JP6727870B2 - METHOD FOR MANUFACTURING FILM-TYPE TRANSFER MATERIAL HAVING MICRO-CONCENTRATION PATTERN AND MANUFACTURING APPARATUS - Google Patents

Description

The present invention relates to a method and an apparatus for manufacturing a film-shaped material to be transferred having a fine concavo-convex pattern.

Conventionally, in fields such as nanoimprint, a film-shaped transfer material is sandwiched between a transfer roll (stamper) on which a fine projection-depression pattern is formed and a nip roll in order to form a fine projection-depression pattern on the transfer material. Then, a method of transferring the fine concavo-convex pattern to the film-shaped transfer material is used (see Patent Documents 1 and 2). In addition, there is also proposed a so-called optical nanoimprint method in which a photocurable resin is applied onto a fine pattern of an original plate or a material to be transferred to perform optical transfer (see Patent Document 3).

In the past, the width of the film-shaped material to be transferred, the width of the nip roll, and the width of the transfer roll were generally the same.

JP, 2010-177457, A JP, 2014-10219, A JP, 2005-238719, A

However, conventionally, at the time of transferring the fine uneven pattern, the resin of the film-shaped transfer material protrudes from both sides of the film-shaped transfer material at the pressing position of the nip roll, and the protruding resin is on the back side of the film-shaped transfer material. It was attached to unnecessary places such as turning, and caused foreign matter (dust).

The present invention has been made in view of the above-described problems, and particularly, the width of the film-shaped material to be transferred, the width of the nip roll, and the width of the transfer roll are regulated so that the resin is not needed. An object of the present invention is to provide a manufacturing method and a manufacturing apparatus for a film-shaped material to be transferred having a fine concavo-convex pattern capable of preventing adhesion.

As a result of repeated intensive studies to solve the above problems, the inventors of the present invention regulated the width of the nip roll, the width of the transfer roll, and the width of the film-like material to be transferred to an unnecessary place of the resin. The inventors have found that it is possible to prevent the adherence of the particles and have completed the present invention. That is, the present invention is as follows.

The present invention is a manufacturing method of transferring the fine concavo-convex pattern to a film-shaped transfer material by sandwiching it with a transfer roll having a fine concavo-convex pattern and a nip roll, wherein the film-shaped transfer material is a photocurable resin layer. The color of the nip rolls is black, the nip rolls are provided before and after irradiating the photocurable resin with light from a light source, and the width of each nip roll is a and the transfer roll is Where b is the width and c is the width of the film-like material to be transferred, the following formula (1) or formula (2) is established, and in addition, the coating width of the photocurable resin layer is When W1, W1≦a is satisfied in the formula (1) and W1≦b is satisfied in the formula (2), and the transfer roll and the photocurable resin layer are brought into close contact with each other by the nip roll. In this state, the photocurable resin layer is photocured to form a cured resin layer having the fine concavo-convex pattern transferred to the surface thereof.
a<b and a<c... (1)
b<a and b<c (2)

With this configuration, it is possible to prevent the resin from squeezing out from the end portion of the film, and to prevent generation of dust due to squeezing out of the resin, wraparound to the back surface of the film, and adhesion of the resin to the side surface of the transfer roll.

In the present invention, it is preferable that the above formula (1) holds. With this configuration, it is possible to more effectively prevent the resin from adhering to the end portion of the transfer roll even after long-time transfer. Further, since the resin is not exposed to an oxygen atmosphere, it is possible to prevent uncured due to oxygen inhibition.

Further, the present invention is sandwiched between a transfer roll having a fine concavo-convex pattern and a nip roll to transfer the fine concavo-convex pattern to a film-like material to be transferred having a photo-curable resin layer, and from the light source to the photo-curable resin layer. A manufacturing apparatus for irradiating light with light to cure the photocurable resin , wherein the color of the nip roll is black, the nip roll is the photocurable resin, before and after irradiating light from the light source, The width a of each nip roll and the width b of the transfer roll are respectively provided by the following formula (1) or formula (2), and in addition, the coating width of the photocurable resin layer is When W1 is satisfied, W1≦a in the formula (1) and W1≦b in the formula (2) are satisfied, and the film-shaped transfer material having a photocurable resin layer is It is characterized in that the photocurable resin layer is photocured in a state of being closely attached to the transfer roll by the nip roll to form a resin cured product layer having the fine uneven pattern transferred to the surface thereof.
a<b and a<c... (1)
b<a and b<c (2)
Here, c is the width of the film-shaped material to be transferred.

With this configuration, it is possible to prevent the resin from squeezing out from the end portion of the film, and to prevent generation of dust due to squeezing out of the resin, wraparound to the back surface of the film, and adhesion of the resin to the side surface of the transfer roll.

Further, in the present invention, the entire width a′ of the nip roll is equal to or larger than the width b of the transfer roll, and recessed steps are formed at both ends of the nip roll, so that the transfer roll of the nip roll is formed. It is preferable that the abutting width a is defined and the above-mentioned formula (1) is established.

With this configuration, it is possible to reduce light leakage from the end portion of the nip roll while suppressing the amount of resin protruding.

According to the present invention, it is possible to prevent the resin from squeezing out from the end portion of the film, and to prevent generation of dust due to squeezing out of the resin, wraparound to the back surface of the film, and adhesion of the resin to the side surface of the transfer roll.

It is the schematic which shows the manufacturing apparatus used for the manufacturing process of the 1st film-shaped mold which concerns on this Embodiment. FIG. 3 is a schematic plan view for explaining the relationship among the width a of the nip roll, the width b of the transfer roll, and the width c of the film-shaped material to be transferred in the present embodiment. It is a schematic perspective view for explaining the structure of the nip roll in the present embodiment. It is the schematic which shows the manufacturing apparatus used for the replication process of the 2nd film-shaped mold with the 1st film-shaped mold manufactured in FIG. It is a cross-sectional schematic diagram and plane schematic diagram which show 1 process of the manufacturing method of the 1st film-shaped mold which concerns on this Embodiment. It is a cross-sectional schematic diagram and plane schematic diagram which show 1 process of the manufacturing method of the 1st film-shaped mold which concerns on this Embodiment. It is a cross-sectional schematic diagram and plane schematic diagram which show 1 process of the manufacturing method of the 2nd film-shaped mold which concerns on this Embodiment. It is a cross-sectional schematic diagram which shows 1 process of the manufacturing method of the 2nd film-shaped mold which concerns on this Embodiment. It is explanatory drawing which shows the manufacturing method of the n-th film mold which concerns on this Embodiment. It is a cross-sectional schematic diagram which shows each process of manufacture of the antireflection material using the nth film-shaped mold obtained by the manufacturing method of the film-shaped transfer material which concerns on this Embodiment. FIG. 6 is a schematic cross-sectional view showing each step of manufacturing a resist mask using the n-th film-shaped mold obtained by the method for manufacturing a film-shaped transferred material according to the present embodiment. It is a cross-sectional schematic diagram which shows each process of another example of a resist mask manufacture using the nth film-shaped mold obtained by the manufacturing method of the film-shaped transfer material which concerns on this Embodiment.

Hereinafter, one embodiment of the present invention (hereinafter, abbreviated as “embodiment”) will be described in detail. The present invention is not limited to the following embodiments, and various modifications can be made within the scope of the spirit thereof.

A method of manufacturing the film-shaped material to be transferred according to the present embodiment will be described. A roll-to-roll method is used as the method of manufacturing the film-shaped material to be transferred according to the present embodiment. Hereinafter, in the method of manufacturing a film-shaped material to be transferred, the film-shaped material to be transferred manufactured by using the cylindrical mold as the original plate will be referred to as a first film-shaped mold for description. In addition, the film-shaped transfer material manufactured by using the first film-shaped mold wound on a part of the surface of the back roll will be described as a second film-shaped mold.

The first film mold can be manufactured by a roll-to-roll method using a cylindrical mold (transfer roll) as an original plate. First, a photocurable resin is applied to the surface of a film-shaped substrate for the first film-shaped mold to form a photocurable resin layer. The fine uneven pattern provided on the peripheral surface of the cylindrical mold is brought into close contact with the uncured photocurable resin layer, and then the photocurable resin layer is photocured to transfer the fine uneven pattern to the surface. The cured resin layer is formed.

FIG. 1 is a schematic diagram showing a manufacturing apparatus used in the manufacturing process of the first film-shaped mold according to the present embodiment.

The manufacturing apparatus 100 shown in FIG. 1 includes an original roll 102 that sends out the film-shaped substrate 101, and a winding roll 104 that winds up the first film-shaped mold 103. Between the original roll 102 and the take-up roll 104, a photo-curable resin is applied onto the film-shaped substrate 101 in order from the upstream side to the downstream side in the transport direction MD of the film-shaped substrate 101. A means 105, a guide roll 106, a transfer roll 107 having a fine concavo-convex pattern on the outer peripheral surface thereof, and nip rolls 108a and 108b for closely contacting the photocurable resin on the film substrate 101 and the outer peripheral surface of the transfer roll 107. And a light source 109 for irradiating the photocurable resin with light, and a guide roll 110.

When the photocurable resin is applied using a solvent, a drying furnace 111 for drying the solvent in the photocurable resin may be further provided.

Using the manufacturing apparatus 100 having the above configuration, the first film-shaped mold is manufactured as follows. First, a photo-curable resin is applied by the applying means 105 onto the light-transmissive film-like substrate 101 sent from the original roll 102 to form a photo-curable resin layer. The film-shaped substrate 101 with the photocurable resin layer is supplied to the transfer roll 107 via the guide roll 106.

Next, while rotating the transfer roll 107, the outer peripheral surface of the transfer roll 107 is brought into close contact with the photocurable resin layer by the pressing means 108 to transfer the fine concavo-convex pattern to the surface of the photocurable resin layer. Next, the photocurable resin layer is irradiated with light from the light source 109 to photocure the photocurable resin layer to form a cured resin layer, and the first film mold 103 is manufactured. The first film mold 103 passes through the guide roll 110 and is wound up by the winding roll 104.

In the manufacturing process of the first film mold 103, in order to protect the fine concavo-convex pattern transferred from the transfer roll 107 to the first film mold 103, it is protected on the photocurable resin layer after photocuring. A film (cover film) may be laminated.

In the manufacturing process of the first film-shaped mold 103, the photocurable resin is in a state in which the transfer roll 107 and the photocurable resin layer are in close contact with each other by the pressing means 108 that press-bonds the transfer roll 107 and the photocurable resin layer. The layer is irradiated with light to be photocured. Since the fine concavo-convex pattern on the outer peripheral surface of the transfer roll 107 and the photo-curable resin layer are in close contact with each other, the fine concavo-convex pattern on the outer peripheral surface of the transfer roll 107 can be accurately photo-transferred, and insufficient curing due to oxygen can be avoided. can do.

In addition, in the manufacturing process of the first film mold 103, it is preferable that the transfer roll 107 and the photocurable resin layer are brought into close contact with each other in a nitrogen atmosphere to perform light irradiation. This makes it possible to avoid contact of oxygen in the air with the photocurable resin of the photocurable resin layer and reduce the inhibition of the photopolymerization reaction by oxygen, so that the photocurable resin can be sufficiently cured. Because you can.

In FIG. 1, in order to bring the photocurable resin layer and the transfer roll 107 into close contact with each other and irradiate light, the photocurable resin layer and the transfer roll are directly pressure-bonded by the nip rolls 108a and 108b as the pressing means 108. Irradiate with light. Further, the tension of the film-shaped substrate 101 may be controlled by unwinding and winding-up to irradiate light with the photo-curable resin layer and the transfer roll in a pressure-bonded state. In these cases, the pressing pressure and the tension can be appropriately adjusted depending on the transferability of the photocurable resin layer.

FIG. 2 is a schematic plan view for explaining the relationship among the width a of the nip roll, the width b of the transfer roll, and the width c of the film-like material to be transferred in the present embodiment.

As shown in FIG. 2A, the width of the nip rolls 108a and 108b is a, the width of the transfer roll 107 is b, and the width of the first film mold 103 is c. As shown in FIG. 2A, the following expression (1) is established between the widths a, b, and c.
a<b and a<c... (1)

According to the expression (1), the width a of the nip rolls 108 a and 108 b is smaller than both the width b of the transfer roll 107 and the width c of the first film-shaped mold 103.

For this reason, the entire width a of the nip rolls 108 a and 108 b is a width in contact with the transfer roll 107 via the first film mold 103. As shown in FIG. 2, since the nip rolls 108a and 108b are set inside the both end portions of the first film-shaped mold 103, the first film-shaped mold 103 includes the nip rolls 108a and 108b and the transfer roll 107. Even if the first film-shaped mold 103 is pressed by being sandwiched between the first film-shaped mold 103 and the first film-shaped mold 103, the pressing region is limited to a range in which the first nip rolls 108a and 108b come into contact, and it is possible to appropriately prevent the resin from protruding from the film end portion. I can. Therefore, it is possible to prevent the generation of dust due to the protrusion of the resin, the wraparound to the back surface of the film, and the adhesion of the resin to the side surface of the transfer roll.

In the configuration shown in FIG. 2A, the relationship between the width b of the transfer roll 107 and the width c of the first film mold 103 is not limited, but it is preferable that c≦b. If c>b, the resin may be deposited on the side surfaces that are both ends of the transfer roll and may become a dust source, but if c≦b, the resin has spread to both ends of the first film-shaped mold. Since the resin moves to the first film-shaped mold and is conveyed, it does not become a dust source.

In addition, the first film-shaped mold 103 has a film-shaped base material and a resin layer applied to the film-shaped base material, and the fine concavo-convex pattern is transferred to the resin layer. In the present embodiment, it is preferable to set the coating width W1 (see FIG. 5 described later) before the fine concavo-convex pattern is transferred to the resin layer to be equal to or less than the width a of the nip rolls 108a and 108b.

Next, in FIG. 2B, the following expression (2) is established between the widths a, b, and c.
b<a and b<c (2)

That is, according to the equation (2), the width b of the transfer roll 107 is smaller than both the width a of the nip rolls 108 a and 108 b and the width c of the first film-shaped mold 103. Also with this configuration, it is possible to appropriately prevent the resin from protruding from the end portion of the film. Therefore, it is possible to prevent the generation of dust due to the protrusion of the resin, the wraparound to the back surface of the film, and the adhesion of the resin to the side surface of the transfer roll.

In the configuration shown in FIG. 2B, the relationship between the width a of the nip rolls 108a and 108b and the width c of the first film mold 103 is not limited, but it is preferable that c≦a. In the case of c>a, the film may be broken or wrinkled in a region of the width c of the first film mold 103 wider than the width a of the nip roll, but if c≦a, the first Since the entire surface of the film mold 103 is in contact with the nip roll, it is possible to prevent the film from being broken or wrinkled.

In addition, the first film-shaped mold 103 has a film-shaped base material and a resin layer applied to the film-shaped base material, and the fine concavo-convex pattern is transferred to the resin layer. In the present embodiment, it is preferable to set the coating width W1 (see FIG. 5 described later) before the fine concavo-convex pattern is transferred to the resin layer to be equal to or less than the width b of the transfer roll 107. If the coating width W1 is made wider than the width b of the transfer roll 107, the risk of resin leakage increases.

In the present embodiment, either of the above formula (1) or formula (2) is established, but in the formula (1) and the formula (2), the width a of the nip rolls 108a and 108b is set as a transfer having a fine concavo-convex pattern. It is preferable to use the above formula (1) that is smaller than the width b of the roll 107. This makes it possible to more effectively prevent the resin from adhering to the end portion of the transfer roll 107 even after long-time transfer. Further, since the resin is not exposed to an oxygen atmosphere, it is possible to prevent uncured due to oxygen inhibition.

By the way, in FIG. 2A, the width a of the nip rolls 108a and 108b is the entire width expressed as the length between both ends of the nip rolls 108a and 108b. In FIG. 2A, the entire width a is a circumferential surface that contacts the back surface of the first film mold 103. However, in the following configuration, even if the entire width of the nip rolls 108a and 108b is not less than the width b of the transfer roll 107, the above formula (1) can be satisfied.

FIG. 3 is a schematic perspective view for explaining the structure of the nip roll in the present embodiment. As shown in FIG. 3, the overall width, which is the length between both ends of the nip rolls 108a and 108b, is a'. As shown in FIG. 3, recessed steps 112 are formed at both ends of the nip rolls 108a and 108b.

The overall width a′ of the nip rolls 108 a and 108 b illustrated in FIG. 3 is equal to or larger than the width b of the transfer roll 107. Further, the width a of the nip rolls 108a, 108b that contacts the transfer roll 107 is defined by the recessed steps 112 formed at both ends of the nip rolls 108a, 108b. The width a is smaller than the width b of the transfer roll 107 and smaller than the width c of the first film mold 103, as shown in the above formula (1). At this time, it is preferable to reduce the diameter of the end portions of the nip rolls 108a and 108b by about 2 mm to 5 mm by the recessed step 112.

With this configuration, it is possible to reduce light leakage from the end portion of the nip roll while suppressing the amount of resin protruding. The reason for reducing light leakage is that the total width a′ of the nip rolls 108a and 108b is large, and thus the amount of light blocked at both ends of the nip rolls 108a and 108b increases. The total width a′ of the nip rolls 108 a and 108 b and the width b of the transfer roll 107 are preferably larger than the width c of the first film mold 103. By reducing the light leakage, it is possible to prevent the resin from being cured before the transfer roll, and it is possible to improve the transferability.

(Second film-shaped mold replication step)
FIG. 4 is a schematic view showing a manufacturing apparatus used in the step of replicating the first film-shaped mold manufactured in FIG. 1 to the second film-shaped mold.

The manufacturing apparatus 200 shown in FIG. 4 includes a first delivery roll 202 for delivering the transferred substrate 201, and a first take-up roll 204 for winding up the completed second film mold 203. .. Between the first delivery roll 202 and the first take-up roll 204, on the surface of the transferred substrate 201 in order from the upstream side to the downstream side in the transport direction MD of the first film mold 103. A coating means 205 for coating a photocurable resin, a second feeding roll 206 for feeding the first film-shaped mold 103, and a first film-shaped mold 103 and the transfer target substrate 201 for bonding A laminating means 207, a guide roll 208, a pressing means 209 for bringing the first film mold 103 and the transferred substrate 201 into close contact with each other, a light source 210 for irradiating the photocurable resin layer with light, and a guide. A roll 211 and a second winding roll 212 for winding the first film-shaped mold 103 are provided.

The laminating means 207 is composed of a pair of laminating rolls 207a and 207b. The pressing unit 209 includes a back roll 209a on which the first film mold 103 and the transferred substrate 201 are conveyed on the outer peripheral surface thereof, and the first film mold 103 and the transferred substrate 201 on the back roll 209a. It is composed of nip rolls 209b and 209c that press. In the production of the second film mold 203, the “transfer roll” refers to a combination of the back roll 209a and the first film mold 103 wound on a part of the surface of the back roll 209a. .. The fine concavo-convex pattern is not formed on the outer peripheral surface of the back roll 209 a, and the fine concavo-convex pattern is formed on the surface of the first film mold 103. In the production of the second film-shaped mold 203, the “fine concavo-convex pattern formed on the transfer roll” refers to the fine concavo-convex pattern formed on the surface of the first film-shaped mold 103.

Further, when the photocurable resin is dissolved in a solvent and applied to the transfer-receiving substrate 201, a drying furnace 213 can be provided on the downstream side of the application unit 205. Further, a drying oven 214 may be provided on the downstream side of the laminating means 207.

Further, the first delivery roll 202 and the second delivery roll 206 may be replaced with each other. That is, the photo-curable resin may be applied on the surface of the first resin film mold 103 where the resin cured material layer is formed.

Using the manufacturing apparatus 200 having such a configuration, the second film mold is duplicated as follows.

First, the transfer base material 201 is delivered from the first delivery roll 202, and the photocurable resin is directly applied onto the surface of the transfer substrate 201 by the application means 205 to form a photocurable resin layer.

At this time, it is preferable that the application width of the photocurable resin applied on the transferred substrate 201 is smaller than the application width of the cured resin layer of the first film mold 103.

Next, the surface of the first film mold 103 on which the resin cured product layer is formed by the laminating means 207 and on which the fine concavo-convex pattern is formed, is covered with the photocurable resin on the transfer-receiving substrate 201. Laminate on layers.

At this time, the photo-curable resin layer on the transferred substrate 201 is attached to the resin-coated region on the fine concavo-convex pattern forming surface of the cured resin layer of the first film mold 103. The alignment between the first film mold 103 and the transferred substrate 201 can be performed, for example, by installing a film meandering adjusting device.

The first film mold 103 and the transferred substrate 201 are supplied to the pressing unit 209 via the guide roll 208. In the pressing means 209, the unevenness forming surface of the resin cured material layer of the first film mold 103 is brought into close contact with the photocurable resin layer. In this state, the photocurable resin is irradiated with light from the light source 210 to photocur the photocurable resin. Adhesion by the pressing means 209 can prevent uncured due to oxygen.

After that, the first film-shaped mold 103 and the transferred substrate 201 are conveyed to the guide roll 211, where the resin-cured material layer is formed on the surface of the first film-shaped mold 103. 201, that is, the second film mold 203 is peeled off. At this time, the inverted shape of the fine concavo-convex pattern of the first film mold 103 is transferred to the second film mold 203.

Then, the second film mold 203 is wound around the first winding roll 204. On the other hand, the first film-shaped mold 103 is wound around the second winding roll 212.

The step of transferring the fine concavo-convex pattern to the film mold will be described in more detail. 5 and 6 are a schematic cross-sectional view and a schematic plan view showing one step of the method of manufacturing the first film-shaped mold according to the present embodiment.

As shown in FIGS. 5A and 5B, a photocurable resin is applied to the surface of the film-shaped substrate 101 to form the photocurable resin layer 12. The photocurable resin is applied in a substantially strip shape along the running direction (MD) of the film-shaped substrate 101. The direction substantially orthogonal to the running direction (MD) of the film-shaped substrate 101 is called the width direction, and the length of the photocurable resin layer 12 along this width direction is the coating width W1.

In the present embodiment, the photocurable resin preferably contains a fluorine-containing substance in order to improve releasability.

Next, the transfer roll 107 (see FIG. 1) is pressed against the uncured photocurable resin layer 12 to bring the fine concavo-convex pattern formed on the peripheral surface of the transfer roll 107 into close contact, and then the photocurable resin The resin layer 12 is photo-cured to provide a resin cured material layer 13 having a fine concavo-convex pattern transferred on the surface thereof, as shown in FIG. 6A, to obtain a first film mold 103. In the present embodiment, when the width of the nip roll is a, the width of the transfer roll is b, and the width of the film-shaped transfer material is c, the above formula (1) or formula (2) is established. There is.

In the present embodiment, when the transfer roll 107 is pressed against the photocurable resin layer 12, the photocurable resin layer 12 is spread in the width direction as shown in FIGS. 6A and 6B, and the cured resin layer The width W2 of the fine concavo-convex pattern transferred to 13 is wider than the initial coating width W1. As described above, even if the width W2 of the fine concavo-convex pattern is widened by the pressing step, in the present embodiment, since the above formula (1) or formula (2) is satisfied, the resin does not protrude from the end portion of the film. It is possible to prevent the generation of dust due to the protrusion of the resin, the wraparound to the back surface of the film, and the adhesion of the resin to the side surface of the transfer roll.

7 and 8 are a schematic cross-sectional view and a schematic plan view showing one step of the method of manufacturing the film-shaped material to be transferred (second film-shaped mold) according to the present embodiment.

As shown in FIG. 7A, a transfer resin layer formed on the surface of a film base material (hereinafter, referred to as a transfer base material) 31 for the second film mold from the first film mold 103. The fine concavo-convex pattern 14 is transferred to 32. At this time, the width of the transferred resin layer 32 in the width direction, that is, the applied width is set so that the transferred resin layer 32 is accommodated in the resin application region 13a of the cured resin layer 13, as shown in FIGS. 7A and 7B. W3 is made smaller than the coating width W1 of the resin coating region 13a, and the transferred resin layer 32 is attached to the inside of the resin coating region 13a. After that, the photocurable resin forming the transferred resin layer 32 is photocured while being pressed, and the transferred resin layer 32 after the photocuring is peeled off together with the film-shaped substrate 31 as shown in FIG. The film mold 203 of No. 2 is obtained. The fine concavo-convex pattern 33 corresponding to the fine concavo-convex pattern 14 of the first film-shaped mold 103 is transferred onto the transferred resin layer 32 of the second film-shaped mold 203. As shown in FIG. 8, the width of the transferred resin layer 32 after the photo-curing while pressing, the fine concavo-convex pattern is transferred and cured is referred to as a transfer width W4. Even in the step of transferring the fine concavo-convex pattern to the second film-shaped mold, the above formula (1) or formula (2) is established, so that the resin can be prevented from squeezing out from the end portion of the film. It is possible to prevent the generation of dust due to the protrusion of the film, the wraparound to the back surface of the film, and the adhesion of resin to the side surface of the transfer roll.

The transferred resin layer 32 is preferably formed by applying a photocurable resin containing a fluorine-containing substance.

Next, the components of the method for manufacturing a film-shaped transfer material according to the present embodiment will be described in more detail.

(Film base material)
As the film-shaped substrate 101, a film-shaped substrate having a light-transmitting property can be used.

The film-shaped substrate is not particularly limited as long as it is mainly composed of a material having a substantially light-transmitting property with respect to a light source used in the ultraviolet/visible light region, but is excellent in handleability and processability. It is preferably a resin material. Examples of such resin materials include polymethylmethacrylate resin, polycarbonate resin, polystyrene resin, cycloolefin resin (COP), crosslinked polyethylene resin, polyvinyl chloride resin, polyarylate resin, polyphenylene ether resin, modified polyphenylene ether resin. , Polyetherimide resin, Polyethersulfone resin, Polysulfone resin, Polyetherketone resin, Amorphous thermoplastic resin such as triacetyl cellulose (TAC) resin, Polyethylene terephthalate (PET) resin, Polyethylene naphthalate resin , A crystalline thermoplastic resin such as a polyethylene resin, a polypropylene resin, a polybutylene terephthalate resin, an aromatic polyester resin, a polyacetal resin, or a polyamide resin.

The film-like substrate is preferably in the form of a film because it is applied to the roll-to-roll method.

The thickness of the film substrate depends on the material, but is preferably 20 to 200 μm, more preferably 50 to 150 μm, and further preferably 50 to 100 μm. When it is 200 μm or less, the transmittance of ultraviolet rays used for the light source of the photo-nanoimprint is good, and a sufficient amount of light for photocuring can be obtained. When the thickness is 20 μm or more, the rigidity of the film can be maintained, so that handling is easy.

The surface of the film-shaped substrate can be subjected to primer treatment, atmospheric pressure plasma treatment, and corona treatment for improving the adhesion with the photocurable resin.

In the method for manufacturing a film-shaped material to be transferred according to the present embodiment, as described above, with respect to the transfer roll 107 or the first film-shaped mold 103 (when the second film-shaped mold 203 is manufactured), The photocurable resin layer is irradiated with light while being in close contact with the cured resin layer to be photocured. Therefore, although depending on the photocurable resin used, the film-shaped substrate is required to have good light transmittance in the wavelength range of 200 nm to 500 nm. Since it depends on the photosensitivity of the photocurable resin to be used, the specific transmittance value in the wavelength range of 200 nm to 500 nm is not particularly limited, but if the total light transmittance of 365 nm, 405 nm and The curable resin is preferable because it is sufficiently photocured. Further, if the transmittance in the wavelength range of 200 nm to 500 nm is good, the light irradiation energy required for curing the photocurable resin can be reduced, and the transfer can be speeded up.

(Photocurable resin)
The photocurable resin layer is formed of a photocurable resin. Photocurable resin is transferability, peelability from original plate, adhesion to film substrate, viscosity, film forming property, photosensitivity, mechanical property after curing, peeling property from resin layer during resin mold preparation. Select in consideration of.

When the resin cured product layer obtained by photocuring the photocurable resin layer is used as a resin template, the fluorine element concentration (Es) in the surface portion of the unevenness-formed surface on which the fine unevenness pattern is formed is the photocurable resin. It is preferably higher than the average elemental fluorine concentration (Eb) in the layer.

According to this, since the fluorine element concentration (Es) on the side of the concavo-convex formation surface in the resin cured product layer is relatively higher than the average fluorine element concentration (Eb) in the resin cured product layer, for example, the second From the first film mold of the cured resin layer of the second film mold, and from the second film mold when producing a product with a fine uneven pattern developed from the second film mold. The releasability of the product with the fine concavo-convex pattern is improved.

The fluorine atom in the cured resin layer is introduced by the fluorine atom-containing substance. The fluorine-containing substance refers to a surfactant, a fluorine-containing polymerizable monomer (acrylate, methacrylate, epoxy), a release agent, a surface treatment agent, and a fluorine-based solvent. From the viewpoint of mobility in the photocurable resin, a fluorine-based surfactant and a fluorine-containing polymerizable monomer are preferable.

In the film-shaped mold according to the present embodiment, the fluorine element concentration (Es) in the surface portion of the resin cured product layer on the side of the concavo-convex formation surface is relative to the average fluorine concentration (Eb) in the resin cured product layer. It is preferable to provide a concentration gradient so that it becomes large, that is, from the surface portion on the film base material side to the surface portion on the irregularity formation surface side. This improves the releasability of the object to be treated from the fine concavo-convex pattern of the resin cured product layer while maintaining the adhesion between the resin cured product layer and the film-shaped substrate. That is, the releasability of the second film-shaped mold from the first film-shaped mold, the releasability of the third film-shaped mold from the second film-shaped mold, and the fine release from the second film-shaped mold The mold release property of the product with the uneven pattern is improved.

The concentration gradient of the resin cured product layer is a range in which the fluorine element concentration (Es) of the resin cured product layer on the unevenness forming surface side is relatively larger than the fluorine element concentration (Eb) of the resin cured product layer. If so, any kind may be used. For example, the concentration gradient may be one that continuously changes steplessly from the surface portion on the film-shaped substrate side of the resin cured product layer toward the surface portion on the unevenness forming surface side, and may be stepwise. It may be changed dynamically. In addition, in the thickness direction from the surface of the cured resin layer on the side of the film-like substrate to the side of the uneven surface, the concentration gradient from the surface of the substrate on the side of the film to the center of the cured resin layer and the resin curing The concentration gradient from the central portion of the physical layer to the surface portion on the concavo-convex forming surface side may be the same or may have different concentration gradients.

In the present embodiment, the fluorine element concentration (Es) of the surface portion of the cured resin layer adopts the value obtained by the XPS method. In the present embodiment, the fluorine element concentration (Es) is the measured value at a depth of several nm which is the penetration length of X-rays in the XPS method.

On the other hand, the average fluorine element concentration (Eb) in the cured resin layer is a value calculated from the charged amount, a value obtained by cutting the cured resin surface layer in advance and exposing the inner surface by the XPS method, a gas chromatograph mass spectrometer (GC /MS) or the value analyzed from ion chromatographic analysis. That is, it means the concentration of elemental fluorine contained in the entire resin cured product layer. For example, a piece of a film-shaped transfer material composed of a cured product of a photopolymerizable mixture formed into a film, in which a resin portion is physically peeled off, is decomposed by a flask combustion method, and then ion chromatography The average fluorine element concentration (Eb) in the photocurable resin can be identified by applying the analysis.

As the photocurable resin, for example, various acrylate compounds and methacrylate compounds, epoxy compounds, isocyanate compounds, thiol compounds, silicone compounds and the like which can be polymerized by a photopolymerization initiator can be used. Among these, it is preferable to use an acrylate compound and a methacrylate compound, an epoxy compound, and a silicone compound, and it is more preferable to use an acrylate compound and a methacrylate compound. These compounds may be used alone or in combination of plural kinds such as a combination of an epoxy compound and an acrylate compound.

Further, as the photocurable resin, a fluorine-containing compound in which hydrogen in a hydrocarbon is replaced by fluorine among the above-mentioned acrylate compounds and methacrylate compounds, epoxy compounds, isocyanate compounds and silicone compounds can be used. By using the fluorine-containing compound, the surface free energy after curing is reduced, and the original plate (transfer roll 107 or the first film mold 103 (when the second film mold 203 is manufactured)) in the transfer step is removed. The releasability of the transferred products (the first film mold 103 and the second film mold 203) is improved.

The fluorine-containing (meth)acrylate preferably has a polyfluoroalkylene chain and/or a perfluoro(polyoxyalkylene) chain and a polymerizable group, and is a linear perfluoroalkylene group, or between carbon atoms-carbon atoms. A perfluorooxyalkylene group having an etheric oxygen atom inserted therein and having a trifluoromethyl group in its side chain is more preferable. Further, a linear polyfluoroalkylene chain and/or a linear perfluoro(polyoxyalkylene) chain having a trifluoromethyl group at the molecular side chain or the molecular structure terminal is particularly preferable.

As the fluorine-containing (meth)acrylate, the weight average molecular weight Mw is preferably 50 to 50,000, the weight average molecular weight Mw is preferably 50 to 5,000 from the viewpoint of compatibility, and the weight average molecular weight Mw is 100 to 5,000. Is more preferable. A diluent solvent may be used when a high-molecular weight compound having low compatibility is used. As the diluting solvent, a solvent having a single solvent having a boiling point of 40°C to 180°C is preferable, 60°C to 180°C is more preferable, and 60°C to 140°C is further preferable. Two or more kinds of diluents may be used.

The photocurable resin preferably contains a photopolymerization initiator in order to improve photosensitivity. Examples of the photopolymerization initiator include a photoradical polymerization initiator, a photoacid generator and a photobase generator. The photopolymerization initiator can be selected in consideration of the wavelength of the light source used, the base material (transparent sheet), various physical properties and the like.

As the photocurable resin, those containing a sensitizer for improving photosensitivity are preferable. The viscosity of the photocurable resin can be adjusted by adding a solvent.

The photocurable resin can be cured by, for example, photocuring, heat curing, electron beam curing, and microwave curing. Of these, photocuring is preferably used. After the photocurable resin is applied to the film-shaped substrate by the above-mentioned application method, the curing reaction of the photocurable resin can be accelerated by irradiating the photocurable resin with light at an arbitrary light amount at a predetermined wavelength. ..

(Applying means)
Examples of the method of applying the photocurable resin to the film-shaped substrate by the application means 105 and 205 include a known application method using a coating coater or an impregnation coating coater. Specific examples include a coating method using a gravure coater, a micro gravure coater, a blade coater, a wire bar coater, an air knife coater, a dip coater, a comma knife coater, a spray coater, a curtain coater, a spin coater, a laminator, and the like. One of these coating methods may be used, or two or more coating methods may be used in combination, if necessary. Further, it is preferable that these coating methods be applied in a continuous manner from the viewpoint of productivity. Further, a continuous coating method using a dip coater, a comma knife coater, a gravure coater or a laminator is particularly preferable.

(light source)
The light sources 109 and 210 used for irradiating the photocurable resin with light are not particularly limited, and various light sources can be used depending on the application and equipment. For example, a high pressure mercury lamp, a low pressure mercury lamp, an electrodeless lamp, a metal halide lamp, an excimer lamp, an LED lamp, a xenon pulsed ultraviolet lamp, etc. can be used. Further, photocurable resins can amount exposed to ultraviolet rays or visible light having a wavelength 200nm~500nm is cured by irradiation so as to ^{100mJ / cm 2 ~2000mJ / cm 2} . Further, from the viewpoint of preventing the inhibition of the photo-curing reaction by oxygen, it is desirable to irradiate the light with a low oxygen concentration during the light irradiation.

(Transfer roll)
The transfer roll 107 is used for the original plate used for manufacturing the first film mold 103 from the viewpoint of continuous productivity and yield. Further, the transfer roll 107 is more preferably seamless. When there is a seam, in the final product with the fine uneven pattern, the part without the fine uneven pattern corresponding to the seam is cut off, not only the yield is deteriorated but also the cutting operation is included, so continuous production is performed. Sex also deteriorates.

As the transfer roll 107, a cylindrical mold having a fine concavo-convex pattern on its outer peripheral surface is used. The fine concavo-convex pattern corresponds to the shape of the fine concavo-convex pattern of the product with the fine concavo-convex pattern to be manufactured.

The fine concavo-convex pattern of the transfer roll 107 is formed into a cylinder by a processing method such as a laser cutting method, an electron beam drawing method, a photolithography method, a direct drawing lithography method using a semiconductor laser, an interference exposure method, an electroforming method, or an anodizing method. It can be directly formed on the outer peripheral surface of the base material. Among these, the photolithography method, the direct writing lithography method using a semiconductor laser, the interference exposure method, the electroforming method, and the anodizing method are preferable from the viewpoint of obtaining a cylindrical mold that does not seamlessly form a fine concavo-convex pattern. More preferable are a direct writing lithography method, an interference exposure method, and an anodizing method.

Further, as the transfer roll 107, one in which the fine concavo-convex pattern formed on the surface of the flat plate substrate by the above-described processing method is transferred to a resin material (film) and the film is laminated on the outer peripheral surface of the cylindrical mold with high positional accuracy You may use. Alternatively, the fine concavo-convex pattern formed on the surface of the flat substrate by the above processing method may be transferred to a thin film of nickel or the like by electroforming, and the thin film may be wound on a roller.

As the material of the transfer roll 107, it is desirable to use a material that can easily form a fine concavo-convex pattern and has excellent durability. From such a viewpoint, a glass roll, a quartz glass roll, a nickel electroformed roll, a chrome electroformed roll, an aluminum roll, or a SUS roll (stainless steel roll) is preferable.

A conductive material having conductivity can be used as a base material for the nickel electroforming roll and the chrome electroforming roll. As the conductive material, for example, materials such as iron, carbon steel, chrome steel, cemented carbide, die steel (for example, maraging steel), stainless steel, aluminum alloy and the like are preferably used.

It is desirable that the surface of the transfer roll 107 be subjected to a release treatment. Since the surface free energy of the transfer roll 107 can be lowered by performing the mold release treatment, even when the transfer roll 107 is continuously transferred to the photocurable resin, the good releasability and the pattern shape of the fine concavo-convex pattern are maintained. can do. In addition, since the releasability of the transfer roll 107 is reflected from the first film-shaped mold 103 to the second film-shaped mold 203 that is duplicated, it is preferable to perform the release processing. In the production of the first film mold 103, the fluorine component is strongly segregated by bringing the photocurable resin into contact with the surface of the transfer roll 107 having the low surface free energy achieved by the opposite mold release treatment. .. Even when the second film-shaped mold 203 is duplicated from the first film-shaped mold 103, the same mechanism is used. Therefore, depending on the surface condition of the mold in the first first film-shaped mold manufacturing process, the subsequent process may be performed. The mold releasability and transferability are controlled.

A commercially available release agent and surface treatment agent can be used for the release treatment. Examples of commercially available release agents and surface treatment agents include OPTOOL (manufactured by Daikin Chemical Industry Co., Ltd.), Durasurf (manufactured by Daikin Chemical Industry Co., Ltd.), Novec series (manufactured by 3M Company), and the like. As the release agent and the surface treatment material, a suitable release agent and surface treatment agent can be appropriately selected depending on the combination of the material of the transfer roll 107 and the photocurable resin to be transferred.

(Nip roll)
In the present embodiment, a transfer roll 107 having a fine concavo-convex pattern (in the production of the second film mold 203, a combination of the back roll 209a and the first film mold 103 in contact with the surface of the back roll 209a) ) And nip rolls 108a and 108b to transfer the fine concavo-convex pattern to the first film mold 103 and the second film mold 203.

In the configuration of the nip rolls 108a and 108b, a general rubber material can be adopted, although it depends on the composition and viscosity of the resin used. For example, ethylene propylene rubber, acrylonitrile butadiene rubber, acrylic rubber, butyl rubber, silicon rubber, fluororubber, styrene butadiene rubber, urethane rubber and the like can be adopted, but from the viewpoint of light resistance and chemical resistance, ethylene propylene rubber, Acrylonitrile butadiene rubber, silicone rubber, and fluororubber are preferable.

Although it depends on the material of the nip roll, the rubber hardness of the nip roll is preferably 20 or more and 60 or less. When the rubber hardness is 20 or more, the film is in close contact with the film and the releasability can be secured, so that the transferability can be secured. When the rubber hardness is 60 or less, it is possible to uniformly press in the width direction of the nip roll and the linear pressure does not increase, so that the spread of the resin in the width direction of the film can be suppressed. When the rubber hardness is 60 or more, it cannot be pressed uniformly unless a certain amount of pressure is applied due to its installation accuracy, and when the pressure is increased to press uniformly, the resin overflows in the width direction and becomes a dust source. May be. The rubber hardness is indicated by the measurement hardness of JIS K 6253 type A durometer.

The color of the nip roll is not particularly limited, but a color capable of absorbing the light or the wavelength at the emission wavelength of the light source used or the absorption wavelength of the photoinitiator is preferable. In general, black color absorbs light in a wide range of wavelengths, so that light leakage can be prevented and curing of the resin can be prevented.

(Production of n-th film mold)
In the method for manufacturing a film-shaped mold according to the present embodiment described above, the second film-shaped mold 203 is duplicated using the first film-shaped mold 103 produced by transferring the fine concavo-convex pattern from the transfer roll 107 as an original plate. The case was explained. However, it is also possible to further duplicate the third film-shaped mold by using the second film-shaped mold 203 as an original plate. That is, the present invention can be applied to a method for producing an (n-1)th (n is an integer of 2 or more) film mold to an nth film mold.

FIG. 9 is an explanatory view showing the method for manufacturing the n-th film-shaped mold according to the present embodiment. As shown in FIG. 9, a first film-shaped mold M-1 was prepared by using the cylindrical mold M-0 as an original plate, and a second film-shaped mold M was prepared by using this first film-shaped mold M-1 as an original plate. -2 can be duplicated. Furthermore, the third film mold M-3 can be duplicated using the second film mold M-2 as an original plate. Similarly, the n-th film-shaped mold M-n can be duplicated using the (n-1)-th film-shaped mold M-(n-1) as an original plate.

That is, the (n-1)th film-shaped mold M-(n-1) used for replicating the nth film-shaped mold M-n is the previous (n-2)th film. The mold M-(n-2) (not shown) is used as an original plate.

Thus, in the transfer of the fine concavo-convex pattern from the (n-1)th film-shaped mold M-(n-1) as the original plate to the nth film-shaped mold M-n, the expression ( By satisfying the condition 1) or the formula (2), it is possible to prevent the resin from squeezing out from the edge part of the film, generating dust due to the resin squeezing out, wrapping around to the back surface of the film, and sticking the resin to the side surface of the transfer roll. Can be prevented.

Any of the second to nth film-shaped molds M-2 to Mn manufactured as described above can be used as a master plate to mass-produce products P with a fine concavo-convex pattern.

(Application example of the n-th film mold)
The n-th film-shaped mold obtained by the method for manufacturing a film-shaped mold according to the present embodiment described above is, for example, the production of an antireflection material, the production of a resist mask, the cell culture medium, the superhydrophobic treatment and the superhydrophobic treatment. It can be applied to hydrophilic processing and is useful. Application examples for (1) production of antireflection material and (2) production of resist mask will be described below.

(1) Manufacture of Antireflection Material A material having a periodic fine concavo-convex pattern including a pillar shape, a conical shape, a pyramidal shape, and a conical shape can be used as an antireflection film having a moth-eye structure having an antireflection effect. Here, the moth-eye structure refers to a structure in which submicron-order pyramid-shaped uneven structures are arranged in a two-dimensional pattern like a moth eye. In such a moth-eye structure, a nano-order fine concavo-convex pattern formed on the surface induces a smooth bending rate gradient, and reflection caused by a difference in refractive index at the interface does not occur, so that it is suitably used as an antireflection film. It becomes possible.

FIG. 10 is a schematic cross-sectional view showing each step of manufacturing an antireflection material using the n-th film-shaped mold obtained by the method for manufacturing a film-shaped mold according to this Embodiment.

As shown in FIG. 10A, an nth film-shaped mold 801 is prepared. The nth film-shaped mold 801 is composed of a film-shaped substrate 802 and a resin cured material layer 803 having a fine uneven pattern provided on the surface of the film-shaped substrate 802.

Next, as shown in FIG. 10B, a resin 804 is applied to the fine concavo-convex pattern of the cured resin layer 803 of the n-th film mold 801. At this time, it may be a molten resin or a solution. Further, the resin 804 may be any of a thermoplastic resin, a thermosetting resin, or a photocurable resin.

Then, as shown in FIG. 10C, a base material 805 is laminated on the resin 804. Further, by peeling the n-th film-shaped mold 801 from the resin 804, the antireflection material 800 can be obtained as shown in FIG. 10D.

(2) Preparation of resist mask Using the n-th film mold obtained by the method for manufacturing a film mold according to the present embodiment, a resist mask can be prepared on the surface of the substrate to be etched.

FIG. 11 is a schematic cross-sectional view showing each step of manufacturing a resist mask using the n-th film-shaped mold obtained by the method for manufacturing a film-shaped mold according to this Embodiment.

As shown in FIG. 11A, an nth film-shaped mold 901 is prepared. The n-th film-shaped mold 901 is composed of a film-shaped substrate 902 and a resin cured material layer 903 having a fine concavo-convex pattern provided on the surface of the film-shaped substrate 902.

Next, as shown in FIG. 11B, a resist material 904 is applied and embedded in the fine concavo-convex pattern of the resin cured material layer 903 of the nth film-shaped mold 901. The resist material 904 can be selected according to the substrate used. When the resist material 904 is a resin, it may be a molten resin or a solution. The resin may be any of a thermoplastic resin, a thermosetting resin, a heat decomposable resin, a photocurable resin or a photodegradable resin.

Thereafter, as shown in FIG. 11C, the substrate 905 is placed on the cured resin layer 903, and the resist material 904 is attached by some method. Further, by releasing the n-th film-shaped mold 901, as shown in FIG. 11D, a resist mask 906 having an inverted structure of a fine concavo-convex pattern is formed on the surface of the substrate 905.

FIG. 12 is a schematic cross-sectional view showing each step of another example of manufacturing a resist mask using the n-th film-shaped mold obtained by the method for manufacturing a film-shaped mold according to this Embodiment.

As shown in FIG. 12A, a resist material 1002 is applied on the surface of the substrate 1001. Next, as shown in FIG. 12B, the concave-convex forming surface of the cured resin layer 903 of the n-th film mold 901 is attached to and pressed against the resist material 1002. Thereafter, the n-th film-shaped mold 901 is released, and a resist mask 1003 having a fine concavo-convex pattern inversion structure is formed on the surface of the substrate 1001, as shown in FIG. 12C.

Note that an adhesive layer may be provided between the resist material 1002 and the substrate 1001, or a two-layer resist in which another resist material is laminated may be used.

By etching the substrates 905 and 1001 using the resist masks 906 and 1003 manufactured as described above, a fine concavo-convex pattern can be formed on the substrates 905 and 1001.

The film-shaped material to be transferred obtained in the present embodiment can be applied to a wire grid polarizer sheet or the like.

(Fine uneven pattern)
In the method for manufacturing a film-shaped transferred material according to the present embodiment, the fine concavo-convex pattern means a pillar shape including a plurality of convex portions having a conical shape, a pyramidal shape or an elliptic cone shape, or a conical shape, a pyramidal shape or an elliptic cone It is a hole shape or a line-and-space shape including a plurality of concave portions. Here, the "pillar shape" is a "shape in which a plurality of columnar bodies (pyramidal states) are arranged", and the "hole shape" is a "shape in which a plurality of columnar (pyramidal) holes are formed". is there.

The scale of the fine concavo-convex pattern is not particularly specified because it depends on the application to be used, but refers to several tens of nanometers to several tens of micrometers. Further, this scale may be the size, diameter, depth, or pitch of one fine concavo-convex pattern body. Also, a random structure can be one of the fine concavo-convex pattern bodies.

Hereinafter, examples performed for confirming the effects of the present invention will be described.
(Example 1)
The width a of the nip roll was 570 mm, the width b of the transfer roll was 640 mm, and the width c of the film-shaped transfer material was 640 mm. This condition corresponds to the above equation (1). Further, a resin was applied to the film-shaped transfer material with a width of 570 mm. The nip roll was made of ethylene propylene rubber having a rubber hardness of 30 and black.

Then, when the fine concavo-convex pattern formed on the transfer roll was transferred to the resin of the film-shaped transfer material, the coating resin spread on both sides by being pressed by the nip roll was transferred without protruding from the film edge. We were able to.

(Example 2)
The width a of the nip roll was 530 mm, the width b of the transfer roll was 750 mm, and the width c of the film-shaped transfer material was 560 mm. This condition corresponds to the above equation (1). Further, a resin was applied to the film-shaped transfer material with a width of 530 mm. The nip roll was made of ethylene propylene rubber having a rubber hardness of 30 and black.

Then, when the fine concavo-convex pattern formed on the transfer roll was transferred to the resin of the film-shaped transfer material, the coating resin spread on both sides by being pressed by the nip roll was transferred without protruding from the film edge. We were able to.

(Example 3)
The width a of the nip roll was 750 mm, the width b of the transfer roll was 640 mm, and the width c of the film-shaped transfer material was 720 mm. This condition corresponds to the above equation (2). Further, a resin was applied to the film-shaped transfer material with a width of 530 mm. The nip roll was made of ethylene propylene rubber having a rubber hardness of 30 and black.

Then, when the fine concavo-convex pattern formed on the transfer roll was transferred to the resin of the film-shaped transfer material, the coating resin spread on both sides by being pressed by the nip roll was transferred without protruding from the film edge. We were able to.

However, it was found that the resin was accumulated at the end of the transfer roll as the transfer was continued for a long time, and became resin waste at the end of the transfer roll after 6 hours.

From the above, it was found that in this example, the formula (1) or the formula (2) was satisfied, but it is preferable that the formula (1) be satisfied rather than the formula (2).

(Example 4)
The overall width of the nip roll a'(see FIG. 3) was 750 mm, and the width b of the transfer roll was 640 mm. Further, the diameter of both end portions of the nip roll was reduced by 2 mm over a width of 90 mm, and the width a at which the nip roll abuts the transfer roll was set to 570 mm. The width c of the film-shaped transfer material was set to 640 mm. This condition corresponds to the above equation (1). Further, a resin was applied to the film-shaped transfer material with a width of 570 mm. The nip roll was made of ethylene propylene rubber having a rubber hardness of 30 and black.

Then, when the fine concavo-convex pattern formed on the transfer roll was transferred to the resin of the film-shaped transfer material, the coating resin spread on both sides by being pressed by the nip roll was transferred without protruding from the film edge. In addition, it was possible to prevent light leakage from the nip roll.

(Example 5)
The overall width of the nip roll a'(see FIG. 3) was 750 mm, and the width b of the transfer roll was 750 mm. Further, the diameter of both end portions of the nip roll was reduced by 2 mm over the width of 110 mm, and the width a at which the nip roll abuts the transfer roll was set to 530 mm. The width c of the film-shaped transfer material was set to 560 mm. This condition corresponds to the above equation (1). Further, a resin was applied to the film-shaped transfer material with a width of 530 mm. The nip roll was made of ethylene propylene rubber having a rubber hardness of 30 and black.

Then, when the fine concavo-convex pattern formed on the transfer roll was transferred to the resin of the film-shaped transfer material, the coating resin spread on both sides by being pressed by the nip roll was transferred without protruding from the film edge. In addition, it was possible to prevent light leakage from the nip roll.

(Comparative example)
The width a of the nip roll was 570 mm, the width b of the transfer roll was 640 mm, and the width c of the film-shaped transfer material was 550 mm. Further, a resin was applied to the film-shaped transfer material with a width of 530 mm. As the nip roll, a rubber hardness of ethylene propylene rubber of 30 and black was used.

By pressing the entire width of the film-like transfer material with the nip roll, the resin protruded from the end of the film-like transfer material, and adhesion to the nip roll and wraparound to the back surface of the film-like transfer material occurred.

It should be noted that the present invention is not limited to the above-described embodiment, and can be implemented with various modifications. In the above-described embodiment, the size, shape, and the like illustrated in the accompanying drawings are not limited to this, and can be appropriately changed within the range where the effect of the present invention is exhibited.

The present invention can be applied to a method for producing a film-shaped mold for forming a fine concavo-convex pattern, and the obtained film-shaped mold is, for example, production of an antireflection material, production of a resist mask, cell culture medium, It can be suitably applied to super water repellent processing and super hydrophilic processing.

12 Photo-curable resin layer 13, 803, 903 Resin cured product layer 14, 33 Fine concavo-convex pattern 31, 101, 802, 902 Film-shaped substrate 32 Transferred resin layer 100, 200 Manufacturing apparatus 103 First film-shaped mold 105 , 205 coating means 107 transfer rolls 108, 209 pressing means 108a, 108b, 209b, 209c nip rolls 109, 210 light source 112 concave step 203 second film mold 207 laminating means 209a back roll

Claims (4)

A manufacturing method of transferring the fine uneven pattern to a film-shaped material to be transferred, which is sandwiched between a transfer roll having a fine uneven pattern and a nip roll,
The film-shaped transfer material has a photocurable resin layer,
The color of the nip roll is black, the nip roll is provided on the photocurable resin before and after irradiating light from a light source, respectively,
When the width of each nip roll is a, the width of the transfer roll is b, and the width of the film-shaped material to be transferred is c, the following formula (1) or formula (2) holds, and in addition, When the coating width of the photocurable resin layer is W1, W1≦a in the formula (1) and W1≦b in the formula (2) are satisfied,
In a state where the transfer roll and the photocurable resin layer are brought into close contact with each other by the nip roll, the photocurable resin layer is photocured to form a resin cured product layer having the fine concavo-convex pattern transferred to the surface. A method of manufacturing a film-shaped material to be transferred having a fine concavo-convex pattern.
a<b and a<c... (1)
b<a and b<c (2) The method for producing a film-shaped transfer material according to claim 1, wherein the formula (1) is established. It is sandwiched between a transfer roll having a fine concavo-convex pattern and a nip roll, the fine concavo-convex pattern is transferred to a film-shaped material to be transferred having a photocurable resin layer, and the photocurable resin layer is irradiated with light from a light source. A manufacturing apparatus for photocuring the photocurable resin ,
The color of the nip roll is black, the nip roll is provided on the photocurable resin, before and after irradiation with light from the light source, respectively,
The width a of each nip roll and the width b of the transfer roll satisfy the following formula (1) or formula (2), and in addition, when the coating width of the photocurable resin layer is W1, In (1), W1≦a is satisfied, and in the above formula (2), W1≦b is satisfied,
The film-shaped material to be transferred having a photocurable resin layer is brought into close contact with the transfer roll by the nip roll, and the photocurable resin layer is photocured to transfer the fine uneven pattern to the surface. An apparatus for producing a film-shaped transfer material having a fine concavo-convex pattern, which comprises forming a cured resin layer.
a<b and a<c... (1)
b<a and b<c (2)
Here, c is the width of the film-shaped material to be transferred. The entire width a′ of the nip roll is equal to or larger than the width b of the transfer roll, and a step difference is formed at both ends of the nip roll so that the width a of the nip roll that contacts the transfer roll is a. The apparatus for producing a film-shaped material to be transferred having a fine concavo-convex pattern according to claim 3, wherein the expression (1) is defined.

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