JP2016003990A - Pressure sensor device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a pressure sensor device that can supply a signal to a TFT for a broken conductor even when a data line or a scanning line is broken and can make accurate detection over a long time.SOLUTION: According to the present invention, there is provided a pressure sensor device that includes: a substrate; a plurality of data lines on the substrate; a plurality of scanning lines on the substrate intersecting with the data lines; a plurality of TFTs at the intersections of the data lines and scanning lines electrically connected to the data lines and the scanning lines; a pressure sensitive member on the TFTs having conductive particles dispersed therein; and a common electrode connected to the TFTs via the pressure sensitive member, at least two adjacent lines of the data lines being electrically connected together at both ends of each line and at least two adjacent lines of the scanning lines being electrically connected at both ends of each line.

Description

  The present invention relates to a pressure sensor device capable of detecting pressure even when a defect occurs in a conducting wire or a thin film transistor.

  2. Description of the Related Art Conventionally, a pressure sensor device that detects pressure by changing electric resistance according to applied pressure is known. Specifically, a pressure-sensitive member in which conductive particles are dispersed in an insulating resin is disposed between the electrodes, and the conductive particles dispersed in the pressure-sensitive member are in contact with each other by applying pressure between the electrodes. And the pressure sensor apparatus based on the principle of reducing the surface resistance of a pressure-sensitive member is known. For example, Patent Document 1 discloses a pressure sensor device in which a plurality of pressure-sensitive conductors having different resistance characteristics are stacked on the surface of the pressure sensor device. Patent Document 2 discloses a pressure sensor device in which a pressure-sensitive conductor and a pressure sheet are formed on the surface of the pressure sensor device, and a part of the pressure-sensitive conductor and the pressure sheet is not contacted. Yes.

FIG. 8A is a schematic plan view showing an example of a conventional pressure sensor device, and FIG. 8B is an enlarged schematic view of one measurement unit D of the pressure sensor device 100 ′ of FIG. 8A. FIG. 8C is a plan view, and FIG. 8C is a cross-sectional view taken along line A′-A ′ of FIG. As shown in FIGS. 8A to 8C, the conventional pressure sensor device 2 is arranged on a substrate 3 and has m data lines X1 to Xm (m is a natural number of 2 or more) intersecting each other. And n (where n is a natural number greater than or equal to 2) scanning lines Y1 to Yn, and the data lines X1 to Xm and the scanning lines Y1 to Yn are provided at intersections of the data lines X1 to Xm and the scanning lines. A plurality of thin film transistors electrically connected to Y1 to Yn, a pressure sensitive member 8 formed on the plurality of thin film transistors, and a common electrode 9 facing the thin film transistors with the pressure sensitive member 8 interposed therebetween. Normally, m data lines and n scanning lines are selectively driven, and a signal is supplied to a thin film transistor provided at the intersection of the selectively driven data line and the scanning line. Therefore, for example, in FIG. 8A, when the data line X1 and the scanning line Y1 are selectively driven, signals are supplied to the thin film transistors _{(X1, Y1)} . Note that, as described above, the positions of the thin film transistors provided at the intersections of the data lines and the scanning lines are represented using the reference numerals of the data lines and the scanning lines, respectively. In FIG. 8A, the gate insulating layer, the semiconductor layer, the passivation layer, and the common electrode are omitted to simplify the drawing, and in FIG. 8B, the gate insulating layer, the passivation layer, and the common electrode are omitted. doing. Hereinafter, the thin film transistor may be abbreviated as TFT.

The pressure sensor device uses one TFT, a pressure-sensitive member formed on the TFT, and a common electrode connected to the TFT through the pressure-sensitive member as one measurement unit. Here, the measurement unit in the pressure sensor device will be described with reference to the drawings. As shown in FIGS. 8B and 8C, the measurement unit D of the pressure sensor device 100 ′ includes the gate electrode 4, the gate insulating layer 5, the gate electrode 4 and the gate insulating layer formed on the substrate 3. 5 includes a TFT composed of a source electrode 6S and a drain electrode 6D formed via 5 and a semiconductor layer 7 formed between the source electrode 6S and the drain electrode 6D. At this time, the gate electrode 4 in the TFT is electrically connected to the scanning line 12, the source electrode 6 </ b> S is electrically connected to the data line 11, and the drain electrode 6 </ b> D is passed through a through hole formed in the passivation layer 14. Exposed.
In a measurement unit in such a pressure sensor device, when pressure is applied, the pressure-sensitive member 8 is bent and the conductive particles come into contact with each other. Thereby, the surface resistance of the pressure-sensitive member 8 is lowered, and the TFT and the common electrode 9 are conducted. The pressure is detected using this change in conduction.

JP 2013-68562 A JP 2013-68563 A

  The pressure sensor device is suitably used in the field of rehabilitation, for example, as a walking assistance device that attaches the pressure sensor device to the sole and senses the state of landing and leaving the sole. On the other hand, in such a pressure sensor device, a conductor such as a data line or a scanning line is disconnected due to the applied pressure in the process of use, and the supply of signals to the TFT corresponding to the disconnected conductor is delayed. As a result, there is a problem that the function as the pressure sensor device is deteriorated.

  The present invention has been made in view of the above problems, and even when a data line or a scanning line is disconnected, it is possible to supply a signal to a TFT corresponding to the disconnected conductor, and for a long period of time. A main object is to provide a pressure sensor device capable of accurate detection.

  To achieve the above object, the present invention includes a substrate, a plurality of data lines arranged on the substrate, a plurality of scanning lines arranged on the substrate and intersecting the plurality of data lines, A plurality of TFTs electrically connected to the data lines and the scanning lines and disposed at a plurality of intersections where the plurality of data lines and the plurality of scanning lines intersect with each other; A pressure-sensitive member in which particles are dispersed, and a common electrode connected to the TFT through the pressure-sensitive member, and two or more adjacent data lines out of the plurality of data lines. Provided is a pressure sensor device characterized in that conduction is made at an end portion and two or more adjacent ones of the plurality of scanning lines are conducted at both end portions of the scanning line.

  In the present invention, two or more adjacent data lines among the plurality of data lines are electrically connected at both end portions of the data line, and two or more adjacent data lines among the plurality of scanning lines are scanned. Conduction is conducted at both ends of the wire. Thereby, even when the data line or the scanning line is disconnected, a signal can be supplied to the TFT corresponding to the disconnected conductor. Hereinafter, the data line or the scanning line may be abbreviated as a conducting wire.

  According to the present invention, the TFT is preferably an organic TFT having an organic semiconductor layer. Since it can be set as TFT excellent in flexibility, the problem that a pressure sensor apparatus is damaged with the applied pressure can be suppressed, and it can be made highly reliable.

  In the present invention, even when a data line or a scanning line is disconnected, a pressure sensor device capable of supplying a signal to a TFT corresponding to the disconnected conductor and capable of accurate detection over a long period of time is provided. There is an effect that it can be provided.

It is a schematic plan view which shows an example of the pressure sensor apparatus of this invention. It is a schematic plan view which shows the other example of the pressure sensor apparatus of this invention. It is a schematic diagram for demonstrating the flexible printed wiring board used for this invention. It is a schematic diagram which shows the other example of the pressure sensor apparatus of this invention. It is a schematic diagram which shows the other example of the pressure sensor apparatus of this invention. It is a schematic process drawing which shows the manufacturing process of the pressure sensor apparatus of this invention in Example 1. It is a schematic process drawing which shows the manufacturing process of the pressure sensor apparatus of this invention in Example 1. It is a schematic process drawing which shows the manufacturing process of the pressure sensor apparatus of this invention in Example 2. It is a schematic plan view which shows an example of the conventional pressure sensor apparatus.

Hereinafter, the pressure sensor device of the present invention will be described.
The pressure sensor device according to the present invention includes a substrate, a plurality of data lines arranged on the substrate, a plurality of scanning lines arranged on the substrate so as to intersect the plurality of data lines, and the data line. And a plurality of TFTs that are electrically connected to the scanning lines and arranged at a plurality of intersections where the plurality of data lines and the plurality of scanning lines intersect, and are disposed on the TFTs, and conductive particles are dispersed therein. A pressure sensitive member and a common electrode connected to the TFT via the pressure sensitive member, and two or more adjacent ones of the plurality of data lines are electrically connected at both end portions of the data line. And two or more adjacent ones of the plurality of scanning lines are electrically connected at both end portions of the scanning lines.

The pressure sensor device of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic plan view showing an example of the pressure sensor device of the present invention, and FIG. 1B is an enlarged schematic plan view of the pressure sensor device 100 of FIG. ) Is a cross-sectional view taken along line AA of FIG. As shown in FIG. 1A, the pressure sensor device 100 of the present invention includes a substrate, m data lines X1 to Xm arranged on the substrate (where m is a natural number of 2 or more), and the above N scanning lines Y1 to Yn (where n is a natural number of 2 or more), data lines X1 to Xm, and scanning lines Y1 to Yn arranged on the substrate so as to intersect with the data lines X1 to Xm. Are arranged at a plurality of intersecting points, and have a plurality of TFTs electrically connected to the data lines X1 to Xm and the scanning lines Y1 to Yn.

Further, in the pressure sensor device 100 shown in FIG. 1, the data lines X1 to X3 and the data lines X4 to X6 are respectively conducted at both end portions of the conducting wires, and further, the scanning lines Y1 to Y3 and the scanning lines Y4 to Y6 are connected. However, they are electrically connected at both end portions of the conducting wire. Therefore, nine TFTs _{(X1 to X3, Y1 to Y3)} corresponding to the data lines X1 to X3 and the scanning lines Y1 to Y3, and nine TFTs _{(X1 to X3)} corresponding to the data lines X1 to X3 and the scanning lines Y4 to _{Y6. , Y4 to Y6)} , nine TFTs corresponding to the data lines X4 to X6 and the scanning lines Y1 to _{Y3 (X4 to X6, Y1 to Y3)} , and nine corresponding to the data lines X4 to X6 and the scanning lines Y4 to Y6 _{Each of the} TFTs _{(X4 to X6, Y4 to Y6)} functions as one measurement unit D. In addition, about the code | symbol which is not demonstrated in Fig.1 (a)-(b), since it can be made the same as that of FIG. 8, description here is abbreviate | omitted.

In conventional pressure sensor device, for example, as shown in FIG. 2 (a), when the data lines X3 is broken, the signal from the data line driver C _X for driving the data lines X1~Xm is, the data line X3 There is a problem in that it becomes stagnant at the disconnection portion _, and it becomes difficult to drive the TFT _{(X3, Y2)} and the TFT _{(X3, Y1)} corresponding to the data line X3. Also, when the scanning line Y2 is broken, as in the case where the data line X3 is broken, a signal from the scan line driver C _Y for driving scanning lines Y1~Yn is stuck in broken portion of the scanning line Y2 _Therefore, there is a problem that it becomes difficult to drive the TFTs _{(X6, Y2)} corresponding to the scanning line Y2.

On the other hand, in the present invention, for example, as shown in FIG. 2B, the data lines X1 to X3 and the data lines X4 to X6 are respectively conducted at both end portions of the conducting wires, and further, the scanning lines Y1 to X1 are connected. Y3 and the scanning lines Y4 to Y6 are electrically connected at both end portions of the conducting wire. Therefore, similarly to FIG. 1, nine TFTs _{(X1 to X3, Y1 to Y3)} , nine TFTs _{(X1 to X3, Y4 to Y6)} , nine TFTs _{(X4 to X6, Y1 to Y3)} , and nine TFTs _{Each of the} TFTs _{(X4 to X6, Y4} to _Y6) can function as one measurement unit.

Further, as shown in FIG. 2 (b), even if the data line X3 is disconnected due to the conduction of the conductive wires at both end portions, the signal from the data line driving unit C _X is transmitted to the data line. The data lines X1 and X2 that are electrically connected to X3 are supplied to the TFTs _{(X3 and Y2)} and TFTs _{(X3 and Y1)} corresponding to the disconnected portions of the data line X3. Similarly, when the scanning line Y2 is disconnected, the signal from the scan line driver _{C Y} from the scanning lines Y1, Y3 which conducts the scanning line Y2, _TFT corresponding to broken point of the scanning line Y2 _{(X6, Y2)} is fed around. Therefore, even when the data line or the scanning line is disconnected, a signal can be supplied to the TFT corresponding to the disconnected conductor.

  Furthermore, in this invention, each conducting wire can be made to conduct | electrically_connect at both terminal parts, and several TFT can be functioned as one measurement unit. Here, functioning as one measurement unit means that when a pressure is applied to one measurement unit, the measurement unit is assigned to the measurement unit from each measurement data obtained by a plurality of TFTs included in the measurement unit. This means detecting pressure. For this reason, even if a defect occurs in any TFT included in one measurement unit and it becomes difficult to measure the pressure in the TFT, the measurement data obtained from other TFTs included in one measurement unit The pressure applied to the measurement unit can be detected.

Here, “a plurality of data lines arranged on the substrate and a plurality of scanning lines arranged on the substrate so as to intersect with the plurality of data lines” are as shown in FIG. The data lines 11 and the plurality of scanning lines 12 are arranged so as to intersect each other so as to form a lattice pattern.
Further, “a plurality of intersections at which the plurality of data lines and the plurality of scanning lines intersect” is not only a point at which the data lines and the scanning lines intersect, but also an intersection between the data lines and the scanning lines. It includes even the area near the corner.
Furthermore, “a plurality of TFTs electrically connected to the data line and the scanning line and arranged at a plurality of intersections where the plurality of data lines and the plurality of scanning lines intersect” is, for example, a data line and The source electrode is electrically connected, the scanning line and the gate electrode are electrically connected, and the common electrode and the drain electrode are disposed via the pressure-sensitive member, and the data This indicates a state in which TFTs are arranged at the intersections of lines and scanning lines.
Furthermore, “both end portions” refer to regions at both ends of the data line or the scanning line, and do not necessarily need to be the most distal portions at both ends of the data line and the scanning line.

  Hereinafter, each structure in the pressure sensor apparatus of this invention is demonstrated.

1. Pressure-Sensitive Member The pressure-sensitive member of the present invention is a member formed on a TFT described later and having conductive particles dispersed therein.

  The pressure-sensitive member in the present invention is not particularly limited as long as the conductive particles are dispersed and the surface resistance changes according to the applied pressure. Specifically, it exhibits electrical insulation under no pressure, and when a predetermined pressure is applied, the conductive particles can be brought into contact with each other in the insulating resin to reduce the electrical resistance of the pressure-sensitive member. If it is, it will not be specifically limited. For example, it is preferable to match the on-resistance of the corresponding TFT.

  The pressure-sensitive member preferably has an elastic modulus such that the conduction resistance between the pressure-sensitive member and the electrode disposed in contact with the pressure-sensitive member varies favorably according to the applied pressure. For example, in a pressure-sensitive member having a high elastic modulus, when a large pressure is applied, the pressure-sensitive member bends, and the conductive particles come into contact with each other to reduce the resistance. Therefore, when a pressure-sensitive member having a high elastic modulus is used, a high pressure-sensitive range can be covered. On the other hand, in a pressure-sensitive member having a low elastic modulus, when a small pressure is applied, the pressure-sensitive member bends, and the conductive particles come into contact with each other to reduce resistance. Therefore, when a pressure sensitive member having a low elastic modulus is used, a low pressure sensitive range can be covered.

The thickness of the pressure-sensitive member is appropriately adjusted according to the structure of the pressure sensor device, the specific application, and the like. For example, it is preferably within a range of 0.1 μm to 10 mm, more preferably within a range of 1 μm to 1 mm, and particularly preferably within a range of 5 μm to 500 μm. When the pressure-sensitive member is used in a pressure sensor device, the conduction resistance between the pressure-sensitive member and the electrode disposed in contact with the pressure-sensitive member can be favorably changed according to the applied pressure. Because it can.
The thickness of the pressure-sensitive member refers to the maximum distance among the distances from the surface on the TFT side of the pressure-sensitive member to the surface on the pressure side.

  The insulating resin used for the pressure-sensitive member is not particularly limited as long as it has a predetermined electrical insulation property. In addition, the conductive particles described later can be dispersed, have elasticity that deforms according to the pressure applied to the pressure sensor device of the present invention, and the conductive particles come into contact with each other in the insulating resin. It will not specifically limit if the electrical resistance in a pressure member can be reduced, What is generally used for a pressure sensor apparatus can be used. For example, silicone resin, fluorine resin, polyamide resin, acrylic resin, polyurethane resin, polyester resin, epoxy resin, butyral resin, styrene-ethylene copolymer, butylene-olefin copolymer, olefin-ethylene copolymer and butylene olefin A copolymer etc. are mentioned. Among these, it is preferable to use a silicone resin. This is because it has excellent insulating properties and excellent stability over time. The insulating resin may be a mixture of two or more materials.

  The conductive particles used in the pressure-sensitive member may be those having desired conductivity, and those generally used in pressure sensor devices can be used. Examples thereof include carbon-based particles such as graphite, conductive carbon, copper, aluminum, nickel, iron powder, conductive tin oxide and conductive titanium oxide that are metal oxides, and carbides of organic resins. Among these, it is preferable to use graphite. Moreover, you may use the said electroconductive particle in combination of 2 or more types.

The average particle diameter of the conductive particles is not particularly limited as long as desired pressure sensitivity can be obtained when the pressure sensor device of the present invention is used as the pressure sensor device using the pressure sensitive member. It adjusts suitably according to the kind of electroconductive particle, the required sensitivity, etc. For example, in a pressure-sensitive member having conductive particles having a large average particle diameter, even when a small pressure is applied and the pressure-sensitive member is slightly bent, the conductive particles come into contact with each other and the resistance decreases. Therefore, when a pressure-sensitive member having conductive particles having a large average particle diameter is used, a relatively low pressure-sensitive range can be covered. On the other hand, in a pressure-sensitive member having conductive particles having a small average particle diameter, when a large pressure is applied and the pressure-sensitive member bends violently, the conductive particles come into contact with each other and the resistance decreases. Therefore, when a pressure-sensitive member having conductive particles having a small average particle diameter is used, a relatively high pressure-sensitive range can be covered.
The specific average particle diameter of the conductive particles contained in the pressure-sensitive member is preferably, for example, in the range of 0.1 μm to 500 μm, and more preferably in the range of 10 μm to 100 μm. , Preferably in the range of 15 μm to 50 μm.
In addition, an average particle diameter is an average particle diameter by microscope observation. The average particle diameter by microscopic observation is obtained, for example, by performing microscopic observation at a magnification of 100, measuring 100 particle diameters of arbitrary conductive particles with image processing software, and the like and averaging the number. In addition, a particle size refers to the average value of the major axis diameter and minor axis diameter of electroconductive particle.

Further, the content of the conductive particles in the pressure-sensitive member is particularly limited as long as a desired pressure-sensitive property is obtained when the pressure-sensitive member is used and the pressure sensor device of the present invention is used as the pressure sensor device. It is not a thing and it adjusts suitably according to the kind of electroconductive particle, the required sensitivity, etc. For example, in a pressure-sensitive member having a large content of conductive particles, even when a small pressure is applied and the pressure-sensitive member is slightly bent, the conductive particles come into contact with each other and the resistance decreases. Therefore, when a pressure-sensitive member having a high content of conductive particles is used, a relatively low pressure-sensitive range can be covered. On the other hand, in a pressure-sensitive member having a small content of conductive particles, when a large pressure is applied and the pressure-sensitive member bends vigorously, the conductive particles come into contact with each other and the resistance decreases. Therefore, when a pressure-sensitive member having a low content of conductive particles is used, a relatively high pressure-sensitive range can be covered.
As content of the electroconductive particle in a pressure-sensitive member, it is preferable to exist in the range of 1 mass%-99 mass%, for example, and it is preferable that it is in the range of 10 mass%-70 mass% especially, Especially. In the range of 20% by mass to 60% by mass.

  In addition to the insulating resin and conductive particles described above, the pressure-sensitive member has conventionally been used as an additive for resin members such as a vulcanization accelerator, a filler, an anti-aging agent, a softening agent, and a plasticizer as necessary. What is used may be contained suitably.

  A method for forming the pressure-sensitive member is not particularly limited as long as the method can disperse the conductive particles in the insulating resin. For example, the following forming method is mentioned. That is, first, an insulating resin and conductive particles are mixed using a kneader, and then formed into a desired shape by performing extrusion molding, injection molding, press molding, or the like. Then, a pressure-sensitive member can be obtained by vulcanization by heating or cooling. In addition, the pressure-sensitive member used in the present invention may be directly formed on the TFT described later, or a pre-formed pressure-sensitive member may be disposed on the TFT described later.

  The shape of the pressure-sensitive member in plan view is not particularly limited as long as the drain electrode and the common electrode can be connected, and may be a rectangular shape such as a quadrangle or a circular shape. Further, as the pressure sensitive member, for example, as shown in FIGS. 5 and 7 (a) to (c), the pressure sensitive member may be arranged in a strip shape along the data line X. It may be arranged in a band shape along. Furthermore, as the pressure-sensitive member, as shown in FIGS. 4 and 6 (a) to (c), the pressure-sensitive member may be individually arranged in each pressure-sensitive region.

2. Data line and scanning line The data line and the scanning line in the present invention are arranged on the substrate and intersect each other, and two or more adjacent data lines among the plurality of data lines are conductive at both end portions of the data line. In addition, two or more adjacent ones of the plurality of scanning lines are electrically connected at both end portions of the scanning lines.

  In the present invention, two or more adjacent data lines among the plurality of data lines are electrically connected at both end portions of the data line, and two or more adjacent data lines among the plurality of scanning lines are scanned. There is no particular limitation as long as it is conductive at both ends of the wire. Even if a disconnection occurs in either the data line or the scanning line, the signal wraps around from the data line or the conductive line that conducts to the scanning line. Therefore, a signal can be supplied to each TFT corresponding to the disconnected conductive line. It becomes possible.

  Further, the plurality of data lines and the plurality of scanning lines are not particularly limited as long as two or more adjacent lines are conductive, and are appropriately adjusted depending on the use of the pressure sensor device and the like. When two or more data lines and a plurality of scanning lines are conductive, even if the data line or the scanning line is disconnected, there is another conductive line that is conductive to the conductive line. The signal can be passed to each TFT corresponding to the conducting wire. Thereby, each TFT can be driven sufficiently.

Examples of the material for the data line and the scanning line include metal materials such as Al, Cu, Ta, Mo, Ag, and Au. Examples of a method for forming the data line and the scanning line include a method in which a metal layer is formed on a substrate by a sputtering method, a vacuum evaporation method, a CVD method, or the like, and then the metal layer is etched into a desired pattern. It is done. Moreover, the method of vapor-depositing a metal material in a desired pattern using a mask is mentioned.
Note that the line width and the like of the data line and the scanning line can be the same as those of a general data line and the scanning line, and thus description thereof is omitted here.

The method for conducting two or more adjacent data lines or scanning lines at both ends of the conducting wire is not particularly limited. For example, a method of attaching a flexible printed wiring board to the both ends of the conducting wire to conduct it, A method of forming conductive portions at both terminal portions of the conducting wire by a printing method or the like using a metal material can be mentioned.
In the present invention, for example, as shown in FIG. 3A, a flexible printed wiring plate 10 in which a conductive wiring portion 2 is formed on the surface of the insulating sheet 1 can be used. Specifically, for example, as shown in FIG. 3B, the flexible printed wiring plate 10 is attached to the end portions of the data lines X1 to X3 arranged on the substrate 3 so that the wiring portion 2 faces each other. It can be made conductive by attaching. 3A and 3B are schematic diagrams for explaining the flexible printed wiring board used in the present invention. Hereinafter, the flexible printed wiring board may be abbreviated as FPC.

  The wiring part in the FPC is not particularly limited as long as it is made of a conductive material. Normally, an FPC used for conducting a data line preferably has a wiring portion made of the same material as the data line. In an FPC used for conducting a scanning line, It is preferable to have a wiring portion made of the same material. A specific material can be the same as the material of the data line and the scanning line described above, and thus description thereof is omitted here.

  Further, the insulating sheet in the FPC is not particularly limited as long as it has a desired insulating property, and examples thereof include a flexible polyimide film having a thickness of about 25 μm.

3. TFT
The TFT in the present invention is usually composed of a gate electrode, a gate insulating layer, a source electrode, a drain electrode, and a semiconductor layer. In the present invention, an organic TFT using an organic semiconductor layer as the semiconductor layer is preferable. A TFT having excellent flexibility can be obtained. Therefore, the problem that the pressure sensor device is damaged by the applied pressure can be suppressed, and the pressure sensor device can be made highly reliable.

  For example, as shown in FIGS. 1A to 1C, the TFT according to the present invention includes a gate electrode 4, a gate insulating layer 5, and the gate electrode 4 and the gate insulating layer 5 formed on the substrate 3. And the semiconductor layer 7 formed between the source electrode 6S and the drain electrode 6D. The gate electrode 4 is electrically connected to the scanning line 12, and the source electrode 6 </ b> S is electrically connected to the data line 11.

  The TFT structure includes a gate electrode formed on the substrate, the gate insulating layer formed on the gate electrode, a bottom gate type having the source electrode and the drain electrode formed on the gate insulating layer. The source electrode and the drain electrode formed on the substrate, the gate insulating layer formed on the source electrode and the drain electrode, and the gate formed on the gate insulating layer A top gate type having electrodes may be used.

(1) Gate electrode, source electrode, and drain electrode The source electrode and drain electrode in the present invention are formed through a gate electrode and a gate insulating layer.

  The material constituting the gate electrode, the source electrode, and the drain electrode is not particularly limited as long as it has desired conductivity, and a conductive material generally used for TFTs can be used. Specific examples of the conductive material include inorganic materials such as Ta, Ti, Al, Zr, Cr, Nb, Hf, Mo, Au, Ag, Pt, Mo—Ta alloy, W—Mo alloy, ITO, and IZO. And organic materials having conductivity such as PEDOT / PSS.

  In addition, the gate electrode, the source electrode, and the drain electrode may be made of different materials or all may be made of the same material, but the source electrode and the drain electrode are usually the same. Consists of materials. Further, the gate electrode, the source electrode, and the drain electrode may be made of the same material as the data line, the scanning line, and the common electrode that are electrically connected to each other, and are made of different materials. In general, the gate electrode, the source electrode, and the drain electrode are made of the same material as the data line, the scanning line, and the common electrode that are electrically connected to each other. Hereinafter, the gate electrode, the source electrode, and the drain electrode may be simply referred to as electrodes.

  Although it will not specifically limit if it can be set as the electrode provided with a desired electrode characteristic as the thickness of the electrode in this invention, It is preferable to exist in the range of 50 nm-500 nm, respectively. This is because when the thickness is within the above range, the electrode can have desired electrode characteristics.

  The width of the electrode is not particularly limited as long as it can be an electrode having desired electrode characteristics, and is appropriately set according to the use of the pressure sensor device of the present invention.

  The method for forming the electrode is not particularly limited as long as the electrode can be formed so as to have desired electrode characteristics, pattern shape, and thickness, and is the same as a general electrode forming method. be able to. Specifically, using a metal mask, a conductive material film is formed by directly forming a pattern using a vapor deposition method, a sputtering method, or the like, or a vapor deposition method, a sputtering method, or the like. Examples thereof include a method of patterning the photosensitive resin layer using a photolithography method and then etching to form a pattern, a method using a printing method, and the like.

(2) Semiconductor layer The semiconductor layer in the present invention is formed between the source electrode and the drain electrode. Further, it is formed through a gate electrode and a gate insulating layer.

  The material constituting the semiconductor layer is not particularly limited as long as it exhibits desired switching characteristics. For example, silicon, an oxide semiconductor, or an organic semiconductor can be used. Especially, it is preferable that it is an organic semiconductor, ie, the said semiconductor layer is an organic-semiconductor layer. A TFT having excellent flexibility can be obtained. Therefore, the problem that the pressure sensor device is damaged by the applied pressure can be suppressed, and the pressure sensor device can be made highly reliable.

Examples of organic semiconductors include π-electron conjugated aromatic compounds, chain compounds, organic pigments, and organosilicon compounds. More specifically, pentacene, tetracene, thiophen oligomer derivatives, phenylene derivatives, phthalocyanine compounds, polyacetylene derivatives, polythiophene derivatives, cyanine dyes and the like can be mentioned.
Polysilicon and amorphous silicon can be used as the silicone.
Examples of the oxide semiconductor include zinc oxide (ZnO), titanium oxide (TiO), magnesium zinc oxide (MgxZn1-xO), cadmium zinc oxide (CdxZn1-xO), cadmium oxide (CdO), indium oxide (In2O3), Use of gallium oxide (Ga2O3), tin oxide (SnO2), magnesium oxide (MgO), tungsten oxide (WO), InGaZnO-based, InGaSnO-based, InGaZnMgO-based, InAlZnO-based, InFeZnO-based, InGaO-based, ZnGaO-based, InZnO-based Can do.

  The thickness of the semiconductor layer is not particularly limited as long as it can exhibit desired switching characteristics, and varies depending on the type of material constituting the semiconductor layer. When the layer is an organic semiconductor layer, it can be in the range of 1 nm to 1000 nm. The thickness of the semiconductor layer means the maximum distance among the distances from the substrate-side surface of the semiconductor layer to the surface of the semiconductor layer opposite to the substrate.

  The method for forming the semiconductor layer can be the same as the method for forming a general semiconductor layer, and differs depending on the type of material constituting the semiconductor layer. For example, the semiconductor layer is an organic semiconductor. In the case of a layer, various printing methods such as an inkjet printing method, a gravure printing method, a screen printing method, and a flexographic printing method can be used.

(3) Gate insulating layer The gate insulating layer in this invention is formed between the said gate electrode, the said source electrode, the said drain electrode, and the said semiconductor layer.

  The material constituting the gate insulating layer is not particularly limited as long as it has a desired insulating property, and can be the same as a general method for forming a semiconductor layer. Specifically, insulating inorganic materials such as silicon oxide, silicon nitride, aluminum oxide, tantalum oxide, barium strontium titanate (BST), lead zirconate titanate (PZT), acrylic resins, phenolic resins, Insulating organic materials such as fluorine resins, epoxy resins, cardo resins, vinyl resins, imide resins, and novolac resins can be used. Among these, it is preferable to use an insulating organic material. This is because the problem of breakage due to the applied pressure can be suppressed and the reliability can be improved.

  The thickness of the gate insulating layer may be any thickness as long as it can stably insulate between the gate electrode and the source electrode, and can be the same as a general method for forming a semiconductor layer. .

(4) TFT
The TFT in the present invention has a gate electrode, a gate insulating layer, a source electrode, a drain electrode, and a semiconductor layer, but may have other structures as necessary. Specifically, when the TFT according to the present invention has a bottom gate structure, the passivation layer is formed so as to cover the semiconductor layer and prevents deterioration of the semiconductor layer due to the action of moisture and oxygen present in the air. Examples include an overcoat layer formed on the substrate and having a flat surface on the surface of the substrate on which the electrode is formed.

(I) Passivation layer The material constituting the passivation layer is not particularly limited as long as it does not easily transmit moisture and oxygen in the air and can prevent deterioration of the semiconductor layer to a desired level. For example, the insulating organic material described in the section “(3) Gate insulating layer” can be used.

  The passivation layer preferably has a light shielding property. This is because malfunction due to light incident on the semiconductor layer can be suppressed, and the TFT switching characteristics can be improved.

  The thickness of the passivation is determined depending on the material constituting the passivation layer, etc., but can usually be in the range of 0.1 μm to 100 μm.

(Ii) Overcoat layer The overcoat layer forms a flat surface on the substrate. The material constituting the overcoat layer is not particularly limited as long as a desired flat surface can be formed. For example, the insulating organic material described in the above section “(3) Gate insulating layer” Can be used.

  The thickness of the overcoat layer may be a thickness that can flatten the step on the substrate surface, and can be in the range of 0.5 μm to 100 μm. As an overcoat layer forming method, an overcoat layer forming coating solution containing the above-mentioned material is applied and formed by a method such as spin coating, roll coating, cast coating, and the material is a photocurable resin. In the case of, a method of photocuring as necessary after ultraviolet irradiation, and in the case of a thermosetting resin, a method of thermosetting as it is after film formation can be mentioned.

4). Common electrode The common electrode in the present invention is formed on the TFT.

  In the pressure sensor device of the present invention, it is preferable that two or more adjacent electrodes among the plurality of common electrodes are electrically connected in addition to the data line and the scanning line described above. The specific conduction method can be the same as the contents described in the section “2. Data line and scanning line”, and the description is omitted here.

  Note that the material and thickness of the common electrode can be the same as the contents described in the section “3. TFT (1) Gate electrode, source electrode and drain electrode” described above. Omitted.

5. Pressure sensor device In the present invention, by mounting the pressure sensor device on the sole of the foot, it is possible to sense the state of landing and getting off the foot, and it can be used in the field of rehabilitation using a walking assist device. . The pressure sensor device according to the present invention can supply a signal to the TFT corresponding to the disconnected conductor from another conductor conducting with the disconnected conductor even when the conductor such as the data line or the scanning line is disconnected. it can. Therefore, when the pressure sensor device is used for rehabilitation or the like using the above-described walking assist device, a pressure sensor device with excellent durability capable of accurate detection over a long period of time can be obtained. Hereinafter, the structure of the pressure sensor device and other configurations will be described.

(1) Structure The structure of the pressure sensor device will be described with reference to the drawings. 4A and 4B are schematic schematic views showing an example of the pressure sensor device of the present invention. 4A is a schematic plan view showing an example of a TFT in the pressure sensor device, and FIG. 4B is a cross-sectional view taken along line BB in FIG. 4A. In FIG. 4A, the gate insulating layer and the common electrode are omitted for the sake of simplicity.

  As shown in FIGS. 4A and 4B, the pressure sensor device has a pressure-sensitive member 8 on the surface of the substrate 3 on the side where the TFT is formed. Specifically, the pressure sensitive member 8 is formed so as to be in contact with the drain electrode 6D, and the common electrode 9 is formed so as to be connected to the drain electrode 6D via the pressure sensitive member 8. As described above, since the drain electrode and the common electrode are connected via the pressure-sensitive member, when pressure is applied to the pressure-sensitive member from the common electrode side, the resistance of the pressurization region is reduced, and the drain Since the electrode and the common electrode are electrically connected, the pressure can be detected. In addition, about the code | symbol which is not demonstrated in FIG. 4 (a), (b), since it can be the same as that of FIG. 1 (a), (b), description here is abbreviate | omitted.

  In the present invention, the pressure sensitive member in the pressure sensor device is preferably formed so as to connect the drain electrode and the common electrode. Specifically, it is preferable to have a structure as shown in FIGS. 5 (a) and 5 (b) are schematic schematic views showing another example of the pressure sensor device of the present invention. 5A is a schematic plan view showing an example of a TFT in the pressure sensor device, and FIG. 5B is a cross-sectional view taken along the line CC of FIG. 5A. In FIG. 5A, the gate insulating layer is omitted for the sake of simplicity.

  In the pressure sensor device, as shown in FIGS. 5A and 5B, the common electrode 9 is formed on the same plane as the source electrode 6S and the drain electrode 6D formed on the gate insulating layer 5, and the common electrode 9 9 and the drain electrode 6 </ b> D may be connected via a pressure-sensitive member 8. Thus, when the common electrode and the drain electrode are connected via the pressure-sensitive member, when pressure is applied to the surface of the pressure-sensitive member, the surface resistance of the pressurization region decreases, and the common electrode and Since the drain electrode is electrically connected, the pressure can be detected. Note that reference numerals that are not described in FIGS. 5A and 5B can be the same as those in FIGS. 1A and 1B, and thus description thereof is omitted here.

  Since the pressure sensor device of the present invention has a structure as shown in FIGS. 5A and 5B, the common electrode can be formed simultaneously with the source electrode and the drain electrode. For this reason, the process of forming the common electrode, the process of bonding the pressure-sensitive member and the common electrode, and the process of patterning the passivation layer to form the through-hole for exposing the drain electrode, etc. are not required. Can be reduced. Moreover, since it becomes possible to apply a pressure directly to a pressure-sensitive member, a pressure can be transmitted stably and reliability can be improved.

  When the pressure sensor device has a structure as shown in FIGS. 5A and 5B, the common electrode 9 is formed in a line shape. For example, it is formed so as to be parallel to the data lines X1 to Xm shown in FIG. 1 and to intersect with the scanning lines Y1 to Yn. The material and thickness of the common electrode at this time can be the same as the contents described in the above section “3. TFT (1) Gate electrode, source electrode, and drain electrode”, and the description is omitted here. To do. Further, the line width of the common electrode formed in a line shape is not particularly limited as long as the desired conductivity can be exhibited, and is appropriately adjusted according to the use of the pressure sensor device and the like. .

(2) Other Configurations The pressure sensor device includes a substrate, a TFT, a common electrode, and a pressure sensitive member, but may have other configurations as necessary. Examples of other configurations include a protective layer that is formed so as to cover the TFT, the common electrode, and the pressure-sensitive member, and protects these configurations.

  The material of the protective layer is not particularly limited as long as it has insulating properties and can protect the TFT and the like. For example, the insulating organic material described in the section “3. TFT (3) Gate insulating layer” can be used.

  Although it will not specifically limit if it is a grade which has a desired protective function as a thickness of a protective layer, For example, it can be in the range of 100 micrometers-1 mm.

  The protective layer in the present invention may also be used as a passivation layer when the TFT has a bottom gate structure. In this case, it is preferable to have a light shielding property.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

  Hereinafter, the present invention will be specifically described with reference to examples.

[Example 1]
First, as shown in FIGS. 4A and 4B, a pressure sensor device having a TFT, a pressure sensitive member 8 and a common electrode 9 was formed on a substrate 3. At this time, m data lines 11 (where m is a natural number of 2 or more) and n scanning lines 12 (where n is a natural number of 2 or more) are formed to cross each other.

Next, as shown in FIG. 6A, the protective layer 16 was formed on the outermost surface of the substrate where the TFT was formed. Subsequently, openings H ₁₁ , H ₁₂ , and H ₁₃ were formed in both end portions of the data line 11, both end portions of the scanning line 12, and the common electrode 9 portion of the protective layer 16, respectively.

Thereafter, as shown in FIG. 6B, the data line 11 and the scanning line 12 exposed from the openings H ₁₁ and H _{12 are connected} to the wiring part 2 made of the same material as the data line 11 and An FPC having the wiring portion 2 made of the same material as the scanning line 12 was bonded. At this time, the FPC 10 as shown in FIG. 3A is used, but for the sake of simplicity, the insulating sheet 1 in the FPC 10 is omitted and only the wiring portion 2 is shown.

Subsequently, as shown in FIG. 6-2 (c), on the common electrode 9 that is exposed from the opening H _13, bonding the FPC having been wiring portion 2 made of the same material as the common electrode 9. In this case, the FPC 10 as shown in FIG. 3A was used as in FIG. 6B, but the insulating sheet 1 in the FPC 10 is omitted for the sake of simplicity. Only the wiring part 2 is shown.

[Example 2]
First, as shown in FIGS. 5A and 5B, a pressure sensor device having a TFT, a pressure sensitive member 8 and a common electrode 9 was formed on a substrate 3. At this time, m data lines 11 (where m is a natural number of 2 or more) and n scanning lines 12 (where n is a natural number of 2 or more) are formed to cross each other.

  Next, as shown in FIG. 7A, a protective layer 16 was formed on the outermost surface of the substrate where the TFT was formed so as to cover the common electrode 9.

  After that, as shown in FIG. 7B, both end portions of the data line 11 and the scanning line 12 are made of the same material as the wiring part 2 and the scanning line 12 made of the same material as the data line 11. The FPC having the wiring part 2 was bonded. At this time, the FPC 10 as shown in FIG. 3A is used, but for the sake of simplicity, the insulating sheet 1 in the FPC 10 is omitted and only the wiring portion 2 is shown.

DESCRIPTION OF SYMBOLS 1 ... Insulating sheet 2 ... Wiring part 3 ... Board | substrate 4 ... Gate electrode 5 ... Gate insulating layer 6S ... Source electrode 6D ... Drain electrode 7 ... Semiconductor layer 8 ... Pressure-sensitive member 9 ... Common electrode 10 ... Flexible printed wiring board (FPC)
DESCRIPTION OF SYMBOLS 11, X ... Data line 12, Y ... Scan line 100 ... Pressure sensor apparatus _CX ... Data line drive part _CY ... Scan line drive part

Claims (2)

A substrate,
A plurality of data lines arranged on the substrate;
A plurality of scanning lines arranged on the substrate so as to intersect the plurality of data lines;
A plurality of thin film transistors electrically connected to the data lines and the scanning lines and disposed at a plurality of intersections where the plurality of data lines and the plurality of scanning lines intersect;
A pressure-sensitive member disposed on the thin film transistor and having conductive particles dispersed therein;
A common electrode connected to the thin film transistor through the pressure sensitive member;
Two or more adjacent data lines among the plurality of data lines are conductive at both end portions of the data line, and two or more adjacent ones of the plurality of scan lines are both end portions of the scan line. A pressure sensor device characterized by being electrically connected.   The pressure sensor device according to claim 1, wherein the thin film transistor is an organic thin film transistor having an organic semiconductor layer.