JP2010225785A - Method of manufacturing transfer film for imprinting, and transfer film for imprinting - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To reduce technical difficulties in making a conventional coating step and an imprinting step compatible, and to prevent even a coating liquid which has low viscosity and high flowability from spreading in a width direction when used. <P>SOLUTION: The method of manufacturing the transfer film for imprinting which is stuck on a stamper where a fine pattern is formed and then irradiated with an energy beam to cure a thermosetting resin and to transfer the pattern of the stamper includes: forming a thermosetting resin thin film layer 11 made of a liquid thermosetting resin composition which is not cured on one surface of a base film 2; and forming the transfer film 10 for imprinting by sticking a cover film 6, performing pattern exposure, and winding the transfer film around a roll body in a state wherein coating flow can be suppressed not only in the width direction, but also in a processing flow direction by providing a thermosetting resin set part 12 to secure higher uniformity of a coating thickness. Further, a method is provided, of manufacturing a transfer film for imprinting which is supplied in the form of sheets. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

The present invention is a method for producing an imprinting transfer film for transferring a stamper pattern by irradiating an energy ray and curing a curable resin after bonding with a stamper having a fine pattern formed thereon, And a transfer film for imprinting.
In addition, the fine pattern in this specification refers to a pattern in which one fine line width and a figure dimension are about several tens of nanometers to about several hundreds of micrometers in a fine line pattern and a figure pattern having fine irregularities.

  Imprint is a technology that enables ultra-fine concavo-convex shape processing at low cost. In recent years, application development in various fields such as semiconductor film, optical film members such as flat panel displays, recording media, biotechnology, and medical related fields has been attempted. . In particular, the following methods are conventionally known as methods for continuously producing a film-like member having a fine uneven shape (see Patent Documents 1 to 4).

In Patent Document 1, (1) a step of forming a film made of a resin composition having both cationic polymerization reactivity and radical polymerization reactivity on a support, (2) a pattern is transferred to the film using a nano stamper. And (3) a method of manufacturing a fine structure including a step of obtaining a fine structure by curing a film onto which a pattern has been transferred.
In Patent Document 2, in a pattern forming method for transferring the concavo-convex shape of an imprint mold to a transfer object, a step of dropping a photocurable resin on a plurality of locations on the transfer object, and the imprint mold being transferred Pressing the photocurable resin on the body, spreading the photocurable resin and filling the concave portion in the imprint mold with the photocurable resin, curing the photocurable resin, A step of separating the imprint mold from the photocurable resin, and the imprint mold has a pattern forming region in which a plurality of uneven patterns having different shapes and intervals are formed, and the opening area of the recess Alternatively, a pattern forming method using a mold having a substantially constant volume is disclosed.
In Patent Document 3, in an imprint apparatus that transfers a surface shape of the stamper to the transferred body by bringing the transferred body and a stamper into contact with each other, the transferred body and the stamper are held at an interval. An inlay comprising: a holding unit; a decompression unit that depressurizes a chamber in which the transfer object and the stamper are disposed; and an alignment unit that aligns a relative position between the transfer object and the stamper. A printing device is disclosed. It should be noted that a photo-curing resin (material to be processed) is applied uniformly on the transfer object.
In Patent Document 4, a transfer object having a base material and a transfer resin layer formed on the base material is placed along the surface of a cylindrical roller, and the transfer resin is rotated while rotating the roller. An adhesion process for closely adhering a layer and a flat mold having a nano uneven pattern; and a solidifying process for solidifying the transferred resin layer in a state where the transferred resin layer and the flat mold are in close contact with each other. There is disclosed a method for producing a pattern forming body characterized by comprising the following.

JP 2008-266608 A JP 2009-006619 A JP 2008-012858 A JP 2007-335647 A

  However, in the manufacturing method described in Patent Documents 1 to 4, in the process of imprinting from the UV curable resin to transferring the fine uneven shape (imprint process), the viscosity of the resin is adjusted so that the fine uneven shape is accurately transferred to the coating film. Since it is lowered to have fluidity, the resin spreads in the width direction at both ends of the coating film, and it is difficult to keep the thickness uniformity constant.

  In addition, as a method for applying a low-viscosity and high-fluidity coating solution, a known method such as a spin coating method, a dispensing method, a slit coating method, a spray coating method, a roller coating method, or an ink jet method is used, but it is uniform. In order to apply to, it requires skill in operation. For this reason, it is technically difficult to operate both the low-viscosity and high-fluidity UV curable resin coating device and the imprinting device (stamper) for imprinting simultaneously, and Since the concave / convex pattern is continuously manufactured by interlocking both apparatuses, there is a problem that the manufacturing process is stopped if there is a defect in either of the both manufacturing apparatuses.

  Furthermore, since the coating process and the imprint process continue, the coating film alone cannot be sufficiently inspected and evaluated. For example, when foreign matter is mixed into the coating film, the foreign matter is directly brought into the imprint process. As a result, defects in shape transfer and in the worst case, the stamper itself is damaged. When a stamper is damaged, it becomes impossible to stably form a fine uneven shape, so that it is necessary to replace the stamper. However, the stamper is very expensive and its manufacture is not easy. For this reason, a large loss is caused in terms of cost and time for the user.

  That is, the object of the present invention is to relieve the technical difficulty of coexistence of the conventional coating process and imprint process, and to prevent the spread in the width direction even when using a low viscosity and high fluidity coating liquid. It is providing the manufacturing method of the transfer film for printing, and the transfer film for imprint.

  In the present invention, in order to solve the above problems, the coating process of the liquid curable resin having a low viscosity and high fluidity and the imprinting process are divided, and the inspection and evaluation as a coating film of the curable resin is sufficiently performed. The transfer film prevents the occurrence of the above problems and allows the imprint apparatus operator to perform imprint even if the operator of the imprint apparatus is not familiar with the operation of the low viscosity and high fluidity curable resin coating apparatus. Is used. Further, the transfer film has a structural feature that prevents spread in the width direction and maintains a uniform coating film thickness even when a curable resin having low viscosity and high fluidity is used.

  The invention according to claim 1 is an imprint transfer film for transferring a stamper pattern by irradiating an energy ray to cure a curable resin after being bonded to a stamper on which a fine pattern is formed. (1) It consists of a synthetic resin film having a long length of 1 to 10,000 m, and shields energy rays on one surface. A step of preparing a long masked cover film having a shielding pattern formed thereon; (2) an uncured and liquid on one surface of a long base film having a length of 1 to 10,000 m; A step of forming a curable resin thin film layer comprising a curable resin composition, (3) bonding the cover film with a mask on the curable resin thin film layer, and energizing from the cover film side with the mask And imprinting, and forming a transfer film obtained by curing the curable resin in a portion of the cover film with a mask where the shielding pattern is not formed. It is a manufacturing method of a film.

According to a second aspect of the present invention, the shielding pattern is formed by using a method of printing a paint or ink having a function of shielding the energy ray, a pattern printed with a photoresist pattern or a solvent-soluble printing material as a shielding mask. A method of forming a film by sputtering or vacuum deposition of metal or metal oxide, a method of forming by a peeling (lift-off) method performed by removing a shielding mask after performing sputtering or vacuum deposition of metal or metal oxide, and a thin film formed by sputtering or vacuum deposition of metal or metal oxide Etching by a photolithographic method, or a method of etching and forming a resin sheet or metal foil having a function of shielding the energy ray and then bonding by a photolithographic method. The method for producing a transfer film for imprinting according to claim 1 A.
According to a third aspect of the present invention, the shape of the shielding pattern is a discontinuous pattern in which a plurality of the masking cover films are arranged apart from each other in the longitudinal direction or a continuous pattern continuous in the longitudinal direction of the masking cover film. It is either, The manufacturing method of the transfer film for imprints of Claim 1 or 2 characterized by the above-mentioned.
The invention according to claim 4 is characterized in that in the cover film with a mask, a peeling treatment is performed on a bonding surface with the curable resin thin film layer. This is a method for producing a transfer film for printing.
The invention according to claim 5 further includes a portion in which the curable resin is cured after forming a transfer film obtained by curing the curable resin in a portion where the shielding pattern of the cover film with a mask is not formed. A slitting step of cutting the transfer film along the longitudinal direction and / or a sheet separation step of cutting the transfer film along the lateral width direction. It is a manufacturing method of the transfer film for imprints described in.

  The invention according to claim 6 is an imprinting transfer film for transferring a stamper pattern by irradiating an energy ray to cure a curable resin after being bonded to a stamper on which a fine pattern is formed. (1) At least the following steps (1) to (2): (1) Uncured and liquid on one surface of a long substrate film having a length of 1 to 10,000 m Forming a curable resin thin film layer comprising the curable resin composition of (2), (2) a cover film comprising a synthetic resin film having a length of 1 to 10,000 m on the curable resin thin film layer and having a length of transparency. And irradiating energy rays using a continuous exposure apparatus in which a shielding pattern for shielding energy rays is formed, and curing the portion where the shielding pattern of the continuous exposure apparatus is not formed Forming a transfer film to cure the resin, a method for producing a transfer film for imprinting, characterized in that it comprises a.

According to a seventh aspect of the present invention, the continuous exposure apparatus includes a cylindrical drum made of a material that transmits energy rays, a shielding pattern portion provided on an outer peripheral wall of the cylindrical drum, and the cylindrical drum. The imprinting transfer film according to claim 6, comprising an exposure light source, and irradiating an energy beam from the inside of the cylindrical drum to the transparent substrate wound around the cylindrical drum. It is a manufacturing method.
According to an eighth aspect of the present invention, the shape of the shielding pattern is any one of a discontinuous pattern that is spaced apart in the circumferential direction of the cylindrical drum, or a continuous pattern that is continuous in the circumferential direction of the cylindrical drum. The method for producing a transfer film for imprinting according to claim 7, wherein:
The invention according to claim 9 further includes forming a transfer film obtained by curing the curable resin in a portion where the shielding pattern of the continuous exposure apparatus is not formed, and then curing the curable resin. 9. The method according to claim 6, further comprising a slitting step of cutting the transfer film along a longitudinal direction, and / or a sheet separation step of cutting the transfer film along a lateral width direction. It is a manufacturing method of the transfer film for imprint of description.
The invention according to claim 10 is the imprint according to any one of claims 6 to 9, wherein the cover film is subjected to a peeling treatment on a surface bonded to the curable resin thin film layer. It is a manufacturing method of this transfer film.

  The invention according to claim 11 is an imprinting transfer film for transferring a stamper pattern by irradiating an energy ray to cure a curable resin after being bonded to a stamper on which a fine pattern is formed. And a curable resin thin film layer comprising a partially cured curable resin composition portion and an uncured curable resin composition portion on one surface of a transparent base film. A transfer film for imprinting, comprising a cover film with a mask made of a synthetic resin film having transparency and formed with a pattern for shielding energy rays.

  The invention according to claim 12 is an imprint transfer film for transferring a stamper pattern by irradiating an energy ray to cure a curable resin after being bonded to a stamper having a fine pattern formed thereon. In addition, a part of the curable resin composition partially cured and uncured by a continuous exposure apparatus in which a pattern for shielding energy rays is formed on one surface of a transparent base film. A transfer film for imprinting, wherein a curable resin thin film layer comprising a curable resin composition portion is formed, and a cover film comprising a synthetic resin film having transparency is laminated.

The invention according to claim 13 is the imprint transfer film according to claim 11 or 12, wherein the imprint transfer film is supplied in a roll form.
The invention according to claim 14 is the imprint transfer film according to claim 13, wherein the transfer film is imprinted in a long shape having a length of 1 to 10,000 m and wound around a roll body.
The invention according to claim 15 is the imprint transfer film according to claim 11 or 12, wherein the imprint transfer film is supplied on a sheet.
The invention according to claim 16 is used to manufacture any one of the group consisting of an optical functional film, a semiconductor element, a precision mechanical member, and a magnetic recording medium member. 15. The imprint transfer film according to any one of 15 above.
The invention according to claim 17 is characterized in that alignment marks for alignment with a stamper of an imprint apparatus are two-dimensionally arranged on the base film. This is a transfer film for imprinting.

  According to the present invention, an operator of an imprint apparatus can supply a transfer film so that imprinting can be performed even if the operator of the imprint apparatus is not familiar with the operation of a curable resin coating apparatus having low viscosity and high fluidity. . In addition, since inspection and evaluation can be performed at the stage of the curable resin thin film layer, contamination of foreign matters and the like in the imprint process can be suppressed to some extent in advance, thereby reducing the risk of damage to expensive stampers. Furthermore, the spread of the curable resin having a low viscosity and high fluidity is prevented by the effect of the weir due to the non-flowable pattern curing site partially formed in the curable resin thin film layer, and the curable resin thin film layer The thickness can be kept uniform.

  According to the invention according to claim 1, by curing the inside of the curable resin thin film layer, a non-fluid part can be formed at a position continuous with the fluid part between them, and it has a function as a weir. Expansion of the conductive resin thin film layer in the width direction can be prevented. Moreover, even if it uses curable resin which causes oxygen inhibition by bonding a cover film and irradiating an energy beam, the curing failure by oxygen inhibition can be prevented and hardening can fully be performed. In addition, by making the transfer film product with the cover film pasted, it is possible to prevent foreign matter from adhering to the surface of the curable resin thin film layer during the period until the next process, thus increasing the cleanliness of the product. Can keep.

According to the invention according to claim 2 or 3, the above-mentioned various methods can be freely selected as long as the formation method or shape of the shielding pattern satisfies the necessary shielding performance, cost, compatibility with the cover film, and the like. .
According to the invention which concerns on Claim 4, when peeling a cover film from a curable resin thin film layer by giving a peeling process to the bonding surface with the curable resin thin film layer of a cover film, of a curable resin thin film layer Non-uniform thickness due to rough surfaces can be prevented.
According to the invention which concerns on Claim 5, productivity can be improved by dividing one base film into several transfer film by multi-chamfering.

  According to the invention of claim 6, in addition to the effect of the invention of claim 1, by forming a shielding pattern on the cylindrical drum, the shielding pattern can be applied to a long cover film having a length of 1 to 10,000 m. The step of forming can be omitted.

According to the invention which concerns on Claim 7 or 8, if it is a method of satisfy | filling the permeation | transmission performance, cost, etc. of a required energy ray, the said various method can be selected freely. Moreover, if the shape of a shielding pattern is the method of satisfy | filling the shielding performance required, cost, compatibility with a cover film, etc., the said various method can be selected freely.
According to the invention which concerns on Claim 9, productivity can be improved by dividing | segmenting one base film into several transfer film by multi-chamfering.
According to the invention which concerns on Claim 10, when peeling a cover film from a curable resin thin film layer by giving a peeling process to the bonding surface with the curable resin thin film layer of a cover film, of a curable resin thin film layer. Non-uniform thickness due to rough surfaces can be prevented.
According to the invention which concerns on Claims 11-17, even if the driving | operating operator of the imprint apparatus is not familiar with the driving | operation of the application | coating apparatus of curable resin with low viscosity and high fluidity, imprint can be performed.

It is the schematic which shows the representative example of the manufacturing method by 1st Embodiment. It is the schematic which shows an example of the transfer film manufactured with the manufacturing method by 1st Embodiment, (a) is a top view, (b) is sectional drawing which follows the AA line of (a). It is the schematic which shows another example of the transfer film manufactured with the manufacturing method by 1st Embodiment, (a) is a top view, (b) is sectional drawing which follows the BB line of (a). It is the schematic which shows another example of the transfer film manufactured with the manufacturing method by 1st Embodiment, (a) is a top view, (b) is sectional drawing which follows the CC line of (a). In 1st Embodiment, it is the schematic which shows an example of the manufacturing method which performs a single wafer process. It is the schematic which shows an example of the cover film used for multiple chamfering in 1st Embodiment. It is the schematic which shows another example of the cover film used for multiple chamfering in 1st Embodiment. It is the schematic which shows another example of the cover film used for multiple chamfering in 1st Embodiment. In 1st Embodiment, it is the schematic which shows the typical example of the manufacturing method which added the lamination process of the ultraviolet absorption film further. It is the schematic which shows the representative example of the manufacturing method by 2nd Embodiment. It is the schematic which shows an example of the cylindrical drum used by 2nd Embodiment, (a) is a perspective view, (b) is an expanded view. It is the schematic which shows another example of the cylindrical drum used by 2nd Embodiment, (a) is a perspective view, (b) is an expanded view. It is the schematic which shows another example of the cylindrical drum used by 2nd Embodiment, (a) is a perspective view, (b) is an expanded view. It is sectional drawing which shows an example of the transfer film manufactured with the manufacturing method by 2nd Embodiment. It is the schematic which shows the representative example of the process of imprinting to the transfer film manufactured by this invention. It is the schematic which shows the typical example of the conventional imprint product manufacturing process.

The present invention will be described below based on preferred embodiments with reference to the drawings.
FIG. 1 shows an outline of an imprint transfer film manufacturing apparatus and manufacturing process according to the first embodiment of the present invention. That is, the base material supply part 1 which supplies the transparent base material 2 to a manufacturing apparatus, the coating device 3 which apply | coats a curable resin composition to the said transparent base material 2, and an organic solvent etc. are contained in curable resin composition. In this case, a drying device 4 that volatilizes and removes it, a cover film supply unit 5 that supplies a cover film 6 with a mask, a nip roll 7 that bonds the cover film 6 with a mask to an application surface of an ultraviolet curable resin composition, A roll-shaped transfer film is produced using a manufacturing apparatus comprising an ultraviolet irradiation device 8 as a curing device for curing the ultraviolet curable resin composition and a winding unit 9 for winding the processed imprint transfer film. Manufactured.

  The base material supply unit 1 includes a roll body in which the transparent base material 2 is wound in a roll shape, a shaft that holds the roll body, and the like.

Here, the material used for the transparent substrate 2 is preferably a material having low scattering and absorption in the ultraviolet region near 350 nm to 400 nm which inhibits the heat resistance and curing of the ultraviolet curable resin composition. For example, polyethylene terephthalate (PET ) And polyester such as polyethylene naphthalate (PEN), polysulfone, polyethersulfone, polystyrene, polyacrylate, polyetheretherketone, polycarbonate, polyolefin such as polyethylene and polypropylene, polyamide, nylon, polyimide, triacetylcellulose (three Cellulose acetate), cellulose diacetate, poly (meth) acrylic acid alkyl ester, poly (meth) acrylic acid ester copolymer, polymethyl methacrylate, polytetrafluoroethylene and polytrifluoro Fluorine-based resins such as styrene, polyvinyl chloride, polyvinylidene chloride copolymers, vinyl chloride - vinyl acetate copolymer, polyvinyl alcohol, cellophane, and the like cellulose-based film. These materials may be used alone or in combination of two or more.
In particular, among the substrates, it is preferable to use polyethylene terephthalate from the viewpoints of heat resistance, ultraviolet light transmittance, and cost.

  Moreover, it is preferable that surface treatment such as easy adhesion treatment, corona treatment, and atmospheric pressure plasma treatment is performed on the application surface side or both surfaces of the transparent substrate 2. These surface treatments are preferably performed on the transparent substrate 2 in advance. Moreover, these surface treatments can be performed during the period from when the transparent base material 2 is unwound from the base material supply unit 1 to when the curable resin composition is applied by the coating device 3.

  In addition, it is preferable that the thickness of the transparent base material 2 has 16 micrometers-200 micrometers, and it is still more preferable that it has 50 micrometers-150 micrometers. If the thickness of the transparent substrate 2 is too thin, the handling properties are poor, and if the thickness of the transparent substrate 2 is too thick, it is disadvantageous in terms of cost and handling properties.

The coating device 3 may be any device as long as it has means for uniformly supplying and coating the curable resin composition on the transparent substrate 2, but the curable resin composition is continuously applied to the transparent substrate 2. An apparatus having a configuration composed of a tank for storing the curable resin composition, a liquid feed pump, piping, a foreign matter removing filter, and a coater head is preferable (not shown) so that it can be supplied and applied onto the material 2. The coater head is preferably a die coater, for example.
A curable resin thin film layer (coating film) is formed on one surface of the transparent substrate 2 by the coating device 3. The curable resin composition immediately after coating with the coating apparatus 3 is uncured and in a liquid state, and has fluidity suitable for coating.

As the curable resin composition, an ultraviolet curable resin composition, an electron beam curable resin composition, a thermosetting resin composition, or the like can be appropriately selected and used depending on the curing means used for imprinting.
The curable resin composition contains a polymerizable compound that is polymerized by energy rays such as ultraviolet rays, electron beams, and heat rays.
For example, as an ultraviolet curable resin material having curability to ultraviolet rays in the range of 300 nm to 400 nm, a material containing a polymerizable compound (A), a photopolymerization initiator (B), and a release agent (C) Is preferred.
As a polymeric compound (A), the monomer and oligomer of an acrylic monomer, urethane (meth) acrylate, and epoxy (meth) acrylate can be used, for example. Moreover, it is preferable to add a reaction diluent, a photoinitiator, etc. in the coating liquid of an ultraviolet curable resin composition.

The acrylic monomer is not particularly limited and can be appropriately selected according to the purpose. For example, (meth) acrylic acid esters and (meth) acrylic acid amides are used. In the present specification, (meth) acrylic acid is a general term for acrylic acid and methacrylic acid.
Specific examples of (meth) acrylic acid esters include the following compounds.

Phenoxyethyl (meth) acrylate, benzyl (meth) acrylate, stearyl (meth) acrylate, lauryl (meth) acrylate, 2-ethylhexyl (meth) acrylate, ethoxyethyl (meth) acrylate, methoxyethyl (meth) acrylate, glycidyl (meth) ) Acrylate, tetrahydrofurfuryl (meth) acrylate, allyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, N, N-diethylaminoethyl (meth) acrylate, N, N -Mono (meth) acrylates such as dimethylaminoethyl (meth) acrylate and dimethylaminoethyl (meth) acrylate.
1,3-butanediol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, diethylene glycol di (meth) acrylate, neopentyl glycol di (meth) Di (meth) acrylates such as acrylate, polyoxyethylene glycol di (meth) acrylate, and tripropylene glycol di (meth) acrylate.
Tri (meth) acrylates such as trimethylolpropane tri (meth) acrylate and pentaaerythritol tri (meth) acrylate.
Other (meth) acrylates such as dipentaerythritol hexa (meth) acrylate.
Examples of the (meth) acrylamides include (meth) acrylamide, N-methyl (meth) acrylamide, N-ethyl (meth) acrylamide, N-propyl (meth) acrylamide, N-isopropyl (meth) acrylamide, N- n-butylacryl (meth) amide, Nt-butyl (meth) acrylamide, N-cyclohexyl (meth) acrylamide, N- (2-methoxyethyl) (meth) acrylamide, N, N-dimethyl (meth) acrylamide, Examples thereof include N, N-diethyl (meth) acrylamide, N-phenyl (meth) acrylamide, N-benzyl (meth) acrylamide, (meth) acryloylmorpholine, diacetone acrylamide and the like. Specific product names include Beam Set 371 (Arakawa Chemical Industries).
These acrylic monomers may be used individually by 1 type, and may use 2 or more types together.

  Urethane (meth) acrylate is obtained, for example, by reacting polyisocyanates such as hexamethylene diisocyanate, isophorone diisocyanate, tolylene diisocyanate, and xylene isocyanate with hydroxyl group-containing (meth) acrylates such as hydroxy (meth) acrylate. In addition, a polymer or oligomer obtained by reacting polyols such as ethylene glycol, 1,4-butanediol, neopentyl glycol, polycaprolactone polyol, polyester polyol, polycarbonate diol, and polytetramethylene glycol with the isocyanates, and hydroxy A wide variety of urethane (meth) acrylates can be obtained by reacting hydroxyl group-containing (meth) acrylates such as (meth) acrylate.

  Epoxy (meth) acrylates include, for example, epoxy resins such as bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin, terminal glycidyl ether of bisphenol A type propylene oxide adduct, and fluorene epoxy resin. ) It can be obtained by reacting with acrylic acid.

Examples of the photopolymerization initiator (B) include acetophenone photopolymerization initiators, benzoin photopolymerization initiators, benzophenone photopolymerization initiators, thioxanthone photopolymerization initiators, and thioxanthone photopolymerization initiators. .
Acetophenone-based photopolymerization initiator: acetophenone, p- (tert-butyl) 1 ′, 1 ′, 1′-trichloroacetophenone, chloroacetophenone, 2 ′, 2′-diethoxyacetophenone, hydroxyacetophenone, 2,2-dimethoxy- 2'-phenylacetophenone, 2-aminoacetophenone, dialkylaminoacetophenone and the like.
Benzoin photopolymerization initiators: benzyl, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenyl-2-methylpropane -1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, benzyldimethyl ketal and the like.
Benzophenone photopolymerization initiator: benzophenone, benzoylbenzoic acid, benzoylmethyl benzoate, methyl-o-benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, hydroxypropylbenzophenone, acrylic benzophenone, 4,4'-bis (dimethylamino) Benzophenone etc.
Thioxanthone photopolymerization initiators: thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, diethylthioxanthone, dimethylthioxanthone, and the like.
Other photopolymerization initiators: α-acyloxime ester, benzyl- (o-ethoxycarbonyl) -α-monooxime, acylphosphine oxide, glyoxyester, 3-ketocoumarin, 2-ethylanthraquinone, camphorquinone, tetramethylthiuram Sulfide, azobisisobutyronitrile, benzoyl peroxide, dialkyl peroxide, tert-butyl peroxypivalate and the like.

  The content of the polymerization initiator in the ultraviolet curable resin material is preferably 0.001 to 10 parts by mass and more preferably 0.01 to 10 parts by mass with respect to 100 parts by mass of the polymerizable compound. Preferably, it is 0.1-5 mass parts. If the content of the polymerization initiator is 0.001 part by mass or more, the polymerizable compound can be polymerized in a short time, and if it is 10 parts by mass or less, the residue of the polymerization initiator hardly remains in the cured product.

As the release agent (C), it is preferable to include a fluorine-containing surfactant since a cured product having better release properties can be obtained. Furthermore, a fluorine-containing surfactant having a fluorine content of 10 to 70% by mass is more preferable, and a fluorine-containing surfactant having a fluorine content of 10 to 40% by mass is particularly preferable. The fluorine-containing surfactant may be water-soluble or oil-soluble.
As the fluorine-containing surfactant, any of an anionic fluorine-containing surfactant, a cationic fluorine-containing surfactant, an amphoteric fluorine-containing surfactant, and a nonionic fluorine-containing surfactant may be used. Among these, nonionic fluorine-containing surfactants are particularly preferable because they have good compatibility in the curable resin material and good dispersibility in the cured product.

As the anionic fluorine-containing surfactant, a polyfluoroalkyl carboxylate, a polyfluoroalkyl phosphate, or a polyfluoroalkyl sulfonate is preferable. Specific examples of the cationic surfactant include Surflon S-111 (trade name, manufactured by Seimi Chemical Co., Ltd.), Florard FC-143 (trade name, manufactured by 3M Co., Ltd.), MegaFuck F-120, MegaFak R-30 ( Trade name, manufactured by DIC Corporation).
As the cationic fluorine-containing surfactant, a trimethylammonium salt of polyfluoroalkylcarboxylic acid or a trimethylammonium salt of polyfluoroalkylsulfonic acid amide is preferable. Specific examples of the cationic surfactant include Surflon S-121 (trade name, manufactured by Seimi Chemical Co., Ltd.), Florard FC-134 (trade name, manufactured by 3M Co., Ltd.), Megafac F-150 (trade name, manufactured by DIC Corporation). ) And the like.
As the amphoteric fluorine-containing surfactant, polyfluoroalkyl betaine is preferable. Specific examples of amphoteric surfactants include Surflon S-132 (trade name, manufactured by Seimi Chemical Co., Ltd.), Florard FX-172 (trade name, manufactured by 3M), MegaFuck F-120 (trade name, manufactured by DIC). Etc.
As the nonionic fluorine-containing surfactant, polyfluoroalkylamine oxide or polyfluoroalkyl / alkylene oxide adduct is preferable. Specific examples of the nonionic surfactant include Surflon S-145 (trade name, manufactured by Seimi Chemical Co., Ltd.), Surflon S-393 (trade name, manufactured by Seimi Chemical Co., Ltd.), and Surflon KH-20 (trade name, Seimi Chemical Co., Ltd.). ), Surflon KH-40 (trade name, manufactured by Seimi Chemical Co., Ltd.), Florard FC-170 (trade name, manufactured by 3M), Florado FC-430 (trade name, manufactured by 3M), MegaFuck F-141 (product) Name, manufactured by DIC Corporation).

  The content of the fluorine-containing surfactant in the ultraviolet curable resin composition material is preferably 0.01 to 10% by mass when the entire ultraviolet curable resin composition is 100% by mass, preferably 0.1 to 5%. The mass% is more preferable. If the content of the fluorine-containing surfactant is 0.01% by mass or more, a cured product excellent in releasability can be reliably formed, and if it is 10% by mass or less, an ultraviolet curable resin material is easily prepared. it can.

When the transfer film of the present invention is used in an optical nanoimprint method using ultraviolet rays or the like, a radiation curable resin is used as the curable resin material. When used in the thermal nanoimprint method, a thermoplastic resin or a thermosetting resin is used as the curable resin material.
When a thermoplastic resin is used as the curable resin material in the thermal nanoimprint method, the thermoplastic resin as the material to be transferred is heated to a glass transition temperature or higher and softened, and then a stamper with a fine pattern formed is used. Since the fine pattern is transferred by pressing and cooling, a thermoplastic resin having a glass transition temperature (Tg) lower than the heating temperature at the time of transfer is preferable. In addition, when using a thermosetting resin as the curable resin material in the thermal nanoimprint method, the thermosetting resin that is the material to be transferred is compression-molded from the point of suitability for the thermal nanoimprint method. A thermosetting resin having a glass transition temperature (Tg) higher than the heating temperature at the time of transfer by the like is preferable.

In addition, it is preferable that the coating film thickness of curable resin composition exists in 3-50 micrometers, More preferably, it is 15-35 micrometers.
If the coating film is too thin, shape transferability is deteriorated, and if the coating film is too thick, it is disadvantageous in terms of cost and stability over time in the roll body.

The drying device 4 includes means for heating the coating film of the curable resin composition formed on the transparent substrate 2, means for sending air into the drying device, and means for exhausting air in the drying device. Yes.
The drying device 4 is not intended to cure the curable resin composition, and the coating film has a certain degree of fluidity after drying and is in a liquid or gel form.

  The cover film supply part 5 is comprised from the roll body by which the cover film 6 with a mask was wound, and the axis | shaft etc. which hold | maintain the roll body.

  The nip roll 7 is composed of a pair of rolls sandwiching the transparent base material 2 on which the coating film of the ultraviolet curable resin composition is formed and the cover film 6 with a mask, and is a device for bonding the two together. It is preferable to provide a pressurizing means for pasting, and at least one of the rolls is preferably made of rubber so that a uniform pressure can be easily applied to the film.

As shown in FIG. 2, the masked cover film 6 has a shielding pattern (light shielding pattern) 6 a that shields (shields) energy rays and a transmission pattern 6 b that transmits energy rays (ultraviolet rays). That is, the shielding pattern 6a is formed on one side or both sides of a transparent substrate that can transmit energy rays, and the portion (transmission portion) 6b where the shielding pattern 6a is not formed is configured to transmit energy rays.
In this way, even when using a curable resin that causes oxygen inhibition by irradiating ultraviolet rays in a sealed state where the ultraviolet curable resin is covered with a cover film 6 with a mask and contact with the atmosphere is cut off, Curing failure due to oxygen inhibition can be prevented, and the ultraviolet curable resin can be sufficiently cured.

  The material used for the base material of the cover film 6 with a mask is preferably a material having low scattering / absorption in the ultraviolet region near 350 nm to 400 nm which inhibits the heat resistance and curing of the ultraviolet curable resin composition. It can select from what was illustrated as a material used for the material 2. FIG. The material used for the base material of the cover film with mask 6 may be the same as or different from the material used for the transparent base material 2. In particular, polyethylene terephthalate is preferably used from the viewpoints of heat resistance, ultraviolet light transmittance, and cost.

Moreover, it is preferable that the peeling process is made | formed to the bonding surface with the curable resin thin film layer 11 of the cover film 6 with a mask. When the cover film is peeled from the curable resin thin film layer, the surface of the curable resin thin film layer becomes rough when the cover film is peeled off from the surface of the curable resin thin film layer. Can be prevented.
Examples of the release treatment include application of a silicone-based or fluorine-based release agent.

  The shielding pattern is formed by a method of printing a paint or ink having a function of shielding energy rays, a sputtering pattern of a metal or a metal oxide using a photoresist pattern or a pattern printed with a solvent-soluble printing material as a shielding mask. A method of forming by a peeling (lift-off) method performed by removing a shielding mask after performing vacuum deposition, a method of forming a thin film formed by sputtering or vacuum deposition of metal or metal oxide by photolithography, and Examples of the method include a method in which a resin sheet or a metal foil having a function of shielding the energy rays is bonded and then etched by a photolithography method.

  As shown in FIG. 3, a cover film 6 with a mask is bonded onto an uncured curable resin thin film layer 11, and ultraviolet rays are irradiated from the cover film 6 with mask to block the shielding pattern (shielding) of the cover film 6 with a mask. The portion) 6 a is not formed (transmitting portion) 6 b transmits ultraviolet rays to form the curable resin cured portion 12.

In this embodiment, the pattern to be cured is not limited to a circle as shown in FIG. 2, but a cover film that is light-shielded and patterned so as to be cured into a polygon or stripe as shown in FIG. 4 is used. In addition, the shape of the light-shielding pattern can be freely selected according to the use of the transfer film roll.
By performing pattern exposure in this way, in the continuous pattern as shown in FIG. 4, the curable resin cured portion 12 becomes a lattice shape in the discontinuous shielding pattern 6 a as shown in FIGS. In addition, it is possible to suppress the flow of the coating film in the processing flow direction, and it is possible to ensure a more uniform coating thickness.
The shape of the discontinuous shielding pattern 6a is not particularly limited as long as it is a closed planar shape surrounded by the transmissive portion 6b, and can be various shapes such as an ellipse in addition to a circle or a polygon. It is.
In the example of FIG. 4, the shape of the continuous shielding pattern 6a is a uniform pattern in the longitudinal direction, but the width of the shielding pattern 6a is a continuous pattern that changes periodically, stepwise, or continuously. Is also possible.

When the imprint transfer film is supplied as a single sheet instead of being supplied in a roll shape, the shielding pattern 6a is formed by using the cover film 6 with a mask having a discontinuous pattern as shown in FIGS. After forming the transfer film in which the curable resin is cured in the uncured portion, the transfer film is cut in the width direction in the portion in which the curable resin is cured (a cutting line is indicated by reference numeral 13). In this way, a sheet transfer film can be produced in the sheet forming step. In the cutting (slit) process for producing a single-wafer transfer film, a long transfer film obtained by partially curing a curable resin is wound around the take-up portion 9, and is then fed out from the roll body again. Also good.
Or the winding part 9 is abbreviate | omitted, and as shown in FIG. 5, without winding up the long transfer film obtained by partially hardening curable resin, a cutting process is performed by the cutter 91, for example, A transfer film 92 can also be manufactured. In the sheet transfer film 92 thus obtained, the periphery of the uncured portion of the curable resin used for imprinting is surrounded by the cured portion of the curable resin, and the curable resin is formed from above and below the base material. Since it is sandwiched between the film and the cover film, there is no possibility that the uncured resin protrudes even if it is not rolled.

Also, as shown in FIGS. 6 to 8, after forming the transfer film in which the curable resin is cured in the portion where the shielding pattern 6 a is not formed, the transfer film is elongated in the portion in which the curable resin is cured. By cutting along the direction (a cutting line is denoted by reference numeral 14), a plurality of roll bodies can be simultaneously wound up and productivity can be improved (multiple cutting). In multiple chamfering, the width of the base film and the cover film with mask is several times the width of the transfer film to be a product (for example, 2 times or more for 2 chamfering and 3 times or more for 3 chamfering).
It is also possible to combine multiple chamfering and single wafer cutting and cut a plurality of transfer films cut along the longitudinal direction into single sheets by cutting along the lateral width direction of the transfer film without winding up each in a roll shape. it can.

The ultraviolet irradiation device 8 includes a light source unit that generates ultraviolet rays and a cooling device that removes heat generated by the light source.
The light source can be freely selected from lamp sources such as high-pressure mercury lamps and metal halide lamps, and light-emitting diodes that have an emission peak in the ultraviolet region, as long as they can obtain an ultraviolet irradiation amount that sufficiently cures the ultraviolet curable resin composition. it can.
Among them, a light-emitting diode type light source that emits almost no light having a wavelength other than the curing wavelength of the ultraviolet curable resin composition and causes little thermal damage to the ultraviolet irradiation object is preferably used.

The ultraviolet irradiation device 8 irradiates the entire surface of the transparent substrate 2 with ultraviolet rays and cures the curable resin only in the selected portion of the curable resin thin film layer. Thereby, as shown in FIG.2 (b), the curable resin thin film layer has the uncured part 11 and the cured part 12. In addition, when the curable resin applied by the coating device 3 is a thermosetting resin or an electron beam curable resin, a heat curing device or an electron beam curing device can be used as the curing device.
In view of ease of operation, it is preferable to use an ultraviolet curable resin and an ultraviolet irradiation device.

The winding unit 9 includes a winding shaft for winding the imprint transfer film on which the above-described curable resin thin film layer 11 is formed on a roll body, and a core material that comes to the center of the roll body product. .
The transfer film manufactured in this embodiment is a roll of an imprint transfer film wound around a core material while a cover film with a mask is bonded. After being wound up, it is removed from the winding shaft to become a product.
In addition, it is possible to prevent foreign matter from adhering to the surface of the curable resin thin film layer during the period until the next process by making the product in a roll or sheet while the cover film with a mask is bonded. The degree of cleanliness of the curable resin thin film layer can be visually confirmed by an operator in the next process.

  In this embodiment, as shown in FIG. 9, the ultraviolet absorbing film 16 can be wound together with the transfer film in the winding unit 9. In FIG. 9, the ultraviolet absorbing film 16 is supplied from the ultraviolet absorbing film supply unit 15, and is bonded to the back surface (surface opposite to the coating surface) of the base film 2 by the nip roll 17. Thereby, even if the base film 2 is UV transmissive and receives external UV light after the imprinting transfer film is unwound from the roll, the coated surface side is covered by the shielding pattern 6a of the cover film 6 with mask, The uncured portion 11 of the curable resin thin film layer is reliably protected from external ultraviolet rays by the ultraviolet absorbing film 16 on the back side. Of the coated surface side, the transmissive part 6b of the cover film 6 with mask is UV transmissive, but the cured part 12 of the curable resin thin film layer under the transmissive part 6b is not used for imprint transfer. There is no problem in the printing process.

FIG. 10 shows an outline of an imprint transfer film manufacturing apparatus and manufacturing process according to the second embodiment of the present invention.
The apparatus shown in FIG. 10 has the base material supply unit 1, the transparent base material 2, the coating device 3, the drying device 4, the cover film supply unit 5, and the cover film 18 shown in FIG. In addition to the nip roll 7 to be bonded, it comprises a cylindrical film 19 in which a cover film 18 without a shielding pattern (light shielding pattern) for shielding (shielding) energy rays and an ultraviolet irradiation device 8 are incorporated. Moreover, the winding part 9 of FIG. 10 is the same as the winding part 9 of FIG. 1, although the cover film bonded to the imprinting transfer film to be wound is different.
The cylindrical drum 19 is a continuous exposure device including the ultraviolet irradiation device 8 and a shaft for holding the ultraviolet irradiation device 8.

As shown in FIG. 11, the cylindrical drum 19 includes a shielding pattern (light shielding pattern) 19 a that shields (shields) energy rays, and a transmission pattern 19 b that transmits energy rays (ultraviolet rays). That is, the shielding pattern 19a is formed on one surface or both surfaces of the cylindrical drum 19 that can transmit energy rays, and a portion (transmission portion) 19b where the shielding pattern 19a is not formed is configured to transmit energy rays.
The positions of both ends in the width direction of the base film 2 are denoted by reference numeral 20. The circumferential direction of the cylindrical drum 19 (the left-right direction in the developed view of FIG. 11B) corresponds to the longitudinal direction of the base film 2.
Since the cylindrical drum 19 rotates at the same speed as the transparent base material 2 that is continuously transferred, the transparent base material 2 is exposed while the portions of the transparent base material 2 are wound around the cylindrical drum 19. The shielding pattern 19a and the transmission pattern 19b with respect to 2 are not shifted, and the exposure for the required time can be continued.

  The material used for the base material of the cylindrical drum 19 is preferably a material having low scattering and absorption in the ultraviolet region in the vicinity of 350 nm to 400 nm that inhibits the heat resistance and the curing of the ultraviolet curable resin composition.

  The shielding pattern is formed by a method of printing a paint or ink having a function of shielding energy rays, a sputtering pattern of a metal or a metal oxide using a photoresist pattern or a pattern printed with a solvent-soluble printing material as a shielding mask. A method of forming by a peeling (lift-off) method performed by removing a shielding mask after performing vacuum deposition, a method of forming a thin film formed by sputtering or vacuum deposition of metal or metal oxide by photolithography, and Examples of the method include a method in which a resin sheet or a metal foil having a function of shielding the energy rays is bonded and then etched by a photolithography method.

  A cover film 18 is bonded onto the uncured curable resin thin film layer 11, and ultraviolet rays are irradiated from the cover film 18 side when passing over the cylindrical drum 19, and a shielding pattern (shielding portion) 19 a of the cylindrical drum 19 is formed. The curable resin cured portion 12 is formed by transmitting ultraviolet rays through the portion (transmission portion) 19b that is not formed. Thereby, as shown in FIG. 14, the transfer film 10 in which the cover film 18 having no light shielding portion covers the uncured portion 11 and the cured portion 12 of the curable resin thin film layer can be manufactured. Moreover, since the process of forming the shielding pattern on the long cover film can be omitted, the production cost can be reduced.

In this embodiment, the light-shielding pattern 19a in the cylindrical drum 19 is not limited to a circle as shown in FIG. 11, but is light-shielded and patterned so as to be cured into a polygon as shown in FIG. 12 or a stripe as shown in FIG. It is also possible to use a cylindrical drum, and the shape of the light shielding pattern can be freely selected according to the use of the transfer film roll.
By performing pattern exposure in this way, the continuous pattern as in FIG. 13 is in the width direction, and in the discontinuous shielding pattern 19a as in FIGS. In addition, it is possible to suppress the flow of the coating film in the processing flow direction, and to ensure higher uniformity of the coating film thickness. The number of discontinuous shielding patterns 19a arranged in the circumferential direction of the cylindrical drum 19 (four in FIGS. 11 and 12) is not particularly limited, and may be one or plural.
As shown in FIG. 13, when the shielding pattern 19a is continuous, the shielding pattern 19a and the transmission pattern 19b do not shift even if the cylindrical drum 19 does not rotate. Therefore, even if the cylindrical drum 19 is fixed. I do not care.
The shape of the discontinuous shielding pattern 19a is not particularly limited as long as it is a closed planar shape surrounded by a transmissive portion 19b, and may be various shapes such as an ellipse in addition to a circle or a polygon. It is.
In the example of FIG. 13, the shape of the continuous shielding pattern 19a is a uniform pattern in the longitudinal direction, but the width of the shielding pattern 19a is a continuous pattern that changes periodically, stepwise, or continuously. Is also possible.

  Although not shown, in the second embodiment, similarly to the first embodiment, a process of laminating an ultraviolet absorbing film, a longitudinal slit process for multi-face drawing, and a sheet transfer film manufacturing process. For this purpose, a horizontal slit process can be performed. When performing the step of laminating the ultraviolet absorbing film, the ultraviolet absorbing film can be laminated not only on the back side of the transfer film 10 but also on the cover film 18 on which the light shielding pattern is not formed. When performing the horizontal width direction slitting process, instead of providing the winding part 9, a sheet transfer film 92 can be manufactured by providing a cutter 91 or the like as shown in FIG.

Although not shown, in the first and second embodiments, a web cleaner that removes adhering dust, dust, and the like on the application surface of the transparent substrate 2 and an appearance inspection of the application surface are performed before the application process. An online inspection device, a touch roll that assists the product winding process, and the like may be installed as necessary.
The imprint transfer film provided by the present invention and supplied in a roll form can be applied to a continuous imprint apparatus as shown in FIG. 15, for example.
Further, the imprint transfer film provided by the present invention and supplied by a single sheet can be applied to, for example, a step feed type imprint apparatus as disclosed in Patent Document 3.

The roll-shaped transfer film for imprint 10 manufactured according to the above embodiment can transfer a fine uneven shape by an imprint apparatus as shown in FIG.
The imprint apparatus includes a roll-shaped transfer film supply unit 21 that supplies the transfer film 10 with the cover films 6 and 18 manufactured according to the present invention, a back roll 22 that peels the cover films 6 and 18 from the coating surface, and a peeling A cover film winding portion 23 for winding the cover films 6 and 18, a metal fine uneven shape transfer roll 24 having a fine uneven shape on the surface, and a nip roll 25 for pressing the transfer film 10 against the fine uneven shape transfer roll 24, The back roll 26, the ultraviolet irradiation device 8 that cures the ultraviolet curable resin composition, and the fine uneven shape transfer film winding unit 27.

The roll-shaped transfer film supply unit 21 includes a roll body around which the transfer film 10 with the cover films 6 and 18 serving as an imprint raw material is wound, and a shaft that holds the roll body.
The peeling device 22 is a roll for peeling the cover films 6 and 18.
The cover film winding unit 23 includes a winding shaft for winding the cover films 6 and 18 peeled by the peeling device 22 onto a roll body, and a core material that comes to the center of the roll body.

  The fine concavo-convex shape transfer roll 24 is a metal roll having a shape inverted from the fine concavo-convex shape to be finally formed. Moreover, in order to make peeling of the transfer film 10 easy after shape transfer, the thing with which the peeling process was made | formed is used suitably for the fine uneven | corrugated shape transfer roll 24. FIG.

  The nip roll 25 and the back roll 26 are provided with a pressurizing unit so that the transfer film 10 can be pressed against the fine uneven shape transfer roll 24 and the shape of the fine uneven shape transfer roll 24 can be copied onto the transfer film 10.

The ultraviolet irradiation device 8 is provided for curing the ultraviolet curable resin composition while the transfer film 10 is pressed against the fine uneven shape transfer roll 24 and stabilizing the transferred fine uneven shape.
When the transfer film of the present invention is used in the thermal nanoimprint method, a heating device is provided instead of the ultraviolet irradiation device. In this case, imprinting is performed by thermally curing the curable resin composition of the transfer film while transferring the fine uneven shape by compression molding or the like.

  The fine concavo-convex shape transfer film winding unit 27 includes a winding shaft for winding the transfer film 10 having the fine concavo-convex shape transferred thereon onto a roll body, and a core material that comes to the center of the roll body product. .

FIG. 16 is a diagram showing an outline of a production process for producing a conventional fine uneven shape transfer film.
The transparent substrate 2 includes a supply unit 1, a coating device 3, a drying device 4, a fine uneven shape transfer roll 24, a nip roll 25, a back roll 26, and a fine uneven shape transfer film winding portion 27. .
The film-forming process (coating / drying process) of the ultraviolet curable resin composition and the fine uneven shape transfer process are continuously installed, and the film forming process requiring skillful technology and the fine uneven shape transfer process are simultaneously performed. It was necessary to do it, and the technical difficulty was very high.

DESCRIPTION OF SYMBOLS 1 ... Base material supply part, 2 ... Transparent base material (base film which has transparency), 3 ... Coating apparatus, 4 ... Drying apparatus, 5 ... Cover film supply part, 6 ... Cover film with mask, 6a ... Shielding pattern (Light-shielding pattern), 6b ... transmission part (transmission pattern), 7 ... nip roll, 8 ... ultraviolet irradiation device, 9 ... transfer film winding part, 10 ... transfer film, 11 ... uncured part of curable resin thin film layer, DESCRIPTION OF SYMBOLS 12 ... Curing part of curable resin thin film layer, 13 ... Slit position at the time of sheet cutting, 14 ... Slit position at the time of multi-surface drawing, 15 ... Ultraviolet absorption film supply part, 16 ... Ultraviolet absorption film, 17 ... Nip roll, 18 ... Cover film, 19 ... cylindrical drum, 19a ... shielding part (shielding pattern), 19b ... transmission part (transmission pattern), 20 ... position of base film, 21 ... roll-shaped transfer film , 22 ... peeling device (back roll), 23 ... cover film winding unit, 24 ... fine uneven shape transfer roll, 25 ... nip roll, 26 ... back roll, 27 ... imprint product winding unit, 91 ... cutter, 92 ... sheet transfer film.

Claims (17)

A method for producing a transfer film for imprinting for transferring a stamper pattern by irradiating an energy ray and curing a curable resin after bonding with a stamper having a fine pattern formed thereon,
At least the following steps (1) to (3):
(1) A step of preparing a long cover film with a mask made of a synthetic resin film having a length of 1 to 10,000 m and having a shielding pattern for shielding energy rays on one surface;
(2) A step of forming a curable resin thin film layer composed of an uncured and liquid curable resin composition on one surface of a substrate film having a long length of 1 to 10,000 m,
(3) The portion of the cover film with the mask where the shielding pattern is not formed by bonding the cover film with the mask onto the curable resin thin film layer and irradiating the cover with the mask with energy rays. Forming a transfer film obtained by curing the curable resin in
The manufacturing method of the transfer film for imprint characterized by including these.   The shielding pattern is formed by a method of printing a paint or ink having a function of shielding the energy ray, a pattern printed with a photoresist pattern or a solvent-soluble printing material as a shielding mask, and a metal or metal oxide. A method of forming by a peeling (lift-off) method in which a shielding mask is removed after sputtering or vacuum deposition, or a thin film formed by sputtering or vacuum deposition of metal or metal oxide is formed by etching by photolithography. 2. The method according to claim 1, wherein the method is a method in which a resin sheet or a metal foil having a function of shielding energy rays is bonded and then etched and formed by photolithography. Of producing a transfer film for imprinting.   The shape of the shielding pattern is one of a discontinuous pattern arranged in a plurality spaced apart in the longitudinal direction of the cover film with mask, or a continuous pattern continuous in the longitudinal direction of the cover film with mask. The manufacturing method of the transfer film for imprints of Claim 1 or 2.   The said cover film with a mask WHEREIN: The peeling process is made | formed by the bonding surface with the said curable resin thin film layer, The manufacturing method of the transfer film for imprints in any one of Claims 1-3 characterized by the above-mentioned. .   Further, after forming a transfer film in which the curable resin is cured in a portion where the shielding pattern of the masked cover film is not formed, in the portion in which the curable resin is cured, the transfer film is placed in the longitudinal direction. The imprint transfer according to any one of claims 1 to 4, further comprising a slitting step for cutting along the transverse direction and / or a sheet-feeding step for cutting the transfer film along the lateral width direction. A method for producing a film. A method for producing a transfer film for imprinting for transferring a stamper pattern by irradiating an energy ray and curing a curable resin after bonding with a stamper having a fine pattern formed thereon,
At least the following steps (1) to (2):
(1) The process of forming the curable resin thin film layer which consists of a non-hardened and liquid curable resin composition on one surface of the base film which has a length of 1-10000 m and has long transparency,
(2) A continuous exposure apparatus in which a cover film made of a synthetic resin film having a long length of 1 to 10,000 m is laminated on the curable resin thin film layer, and a shielding pattern for shielding energy rays is formed. Irradiating with energy rays, and forming a transfer film obtained by curing the curable resin in a portion where the shielding pattern of the continuous exposure apparatus is not formed,
The manufacturing method of the transfer film for imprint characterized by including these.   The continuous exposure apparatus includes a cylindrical drum made of a material that transmits energy rays, a shielding pattern portion provided on an outer peripheral wall of the cylindrical drum, and an exposure light source disposed inside the cylindrical drum, The method for producing a transfer film for imprinting according to claim 6, wherein the transparent substrate wound around the cylindrical drum is an apparatus that irradiates energy rays from the inside of the cylindrical drum.   The shape of the shielding pattern is any one of a discontinuous pattern arranged in a spaced manner in the circumferential direction of the cylindrical drum, or a continuous pattern continuous in the circumferential direction of the cylindrical drum. Item 8. A method for producing a transfer film for imprinting according to Item 7.   Further, after forming a transfer film in which the curable resin is cured in a portion where the shielding pattern of the continuous exposure apparatus is not formed, the transfer film is moved along the longitudinal direction in the portion in which the curable resin is cured. The imprinting transfer film according to any one of claims 6 to 8, further comprising a slitting step for cutting and / or a sheet-fed step for cutting the transfer film along a transverse width direction. Manufacturing method.   The method for producing a transfer film for imprinting according to any one of claims 6 to 9, wherein the cover film is subjected to a peeling treatment on a surface to be bonded to the curable resin thin film layer. An imprint transfer film for transferring a stamper pattern by irradiating an energy ray to cure a curable resin after being bonded to a stamper having a fine pattern formed thereon,
A curable resin thin film layer composed of a partially cured curable resin composition portion and an uncured curable resin composition portion is formed on one surface of a transparent substrate film. An imprinting transfer film comprising: a cover film with a mask made of a synthetic resin film having transparency and formed with a pattern for shielding energy rays. An imprint transfer film for transferring a stamper pattern by irradiating an energy ray to cure a curable resin after being bonded to a stamper having a fine pattern formed thereon,
A part of a curable resin composition partially cured by a continuous exposure apparatus in which a pattern for shielding energy rays is formed on one surface of a transparent base film and an uncured curable resin composition A transfer film for imprinting, comprising a curable resin thin film layer formed of a product portion and a laminated cover film made of a synthetic resin film having transparency.   The imprinting transfer film according to claim 11, wherein the imprinting transfer film is supplied in a roll form.   The imprinting transfer film according to claim 13, wherein the imprinting transfer film has a length of 1 to 10,000 m and is wound around a roll body.   The imprinting transfer film according to claim 11, wherein the imprinting transfer film is supplied on a sheet.   16. The IN according to claim 11, which is used for manufacturing any one of the group consisting of an optical functional film, a semiconductor element, a precision mechanical member, and a magnetic recording medium member. Transfer film for printing.   The imprinting transfer film according to any one of claims 11 to 16, wherein an alignment mark for alignment with a stamper of an imprint apparatus is two-dimensionally arranged on the base film.

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