JP2016034689A - Polishing pad - Google Patents
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- JP2016034689A JP2016034689A JP2014158946A JP2014158946A JP2016034689A JP 2016034689 A JP2016034689 A JP 2016034689A JP 2014158946 A JP2014158946 A JP 2014158946A JP 2014158946 A JP2014158946 A JP 2014158946A JP 2016034689 A JP2016034689 A JP 2016034689A
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Abstract
Description
本発明は、研磨パッドに関する。 The present invention relates to a polishing pad.
板ガラス等の被研磨物の表面における平滑性は、被研磨物の表面を研磨パッドを用いて研磨することで高められる。研磨パッドを用いて被研磨物を研磨するには、回転している研磨パッドを、被研磨物の表面に当接する。このとき、研磨パッドと、被研磨物との間には、研磨用スラリーが供給され、その研磨用スラリーに含まれる研磨材により被研磨物の表面が研磨される。こうした研磨パッドは、基材層と、被研磨物に接触される研磨層とを有している。特許文献１には、研磨用スラリーの滞留を抑制するように、研磨層（特許文献１の「研磨パッド」に相当）に溝又は間隙を設けた構成が開示されている。 The smoothness of the surface of an object to be polished such as plate glass can be enhanced by polishing the surface of the object to be polished with a polishing pad. In order to polish an object to be polished using the polishing pad, the rotating polishing pad is brought into contact with the surface of the object to be polished. At this time, a polishing slurry is supplied between the polishing pad and the object to be polished, and the surface of the object to be polished is polished by the abrasive contained in the polishing slurry. Such a polishing pad has a base material layer and a polishing layer in contact with an object to be polished. Patent Document 1 discloses a configuration in which a groove or a gap is provided in a polishing layer (corresponding to “polishing pad” in Patent Document 1) so as to suppress the retention of polishing slurry.
ところで、研磨パッドが被研磨物に押し当てられた際には、研磨パッドの突出部における先端面が被研磨物に押圧される。そして、研磨パッドと被研磨物とが相対回転すると、研磨パッドの突出部は、被研磨物に対する進行方向とは反対側に撓むように変形する。このとき、研磨パッドの突出部における側面については、被研磨物に当接されたとしても先端面と側面との境界部分であるエッジに圧力が集中し易い。すなわち、従来の研磨パッドでは、突出部の側面を利用した有効な研磨が行われ難く、研磨の効率を高めるという観点から、研磨パッドの有する突出部の形状について未だ改善の余地がある。 By the way, when the polishing pad is pressed against the object to be polished, the tip surface of the protruding portion of the polishing pad is pressed against the object to be polished. When the polishing pad and the object to be polished are relatively rotated, the protrusion of the polishing pad is deformed so as to bend in the direction opposite to the traveling direction with respect to the object to be polished. At this time, with respect to the side surface of the protruding portion of the polishing pad, even if it contacts the object to be polished, the pressure tends to concentrate on the edge that is the boundary portion between the tip surface and the side surface. That is, in the conventional polishing pad, it is difficult to perform effective polishing using the side surface of the protruding portion, and there is still room for improvement in the shape of the protruding portion of the polishing pad from the viewpoint of increasing the polishing efficiency.
本発明は、こうした実情に鑑みてなされたものであり、その目的は、研磨の効率を高めることの容易な研磨パッドを提供することにある。 The present invention has been made in view of such circumstances, and an object of the present invention is to provide a polishing pad that can easily increase the efficiency of polishing.
上記課題を解決する研磨パッドは、基材層と前記基材層の主面に積層された研磨層とを有してなり、被研磨物との相対回転により前記被研磨物を研磨する研磨パッドであって、前記研磨層は、突出部を備え、前記突出部は、前記基材層の主面に平行な先端面と、その先端面に連なるとともに前記基材層の主面に対する角度が鋭角となる傾斜面と、を有し、前記傾斜面は、前記相対回転の方向とは異なる方向に延在している。 A polishing pad for solving the above problems comprises a base material layer and a polishing layer laminated on the main surface of the base material layer, and polishes the object to be polished by relative rotation with the object to be polished. The polishing layer includes a projecting portion, and the projecting portion is connected to the front end surface parallel to the main surface of the base material layer and the front end surface and has an acute angle with respect to the main surface of the base material layer. And the inclined surface extends in a direction different from the direction of the relative rotation.
上記突出部は、その傾斜面が先頭になって被研磨物に対して進行するように研磨パッドと被研磨物とが相対回転されると、傾斜面（突出部の一側面）が被研磨物に好適に押圧される。このように、研磨パッドの研磨層における突出部の一側面が被研磨物の研磨に利用され易くなる。 When the polishing pad and the object to be polished are rotated relative to each other so that the inclined surface is advanced with respect to the object to be polished, the inclined surface (one side surface of the protrusion) is the object to be polished. Is suitably pressed. Thus, one side surface of the protruding portion of the polishing layer of the polishing pad is easily used for polishing the object to be polished.
上記研磨パッドにおいて、前記傾斜面の反対側に位置する前記突出部の側面は、前記基材層の主面に対して前記傾斜面の角度よりも大きい角度を有することが好ましい。
上記突出部において、傾斜面の反対側に位置する側面の角度が傾斜面の角度よりも小さい場合、傾斜面が倒れる方向（傾斜面の角度が小さくなる方向）に突出部が変形され難くなるため、被研磨物と傾斜面との接触面積が小さくなるおそれがある。この点、上記構成によれば、傾斜面が倒れる方向に突出部が変形され易くなるため、被研磨物と傾斜面の接触面積が大きくなり、上記突出部の一側面が被研磨物の研磨にさらに有効に利用され易くなる。
In the polishing pad, it is preferable that a side surface of the protruding portion located on the opposite side of the inclined surface has an angle larger than an angle of the inclined surface with respect to a main surface of the base material layer.
In the above protrusion, when the angle of the side surface located on the opposite side of the inclined surface is smaller than the angle of the inclined surface, it is difficult for the protruding portion to be deformed in the direction in which the inclined surface falls (the direction in which the angle of the inclined surface decreases). The contact area between the object to be polished and the inclined surface may be small. In this regard, according to the above configuration, since the protruding portion is easily deformed in the direction in which the inclined surface falls, the contact area between the object to be polished and the inclined surface is increased, and one side surface of the protruding portion is used for polishing the object to be polished. Furthermore, it becomes easy to use effectively.
上記研磨パッドにおいて、前記傾斜面の反対側に位置する前記突出部の側面の角度は、前記基材層の主面に対して直角又は鋭角であることが好ましい。
上記突出部において、傾斜面の反対側に位置する側面の角度が鈍角の場合、傾斜面が倒れる方向に突出部が過剰に変形するおそれがある。この点、上記構成によれば、傾斜面が倒れる方向への突出部の過剰な変形が抑制されるとともに、突出部の弾性力が得られ易くなるため、被研磨物に対する傾斜面の押圧力が得られ易くなる。これにより、上記突出部の一側面が被研磨物の研磨にさらに有効に利用され易くなる。
In the polishing pad, it is preferable that an angle of a side surface of the protruding portion located on the opposite side of the inclined surface is a right angle or an acute angle with respect to a main surface of the base material layer.
In the protrusion, when the angle of the side surface located on the opposite side of the inclined surface is an obtuse angle, the protrusion may be excessively deformed in the direction in which the inclined surface falls. In this respect, according to the configuration described above, excessive deformation of the protruding portion in the direction in which the inclined surface falls is suppressed, and the elastic force of the protruding portion is easily obtained. It becomes easy to obtain. As a result, one side surface of the protruding portion is more effectively used for polishing the workpiece.
上記研磨パッドにおいて、前記突出部は、前記傾斜面が延在する方向において離間された複数の突出部から構成されていることが好ましい。
この構成によれば、研磨用スラリーの流通路が好適に確保される。
In the polishing pad, it is preferable that the protrusion is composed of a plurality of protrusions that are separated in a direction in which the inclined surface extends.
According to this configuration, the flow path for the polishing slurry is suitably secured.
上記研磨パッドは、前記基材層は、金属層と、前記研磨層の突出部よりも圧縮変形し易い弾性層とを備え、前記弾性層に前記研磨層が積層されてなることが好ましい。
この構成によれば、研磨パッドの突出部は、被研磨物の表面に追従し易くなる。
In the polishing pad, it is preferable that the base material layer includes a metal layer and an elastic layer that is more easily compressed and deformed than a protruding portion of the polishing layer, and the polishing layer is laminated on the elastic layer.
According to this configuration, the protrusion of the polishing pad can easily follow the surface of the object to be polished.
本発明によれば、研磨の効率を高めることが容易となる。 According to the present invention, it becomes easy to increase the efficiency of polishing.
以下、研磨パッドの一実施形態について図面を参照して説明する。なお、図面では、説明の便宜上、構成の一部を誇張して示す場合がある。また、各部分の寸法比率についても、実際と異なる場合がある。 Hereinafter, an embodiment of a polishing pad will be described with reference to the drawings. Note that in the drawings, some of the components may be exaggerated for convenience of explanation. Further, the dimensional ratio of each part may be different from the actual one.
図１及び図２に示すように、研磨パッド１１は、円形状の内周端１１ａと、同じく円形状の外周端１１ｂとを有し、基材層１２と、基材層１２の主面ＰＳに積層された研磨層１３とを有している。研磨パッド１１は、被研磨物との相対回転により被研磨物を研磨する用途に用いられる。 As shown in FIGS. 1 and 2, the polishing pad 11 has a circular inner peripheral end 11 a and a circular outer peripheral end 11 b, a base layer 12, and a main surface PS of the base layer 12. And a polishing layer 13 laminated on the substrate. The polishing pad 11 is used for the purpose of polishing the object to be polished by relative rotation with the object to be polished.
＜基材層＞
図２に示すように、研磨パッド１１の基材層１２は、金属層１２ａと、研磨層１３よりも圧縮変形し易い弾性層１２ｂとを備えている。金属層１２ａは、例えば、アルミニウム、ステンレス鋼等から構成される。弾性層１２ｂは、ゴム又はエラストマーから構成される。弾性層１２ｂは、非発泡体であってもよいし発泡体であってもよい。金属層１２ａと弾性層１２ｂとは図示を省略した接着層を介して接着されている。
<Base material layer>
As shown in FIG. 2, the base material layer 12 of the polishing pad 11 includes a metal layer 12 a and an elastic layer 12 b that is easier to compress and deform than the polishing layer 13. The metal layer 12a is made of, for example, aluminum or stainless steel. The elastic layer 12b is made of rubber or elastomer. The elastic layer 12b may be a non-foamed body or a foamed body. The metal layer 12a and the elastic layer 12b are bonded via an adhesive layer (not shown).
＜研磨層＞
研磨パッド１１の研磨層１３は、弾性層１２ｂに積層されている。研磨層１３は、弾性層１２ｂに支持される平板状の支持部１４と、この支持部１４から突出する複数の突出部１５とを備えている。支持部１４と複数の突出部１５とは、ウレタンゴム等の弾性材料から一体に構成されている。研磨層１３と弾性層１２ｂ（基材層１２）とは図示を省略した接着層を介して接着されている。
<Polishing layer>
The polishing layer 13 of the polishing pad 11 is laminated on the elastic layer 12b. The polishing layer 13 includes a flat plate-like support portion 14 supported by the elastic layer 12 b and a plurality of protrusion portions 15 protruding from the support portion 14. The support portion 14 and the plurality of protruding portions 15 are integrally formed from an elastic material such as urethane rubber. The polishing layer 13 and the elastic layer 12b (base material layer 12) are bonded via an adhesive layer (not shown).
研磨層１３の各突出部１５は、基材層１２（弾性層１２ｂ）の主面ＰＳに平行な先端面１５ａと、その先端面１５ａに連なる第１側面１５ｂと、その第１側面１５ｂの反対側の面である第２側面１５ｃとを有している。第１側面１５ｂ及び第２側面１５ｃは、図１に矢印で示す相対回転の方向ＲＤ（研磨パッド１１の周方向）と異なる方向に延在している。なお、各突出部１５の先端面１５ａは、基材層１２の主面ＰＳの状態や研磨層１３の寸法誤差により、例えば、±５°以内の程度の角度で傾斜していてもよい。 Each protrusion 15 of the polishing layer 13 includes a front end surface 15a parallel to the main surface PS of the base material layer 12 (elastic layer 12b), a first side surface 15b continuous with the front end surface 15a, and the opposite of the first side surface 15b. And a second side surface 15c which is a side surface. The first side surface 15b and the second side surface 15c extend in a direction different from the relative rotation direction RD (circumferential direction of the polishing pad 11) indicated by an arrow in FIG. In addition, the front end surface 15a of each protrusion 15 may be inclined at an angle of about ± 5 °, for example, depending on the state of the main surface PS of the base material layer 12 and the dimensional error of the polishing layer 13.
図１に示すように、本実施形態の研磨パッド１１は、各突出部１５の延在する方向（第１側面１５ｂ及び第２側面１５ｃの延在する方向）が異なる複数の領域を有している。詳述すると、研磨パッド１１は、研磨層１３の平面視において、中心角を６０°として６等分した扇形の領域であって、図１における時計回りの順で領域Ａ１，Ａ２，Ａ３，Ａ４，Ａ５，Ａ６に区分される。領域Ａ１と領域Ａ４、領域Ａ２と領域Ａ５、及び領域Ａ３と領域Ａ６は、研磨パッド１１の平面視において、それぞれ対向して配置されている。領域Ａ１，Ａ４における各突出部１５は、図１の上下方向を基準の径方向Ｄ１とした場合、その径方向Ｄ１に沿って延在している。領域Ａ２，Ａ５における各突出部１５は、径方向Ｄ１から時計回りに６０°回転した径方向Ｄ２に沿って延在している。領域Ａ３，Ａ６における各突出部１５は、径方向Ｄ１から時計回りに１２０°回転した径方向Ｄ３に沿って延在している。 As shown in FIG. 1, the polishing pad 11 according to the present embodiment has a plurality of regions in which the protruding portions 15 extend in different directions (directions in which the first side surface 15 b and the second side surface 15 c extend). Yes. More specifically, the polishing pad 11 is a fan-shaped region divided into six equal parts with a central angle of 60 ° in the plan view of the polishing layer 13, and the regions A1, A2, A3, A4 in the clockwise order in FIG. , A5, A6. The region A1 and the region A4, the region A2 and the region A5, and the region A3 and the region A6 are arranged to face each other in a plan view of the polishing pad 11. Each protrusion 15 in the regions A1 and A4 extends along the radial direction D1 when the vertical direction in FIG. 1 is the reference radial direction D1. Each protrusion 15 in the areas A2 and A5 extends along the radial direction D2 rotated 60 ° clockwise from the radial direction D1. Each protrusion 15 in the regions A3 and A6 extends along the radial direction D3 rotated 120 ° clockwise from the radial direction D1.
領域Ａ１，Ａ４における突出部１５は、径方向Ｄ１において離間された複数の突出部１５から構成されている。領域Ａ２，Ａ５、及び領域Ａ３，Ａ６における突出部１５についても、それぞれ径方向Ｄ２、及び径方向Ｄ３において離間された複数の突出部１５から構成されている。 The protrusions 15 in the regions A1 and A4 are composed of a plurality of protrusions 15 that are separated in the radial direction D1. The protrusions 15 in the regions A2 and A5 and the regions A3 and A6 are also composed of a plurality of protrusions 15 that are separated in the radial direction D2 and the radial direction D3, respectively.
また、領域Ａ１，Ａ４における突出部１５は、径方向Ｄ１と直交する方向において離間された複数の突出部１５から構成されている。領域Ａ２，Ａ５、及び領域Ａ３，Ａ６における突出部１５についても、それぞれ径方向Ｄ２と直交する方向、及び径方向Ｄ３に直交する方向において離間された複数の突出部１５から構成されている。 The protrusions 15 in the regions A1 and A4 are composed of a plurality of protrusions 15 that are separated in a direction orthogonal to the radial direction D1. The protrusions 15 in the regions A2 and A5 and the regions A3 and A6 are also composed of a plurality of protrusions 15 that are separated in the direction orthogonal to the radial direction D2 and in the direction orthogonal to the radial direction D3, respectively.
次に、研磨層１３における各突出部１５の詳細について説明する。
図２に示すように、各突出部１５の第１側面１５ｂは、基材層１２の主面ＰＳに対する角度である第１角度θ１が鋭角となる傾斜面ＴＳから構成されている。
Next, the details of each protrusion 15 in the polishing layer 13 will be described.
As shown in FIG. 2, the first side surface 15 b of each projecting portion 15 is composed of an inclined surface TS in which a first angle θ <b> 1 that is an angle with respect to the main surface PS of the base material layer 12 is an acute angle.
この第１角度θ１は、８０°以下であることが好ましく、より好ましくは７０°以下であり、さらに好ましくは６０°以下である。この第１角度θ１は、１０°以上であることが好ましく、より好ましくは２０°以上であり、さらに好ましくは３０°以上である。また、各突出部１５の傾斜面ＴＳは、先端面１５ａの面積よりも広い面積を有することが好ましい。 The first angle θ1 is preferably 80 ° or less, more preferably 70 ° or less, and further preferably 60 ° or less. The first angle θ1 is preferably 10 ° or more, more preferably 20 ° or more, and further preferably 30 ° or more. Moreover, it is preferable that the inclined surface TS of each protrusion part 15 has an area wider than the area of the front end surface 15a.
各突出部１５において、基材層１２の主面ＰＳに対する第２側面１５ｃの角度である第２角度θ２は特に限定されないが、上記の第１角度θ１よりも大きいことが好ましく、上記の第１角度θ１よりも大きく、かつ直角又は鋭角であることがより好ましい。 In each protrusion 15, the second angle θ <b> 2 that is the angle of the second side surface 15 c with respect to the main surface PS of the base material layer 12 is not particularly limited, but is preferably larger than the first angle θ <b> 1. More preferably, the angle is larger than the angle θ1 and is a right angle or an acute angle.
なお、上述した第１角度θ１及び第２角度θ２は、各突出部１５において傾斜面ＴＳが延在する方向に対して直交する断面における角度を示す。また、基材層１２の主面ＰＳが凹凸を有する場合は、研磨パッド１１と被研磨物との相対回転の軸方向に対して直交する仮想面が角度の基準となる主面ＰＳに相当する。 Note that the first angle θ1 and the second angle θ2 described above indicate angles in a cross section orthogonal to the direction in which the inclined surface TS extends in each protrusion 15. Further, when the main surface PS of the base material layer 12 has irregularities, a virtual surface orthogonal to the axial direction of relative rotation between the polishing pad 11 and the object to be polished corresponds to the main surface PS serving as an angle reference. .
＜研磨パッドの溝＞
図１に示すように、研磨パッド１１の溝１６は、研磨パッド１１の内周端１１ａから外周端１１ｂへ向かって直線状に延びる主幹溝１６ａと、主幹溝１６ａと研磨パッド１１の外周端１１ｂとを直線状に連結する分岐溝１６ｂとを備えている。主幹溝１６ａ及び分岐溝１６ｂは、研磨パッド１１の内周端１１ａと外周端１１ｂとの間において連続した溝１６を構成している。
<Groove of polishing pad>
As shown in FIG. 1, the groove 16 of the polishing pad 11 includes a main groove 16 a extending linearly from the inner peripheral end 11 a of the polishing pad 11 toward the outer peripheral end 11 b, and the main groove 16 a and the outer peripheral end 11 b of the polishing pad 11. And a branch groove 16b for connecting the two in a straight line. The main trunk groove 16a and the branch groove 16b constitute a continuous groove 16 between the inner peripheral end 11a and the outer peripheral end 11b of the polishing pad 11.
図２に示すように、研磨パッド１１の溝１６は、突出部１５とこれに隣り合う突出部１５との間に形成されている。研磨パッド１１の溝１６は、研磨層１３からなる内底を有する第１溝１６ｃと、基材層１２（弾性層１２ｂ）からなる内底を有する第２溝１６ｄとから構成されている。第２溝１６ｄは、研磨層１３と研磨層１３とが離間した部分に形成され、突出部１５とこれに隣り合う突出部１５と間において基材層１２（弾性層１２ｂ）が露出している部分である。換言すると、研磨層１３は、基材層１２（弾性層１２ｂ）上に離間して配置された複数の研磨層１３から構成されることで、研磨パッド１１は、基材層１２を内底として構成された第２溝１６ｄを有している。なお、図１では、第１溝１６ｃと第２溝１６ｄと区別するために第２溝１６ｄを梨地模様で示している。 As shown in FIG. 2, the groove 16 of the polishing pad 11 is formed between the protruding portion 15 and the protruding portion 15 adjacent thereto. The groove 16 of the polishing pad 11 includes a first groove 16c having an inner bottom made of the polishing layer 13 and a second groove 16d having an inner bottom made of the base material layer 12 (elastic layer 12b). The second groove 16d is formed in a portion where the polishing layer 13 and the polishing layer 13 are separated from each other, and the base material layer 12 (elastic layer 12b) is exposed between the protruding portion 15 and the protruding portion 15 adjacent thereto. Part. In other words, the polishing layer 13 includes a plurality of polishing layers 13 that are spaced apart from each other on the base layer 12 (elastic layer 12b), so that the polishing pad 11 has the base layer 12 as an inner bottom. It has the configured second groove 16d. In FIG. 1, the second groove 16d is shown with a satin pattern in order to distinguish it from the first groove 16c and the second groove 16d.
＜研磨パッドの各寸法＞
研磨パッド１１の直径は特に限定されないが、例えば、１０〜１０００ｍｍ程度である。研磨パッド１１の各部分の寸法についても特に限定されないが、平面視において突出部１５の幅は３〜２０ｍｍ程度であり、突出部１５の長さは５〜５０ｍｍ程度であり、溝１６の幅は、３〜２０ｍｍ程度に設定される。また、突出部１５の高さは、５〜３０ｍｍ程度に設定される。
<Each dimension of polishing pad>
Although the diameter of the polishing pad 11 is not specifically limited, For example, it is about 10-1000 mm. The dimensions of each part of the polishing pad 11 are not particularly limited, but the width of the protrusion 15 is about 3 to 20 mm in plan view, the length of the protrusion 15 is about 5 to 50 mm, and the width of the groove 16 is 3 to 20 mm. Moreover, the height of the protrusion part 15 is set to about 5-30 mm.
＜研磨パッドの使用方法及び研磨パッドの作用＞
研磨パッド１１は、例えば、回転駆動装置を備えた周知の研磨機に取り付けられる。被研磨物の表面は、研磨パッド１１と被研磨物との相対回転により研磨される。被研磨物としては、ガラス板、ステンレス板、アルミニウム板等の板材が挙げられる。なお、こうした研磨では、砥粒を含む研磨用スラリーが用いられる。
<Method of using polishing pad and action of polishing pad>
The polishing pad 11 is attached to, for example, a known polishing machine equipped with a rotation drive device. The surface of the object to be polished is polished by relative rotation between the polishing pad 11 and the object to be polished. Examples of the object to be polished include plate materials such as glass plates, stainless steel plates, and aluminum plates. In such polishing, a polishing slurry containing abrasive grains is used.
図３には、研磨パッド１１の使用状態の一例を示している。研磨パッド１１は、研磨機の回転軸ＲＳに取り付けられる。被研磨物としてのガラス板ＧＳは、支持台Ｂ上に固定されている。研磨用スラリーＳＬは、回転軸ＲＳの中空部、及び研磨パッド１１の中央の貫通孔を通じてガラス板ＧＳの上面と研磨層１３との間に供給される。研磨パッド１１は、研磨層１３における各突出部１５の傾斜面ＴＳが先頭になってガラス板ＧＳに対して進行する方向に回転される。これにより、ガラス板ＧＳの上面が研磨される。このとき、研磨パッド１１の有する溝１６は、研磨用スラリーや研磨屑の流路となり、研磨用スラリーや研磨屑は、研磨パッド１１の外周端１１ｂから排出される。 FIG. 3 shows an example of the usage state of the polishing pad 11. The polishing pad 11 is attached to the rotating shaft RS of the polishing machine. A glass plate GS as an object to be polished is fixed on a support base B. The polishing slurry SL is supplied between the upper surface of the glass plate GS and the polishing layer 13 through the hollow portion of the rotation shaft RS and the central through hole of the polishing pad 11. The polishing pad 11 is rotated in the direction in which the inclined surface TS of each protrusion 15 in the polishing layer 13 proceeds with respect to the glass plate GS. Thereby, the upper surface of the glass plate GS is polished. At this time, the groove 16 of the polishing pad 11 becomes a flow path for polishing slurry and polishing waste, and the polishing slurry and polishing waste are discharged from the outer peripheral end 11 b of the polishing pad 11.
本実施形態の研磨パッド１１の研磨層１３における各突出部１５は、基材層１２の主面ＰＳに平行な先端面１５ａと、その先端面１５ａに連なるとともに基材層１２の主面ＰＳに対する角度が鋭角となる傾斜面ＴＳとを有している。この傾斜面ＴＳは、研磨パッド１１と被研磨物との相対回転の方向ＲＤとは異なる方向に延在している。こうした研磨パッド１１の研磨層１３における各突出部１５は、その傾斜面ＴＳが先頭になって被研磨物に対して進行するように研磨パッド１１と被研磨物とが相対回転されると、傾斜面ＴＳ（突出部１５の一側面）が被研磨物に好適に押圧される。このように、研磨パッド１１の研磨層１３における突出部１５の一側面が被研磨物の研磨に利用され易くなる。 Each protrusion 15 in the polishing layer 13 of the polishing pad 11 of the present embodiment is connected to the front end surface 15a parallel to the main surface PS of the base material layer 12 and the front end surface 15a and to the main surface PS of the base material layer 12. The inclined surface TS has an acute angle. The inclined surface TS extends in a direction different from the direction RD of relative rotation between the polishing pad 11 and the object to be polished. Each protrusion 15 in the polishing layer 13 of the polishing pad 11 is inclined when the polishing pad 11 and the object to be polished are rotated relative to each other so that the inclined surface TS proceeds to the object to be polished. The surface TS (one side surface of the protruding portion 15) is suitably pressed against the object to be polished. Thus, one side surface of the protrusion 15 in the polishing layer 13 of the polishing pad 11 is easily used for polishing the object to be polished.
以上詳述した実施形態によれば、次のような効果が発揮される。
（１）本実施形態の研磨パッド１１は、被研磨物との相対回転により被研磨物を研磨する用途に用いられるものであり、基材層１２とこの基材層１２の主面ＰＳに積層された研磨層１３とを有している。研磨パッド１１の研磨層１３における各突出部１５は、基材層１２の主面ＰＳに平行な先端面１５ａと、その先端面１５ａに連なるとともに基材層１２の主面ＰＳに対する角度が鋭角となる傾斜面ＴＳとを有している。各突出部１５の傾斜面ＴＳは、研磨パッド１１と被研磨物との相対回転の方向ＲＤとは異なる方向に延在している。
According to the embodiment detailed above, the following effects are exhibited.
(1) The polishing pad 11 of this embodiment is used for the purpose of polishing an object to be polished by relative rotation with the object to be polished, and is laminated on the base layer 12 and the main surface PS of the base layer 12. The polished layer 13 is provided. Each protrusion 15 in the polishing layer 13 of the polishing pad 11 has a leading end surface 15a parallel to the main surface PS of the base material layer 12 and an angle with respect to the main surface PS of the base material layer 12 that is continuous with the leading end surface 15a. And an inclined surface TS. The inclined surface TS of each protrusion 15 extends in a direction different from the direction RD of relative rotation between the polishing pad 11 and the object to be polished.
この構成によれば、研磨パッド１１の研磨層１３における各突出部１５の一側面（第１側面１５ｂ）が被研磨物の研磨に有効に利用され易くなるため、研磨の効率を高めることが容易となる。 According to this configuration, since one side surface (first side surface 15b) of each protrusion 15 in the polishing layer 13 of the polishing pad 11 is easily used effectively for polishing the object to be polished, it is easy to increase the polishing efficiency. It becomes.
（２）研磨パッド１１の研磨層１３における各突出部１５において、第２角度θ２が第１角度θ１よりも小さい場合、傾斜面ＴＳが倒れる方向（第１角度θ１が小さくなる方向）に各突出部１５が変形され難くなるため、被研磨物と傾斜面ＴＳとの接触面積が小さくなるおそれがある。この点、上記研磨パッド１１において、研磨層１３の各突出部１５における第２側面１５ｃは、傾斜面ＴＳの第１角度θ１よりも大きい第２角度θ２を有することが好ましい。この場合、傾斜面ＴＳが倒れる方向に各突出部１５が変形され易くなるため、被研磨物と傾斜面ＴＳの接触面積が大きくなり、各突出部１５の一側面が被研磨物の研磨にさらに有効に利用され易くなる。これにより、研磨の効率をさらに高めることが容易となる。 (2) In each protrusion 15 in the polishing layer 13 of the polishing pad 11, when the second angle θ2 is smaller than the first angle θ1, each protrusion protrudes in the direction in which the inclined surface TS falls (the direction in which the first angle θ1 decreases). Since the portion 15 is not easily deformed, the contact area between the workpiece and the inclined surface TS may be small. In this regard, in the polishing pad 11, the second side surface 15c of each protrusion 15 of the polishing layer 13 preferably has a second angle θ2 that is larger than the first angle θ1 of the inclined surface TS. In this case, since each protrusion 15 is easily deformed in the direction in which the inclined surface TS falls, the contact area between the object to be polished and the inclined surface TS is increased, and one side surface of each protrusion 15 is further used for polishing the object to be polished. It becomes easy to use effectively. This makes it easier to further increase the polishing efficiency.
（３）研磨パッド１１の研磨層１３における各突出部１５において、第２角度θ２が鈍角の場合、傾斜面ＴＳが倒れる方向に各突出部１５が過剰に変形するおそれがある。この点、研磨パッド１１の研磨層１３における各突出部１５において、第２角度θ２は、基材層１２の主面ＰＳに対して直角又は鋭角であることが好ましい。この場合、傾斜面ＴＳが倒れる方向への各突出部１５の過剰な変形が抑制されるとともに、各突出部１５の弾性力が得られ易くなるため、被研磨物に対する傾斜面ＴＳの押圧力が得られ易くなる。これにより、各突出部１５の一側面が被研磨物の研磨にさらに有効に利用され易くなる。これにより、研磨の効率をさらに高めることが容易となる。 (3) In each protrusion 15 in the polishing layer 13 of the polishing pad 11, when the second angle θ2 is an obtuse angle, each protrusion 15 may be excessively deformed in the direction in which the inclined surface TS falls. In this regard, in each protrusion 15 in the polishing layer 13 of the polishing pad 11, the second angle θ <b> 2 is preferably a right angle or an acute angle with respect to the main surface PS of the base material layer 12. In this case, excessive deformation of each projecting portion 15 in the direction in which the inclined surface TS falls is suppressed, and the elastic force of each projecting portion 15 is easily obtained, so that the pressing force of the inclined surface TS against the object to be polished is reduced. It becomes easy to obtain. As a result, one side surface of each protrusion 15 can be more effectively used for polishing the workpiece. This makes it easier to further increase the polishing efficiency.
（４）研磨パッド１１において、研磨層１３の突出部１５は、傾斜面ＴＳが延在する方向において離間された複数の突出部１５から構成されていることが好ましい。この場合、研磨用スラリーの流通路が好適に確保されるため、研磨の効率を高めることがさらに容易となる。 (4) In the polishing pad 11, the protrusion 15 of the polishing layer 13 is preferably composed of a plurality of protrusions 15 that are separated in the direction in which the inclined surface TS extends. In this case, since the flow path of the polishing slurry is suitably ensured, it becomes easier to increase the polishing efficiency.
（５）研磨パッド１１の基材層１２は、金属層１２ａと、研磨層１３の突出部１５よりも圧縮変形し易い弾性層１２ｂとを備え、この弾性層１２ｂに研磨層１３が積層されていることが好ましい。この場合、研磨パッド１１の各突出部１５は、被研磨物の表面に追従し易くなるため、研磨の効率を高めることがさらに容易となる。 (5) The base material layer 12 of the polishing pad 11 includes a metal layer 12a and an elastic layer 12b that is more easily compressively deformed than the protrusion 15 of the polishing layer 13, and the polishing layer 13 is laminated on the elastic layer 12b. Preferably it is. In this case, each protrusion 15 of the polishing pad 11 can easily follow the surface of the object to be polished, so that it becomes easier to increase the polishing efficiency.
（変更例）
上記実施形態を次のように変更して構成してもよい。
・前記研磨パッド１１の基材層１２は、弾性層１２ｂを備えているが、この弾性層１２ｂを省略してもよい。
(Example of change)
The above embodiment may be modified as follows.
-Although the base material layer 12 of the said polishing pad 11 is provided with the elastic layer 12b, you may abbreviate | omit this elastic layer 12b.
・前記研磨パッド１１の突出部１５は、傾斜面ＴＳが延在する方向において離間された複数の突出部１５から構成されているが、傾斜面ＴＳが延在する方向において一体となった突出部１５に変更してもよい。 The protrusion 15 of the polishing pad 11 is composed of a plurality of protrusions 15 that are spaced apart in the direction in which the inclined surface TS extends, but the protrusion that is integrated in the direction in which the inclined surface TS extends. It may be changed to 15.
・図４（ａ）に示すように、研磨パッド１１の研磨層１３における各突出部１５について、先端面１５ａ側のみに傾斜面ＴＳを有するように変更してもよい。この場合、各突出部１５の断面視において、第１側面１５ｂの全体に対する傾斜面ＴＳの割合は、３０％以上であることが好ましく、より好ましくは４０％以上であり、さらに好ましくは５０％以上である。なお、図４（ａ）に示される突出部１５の第１側面１５ｂにおいて、傾斜面ＴＳと突出部１５の基端との間における面の角度は、基材層１２の主面ＰＳに対して９０°以上、１２０°以下であることが好ましい。 -As shown to Fig.4 (a), about each protrusion part 15 in the polishing layer 13 of the polishing pad 11, you may change so that it may have the inclined surface TS only in the front end surface 15a side. In this case, in the sectional view of each protrusion 15, the ratio of the inclined surface TS to the entire first side surface 15b is preferably 30% or more, more preferably 40% or more, and further preferably 50% or more. It is. In addition, in the 1st side surface 15b of the protrusion part 15 shown by Fig.4 (a), the angle of the surface between the inclined surface TS and the base end of the protrusion part 15 is with respect to main surface PS of the base material layer 12. FIG. It is preferably 90 ° or more and 120 ° or less.
・図４（ｂ）に示すように、研磨パッド１１の研磨層１３における各突出部１５の第２側面１５ｃは、異なる角度を有する複数の面から構成されてもよい。
・図１に示すように、研磨パッド１１の研磨層１３における各突出部１５において、傾斜面ＴＳが延在する方向の両端面は、その方向に対して直交せずに傾斜した面であるが、そうした両端面の角度は適宜変更することができる。
As shown in FIG. 4B, the second side surface 15c of each protrusion 15 in the polishing layer 13 of the polishing pad 11 may be composed of a plurality of surfaces having different angles.
As shown in FIG. 1, in each protrusion 15 in the polishing layer 13 of the polishing pad 11, both end surfaces in the direction in which the inclined surface TS extends are surfaces that are not orthogonal to the direction. The angles of the both end faces can be changed as appropriate.
・前記研磨パッド１１の研磨層１３は、基材層１２（弾性層１２ｂ）上に離間して配置される複数の研磨層１３から構成されているが、一体となった単数の研磨層から構成されてもよい。 The polishing layer 13 of the polishing pad 11 is composed of a plurality of polishing layers 13 that are spaced apart from each other on the base material layer 12 (elastic layer 12b), but is composed of a single polishing layer that is integrated. May be.
・前記研磨パッド１１は、各突出部１５の延在する方向に基づいて領域Ａ１〜Ａ６に区分されているが、これに限定されず、区分する領域の数や形状は変更されてもよい。また、研磨パッド１１における領域を特に設定せずに、各突出部１５を研磨パッドの中心から放射状となるように延在してもよい。 -Although the said polishing pad 11 is divided into area | region A1-A6 based on the direction where each protrusion part 15 is extended, it is not limited to this, The number and shape of the area | region to divide may be changed. In addition, each protrusion 15 may extend radially from the center of the polishing pad without particularly setting a region in the polishing pad 11.
・前記研磨パッド１１は、研磨層１３側から見た平面視（図１）において反時計回りとなるように相対回転させて使用するが、時計回りとなるように相対回転させて使用する研磨パッドに変更されてもよい。この場合の研磨パッドは、研磨層１３の各突出部１５における第２側面１５ｃに傾斜面ＴＳを有するように変更される。 The polishing pad 11 is used by being relatively rotated so as to be counterclockwise in a plan view (FIG. 1) viewed from the polishing layer 13 side, but is used by being relatively rotated so as to be clockwise. May be changed. The polishing pad in this case is changed so as to have the inclined surface TS on the second side surface 15 c of each protrusion 15 of the polishing layer 13.
・前記研磨パッド１１の研磨層１３（各突出部１５）に砥粒を含有させることで、研磨用スラリーを用いずに水等を研磨用液として被研磨物を研磨してもよい。
・前記研磨パッド１１を回転させずに、被研磨物を回転させることで被研磨物を研磨してもよい。また、研磨パッド１１は、複数の研磨パッドを遊星歯車機構により同時に回転させて用いる研磨機に装着して用いてもよい。
-By including abrasive grains in the polishing layer 13 (each projecting portion 15) of the polishing pad 11, the object to be polished may be polished using water or the like as a polishing liquid without using a polishing slurry.
The object to be polished may be polished by rotating the object to be polished without rotating the polishing pad 11. Further, the polishing pad 11 may be used by being mounted on a polishing machine in which a plurality of polishing pads are simultaneously rotated by a planetary gear mechanism.
１１…研磨パッド、１２…基材層、１２ａ…金属層、１２ｂ…弾性層、１３…研磨層、１５…突出部、１５ａ…先端面、１５ｃ…第２側面、ＧＳ…ガラス板、ＰＳ…主面、ＲＤ…相対回転の方向、ＴＳ…傾斜面、θ１…第１角度、θ２…第２角度。 DESCRIPTION OF SYMBOLS 11 ... Polishing pad, 12 ... Base material layer, 12a ... Metal layer, 12b ... Elastic layer, 13 ... Polishing layer, 15 ... Projection part, 15a ... End surface, 15c ... Second side, GS ... Glass plate, PS ... Main Surface, RD: direction of relative rotation, TS: inclined surface, θ1: first angle, θ2: second angle.
Claims (5)
前記研磨層は、突出部を備え、
前記突出部は、前記基材層の主面に平行な先端面と、その先端面に連なるとともに前記基材層の主面に対する角度が鋭角となる傾斜面と、を有し、
前記傾斜面は、前記相対回転の方向とは異なる方向に延在していることを特徴とする研磨パッド。 A polishing pad comprising a base material layer and a polishing layer laminated on a main surface of the base material layer, and polishing the object by relative rotation with the object to be polished,
The polishing layer includes a protrusion,
The protrusion has a tip surface parallel to the main surface of the base material layer, and an inclined surface that is continuous with the tip surface and has an acute angle with respect to the main surface of the base material layer,
The polishing pad, wherein the inclined surface extends in a direction different from the direction of the relative rotation.
前記基材層の主面に対して前記傾斜面の角度よりも大きい角度を有することを特徴とする請求項１に記載の研磨パッド。 The side surface of the protruding portion located on the opposite side of the inclined surface is
The polishing pad according to claim 1, wherein the polishing pad has an angle larger than an angle of the inclined surface with respect to a main surface of the base material layer.
前記基材層の主面に対して直角又は鋭角であることを特徴とする請求項２に記載の研磨パッド。 The angle of the side surface of the protrusion located on the opposite side of the inclined surface is:
The polishing pad according to claim 2, wherein the polishing pad has a right angle or an acute angle with respect to a main surface of the base material layer.
前記弾性層に前記研磨層が積層されてなることを特徴とする請求項１から請求項４のいずれか一項に記載の研磨パッド。 The base material layer includes a metal layer and an elastic layer that is more easily compressed and deformed than the protruding portion of the polishing layer,
The polishing pad according to any one of claims 1 to 4, wherein the polishing layer is laminated on the elastic layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014158946A JP6354432B2 (en) | 2014-08-04 | 2014-08-04 | Polishing pad |
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| JP2014158946A JP6354432B2 (en) | 2014-08-04 | 2014-08-04 | Polishing pad |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2019098480A (en) * | 2017-12-05 | 2019-06-24 | 日本電気硝子株式会社 | Polishing pad |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010045306A (en) * | 2008-08-18 | 2010-02-25 | Kuraray Co Ltd | Polishing pad |
| US20100056031A1 (en) * | 2008-08-29 | 2010-03-04 | Allen Chiu | Polishing Pad |
| JP2013107193A (en) * | 2012-10-18 | 2013-06-06 | Tokyo Seimitsu Co Ltd | Polishing device having pressure distribution adjusting function |
| WO2013103142A1 (en) * | 2012-01-06 | 2013-07-11 | 東レ株式会社 | Polishing pad |
| WO2013184465A1 (en) * | 2012-06-04 | 2013-12-12 | Nexplanar Corporation | Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layer |
| JP2015196234A (en) * | 2014-04-03 | 2015-11-09 | 東レ株式会社 | Abrasive pad |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010045306A (en) * | 2008-08-18 | 2010-02-25 | Kuraray Co Ltd | Polishing pad |
| US20100056031A1 (en) * | 2008-08-29 | 2010-03-04 | Allen Chiu | Polishing Pad |
| WO2013103142A1 (en) * | 2012-01-06 | 2013-07-11 | 東レ株式会社 | Polishing pad |
| WO2013184465A1 (en) * | 2012-06-04 | 2013-12-12 | Nexplanar Corporation | Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layer |
| JP2013107193A (en) * | 2012-10-18 | 2013-06-06 | Tokyo Seimitsu Co Ltd | Polishing device having pressure distribution adjusting function |
| JP2015196234A (en) * | 2014-04-03 | 2015-11-09 | 東レ株式会社 | Abrasive pad |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019098480A (en) * | 2017-12-05 | 2019-06-24 | 日本電気硝子株式会社 | Polishing pad |
| JP7087365B2 (en) | 2017-12-05 | 2022-06-21 | 日本電気硝子株式会社 | Polishing pad |
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