JP2016009727A5 - - Google Patents

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Publication number
JP2016009727A5
JP2016009727A5 JP2014128586A JP2014128586A JP2016009727A5 JP 2016009727 A5 JP2016009727 A5 JP 2016009727A5 JP 2014128586 A JP2014128586 A JP 2014128586A JP 2014128586 A JP2014128586 A JP 2014128586A JP 2016009727 A5 JP2016009727 A5 JP 2016009727A5
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JP
Japan
Prior art keywords
substrate
arrangement
substrates
nozzle
pattern
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JP2014128586A
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English (en)
Japanese (ja)
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JP6144236B2 (ja
JP2016009727A (ja
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Publication of JP2016009727A5 publication Critical patent/JP2016009727A5/ja
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JP2014128586A 2014-06-23 2014-06-23 基板処理方法、記憶媒体及び基板処理装置 Active JP6144236B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014128586A JP6144236B2 (ja) 2014-06-23 2014-06-23 基板処理方法、記憶媒体及び基板処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014128586A JP6144236B2 (ja) 2014-06-23 2014-06-23 基板処理方法、記憶媒体及び基板処理装置

Publications (3)

Publication Number Publication Date
JP2016009727A JP2016009727A (ja) 2016-01-18
JP2016009727A5 true JP2016009727A5 (OSRAM) 2016-09-01
JP6144236B2 JP6144236B2 (ja) 2017-06-07

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JP2014128586A Active JP6144236B2 (ja) 2014-06-23 2014-06-23 基板処理方法、記憶媒体及び基板処理装置

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JP (1) JP6144236B2 (OSRAM)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6956924B2 (ja) * 2019-08-29 2021-11-02 東京エレクトロン株式会社 基板処理装置および基板処理方法
JP7433178B2 (ja) * 2020-09-17 2024-02-19 東京エレクトロン株式会社 処理装置
JP7695038B2 (ja) 2021-09-13 2025-06-18 東京エレクトロン株式会社 基板処理装置及び基板処理方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10242113A (ja) * 1997-02-24 1998-09-11 Omega Semicon Denshi Kk ベーパ乾燥装置
JP3128643B2 (ja) * 1997-04-02 2001-01-29 東京エレクトロン株式会社 洗浄・乾燥処理装置
JP2003174075A (ja) * 2001-12-05 2003-06-20 Semi Techno:Kk 基板のピッチ変換装置

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