WO2016045536A3 - 一种金刚石抛光膜制备方法 - Google Patents

一种金刚石抛光膜制备方法 Download PDF

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Publication number
WO2016045536A3
WO2016045536A3 PCT/CN2015/089912 CN2015089912W WO2016045536A3 WO 2016045536 A3 WO2016045536 A3 WO 2016045536A3 CN 2015089912 W CN2015089912 W CN 2015089912W WO 2016045536 A3 WO2016045536 A3 WO 2016045536A3
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WO
WIPO (PCT)
Prior art keywords
polishing film
diamond
preparation
diamond powder
film
Prior art date
Application number
PCT/CN2015/089912
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English (en)
French (fr)
Other versions
WO2016045536A2 (zh
Inventor
汪静
堀江祐二
Original Assignee
河南省联合磨料磨具有限公司
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Application filed by 河南省联合磨料磨具有限公司 filed Critical 河南省联合磨料磨具有限公司
Publication of WO2016045536A2 publication Critical patent/WO2016045536A2/zh
Publication of WO2016045536A3 publication Critical patent/WO2016045536A3/zh

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0072Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using adhesives for bonding abrasive particles or grinding elements to a support, e.g. by gluing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

一种金刚石抛光膜制备方法,包括将金刚石微粉分散到粘合剂中然后涂覆于基膜表面的步骤,分散前先对金刚石微粉进行水洗,直到水洗液的PH值达到6.0以上。通过水洗控制金刚石表面的PH值处于近中性或中性,能够大幅度提升金刚石微粉与粘合剂的结合牢度,使用过程中抛光膜上的金刚石微粉不易脱落,抛光膜的使用寿命得以延长。
PCT/CN2015/089912 2014-09-26 2015-09-18 一种金刚石抛光膜制备方法 WO2016045536A2 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201410500221.5A CN104275651A (zh) 2014-09-26 2014-09-26 一种金刚石抛光膜制备方法
CN201410500221.5 2014-09-26

Publications (2)

Publication Number Publication Date
WO2016045536A2 WO2016045536A2 (zh) 2016-03-31
WO2016045536A3 true WO2016045536A3 (zh) 2016-05-19

Family

ID=52251249

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2015/089912 WO2016045536A2 (zh) 2014-09-26 2015-09-18 一种金刚石抛光膜制备方法

Country Status (2)

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CN (1) CN104275651A (zh)
WO (1) WO2016045536A2 (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104275651A (zh) * 2014-09-26 2015-01-14 河南省联合磨料磨具有限公司 一种金刚石抛光膜制备方法
CN108927740A (zh) * 2018-08-03 2018-12-04 柴德维 一种研磨片及其制备方法
CN108994720A (zh) * 2018-08-03 2018-12-14 柴德维 高稳定性研磨片及其制备方法
CN108994721A (zh) * 2018-08-03 2018-12-14 柴德维 具有优异稳定性的研磨机
CN108942637A (zh) * 2018-08-03 2018-12-07 柴德维 一种具有优异稳定性的研磨机
CN109015340A (zh) * 2018-08-04 2018-12-18 乔斌 耐磨损研磨机
CN108908142A (zh) * 2018-08-04 2018-11-30 乔斌 耐磨损研磨机

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US20030171078A1 (en) * 2002-03-06 2003-09-11 Fuji Photo Film Co., Ltd. Polishing member and method for polishing end faces of optical fibers
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CN100535070C (zh) * 2007-05-17 2009-09-02 中国地质大学(武汉) 一种高纯度纳米金刚石抛光膏及其制备方法
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Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10106988A (ja) * 1996-09-30 1998-04-24 Hitachi Chem Co Ltd 酸化セリウム研磨剤及び基板の研磨法
JP2000114211A (ja) * 1998-08-05 2000-04-21 Showa Denko Kk Lsiデバイス研磨用研磨材組成物及び研磨方法
CN1376726A (zh) * 2001-03-22 2002-10-30 王振国 一种抛光膜及其制备方法
CN1332219A (zh) * 2001-08-23 2002-01-23 刘麒荣 超精研磨剂及其制备工艺
CN1940003A (zh) * 2005-09-27 2007-04-04 耐博检测技术(上海)有限公司 水基金刚石抛光液及其制备方法
CN101033374A (zh) * 2007-04-13 2007-09-12 中国地质大学(武汉) 一种高纯度纳米金刚石抛光液及其制备方法
CN101225281A (zh) * 2007-12-17 2008-07-23 河南省联合磨料磨具有限公司 一种抛光膜及其制备方法
CN101817172A (zh) * 2010-04-12 2010-09-01 南京航空航天大学 基于热引发固化的固结磨料研磨抛光垫及其制备方法
CN101831243A (zh) * 2010-04-30 2010-09-15 中国计量学院 高精密非水基纳米级金刚石研磨液、制备方法及用途
CN104275651A (zh) * 2014-09-26 2015-01-14 河南省联合磨料磨具有限公司 一种金刚石抛光膜制备方法

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WO2016045536A2 (zh) 2016-03-31
CN104275651A (zh) 2015-01-14

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