JP2016046533A5 - - Google Patents
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- Publication number
- JP2016046533A5 JP2016046533A5 JP2015162941A JP2015162941A JP2016046533A5 JP 2016046533 A5 JP2016046533 A5 JP 2016046533A5 JP 2015162941 A JP2015162941 A JP 2015162941A JP 2015162941 A JP2015162941 A JP 2015162941A JP 2016046533 A5 JP2016046533 A5 JP 2016046533A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- coating
- semiconductor
- oxidation
- process according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/464,748 | 2014-08-21 | ||
| US14/464,748 US9340880B2 (en) | 2009-10-27 | 2014-08-21 | Semiconductor fabrication process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016046533A JP2016046533A (ja) | 2016-04-04 |
| JP2016046533A5 true JP2016046533A5 (enExample) | 2020-01-09 |
Family
ID=53776472
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015162941A Pending JP2016046533A (ja) | 2014-08-21 | 2015-08-20 | 半導体製造工程 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP2988327A1 (enExample) |
| JP (1) | JP2016046533A (enExample) |
| KR (1) | KR20160028358A (enExample) |
| CN (1) | CN105390371A (enExample) |
| SG (1) | SG10201506024WA (enExample) |
| TW (1) | TWI659121B (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3954804A1 (de) | 2020-08-14 | 2022-02-16 | Siltronic AG | Vorrichtung und verfahren zum abscheiden einer schicht aus halbleitermaterial auf einer substratscheibe |
| WO2024162361A1 (ja) * | 2023-02-03 | 2024-08-08 | ジーエルサイエンス株式会社 | 保護膜とその製造方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4560589A (en) * | 1982-09-22 | 1985-12-24 | Shin-Etsu Chemical Co., Ltd. | Method for providing a coating layer of silicon carbide on substrate surface |
| JP4166346B2 (ja) * | 1997-10-27 | 2008-10-15 | 日本碍子株式会社 | 耐蝕性部材、耐蝕性部材の製造方法および腐食性物質の加熱装置 |
| US6444326B1 (en) | 1999-03-05 | 2002-09-03 | Restek Corporation | Surface modification of solid supports through the thermal decomposition and functionalization of silanes |
| EP1462540B1 (en) * | 2001-12-03 | 2012-03-07 | Nippon Sheet Glass Company, Limited | Method for forming thin film. |
| US9612215B2 (en) * | 2004-07-22 | 2017-04-04 | Toyo Tanso Co., Ltd. | Susceptor |
| WO2009032488A1 (en) * | 2007-08-28 | 2009-03-12 | International Business Machines Corporation | Improved low k porous sicoh dielectric and integration with post film formation treatment |
| CN101318821A (zh) * | 2007-11-30 | 2008-12-10 | 中国人民解放军国防科学技术大学 | 一种含铪的SiC陶瓷先驱体的制备方法 |
| JP5735522B2 (ja) * | 2009-10-27 | 2015-06-17 | シルコテック コーポレイション | 化学気相成長コーティング、物品、及び方法 |
| KR101512579B1 (ko) * | 2010-10-05 | 2015-04-15 | 실코텍 코포레이션 | 내마모성 코팅, 물건 및 방법 |
| CN102120822B (zh) * | 2011-04-02 | 2012-05-02 | 中国人民解放军国防科学技术大学 | 一种常压合成聚碳硅烷的方法 |
-
2015
- 2015-07-31 SG SG10201506024WA patent/SG10201506024WA/en unknown
- 2015-08-04 EP EP15179688.5A patent/EP2988327A1/en not_active Withdrawn
- 2015-08-11 TW TW104126087A patent/TWI659121B/zh active
- 2015-08-19 KR KR1020150116889A patent/KR20160028358A/ko not_active Withdrawn
- 2015-08-20 JP JP2015162941A patent/JP2016046533A/ja active Pending
- 2015-08-21 CN CN201510520640.XA patent/CN105390371A/zh active Pending
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