that the fine uneven pattern provided on the transfer roll is damaged. Conventionally, the movement of the nip roll is performed by a mechanical mechanism, and control for the impact of the nip roll on the transfer roll has not been performed. In particular, as described above, the fine concavo-convex pattern is formed on the outer peripheral surface of the transfer roll, and since the fine concavo-convex pattern has been further refined and densified in recent years, It was easily damaged by impact.

  The present embodiment has been made in view of the special circumstances described above, and has improved the movement mechanism for the nip roll so as to reduce the impact of the nip roll on the transfer roll. Hereinafter, the manufacturing method of a film mold is demonstrated, referring the transfer apparatus of this Embodiment.

(First film mold production process)
FIG. 1 is a schematic view of a transfer device used in the first film-shaped mold manufacturing method according to the present embodiment, and is an explanatory view for particularly explaining a pressing step. FIG. 2 is a schematic view of a transfer device used in the first film-shaped mold manufacturing method according to the present embodiment, and is an explanatory view for particularly explaining a transfer process. FIG. 3 is an enlarged conceptual diagram showing the transfer roll and its peripheral portion shown in FIG. 2 in an enlarged manner.

  A transfer apparatus 100 shown in FIG. 1 includes an original fabric roll 102 that sends out a mold base 101 and a take-up roll 104 that winds up. Between the raw roll 102 and the take-up roll 104, an application means 105 for applying a photocurable resin on the mold base 101 in order from the upstream side to the downstream side in the conveyance direction MD of the mold base 101. A guide roll 106, a transfer roll (cylindrical mold) 107 having a fine concavo-convex pattern on the outer peripheral surface, and a nip roll that closely contacts the photocurable resin on the mold base 101 and the outer peripheral surface of the transfer roll 107 A pressing unit 108 including 108a and 108b, a light source 109 for irradiating light to the photocurable resin, and a guide roll 110 are provided.

  In addition, when apply | coating photocurable resin using a solvent, you may further provide the drying furnace 111 which dries the solvent in photocurable resin.

  Using the transfer apparatus 100 having the above-described configuration, a first film mold is produced as follows.

  In FIG. 1, the mold base 101 is in contact with the outer peripheral surface of the transfer roll 107 with a predetermined tension between the raw roll 102 and the take-up roll 104. In FIG. 1, the nip rolls 108 a and 108 b are supported at positions separated from the transfer roll 107. As shown in FIG. 1, impact control means 112 and 112 are disposed outside the nip rolls 108a and 108b. The impact control means 112 is preferably a pneumatic cylinder, a hydraulic cylinder, or an AC servo. In FIG. 1, pneumatic cylinders and hydraulic cylinders are shown as the impact control means 112 and 112. Therefore, the impact control means 112 shown in FIG. 1 has a cylinder body 112a and a piston 112b that can reciprocate. For example, the nip rolls 108a and 108b are urged away from the transfer roll 107 by urging means (not shown), and the nip rolls 108a and 108b and the piston 112b of the impact control means 112 are in contact with each other. The The center of each piston 112b, the center of each nip roll 108a, and the center of the transfer roll 107 are in a straight line.

  The pistons 112b and 112b of the respective impact control means 112 and 112 are in a retracted position (retracted) with respect to the transfer roll 107, so that the nip rolls 108a and 108b are separated from the transfer roll 107 as shown in FIG. Supported at different positions.

  Back pressure is applied to the impact control means 112, 112 to advance (protrude) the pistons 112 b, 112 b toward the transfer roll 107 and press the nip rolls 108 a, 108 b toward the transfer roll 107. At this time, an appropriate pressure can be applied to the nip rolls 108 a and 108 b to move the nip rolls 108 a and 108 b toward the transfer roll 107. When the nip rolls 108a and 108a come into contact with the surface of the mold base 101, the movement of the pistons 112b and 112b of the impact control means 112 and 112 is stopped.

  As a result, as shown in FIG. 2, the mold base 101 can be held between the transfer roll 107 and the nip rolls 108a and 108b with a predetermined pressing force.

  As shown in FIGS. 1 to 2, the nip rolls 108a and 108b are moved in the direction of the transfer roll 107, and the mold base 101 is sandwiched between the transfer roll 107 and the nip rolls 108a and 108b, and then, as shown in FIG. A photocurable resin layer (transfer layer) is formed by applying a photocurable resin onto the light-transmitting mold substrate 101 fed from the raw fabric roll 102 by the application means 105 shown. The mold base 101 with the photocurable resin layer is supplied to the transfer roll 107 through the guide roll 106.

  Next, while rotating the transfer roll 107 and the nip rolls 108a and 108b, the outer peripheral surface of the transfer roll 107 is brought into close contact with the photocurable resin layer to transfer the fine uneven pattern onto the surface of the photocurable resin layer.

  As shown in FIG. 3, a fine uneven pattern 113 is formed on the outer peripheral surface 107a of the transfer roll 107, and the photocurable resin layer 114 and the fine uneven pattern 113 are in close contact with each other. The mold base 101 has a configuration in which a photocurable resin layer 114 is formed on a film-like base 115 with a predetermined thickness.

  The fine concavo-convex pattern 113 shown in FIG. 3 is a pillar shape including a plurality of conical, pyramidal or elliptical cone-shaped convex portions, or a hole shape or a line and space including a plurality of conical, pyramidal or elliptical conical concave portions. Shape. Here, the “pillar shape” is a “shape in which a plurality of columnar bodies (conical states) are arranged”, and the “hole shape” is a “shape in which a plurality of columnar (conical) holes are formed”. is there.

  The scale of the fine concavo-convex pattern is not particularly specified because it depends on the application to be used, but it refers to tens of nanometers to tens of micrometers. The scale may be the size, diameter, depth, and pitch of one microstructure. A random structure can be one of the fine structures.

  As an example of the size, the fine concavo-convex pattern 113 has, for example, a pitch P of about 100 nm to 3000 nm (preferably 200 nm or more) and a protrusion width D of about 30 nm to 3000 nm (preferably 100 nm or more). Further, the height H of the convex portion is about several tens of nm to several tens of μm. The pitch P is defined by a size obtained by adding the widths of adjacent convex portions and concave portions, an intermediate width between adjacent convex portions, or an intermediate width between adjacent concave portions. Moreover, the film thickness of the photocurable resin layer 114 of the mold base 101 is about 1 to 20 μm. As described above, the fine unevenness pattern 113 is further miniaturized, and the thickness of the photocurable resin layer 114 is also reduced. As a result, as shown in FIGS. 1 to 2, a structure in which the impact during the pressing process of the nip rolls 108a and 108b easily propagates to the surface of the transfer roll 107 on which the fine uneven pattern 113 is formed via the mold base 101. However, in this embodiment, this impact is reduced by using the impact control means 112. The “impact control means” will be described in detail later.

  Subsequently, as shown in FIG. 3, the photocurable resin layer 114 is irradiated with light L from the light source 109 to photocur the photocurable resin layer 114 to form a cured resin layer.

  Thus, the first film mold 103 having a fine uneven pattern on the surface can be produced. Then, as shown in FIG. 2, the first film-like mold 103 is taken up by the take-up roll 104 through the guide roll 110.

  In addition, in the manufacturing process of the 1st film-form mold 103, in order to protect the fine uneven | corrugated pattern transcribe | transferred from the transfer roll 107 to the 1st film-form mold 103, it protects on the photocurable resin layer after photocuring. A film (cover film) may be laminated.

  In this embodiment, as shown in FIG. 3, the fine unevenness pattern 113 on the outer peripheral surface 107 a of the transfer roll 107 and the photocurable resin layer 114 are in close contact with each other. The pattern 113 can be accurately photo-transferred, and insufficient curing due to oxygen can be avoided.

  Further, it is preferable to perform light irradiation with the transfer roll 107 and the photocurable resin layer 114 in close contact with each other in a nitrogen atmosphere. Thereby, contact of oxygen in the atmosphere with the photocurable resin layer 114 can be avoided, and inhibition of the photopolymerization reaction by oxygen can be reduced, so that the photocurable resin layer 114 can be sufficiently cured. It is.

(Second film mold replication process)
FIG. 4 is a schematic diagram showing a transfer device used in the second film-shaped mold duplication step of the film-shaped mold manufacturing method according to the present embodiment.

  A transfer apparatus 200 shown in FIG. 4 includes a first delivery roll 202 for delivering the transfer target substrate 201 and a first take-up roll 204 for winding the completed second film mold 203. . Between the first delivery roll 202 and the first take-up roll 204, the first film-like mold 103 is placed on the surface of the substrate 201 to be transferred in order from the upstream side to the downstream side in the transport direction MD. Application means 205 for applying a photocurable resin, a second delivery roll 206 for delivering the first film mold 103, and for bonding the first film mold 103 and the substrate 201 to be transferred. A bonding unit 207, a guide roll 208, a pressing unit 209 for bringing the first film mold 103 and the transferred substrate 201 into close contact, a light source 210 for irradiating light to the photocurable resin layer, and a guide A roll 211 and a second take-up roll 212 for taking up the first film mold 103 are provided.

  The bonding means 207 is composed of a pair of laminate rolls 207a and 207b. The pressing means 209 presses the first film mold 103 and the transferred substrate 201 against the rubber roll 209a on which the first film mold 103 and the transferred substrate 201 are conveyed on the outer peripheral surface thereof. Nip rolls 209b and 209c.

  Further, when the photocurable resin is dissolved in a solvent and applied to the transfer base material 201, a drying furnace 213 can be provided on the downstream side of the applying unit 205. Further, a drying furnace 214 may be provided on the downstream side of the bonding unit 207.

  Further, the first delivery roll 202 and the second delivery roll 206 may be interchanged. That is, a photocurable resin may be applied on the unevenness forming surface of the cured resin layer of the first film mold 103.

  Using the transfer device 200 having such a configuration, the second film-shaped mold is duplicated as follows.

  First, the substrate 201 to be transferred is fed from the first feed roll 202, and the photocurable resin is directly applied on the surface by the coating means 205 to form a photocurable resin layer.

  Next, the unevenness forming surface of the resin cured product layer of the first film mold 103 unwound from the second delivery roll 206 by the bonding means 207 is applied to the photocurable resin layer on the substrate 201 to be transferred. to paste together.

  At this time, the photocurable resin layer on the transferred substrate 201 is bonded to the resin application region on the unevenness forming surface of the cured resin layer of the first film mold 103. The first film-like mold 103 and the transferred substrate 201 can be aligned, for example, by installing a film meandering adjustment device.

  The first film mold 103 and the substrate 201 to be transferred are supplied to the pressing unit 209 through the guide roll 208. In the pressing means 209, the uneven surface of the cured resin layer of the first film mold 103 is brought into close contact with the photocurable resin layer. In this state, the light curable resin is irradiated with light from the light source 210 to photocur the photocurable resin. The adhesion by the pressing means 209 can prevent uncured by oxygen.

  Thereafter, the first film-shaped mold 103 and the substrate to be transferred 201 are conveyed to the guide roll 211, where the substrate to be transferred has a cured resin layer formed on the surface from the first film-shaped mold 103. 201, that is, the second film mold 203 is peeled off. At this time, the inverted shape of the fine uneven structure of the first film mold 103 is transferred to the second film mold 203.

  Thereafter, the second film-shaped mold 203 is wound around the first winding roll 204. On the other hand, the first film mold 103 is wound around the second winding roll 212.

(Preparation of nth film mold)
In the film-shaped mold manufacturing method according to the present embodiment described above, the second film-shaped mold 203 is duplicated using the first film-shaped mold 103 produced by transferring the fine concavo-convex pattern from the transfer roll 107 as an original plate. Explained the case. However, it is also possible to further replicate the third film mold using the second film mold 203 as an original plate. That is, the present invention can be applied from the (n−1) th (n is an integer of 2 or more) film-shaped mold to the method for producing the n-th film-shaped mold.

  FIG. 5 is an explanatory view showing a method of manufacturing the nth film mold according to the present embodiment. As shown in FIG. 5, a first film mold M-1 is produced using a cylindrical mold M-0 as an original plate, and a second film mold M1 is produced using this first film mold M-1 as an original plate. -2 can be duplicated. Further, the third film mold M-3 can be duplicated using the second film mold M-2 as an original plate. Similarly, the nth film mold M-n can be duplicated using the n-1th film mold M- (n-1) as an original plate.

  That is, the (n-1) th film mold M- (n-1) used for replicating the nth film mold M-n is the previous (n-2) th film mold M-. (N-2) (not shown) was used as an original plate.

  Any of the second to n-th film molds M-2 to M-n manufactured as described above can be used for mass-producing the product P with a fine concavo-convex structure using this as an original plate.

(Application example of nth film mold)
The nth film mold obtained by the method for manufacturing a film mold according to the present embodiment described above includes, for example, the manufacture of an antireflection material, the production of a resist mask, a cell culture medium, a super-water-repellent process, It can be applied to hydrophilic processing and is useful. For example, a film having a periodic fine concavo-convex structure including a pillar shape, a cone shape, a pyramid shape, and a cone shape can be used as an antireflection film having a moth-eye structure having an antireflection effect. Here, the moth-eye structure refers to a structure in which submicron-order pyramidal concavo-convex structures are arranged in a two-dimensional pattern such as an eyelet. In such a fine structure, a nano-order fine concavo-convex structure formed on the surface induces a smooth curvature gradient, and no reflection caused by a difference in refractive index at the interface occurs. Therefore, it is suitable as an antireflection film. It can be used. Moreover, a resist mask can be produced on the surface of the substrate to be etched using the nth film mold obtained by the method for manufacturing a film mold according to the present embodiment.

  Hereafter, the component of the manufacturing method of the film mold which concerns on this Embodiment is demonstrated in detail.

(Applying means)
Examples of the coating method of the photocurable resin onto the film-like substrate by the coating means 105 and 205 include a coating method using a known coating coater or impregnation coating coater. Specific examples include coating methods using a gravure coater, micro gravure coater, blade coater, wire bar coater, air knife coater, dip coater, comma knife coater, spray coater, curtain coater, spin coater, laminator and the like. These coating methods may use one type of coating method as needed, or may be used in combination of two or more types of coating methods. In addition, these coating methods are preferably applied in a continuous manner from the viewpoint of productivity. A continuous coating method using a dip coater, comma knife coater, gravure coater or laminator is particularly preferred.

(light source)
The light sources 109 and 210 used for light irradiation to the photocurable resin are not particularly limited, and various light sources can be used depending on the application and equipment. For example, a high pressure mercury lamp, a low pressure mercury lamp, an electrodeless lamp, a metal halide lamp, an excimer lamp, an LED lamp, a xenon pulse ultraviolet lamp, or the like can be used. Further, photocurable resins can amount exposed to ultraviolet rays or visible light having a wavelength 200nm~500nm is cured by irradiation so as to ^{100mJ / cm 2 ~2000mJ / cm 2} . Further, from the viewpoint of preventing the inhibition of the photocuring reaction due to oxygen, it is desirable to irradiate light with a low oxygen concentration during light irradiation.

(Transfer roll)
The transfer roll 107 is more preferably seamless. If there is a seam, the final product with a fine uneven pattern will be cut off where there is no fine uneven pattern corresponding to the seam. Sexuality also deteriorates.

  The fine concavo-convex pattern of the transfer roll 107 is formed by a cylindrical method by a processing method such as a laser cutting method, an electron beam drawing method, a photolithography method, a direct drawing lithography method using a semiconductor laser, an interference exposure method, an electroforming method, or an anodizing method. It can form directly on the outer peripheral surface of a substrate. Among these, from the viewpoint of obtaining a transfer roll that is seamless to a fine concavo-convex pattern, a photolithography method, a direct drawing lithography method using a semiconductor laser, an interference exposure method, an electroforming method, and an anodic oxidation method are preferable, and a semiconductor laser is used. The direct drawing lithography method, the interference exposure method, and the anodic oxidation method that are used are more preferable.

  Further, as the transfer roll 107, a fine structure formed on the surface of the flat substrate by the above processing method is transferred to a resin material (film), and this film is bonded to the outer peripheral surface of the transfer roll with high positional accuracy. Also good. Moreover, the fine structure formed on the surface of the flat substrate by the above processing method may be transferred to a thin film such as nickel by electroforming, and the thin film wound around a roller may be used.

  As a material of the transfer roll 107, it is desirable to use a material that can easily form a fine uneven pattern and has excellent durability. From such a viewpoint, a glass roll, a quartz glass roll, a nickel electroformed roll, a chromium electroformed roll, an aluminum roll, or a SUS roll (stainless steel roll) is preferable.

  As the base material for the nickel electroforming roll and the chromium electroforming roll, a conductive material having conductivity can be used. As the conductive material, for example, materials such as iron, carbon steel, chrome steel, cemented carbide, steel for mold (for example, maraging steel), stainless steel, aluminum alloy and the like are preferably used.

  It is desirable to perform a mold release process on the surface of the transfer roll 107. By performing the mold release treatment, the surface free energy of the transfer roll 107 can be reduced, so that even when continuously transferred to a photo-curing resin, good releasability and a fine uneven pattern pattern shape are maintained. can do. Moreover, since the mold release property of the transfer roll 107 is reflected from the first film mold 103 to the second film mold 203 to be replicated, it is preferable to perform a mold release process.

  A commercially available release agent and surface treatment agent can be used for the release treatment. Examples of commercially available release agents and surface treatment agents include OPTOOL (registered trademark) (manufactured by Daikin Chemical Industry), Durasurf (registered trademark) (manufactured by Daikin Chemical Industry), Novec (registered trademark) series (3M Company). Manufactured). Moreover, as a mold release agent and a surface treatment agent, a suitable mold release agent and a surface treatment agent can be selected suitably by the combination with the kind of material of the transfer roll 107, and the photocurable resin transcribe | transferred.

(Impact control means)
In this embodiment, as shown in FIGS. 1 and 2, when the nip rolls 108a and 108b are pressed against the transfer roll 107 through the mold base 101, the impact control means 112 is used to press the nip rolls 108a and 108b. The shock is eased.

  In the present embodiment, a pneumatic cylinder, a hydraulic cylinder, or an AC servo can be preferably used as the impact control means 112. However, an appropriate pressing force can be applied to the nip rolls 108a and 108b and the movement can be made finely. Control and position control can be performed (fine adjustment control is possible), and the impact at the time of pressing can be reduced as compared with the conventional case. For example, in the initial stage of pressing the nip rolls 108a and 108b, when the moving speed of the piston 112b is increased and the nip rolls 108a and 108b are brought close to the transfer roll 107 and the remaining distance is small (when the final stage of pressing is reached), It is possible to control so that the movement of the nip rolls 108a and 108b becomes slow by reducing the moving speed of the piston 112b. For example, the moving distance of the piston 112b is programmed in advance, and the movement of the piston 112b can be stopped when the piston 112b moves a predetermined distance. At this time, the nip rolls 108a and 108b are in contact with the surface of the mold base 101 and are in a state of pressing the mold base 101 toward the transfer roll 107 with a predetermined pressure. In this embodiment, a pneumatic cylinder can be preferably applied in order to suppress environmental resistance and deformation of the nip rolls 108a and 108b.

  As described above, in the present embodiment, it is possible to suppress damage to the fine uneven pattern 113 of the transfer roll 107 shown in FIG. 3 during the pressing process of the nip rolls 108a and 108b (at the time of shifting from FIG. 1 to FIG. 2). When the fine uneven pattern 113 is damaged in the transfer roll 107, pattern unevenness corresponding to the outer diameter cycle of the transfer roll 107 occurs in the film mold. According to this embodiment, the fineness of the transfer roll 107 is generated. Since damage to the concavo-convex pattern 113 can be suppressed, a film mold with few pattern defects can be manufactured.

In the present embodiment, it is preferable to control the impact force of the nip rolls 108a and 108b to the transfer roll 107 to 0.05 to 0.2 kgf / cm ² . The impact force can be measured by Fuji Film Prescale Fine Pressure (4LW). Moreover, in this Embodiment, it is preferable to control the operating speed of the nip rolls 108a and 108b to 5 to 10 mm / s. By adjusting the impact force and operating speed in this way, it is possible to more effectively suppress the occurrence of damage to the fine uneven pattern 113 formed on the outer peripheral surface of the transfer roll 107. As a result, the transfer roll 107 can be used repeatedly, and the life of the transfer apparatus 100 can be extended. Moreover, according to this Embodiment, since a film-like mold with few pattern defects can be manufactured, it is possible to improve productivity and reduce production costs.

  In the present embodiment, as shown in FIGS. 1 to 3, a plurality of nip rolls 108 a and 108 b are arranged with respect to the transfer roll 107. At this time, the impact control means 112 is preferably controlled so that the nip rolls 108 a and 108 b are in contact with the transfer roll 107 simultaneously. In the production stage of the film mold, the nip rolls 108a and 108b actually come into contact with the surface of the mold base 101.

  Specifically, the impact control means 112 is individually operated in an independent circuit for each of the nip rolls 108a and 108b, and the nip rolls 108a and 108b can be grounded simultaneously by adjusting their speed controllers. For example, speed adjustment and left and right grounding balance adjustment are performed by rotating dials of speed controllers attached to the left and right air cylinder outlets so that the grounding at the roll surface length is uniform. Further, by applying a back pressure to the outlet side of the air cylinder, rapid piston operation is suppressed, and simultaneous grounding of the nip rolls 108a and 108b is controlled.

  Thus, the simultaneous grounding of the nip rolls 108a and 108b can suppress the uneven load when the nip rolls 108a and 108b are pressed against the transfer roll 107 through the mold base 101, and the surface of the transfer roll 107 can be finely ground. Damage to the uneven pattern 113 can be suppressed, and as a result, uneven unevenness transferred to the mold substrate 101 can be suppressed. As described above, the yield (product yield) can be improved.

  Further, in the present embodiment, the impact control means 112 preferably has a cylinder that controls each nip roll 108a, 108b independently and controls self-excited vibration and friction. In the present embodiment, the stick-slip phenomenon can be prevented by changing to a low-speed type air cylinder. As a cylinder, for example, a cylinder united as a two-stage structure (upper: CM2XF32-200 manufactured by SMC, MGPL25-40Z-XB13 manufactured by SMC) rather than being composed of only CDG1YF25-250Z manufactured by SMC. ) Was used to suppress the stick-slip phenomenon. Note that stick-slip is generated in the piston when a cylinder with a long stroke is used, but in this embodiment, the stroke can be shortened by using a cylinder combined as an upper and lower two-stage structure. That is, for example, if the first-stage cylinder is originally fully extended, the stroke of the second-stage cylinder can be shortened and the stick-slip phenomenon can be suppressed. As a result, the uneven load when the nip rolls 108a and 108b are pressed against the transfer roll 107 via the mold base 101 can be suppressed, and damage to the fine uneven pattern 113 on the surface of the transfer roll 107 can be suppressed. Unevenness pattern unevenness transferred to the mold substrate 101 can be suppressed. As described above, the yield (product yield) can be improved.

  In the present embodiment, the surface hardness of the nip rolls 108a and 108b is preferably adjusted to a rubber hardness of 10 ° to 50 °. Thereby, the deformation | transformation at the time of continuous use of nip roll 108a, 108b can be prevented, and the fine uneven | corrugated pattern transcribe | transferred to a mold base material can be formed neatly. Moreover, the lifetime of the nip rolls 108a and 108b can be extended. In particular, by changing to a rubber roll that does not deform, when the above-described AC servo (servo control) is used as the impact control means 112, nip roll deformation can be prevented and effective.

  By using the above transfer apparatus, in the present embodiment, a film-like mold having no pattern defects and having a fine uneven pattern can be manufactured. The film mold will be described below.

(Film mold)
FIG. 6 is a schematic cross-sectional view of a film mold. FIG. 6 illustrates the first film mold 103. As shown in FIG. 6, the first film mold 103 has a cured resin layer 117 formed on a film substrate 115. As shown in FIG. 6, a fine uneven pattern 116 is formed on the surface of the cured resin layer 117. The fine concavo-convex pattern 116 shown in FIG. 6 has a shape obtained by transferring the fine concavo-convex pattern 113 of the transfer roll 107 shown in FIG. 3, that is, an inverted shape (reverse pattern) of the fine concavo-convex pattern 113. The fine concavo-convex pattern 116 is a pillar shape including a plurality of conical, pyramidal, or elliptical cone-shaped convex portions, or a hole shape or a line-and-space shape including a plurality of conical, pyramid-shaped, or elliptical conical concave portions. As an example of the size, the fine uneven pattern 116 has, for example, a pitch P of about 100 nm to 3000 nm (preferably 200 nm or more), a protrusion width D of about 30 nm to 3000 nm (preferably 100 nm or more), and a protrusion. The height H1 is about several tens of nm to several tens of μm. The pitch P is defined by a size obtained by adding the widths of adjacent convex portions and concave portions, an intermediate width between adjacent convex portions, or an intermediate width between adjacent concave portions.

(Film substrate)
As the mold substrate 101 used in the production of the first film mold and the transfer target substrate 201 used for the duplication of the second film mold, a film substrate having optical transparency can be used.

  The film-like substrate is not particularly limited as long as it is mainly composed of a material that has a substantially light-transmitting property with respect to a light source used in the ultraviolet / visible light region, but has excellent handling properties and workability. A resin material is preferable. Examples of such resin materials include polymethyl methacrylate resin, polycarbonate resin, polystyrene resin, cycloolefin resin (COP), cross-linked polyethylene resin, polyvinyl chloride resin, polyarylate resin, polyphenylene ether resin, and modified polyphenylene ether resin. , Polyetherimide resin, polyether sulfone resin, polysulfone resin, polyether ketone resin, amorphous thermoplastic resin such as triacetyl cellulose (TAC) resin, polyethylene terephthalate (PET) resin, polyethylene naphthalate resin And crystalline thermoplastic resins such as polyethylene resin, polypropylene resin, polybutylene terephthalate resin, aromatic polyester resin, polyacetal resin, and polyamide resin.

  Although the thickness of a film-like base material is based also on material, Preferably it is 20-200 micrometers, More preferably, it is 50-150 micrometers, More preferably, it is 50-100 micrometers. If it is 200 micrometers or less, the transmittance | permeability of the ultraviolet-ray used for the light source of optical nanoimprint is favorable, and sufficient light quantity for photocuring can be obtained. If it is 20 micrometers, since the rigidity as a film can be hold | maintained, handling is easy.

  The surface of the film-like substrate can be subjected to primer treatment, atmospheric pressure plasma treatment, and corona treatment in order to improve adhesion to the photocurable resin.

(Photo-curing resin)
The photocurable resin layer is formed of a photocurable resin. Photocurable resins are transferability, peelability from the original plate, adhesion to film-like substrates, viscosity, film-forming properties, photosensitivity, mechanical properties after curing, and peelability from the resin layer during resin mold preparation. Select with consideration.

  As the photocurable resin, for example, various acrylate compounds and methacrylate compounds that can be polymerized by a photopolymerization initiator, epoxy compounds, isocyanate compounds, thiol compounds, silicone compounds, and the like can be used. Among these, acrylate compounds, methacrylate compounds, epoxy compounds, and silicone compounds are preferably used, and acrylate compounds and methacrylate compounds are more preferably used. These compounds may be used alone or in combination of a plurality of types such as a combination of an epoxy compound and an acrylate compound.

  Examples of the acrylate compound and methacrylate compound include aromatic (meth) acrylates such as (meth) acrylic acid, phenoxyethyl acrylate, and benzyl acrylate.

  Examples of the acrylate compound and the methacrylate compound include EO-modified glycerol tri (meth) acrylate, ECH-modified glycerol tri (meth) acrylate, and PO-modified glycerol tri (meth) acrylate.

  Moreover, as a photocurable resin, the fluorine-containing compound by which the hydrogen in hydrocarbon was substituted by the fluorine among the said acrylate compound, a methacrylate compound, an epoxy compound, an isocyanate compound, and a silicone type compound can be used. By using the fluorine-containing compound, the surface free energy after curing is reduced, and the transferred product (first film mold 103 and first film mold 103 and the first film mold 103) from the original plate (transfer roll 107 and first film mold 103) in the transfer process is reduced. The releasability of the second film mold 203) is improved.

  The fluorine-containing (meth) acrylate preferably has a polyfluoroalkylene chain and / or a perfluoro (polyoxyalkylene) chain and a polymerizable group.

  The photocurable resin preferably contains a photopolymerization initiator in order to improve photosensitivity. Examples of the photopolymerization initiator include a photoradical polymerization initiator, a photoacid generator, and a photobase generator. The photopolymerization initiator can be selected in consideration of the light source wavelength to be used, the substrate (transparent sheet), various physical properties, and the like. Examples of commercially available initiators include “IRGACURE (registered trademark, the same applies hereinafter)” (for example, IRGACURE651, 184, 500, 2959, 127, 754, 907, 369, 379, 379EG, 819, manufactured by Ciba. 1800, 784, OXE01, OXE02) and “DAROCUR (registered trademark, the same applies hereinafter)” (for example, DAROCUR1173, MBF, TPO, 4265) and the like.

  As a photocurable resin, what contains a sensitizer for a photosensitivity improvement is preferable. Examples of such a sensitizer include Michler's ketone and 4,4'-bis (diethylamino) benzophenone. Moreover, a sensitizer may be used individually by 1 type and may use multiple types as a mixture.

  The viscosity of the photocurable resin can be adjusted by adding a solvent. As the solvent, N, N-dimethylformamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, and the like are preferable. These solvents may be used alone or in combination of two or more. Among these solvents, N-vinyl-2-pyrrolidone, N-methyl-2-pyrrolidone, acetone, methyl ethyl ketone, and isopropyl alcohol are preferable.

  In addition, the mold base material in this Embodiment is applied to all shapes, such as a metal mold | die other than roll shape.

  Hereinafter, the present invention will be described in detail by way of examples and comparative examples carried out in order to clarify the effects of the present invention. In addition, this invention is not limited at all by the following examples.

Example 1
An experiment was conducted using a nip roll having a rubber hardness of 30 ° and a prescale (impact force of the nip roll on the transfer roll) of 0.05 kgf / cm ² . Further, each nip roll disposed on both sides of the transfer roll was simultaneously brought into contact with the transfer roll. As a result, it was confirmed that the fine uneven pattern of the transfer roll was not damaged.

(Example 2)
An experiment was conducted using a nip roll having a rubber hardness of 30 ° and a prescale (impact force of the nip roll on the transfer roll) of 0.2 kgf / cm ² . Further, each nip roll disposed on both sides of the transfer roll was simultaneously brought into contact with the transfer roll. As a result, it was confirmed that the fine uneven pattern of the transfer roll was not damaged.

(Comparative Example 1)
An experiment was conducted using a nip roll having a rubber hardness of 30 ° and a prescale (impact force of the nip roll on the transfer roll) of 0.5 kgf / cm ² . As a result, it was confirmed that the fine uneven pattern of the transfer roll was damaged. Further, when one nip roll arranged on both sides of the transfer roll hits one side (uneven load), it was confirmed that the fine uneven pattern of the transfer roll was damaged at the portion where the nip roll contacted first.

(Comparative Example 2)
An experiment was conducted using a nip roll having a rubber hardness of 60 ° and a prescale (impact force of the nip roll on the transfer roll) of 0.2 kgf / cm ² . As a result, it was confirmed that the fine uneven pattern of the transfer roll was damaged.

(Damage assessment)
When the degree of damage was severe, damage was confirmed visually. Moreover, when the degree of damage was light, damage could be confirmed by measurement with an AFM (atomic force microscope).

  The present invention can be applied to a method for producing a film mold for forming a fine concavo-convex pattern, and the obtained film mold includes, for example, production of an antireflection material, production of a resist mask, cell culture medium, It can be suitably applied to superhydrophobic processing and superhydrophilic processing.

100, 200 Transfer device 101 Mold substrate 103, 203 Film-shaped mold 105, 205 Application means 107 Transfer roll 108, 209 Press means 108a, 108b, 209b, 209c Nip roll 109, 210 Light source 112 Impact control means 112a Cylinder body 112b Piston 113 , 116 Fine concavo-convex pattern 114 Photocurable resin layer 115 Film-like substrate 117 Resin cured material layer 209a Rubber roll

Claims (9)

A pressing step of pressing a nip roll against a transfer roll having a fine uneven pattern formed on the outer peripheral surface through a film-shaped mold substrate,
A transfer step of transferring the fine concavo-convex pattern to the surface of the mold base while feeding the mold base sandwiched between the transfer roll and the nip roll,
In the pressing step, the nip roll is pressed using an impact control means capable of controlling the impact of the nip roll on the transfer roll. ^{2. The} method for producing a film-shaped mold according to claim 1, wherein an impact force of the nip roll to the transfer roll is controlled to 0.05 to 0.2 kgf / cm ² .   The method for producing a film mold according to claim 1 or 2, wherein an operating speed of the nip roll is controlled to 5 to 10 mm / s.   When a transfer roll having a fine uneven pattern formed on the outer peripheral surface, a nip roll for sandwiching a film-like mold base material together with the transfer roll, and the nip roll pressed against the transfer roll via the mold base, And an impact control means for controlling an impact of the nip roll on the transfer roll. 5. The transfer device according to claim 4, wherein the impact control unit controls an impact force of the nip roll to the transfer roll during pressing to 0.05 to 0.2 kgf / cm ^2. .   6. The transfer apparatus according to claim 4, wherein the impact control means is constituted by a pneumatic cylinder, a hydraulic cylinder, or an AC servo.   7. A plurality of nip rolls are arranged with respect to the transfer roll, and the impact control means is controlled so that each nip roll abuts against the transfer roll at the same time. The transfer apparatus described.   The transfer device according to claim 7, wherein the impact control unit includes a cylinder that controls each nip roll independently and controls self-excited vibration of friction and slip. The transfer device according to claim 4, wherein the surface hardness of the nip roll is adjusted to a rubber hardness of 10 ° to 50 °.

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