JP2016032073A5 - - Google Patents
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- Publication number
- JP2016032073A5 JP2016032073A5 JP2014155111A JP2014155111A JP2016032073A5 JP 2016032073 A5 JP2016032073 A5 JP 2016032073A5 JP 2014155111 A JP2014155111 A JP 2014155111A JP 2014155111 A JP2014155111 A JP 2014155111A JP 2016032073 A5 JP2016032073 A5 JP 2016032073A5
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- tank
- based substrate
- substrate
- photovoltaic cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 30
- 229910052710 silicon Inorganic materials 0.000 claims 30
- 239000010703 silicon Substances 0.000 claims 30
- 239000000758 substrate Substances 0.000 claims 30
- 238000004519 manufacturing process Methods 0.000 claims 13
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 9
- 239000012535 impurity Substances 0.000 claims 7
- 230000001590 oxidative effect Effects 0.000 claims 7
- 239000000126 substance Substances 0.000 claims 7
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims 6
- 238000004140 cleaning Methods 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims 3
- 239000010410 layer Substances 0.000 claims 3
- 238000009792 diffusion process Methods 0.000 claims 2
- 238000001035 drying Methods 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 2
- 239000007789 gas Substances 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 1
- 238000007664 blowing Methods 0.000 claims 1
- 229910052796 boron Inorganic materials 0.000 claims 1
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
- 239000011574 phosphorus Substances 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 239000002344 surface layer Substances 0.000 claims 1
- 238000005406 washing Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014155111A JP2016032073A (ja) | 2014-07-30 | 2014-07-30 | 太陽電池セルの製造方法および太陽電池セルの製造装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014155111A JP2016032073A (ja) | 2014-07-30 | 2014-07-30 | 太陽電池セルの製造方法および太陽電池セルの製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016032073A JP2016032073A (ja) | 2016-03-07 |
| JP2016032073A5 true JP2016032073A5 (enrdf_load_stackoverflow) | 2017-11-30 |
Family
ID=55442276
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014155111A Pending JP2016032073A (ja) | 2014-07-30 | 2014-07-30 | 太陽電池セルの製造方法および太陽電池セルの製造装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2016032073A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110237709A (zh) * | 2019-07-10 | 2019-09-17 | 中威新能源(成都)有限公司 | 基于太阳电池制造工艺的硅片表面抑制氧化方法 |
| CN112259444A (zh) * | 2020-10-19 | 2021-01-22 | 绍兴同芯成集成电路有限公司 | 一种高疏水性超薄晶圆清洗方法 |
| CN114864744B (zh) * | 2022-05-05 | 2024-04-02 | 普乐新能源科技(泰兴)有限公司 | 一种纳米硅浆料的高效清洗方法及系统 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11260778A (ja) * | 1998-03-06 | 1999-09-24 | Sony Corp | 枚葉式表面洗浄方法及び装置 |
| JP4989042B2 (ja) * | 2005-06-09 | 2012-08-01 | 信越半導体株式会社 | 太陽電池用基板の製造方法 |
| JP2011129867A (ja) * | 2009-11-17 | 2011-06-30 | Shirakuseru Kk | ボロン拡散層を有するシリコン太陽電池セル及びその製造方法 |
| JP2012009722A (ja) * | 2010-06-28 | 2012-01-12 | Sumco Corp | 太陽電池基板用半導体ウェーハの洗浄方法 |
| US20130220410A1 (en) * | 2011-09-07 | 2013-08-29 | Air Products And Chemicals, Inc. | Precursors for Photovoltaic Passivation |
| JP2014096459A (ja) * | 2012-11-08 | 2014-05-22 | Mitsubishi Electric Corp | 太陽電池用半導体基板の表面処理方法、太陽電池用半導体基板の製造方法、太陽電池の製造方法及び太陽電池製造装置 |
| JP2014220346A (ja) * | 2013-05-07 | 2014-11-20 | 株式会社村田製作所 | 太陽電池セルおよびその製造方法 |
-
2014
- 2014-07-30 JP JP2014155111A patent/JP2016032073A/ja active Pending
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