JP2016015252A5 - - Google Patents
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- JP2016015252A5 JP2016015252A5 JP2014136874A JP2014136874A JP2016015252A5 JP 2016015252 A5 JP2016015252 A5 JP 2016015252A5 JP 2014136874 A JP2014136874 A JP 2014136874A JP 2014136874 A JP2014136874 A JP 2014136874A JP 2016015252 A5 JP2016015252 A5 JP 2016015252A5
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- JP
- Japan
- Prior art keywords
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- 238000003384 imaging method Methods 0.000 claims 20
- 238000000034 method Methods 0.000 claims 4
- 239000002131 composite material Substances 0.000 claims 3
- 238000010894 electron beam technology Methods 0.000 claims 3
- 230000001678 irradiating effect Effects 0.000 claims 3
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 238000003786 synthesis reaction Methods 0.000 claims 1
- 230000002194 synthesizing effect Effects 0.000 claims 1
- 230000000007 visual effect Effects 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014136874A JP6190768B2 (ja) | 2014-07-02 | 2014-07-02 | 電子顕微鏡装置およびそれを用いた撮像方法 |
| DE112015001902.2T DE112015001902B4 (de) | 2014-07-02 | 2015-05-27 | Elektronenmikroskopvorrichtung und sie verwendendes Abbildungsverfahren |
| CN201580027482.2A CN106415774B (zh) | 2014-07-02 | 2015-05-27 | 电子显微镜装置及使用该电子显微镜装置的拍摄方法 |
| US15/312,866 US9824853B2 (en) | 2014-07-02 | 2015-05-27 | Electron microscope device and imaging method using same |
| PCT/JP2015/065319 WO2016002397A1 (ja) | 2014-07-02 | 2015-05-27 | 電子顕微鏡装置およびそれを用いた撮像方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014136874A JP6190768B2 (ja) | 2014-07-02 | 2014-07-02 | 電子顕微鏡装置およびそれを用いた撮像方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016015252A JP2016015252A (ja) | 2016-01-28 |
| JP2016015252A5 true JP2016015252A5 (enExample) | 2016-12-22 |
| JP6190768B2 JP6190768B2 (ja) | 2017-08-30 |
Family
ID=55018950
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014136874A Expired - Fee Related JP6190768B2 (ja) | 2014-07-02 | 2014-07-02 | 電子顕微鏡装置およびそれを用いた撮像方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9824853B2 (enExample) |
| JP (1) | JP6190768B2 (enExample) |
| CN (1) | CN106415774B (enExample) |
| DE (1) | DE112015001902B4 (enExample) |
| WO (1) | WO2016002397A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016026038A1 (en) * | 2014-08-18 | 2016-02-25 | Viewsiq Inc. | System and method for embedded images in large field-of-view microscopic scans |
| US10974182B2 (en) * | 2015-08-21 | 2021-04-13 | Cummins Filtration Ip, Inc. | High speed rotating crankcase ventilation filter media and media pack |
| WO2017040256A1 (en) | 2015-08-28 | 2017-03-09 | Cummins Filtration Ip, Inc | Rotating coalescing element with directed liquid drainage and gas outlet |
| JP6391170B2 (ja) * | 2015-09-03 | 2018-09-19 | 東芝メモリ株式会社 | 検査装置 |
| US10096097B2 (en) * | 2016-08-01 | 2018-10-09 | The United States Of America As Represented By The Secretary Of The Navy | Content-aware bidirectional image edge highlighting |
| JP7107653B2 (ja) * | 2017-08-31 | 2022-07-27 | 東レエンジニアリング先端半導体Miテクノロジー株式会社 | 画像生成方法 |
| JP7171010B2 (ja) * | 2018-03-07 | 2022-11-15 | 株式会社日立ハイテクサイエンス | 断面加工観察装置、断面加工観察方法及びプログラム |
| EP3598474A1 (en) | 2018-07-19 | 2020-01-22 | FEI Company | Adaptive specimen image acquisition using an artificial neural network |
| CN109087293B (zh) * | 2018-07-27 | 2020-10-16 | 新华三大数据技术有限公司 | 一种调节电子显微镜成像参数的方法及装置 |
| WO2020198752A1 (en) | 2019-03-28 | 2020-10-01 | Massachusetts Institute Of Technology | System and method for learning-guided electron microscopy |
| CN114761990A (zh) * | 2020-01-09 | 2022-07-15 | 株式会社日立高新技术 | 生成图像的系统、以及非暂时性计算机可读介质 |
| WO2022013945A1 (ja) * | 2020-07-14 | 2022-01-20 | 株式会社日立ハイテク | 試料像観察装置、及びその方法 |
| JPWO2024157405A1 (enExample) * | 2023-01-26 | 2024-08-02 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0562630A (ja) * | 1991-08-30 | 1993-03-12 | Jeol Ltd | 複数の記録位置を備えた電子顕微鏡 |
| SG92679A1 (en) * | 2000-02-29 | 2002-11-19 | Inst Materials Research & Eng | Selective deposition of a particle beam based on charging characteristics of a sample |
| AU3609601A (en) * | 2000-03-06 | 2001-09-17 | Olympus Optical Co., Ltd. | Pattern forming member applied to sectioning image observing device and sectioning image observing device using it |
| US7634061B1 (en) * | 2004-03-26 | 2009-12-15 | Nova R & D, Inc. | High resolution imaging system |
| JP2011033423A (ja) * | 2009-07-31 | 2011-02-17 | Hitachi High-Technologies Corp | パターン形状選択方法、及びパターン測定装置 |
| JP5188529B2 (ja) * | 2010-03-30 | 2013-04-24 | 株式会社日立ハイテクノロジーズ | 電子ビーム照射方法、及び走査電子顕微鏡 |
| JP5324534B2 (ja) * | 2010-07-29 | 2013-10-23 | 株式会社日立ハイテクノロジーズ | 検査方法及び装置 |
| JP5537460B2 (ja) * | 2011-02-17 | 2014-07-02 | 株式会社日立ハイテクノロジーズ | 荷電粒子線顕微鏡及びそれを用いた計測画像の補正方法 |
| JP5537488B2 (ja) * | 2011-04-15 | 2014-07-02 | 株式会社日立ハイテクノロジーズ | 荷電粒子顕微鏡装置および画像撮像方法 |
| JP2012226874A (ja) * | 2011-04-15 | 2012-11-15 | Ccs Inc | 反射型照明装置 |
| EP2707893B1 (en) * | 2011-05-13 | 2019-01-16 | Fibics Incorporated | Microscopy imaging method and system |
| JP5712074B2 (ja) * | 2011-07-20 | 2015-05-07 | 株式会社日立ハイテクノロジーズ | 走査透過電子顕微鏡 |
| JP2014029460A (ja) * | 2012-07-05 | 2014-02-13 | Canon Inc | 顕微鏡装置及びその制御方法 |
| US9390887B2 (en) * | 2013-09-17 | 2016-07-12 | Kla-Tencor Corporation | Non-invasive charged particle beam monitor |
| JP6242745B2 (ja) * | 2014-05-13 | 2017-12-06 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置及び当該装置を用いる検査方法 |
-
2014
- 2014-07-02 JP JP2014136874A patent/JP6190768B2/ja not_active Expired - Fee Related
-
2015
- 2015-05-27 CN CN201580027482.2A patent/CN106415774B/zh active Active
- 2015-05-27 WO PCT/JP2015/065319 patent/WO2016002397A1/ja not_active Ceased
- 2015-05-27 DE DE112015001902.2T patent/DE112015001902B4/de active Active
- 2015-05-27 US US15/312,866 patent/US9824853B2/en active Active
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