WO2016045536A3 - 一种金刚石抛光膜制备方法 - Google Patents
一种金刚石抛光膜制备方法 Download PDFInfo
- Publication number
- WO2016045536A3 WO2016045536A3 PCT/CN2015/089912 CN2015089912W WO2016045536A3 WO 2016045536 A3 WO2016045536 A3 WO 2016045536A3 CN 2015089912 W CN2015089912 W CN 2015089912W WO 2016045536 A3 WO2016045536 A3 WO 2016045536A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- polishing film
- diamond
- preparation
- diamond powder
- film
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
- B24D18/0072—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using adhesives for bonding abrasive particles or grinding elements to a support, e.g. by gluing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
一种金刚石抛光膜制备方法,包括将金刚石微粉分散到粘合剂中然后涂覆于基膜表面的步骤,分散前先对金刚石微粉进行水洗,直到水洗液的PH值达到6.0以上。通过水洗控制金刚石表面的PH值处于近中性或中性,能够大幅度提升金刚石微粉与粘合剂的结合牢度,使用过程中抛光膜上的金刚石微粉不易脱落,抛光膜的使用寿命得以延长。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410500221.5A CN104275651A (zh) | 2014-09-26 | 2014-09-26 | 一种金刚石抛光膜制备方法 |
CN201410500221.5 | 2014-09-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2016045536A2 WO2016045536A2 (zh) | 2016-03-31 |
WO2016045536A3 true WO2016045536A3 (zh) | 2016-05-19 |
Family
ID=52251249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CN2015/089912 WO2016045536A2 (zh) | 2014-09-26 | 2015-09-18 | 一种金刚石抛光膜制备方法 |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN104275651A (zh) |
WO (1) | WO2016045536A2 (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104275651A (zh) * | 2014-09-26 | 2015-01-14 | 河南省联合磨料磨具有限公司 | 一种金刚石抛光膜制备方法 |
CN108927740A (zh) * | 2018-08-03 | 2018-12-04 | 柴德维 | 一种研磨片及其制备方法 |
CN108994720A (zh) * | 2018-08-03 | 2018-12-14 | 柴德维 | 高稳定性研磨片及其制备方法 |
CN108994721A (zh) * | 2018-08-03 | 2018-12-14 | 柴德维 | 具有优异稳定性的研磨机 |
CN108942637A (zh) * | 2018-08-03 | 2018-12-07 | 柴德维 | 一种具有优异稳定性的研磨机 |
CN109015340A (zh) * | 2018-08-04 | 2018-12-18 | 乔斌 | 耐磨损研磨机 |
CN108908142A (zh) * | 2018-08-04 | 2018-11-30 | 乔斌 | 耐磨损研磨机 |
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JPH10106988A (ja) * | 1996-09-30 | 1998-04-24 | Hitachi Chem Co Ltd | 酸化セリウム研磨剤及び基板の研磨法 |
JP2000114211A (ja) * | 1998-08-05 | 2000-04-21 | Showa Denko Kk | Lsiデバイス研磨用研磨材組成物及び研磨方法 |
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CN1376726A (zh) * | 2001-03-22 | 2002-10-30 | 王振国 | 一种抛光膜及其制备方法 |
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CN101033374A (zh) * | 2007-04-13 | 2007-09-12 | 中国地质大学(武汉) | 一种高纯度纳米金刚石抛光液及其制备方法 |
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CN101817172A (zh) * | 2010-04-12 | 2010-09-01 | 南京航空航天大学 | 基于热引发固化的固结磨料研磨抛光垫及其制备方法 |
CN101831243A (zh) * | 2010-04-30 | 2010-09-15 | 中国计量学院 | 高精密非水基纳米级金刚石研磨液、制备方法及用途 |
CN104275651A (zh) * | 2014-09-26 | 2015-01-14 | 河南省联合磨料磨具有限公司 | 一种金刚石抛光膜制备方法 |
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JP2001115146A (ja) * | 1999-10-18 | 2001-04-24 | Tokuyama Corp | バリア膜用研磨剤 |
US20030171078A1 (en) * | 2002-03-06 | 2003-09-11 | Fuji Photo Film Co., Ltd. | Polishing member and method for polishing end faces of optical fibers |
CN100357342C (zh) * | 2002-06-14 | 2007-12-26 | 北京国瑞升科技有限公司 | 一种超精密抛光膜及其制造方法 |
CN100535070C (zh) * | 2007-05-17 | 2009-09-02 | 中国地质大学(武汉) | 一种高纯度纳米金刚石抛光膏及其制备方法 |
TW201102345A (en) * | 2009-07-03 | 2011-01-16 | Kinik Co | An abrasive tool possesses modified diamond abrasive particles and manufacture method thereof |
CN101966694B (zh) * | 2010-10-15 | 2012-03-28 | 江苏省新型复合研磨材料及制品工程技术研究中心 | 高效能弹性复合研磨片及其制备方法 |
CN102757044B (zh) * | 2012-07-23 | 2013-06-05 | 河南省联合磨料磨具有限公司 | 高切削力金刚石微粉及其制备方法 |
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2014
- 2014-09-26 CN CN201410500221.5A patent/CN104275651A/zh active Pending
-
2015
- 2015-09-18 WO PCT/CN2015/089912 patent/WO2016045536A2/zh active Application Filing
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10106988A (ja) * | 1996-09-30 | 1998-04-24 | Hitachi Chem Co Ltd | 酸化セリウム研磨剤及び基板の研磨法 |
JP2000114211A (ja) * | 1998-08-05 | 2000-04-21 | Showa Denko Kk | Lsiデバイス研磨用研磨材組成物及び研磨方法 |
CN1376726A (zh) * | 2001-03-22 | 2002-10-30 | 王振国 | 一种抛光膜及其制备方法 |
CN1332219A (zh) * | 2001-08-23 | 2002-01-23 | 刘麒荣 | 超精研磨剂及其制备工艺 |
CN1940003A (zh) * | 2005-09-27 | 2007-04-04 | 耐博检测技术(上海)有限公司 | 水基金刚石抛光液及其制备方法 |
CN101033374A (zh) * | 2007-04-13 | 2007-09-12 | 中国地质大学(武汉) | 一种高纯度纳米金刚石抛光液及其制备方法 |
CN101225281A (zh) * | 2007-12-17 | 2008-07-23 | 河南省联合磨料磨具有限公司 | 一种抛光膜及其制备方法 |
CN101817172A (zh) * | 2010-04-12 | 2010-09-01 | 南京航空航天大学 | 基于热引发固化的固结磨料研磨抛光垫及其制备方法 |
CN101831243A (zh) * | 2010-04-30 | 2010-09-15 | 中国计量学院 | 高精密非水基纳米级金刚石研磨液、制备方法及用途 |
CN104275651A (zh) * | 2014-09-26 | 2015-01-14 | 河南省联合磨料磨具有限公司 | 一种金刚石抛光膜制备方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2016045536A2 (zh) | 2016-03-31 |
CN104275651A (zh) | 2015-01-14 |
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