JP2016056220A5 - - Google Patents
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- Publication number
- JP2016056220A5 JP2016056220A5 JP2014181015A JP2014181015A JP2016056220A5 JP 2016056220 A5 JP2016056220 A5 JP 2016056220A5 JP 2014181015 A JP2014181015 A JP 2014181015A JP 2014181015 A JP2014181015 A JP 2014181015A JP 2016056220 A5 JP2016056220 A5 JP 2016056220A5
- Authority
- JP
- Japan
- Prior art keywords
- water
- soluble polymer
- slurry composition
- composition according
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920003169 water-soluble polymer Polymers 0.000 claims 12
- 239000002002 slurry Substances 0.000 claims 10
- 238000005498 polishing Methods 0.000 claims 8
- 239000000758 substrate Substances 0.000 claims 5
- 239000004372 Polyvinyl alcohol Substances 0.000 claims 4
- 229920000642 polymer Polymers 0.000 claims 4
- 229920002451 polyvinyl alcohol Polymers 0.000 claims 4
- 125000004423 acyloxy group Chemical group 0.000 claims 2
- 239000001913 cellulose Substances 0.000 claims 2
- 229920002678 cellulose Polymers 0.000 claims 2
- 239000003795 chemical substances by application Substances 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- 229920000233 poly(alkylene oxides) Polymers 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- 239000006061 abrasive grain Substances 0.000 claims 1
- 238000004140 cleaning Methods 0.000 claims 1
- 239000003002 pH adjusting agent Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014181015A JP6559936B2 (ja) | 2014-09-05 | 2014-09-05 | スラリー組成物、リンス組成物、基板研磨方法およびリンス方法 |
KR1020177008862A KR102524838B1 (ko) | 2014-09-05 | 2015-09-04 | 슬러리 조성물, 린스 조성물, 기판 연마 방법 및 린스 방법 |
TW104129403A TWI633178B (zh) | 2014-09-05 | 2015-09-04 | 漿液組合物、清洗組合物、基板拋光方法及清洗方法 |
PCT/JP2015/004504 WO2016035346A1 (en) | 2014-09-05 | 2015-09-04 | Slurry composition, rinse composition, substrate polishing method and rinsing method |
CN201580047704.7A CN107075309B (zh) | 2014-09-05 | 2015-09-04 | 浆料组合物、漂洗组合物、基板抛光方法以及漂洗方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014181015A JP6559936B2 (ja) | 2014-09-05 | 2014-09-05 | スラリー組成物、リンス組成物、基板研磨方法およびリンス方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2016056220A JP2016056220A (ja) | 2016-04-21 |
JP2016056220A5 true JP2016056220A5 (zh) | 2017-10-19 |
JP6559936B2 JP6559936B2 (ja) | 2019-08-14 |
Family
ID=54197031
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014181015A Active JP6559936B2 (ja) | 2014-09-05 | 2014-09-05 | スラリー組成物、リンス組成物、基板研磨方法およびリンス方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6559936B2 (zh) |
KR (1) | KR102524838B1 (zh) |
CN (1) | CN107075309B (zh) |
TW (1) | TWI633178B (zh) |
WO (1) | WO2016035346A1 (zh) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6801964B2 (ja) * | 2016-01-19 | 2020-12-16 | 株式会社フジミインコーポレーテッド | 研磨用組成物及びシリコン基板の研磨方法 |
JP6971676B2 (ja) * | 2016-08-29 | 2021-11-24 | 株式会社荏原製作所 | 基板処理装置および基板処理方法 |
EP3508550A4 (en) * | 2016-08-31 | 2020-03-25 | Fujimi Incorporated | POLISHING COMPOSITION AND POLISHING COMPOSITION SET |
JP6495230B2 (ja) * | 2016-12-22 | 2019-04-03 | 花王株式会社 | シリコンウェーハ用リンス剤組成物 |
CN110023449B (zh) * | 2016-12-28 | 2021-08-17 | 霓达杜邦股份有限公司 | 研磨用组合物和研磨方法 |
KR20190098142A (ko) * | 2016-12-28 | 2019-08-21 | 니타 하스 인코포레이티드 | 연마용 조성물 |
WO2019187969A1 (ja) * | 2018-03-30 | 2019-10-03 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
JP7361467B2 (ja) * | 2018-12-25 | 2023-10-16 | ニッタ・デュポン株式会社 | 研磨用組成物 |
JP2020203980A (ja) * | 2019-06-17 | 2020-12-24 | 日本キャボット・マイクロエレクトロニクス株式会社 | 化学機械研磨組成物、リンス組成物、化学機械研磨方法及びリンス方法 |
CN112457930A (zh) * | 2019-09-06 | 2021-03-09 | 福吉米株式会社 | 表面处理组合物、表面处理组合物的制造方法、表面处理方法和半导体基板的制造方法 |
CN115873508A (zh) * | 2022-12-26 | 2023-03-31 | 博力思(天津)电子科技有限公司 | 去除速率高且表面粗糙度低的SiC衬底抛光液及抛光工艺 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11140427A (ja) * | 1997-11-13 | 1999-05-25 | Kobe Steel Ltd | 研磨液および研磨方法 |
US6503418B2 (en) * | 1999-11-04 | 2003-01-07 | Advanced Micro Devices, Inc. | Ta barrier slurry containing an organic additive |
JP4668528B2 (ja) * | 2003-09-05 | 2011-04-13 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
JP2006005246A (ja) * | 2004-06-18 | 2006-01-05 | Fujimi Inc | リンス用組成物及びそれを用いたリンス方法 |
KR20130041084A (ko) * | 2010-06-18 | 2013-04-24 | 히타치가세이가부시끼가이샤 | 반도체 기판용 연마액 및 반도체 웨이퍼의 제조 방법 |
KR101970858B1 (ko) * | 2012-03-14 | 2019-04-19 | 가부시키가이샤 후지미인코퍼레이티드 | 연마용 조성물 및 반도체 기판의 제조 방법 |
EP2858096B1 (en) * | 2012-05-25 | 2017-01-11 | Nissan Chemical Industries, Ltd. | Polishing solution composition for wafers |
JP2014038906A (ja) * | 2012-08-13 | 2014-02-27 | Fujimi Inc | 研磨用組成物、当該研磨用組成物の製造方法、及び当該研磨用組成物を用いた半導体基板の製造方法 |
JP5893706B2 (ja) * | 2013-10-25 | 2016-03-23 | 花王株式会社 | シリコンウェーハ用研磨液組成物 |
-
2014
- 2014-09-05 JP JP2014181015A patent/JP6559936B2/ja active Active
-
2015
- 2015-09-04 WO PCT/JP2015/004504 patent/WO2016035346A1/en active Application Filing
- 2015-09-04 KR KR1020177008862A patent/KR102524838B1/ko active IP Right Grant
- 2015-09-04 TW TW104129403A patent/TWI633178B/zh active
- 2015-09-04 CN CN201580047704.7A patent/CN107075309B/zh active Active
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