JP2016015252A5 - - Google Patents
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- JP2016015252A5 JP2016015252A5 JP2014136874A JP2014136874A JP2016015252A5 JP 2016015252 A5 JP2016015252 A5 JP 2016015252A5 JP 2014136874 A JP2014136874 A JP 2014136874A JP 2014136874 A JP2014136874 A JP 2014136874A JP 2016015252 A5 JP2016015252 A5 JP 2016015252A5
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- 238000003384 imaging method Methods 0.000 claims 20
- 238000000034 method Methods 0.000 claims 4
- 239000002131 composite material Substances 0.000 claims 3
- 238000010894 electron beam technology Methods 0.000 claims 3
- 230000001678 irradiating effect Effects 0.000 claims 3
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 238000003786 synthesis reaction Methods 0.000 claims 1
- 230000002194 synthesizing effect Effects 0.000 claims 1
- 230000000007 visual effect Effects 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014136874A JP6190768B2 (ja) | 2014-07-02 | 2014-07-02 | 電子顕微鏡装置およびそれを用いた撮像方法 |
| US15/312,866 US9824853B2 (en) | 2014-07-02 | 2015-05-27 | Electron microscope device and imaging method using same |
| PCT/JP2015/065319 WO2016002397A1 (ja) | 2014-07-02 | 2015-05-27 | 電子顕微鏡装置およびそれを用いた撮像方法 |
| CN201580027482.2A CN106415774B (zh) | 2014-07-02 | 2015-05-27 | 电子显微镜装置及使用该电子显微镜装置的拍摄方法 |
| DE112015001902.2T DE112015001902B4 (de) | 2014-07-02 | 2015-05-27 | Elektronenmikroskopvorrichtung und sie verwendendes Abbildungsverfahren |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014136874A JP6190768B2 (ja) | 2014-07-02 | 2014-07-02 | 電子顕微鏡装置およびそれを用いた撮像方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016015252A JP2016015252A (ja) | 2016-01-28 |
| JP2016015252A5 true JP2016015252A5 (enExample) | 2016-12-22 |
| JP6190768B2 JP6190768B2 (ja) | 2017-08-30 |
Family
ID=55018950
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014136874A Expired - Fee Related JP6190768B2 (ja) | 2014-07-02 | 2014-07-02 | 電子顕微鏡装置およびそれを用いた撮像方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9824853B2 (enExample) |
| JP (1) | JP6190768B2 (enExample) |
| CN (1) | CN106415774B (enExample) |
| DE (1) | DE112015001902B4 (enExample) |
| WO (1) | WO2016002397A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017526011A (ja) * | 2014-08-18 | 2017-09-07 | ビューズアイキュウ インコーポレイテッド | 広視野顕微鏡スキャンにおける埋め込み画像のためのシステムおよび方法 |
| US10974182B2 (en) * | 2015-08-21 | 2021-04-13 | Cummins Filtration Ip, Inc. | High speed rotating crankcase ventilation filter media and media pack |
| DE112016003302T5 (de) | 2015-08-28 | 2018-05-24 | Cummins Filtration Ip, Inc. | Rotierendes Koaleszerelement mit gerichteter Flüssigkeitsdrainage und gerichtetem Gasauslass |
| JP6391170B2 (ja) * | 2015-09-03 | 2018-09-19 | 東芝メモリ株式会社 | 検査装置 |
| US10096097B2 (en) * | 2016-08-01 | 2018-10-09 | The United States Of America As Represented By The Secretary Of The Navy | Content-aware bidirectional image edge highlighting |
| JP7107653B2 (ja) * | 2017-08-31 | 2022-07-27 | 東レエンジニアリング先端半導体Ｍｉテクノロジー株式会社 | 画像生成方法 |
| JP7171010B2 (ja) * | 2018-03-07 | 2022-11-15 | 株式会社日立ハイテクサイエンス | 断面加工観察装置、断面加工観察方法及びプログラム |
| EP3598474A1 (en) | 2018-07-19 | 2020-01-22 | FEI Company | Adaptive specimen image acquisition using an artificial neural network |
| CN109087293B (zh) * | 2018-07-27 | 2020-10-16 | 新华三大数据技术有限公司 | 一种调节电子显微镜成像参数的方法及装置 |
| US11164721B2 (en) | 2019-03-28 | 2021-11-02 | Massachusetts Institute Of Technology | System and method for learning-guided electron microscopy |
| KR102888847B1 (ko) * | 2020-01-09 | 2025-11-19 | 주식회사 히타치하이테크 | 화상을 생성하는 시스템, 및 비일시적 컴퓨터 가독 매체 |
| JP7342271B2 (ja) * | 2020-07-14 | 2023-09-11 | 株式会社日立ハイテク | 試料像観察装置、及びその方法 |
| JPWO2024157405A1 (enExample) * | 2023-01-26 | 2024-08-02 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0562630A (ja) * | 1991-08-30 | 1993-03-12 | Jeol Ltd | 複数の記録位置を備えた電子顕微鏡 |
| SG92679A1 (en) * | 2000-02-29 | 2002-11-19 | Inst Materials Research & Eng | Selective deposition of a particle beam based on charging characteristics of a sample |
| EP1182486B1 (en) * | 2000-03-06 | 2007-07-18 | Olympus Corporation | Confocal microscope comprising pattern forming rotation disk |
| US7634061B1 (en) * | 2004-03-26 | 2009-12-15 | Nova R & D, Inc. | High resolution imaging system |
| JP2011033423A (ja) * | 2009-07-31 | 2011-02-17 | Hitachi High-Technologies Corp | パターン形状選択方法、及びパターン測定装置 |
| JP5188529B2 (ja) * | 2010-03-30 | 2013-04-24 | 株式会社日立ハイテクノロジーズ | 電子ビーム照射方法、及び走査電子顕微鏡 |
| JP5324534B2 (ja) * | 2010-07-29 | 2013-10-23 | 株式会社日立ハイテクノロジーズ | 検査方法及び装置 |
| JP5537460B2 (ja) | 2011-02-17 | 2014-07-02 | 株式会社日立ハイテクノロジーズ | 荷電粒子線顕微鏡及びそれを用いた計測画像の補正方法 |
| JP5537488B2 (ja) * | 2011-04-15 | 2014-07-02 | 株式会社日立ハイテクノロジーズ | 荷電粒子顕微鏡装置および画像撮像方法 |
| JP2012226874A (ja) * | 2011-04-15 | 2012-11-15 | Ccs Inc | 反射型照明装置 |
| EP3528276A3 (en) * | 2011-05-13 | 2019-09-04 | Fibics Incorporated | Microscopy imaging method |
| JP5712074B2 (ja) * | 2011-07-20 | 2015-05-07 | 株式会社日立ハイテクノロジーズ | 走査透過電子顕微鏡 |
| JP2014029460A (ja) * | 2012-07-05 | 2014-02-13 | Canon Inc | 顕微鏡装置及びその制御方法 |
| US9390887B2 (en) * | 2013-09-17 | 2016-07-12 | Kla-Tencor Corporation | Non-invasive charged particle beam monitor |
| JP6242745B2 (ja) * | 2014-05-13 | 2017-12-06 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置及び当該装置を用いる検査方法 |
-
2014
- 2014-07-02 JP JP2014136874A patent/JP6190768B2/ja not_active Expired - Fee Related
-
2015
- 2015-05-27 CN CN201580027482.2A patent/CN106415774B/zh not_active Expired - Fee Related
- 2015-05-27 US US15/312,866 patent/US9824853B2/en not_active Expired - Fee Related
- 2015-05-27 DE DE112015001902.2T patent/DE112015001902B4/de not_active Expired - Fee Related
- 2015-05-27 WO PCT/JP2015/065319 patent/WO2016002397A1/ja not_active Ceased