JPH0354569A - Formation of resist pattern - Google Patents

Formation of resist pattern

Info

Publication number
JPH0354569A
JPH0354569A JP19104989A JP19104989A JPH0354569A JP H0354569 A JPH0354569 A JP H0354569A JP 19104989 A JP19104989 A JP 19104989A JP 19104989 A JP19104989 A JP 19104989A JP H0354569 A JPH0354569 A JP H0354569A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
resin
plate
layer
cured
master
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19104989A
Inventor
Hiroyuki Matsui
Seitaro Tsutsumi
Original Assignee
Dainippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

PURPOSE: To form fine resist patterns with a simple device and process by interposing a curable resin between a master plate and a substrate, pressurizing and curing the resin, and stripping the master plate, then removing the recesses of the cured resin.
CONSTITUTION: The master plate 1 provided with recesses 2 of desired pattern shapes is subjected to a release treatment at need and the ionization radiation curing or thermosetting resin 4 is dropped thereon. A substrate 3 is superposed thereon in such a manner that the electrode layer 13 side thereof faces the master plate and the plates are pressurized by pressing rolls 11 or pressurizing plates to spread the resin 4 over the entire surface. The resin 4 is then cured by irradiation with UV rays, etc., or heating and the plate 1 is stripped. A rugged relief layer 6 consisting of the cured resin is thus formed on the substrate 3. The entire surface is thereafter etched uniformly over the entire surface to completely remove the cured resin of the recesses 8 of the relief layer. The resist layer 7 consisting of the remaining projecting parts is thus formed.
COPYRIGHT: (C)1991,JPO&Japio
JP19104989A 1989-07-24 1989-07-24 Formation of resist pattern Pending JPH0354569A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19104989A JPH0354569A (en) 1989-07-24 1989-07-24 Formation of resist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19104989A JPH0354569A (en) 1989-07-24 1989-07-24 Formation of resist pattern

Publications (1)

Publication Number Publication Date
JPH0354569A true true JPH0354569A (en) 1991-03-08

Family

ID=16268042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19104989A Pending JPH0354569A (en) 1989-07-24 1989-07-24 Formation of resist pattern

Country Status (1)

Country Link
JP (1) JPH0354569A (en)

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04239684A (en) * 1991-01-24 1992-08-27 G T C:Kk Method for forming of fine pattern
US5352634A (en) * 1992-03-23 1994-10-04 Brody Thomas P Process for fabricating an active matrix circuit
US5425848A (en) * 1993-03-16 1995-06-20 U.S. Philips Corporation Method of providing a patterned relief of cured photoresist on a flat substrate surface and device for carrying out such a method
WO2001044875A3 (en) * 1999-12-15 2002-06-27 Nanogen Inc Micromolds fabricated using mems technology and methods of use therefor
JP2002539604A (en) * 1999-03-11 2002-11-19 ボード・オヴ・リージェンツ,ザ・ユニヴァーシティ・オヴ・テキサス・システム It stepped cast-clad seal type lithography
US6616887B2 (en) 1998-12-23 2003-09-09 3M Innovative Properties Company Method for precise molding and alignment of structures on a substrate using a stretchable mold
US6821178B2 (en) 2000-06-08 2004-11-23 3M Innovative Properties Company Method of producing barrier ribs for plasma display panel substrates
US6864071B2 (en) 1999-04-12 2005-03-08 Nanogen/Becton Dickinson Partnership Multiplex amplification and separation of nucleic acid sequences using ligation-dependant strand displacement amplification an bioelectronic chip technology
US6878333B1 (en) 1999-09-13 2005-04-12 3M Innovative Properties Company Barrier rib formation on substrate for plasma display panels and mold therefor
JP2006091596A (en) * 2004-09-24 2006-04-06 Toppan Printing Co Ltd Method for forming black matrix of color filter and method for forming color filter
JP2006098553A (en) * 2004-09-28 2006-04-13 Toppan Printing Co Ltd Method for forming black matrix of color filter and method for forming color filter
US7033534B2 (en) 2001-10-09 2006-04-25 3M Innovative Properties Company Method for forming microstructures on a substrate using a mold
US7070961B2 (en) 1999-04-12 2006-07-04 Nanogen/Becton Dickinson Partnership Electronically mediated nucleic acid amplification in NASBA
JP2006267338A (en) * 2005-03-23 2006-10-05 Toppan Printing Co Ltd Method for forming black matrix of color filter and method for forming color filter
US7176492B2 (en) 2001-10-09 2007-02-13 3M Innovative Properties Company Method for forming ceramic microstructures on a substrate using a mold and articles formed by the method
JP2007164070A (en) * 2005-12-16 2007-06-28 Toppan Printing Co Ltd Intaglio plate for transfer, method for forming object by using the intaglio plate for transfer, method for forming light-shielding barrier, and barrier formed by the method for forming light-shielding barrier
EP2399708A2 (en) 2010-06-28 2011-12-28 Shin-Etsu Chemical Co., Ltd. Method for manufacturing electronic grade synthetic quartz glass substrate
EP2587312A1 (en) 2011-10-24 2013-05-01 Shin-Etsu Chemical Co., Ltd. Electronic grade glass substrate and making method
KR20160022260A (en) 2014-08-19 2016-02-29 신에쓰 가가꾸 고교 가부시끼가이샤 Rectangular substrate for imprint lithography and making method
US9505166B2 (en) 2012-11-01 2016-11-29 Shin-Etsu Chemical Co., Ltd. Rectangular mold-forming substrate

Cited By (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04239684A (en) * 1991-01-24 1992-08-27 G T C:Kk Method for forming of fine pattern
US5352634A (en) * 1992-03-23 1994-10-04 Brody Thomas P Process for fabricating an active matrix circuit
US5426074A (en) * 1992-03-23 1995-06-20 Brody; Thomas P. Process for fabricating an active matrix circuit
US5425848A (en) * 1993-03-16 1995-06-20 U.S. Philips Corporation Method of providing a patterned relief of cured photoresist on a flat substrate surface and device for carrying out such a method
US6616887B2 (en) 1998-12-23 2003-09-09 3M Innovative Properties Company Method for precise molding and alignment of structures on a substrate using a stretchable mold
US6802754B2 (en) 1998-12-23 2004-10-12 3M Innovative Properties Company Method for precise molding and alignment of structures on a substrate using a stretchable mold
US6984935B2 (en) 1998-12-23 2006-01-10 3M Innovative Properties Company Method for precise molding and alignment of structures on a substrate using a stretchable mold
JP2002539604A (en) * 1999-03-11 2002-11-19 ボード・オヴ・リージェンツ,ザ・ユニヴァーシティ・オヴ・テキサス・システム It stepped cast-clad seal type lithography
US6864071B2 (en) 1999-04-12 2005-03-08 Nanogen/Becton Dickinson Partnership Multiplex amplification and separation of nucleic acid sequences using ligation-dependant strand displacement amplification an bioelectronic chip technology
US7070961B2 (en) 1999-04-12 2006-07-04 Nanogen/Becton Dickinson Partnership Electronically mediated nucleic acid amplification in NASBA
US6878333B1 (en) 1999-09-13 2005-04-12 3M Innovative Properties Company Barrier rib formation on substrate for plasma display panels and mold therefor
WO2001044875A3 (en) * 1999-12-15 2002-06-27 Nanogen Inc Micromolds fabricated using mems technology and methods of use therefor
US6821178B2 (en) 2000-06-08 2004-11-23 3M Innovative Properties Company Method of producing barrier ribs for plasma display panel substrates
US7429345B2 (en) 2001-10-09 2008-09-30 3M Innovative Properties Company Method for forming ceramic microstructures on a substrate using a mold
US7033534B2 (en) 2001-10-09 2006-04-25 3M Innovative Properties Company Method for forming microstructures on a substrate using a mold
US7176492B2 (en) 2001-10-09 2007-02-13 3M Innovative Properties Company Method for forming ceramic microstructures on a substrate using a mold and articles formed by the method
JP2006091596A (en) * 2004-09-24 2006-04-06 Toppan Printing Co Ltd Method for forming black matrix of color filter and method for forming color filter
JP2006098553A (en) * 2004-09-28 2006-04-13 Toppan Printing Co Ltd Method for forming black matrix of color filter and method for forming color filter
JP2006267338A (en) * 2005-03-23 2006-10-05 Toppan Printing Co Ltd Method for forming black matrix of color filter and method for forming color filter
JP2007164070A (en) * 2005-12-16 2007-06-28 Toppan Printing Co Ltd Intaglio plate for transfer, method for forming object by using the intaglio plate for transfer, method for forming light-shielding barrier, and barrier formed by the method for forming light-shielding barrier
US9017143B2 (en) 2010-06-28 2015-04-28 Shin-Etsu Chemical Co., Ltd. Method for manufacturing electronic grade synthetic quartz glass substrate
EP2399707A2 (en) 2010-06-28 2011-12-28 Shin-Etsu Chemical Co., Ltd. Method for manufacturing electronic grade synthetic quartz glass substrate
US9017144B2 (en) 2010-06-28 2015-04-28 Shin-Etsu Chemical Co., Ltd. Method for manufacturing electronic grade synthetic quartz glass substrate
EP2399708A2 (en) 2010-06-28 2011-12-28 Shin-Etsu Chemical Co., Ltd. Method for manufacturing electronic grade synthetic quartz glass substrate
EP2587312A1 (en) 2011-10-24 2013-05-01 Shin-Etsu Chemical Co., Ltd. Electronic grade glass substrate and making method
US9205528B2 (en) 2011-10-24 2015-12-08 Shin-Etsu Chemical Co., Ltd. Electronic grade glass substrate and making method
US9902037B2 (en) 2011-10-24 2018-02-27 Shin-Etsu Chemical Co., Ltd. Electronic grade glass substrate and making method
US9505166B2 (en) 2012-11-01 2016-11-29 Shin-Etsu Chemical Co., Ltd. Rectangular mold-forming substrate
KR20160022260A (en) 2014-08-19 2016-02-29 신에쓰 가가꾸 고교 가부시끼가이샤 Rectangular substrate for imprint lithography and making method
EP2995994A2 (en) 2014-08-19 2016-03-16 Shin-Etsu Chemical Co., Ltd. Rectangular substrate for imprint lithography and making method
US9884448B2 (en) 2014-08-19 2018-02-06 Shin-Etsu Chemical Co., Ltd. Rectangular substrate for imprint lithography and making method

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