JP2015521385A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2015521385A5 JP2015521385A5 JP2015512034A JP2015512034A JP2015521385A5 JP 2015521385 A5 JP2015521385 A5 JP 2015521385A5 JP 2015512034 A JP2015512034 A JP 2015512034A JP 2015512034 A JP2015512034 A JP 2015512034A JP 2015521385 A5 JP2015521385 A5 JP 2015521385A5
- Authority
- JP
- Japan
- Prior art keywords
- plate
- cooling
- small beam
- cooling channels
- coolant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261646398P | 2012-05-14 | 2012-05-14 | |
| US61/646,398 | 2012-05-14 | ||
| PCT/EP2013/059948 WO2013171216A1 (en) | 2012-05-14 | 2013-05-14 | Charged particle multi-beamlet lithography system and cooling arrangement manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015521385A JP2015521385A (ja) | 2015-07-27 |
| JP2015521385A5 true JP2015521385A5 (https=) | 2016-07-14 |
| JP5973061B2 JP5973061B2 (ja) | 2016-08-23 |
Family
ID=48444378
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015512034A Active JP5973061B2 (ja) | 2012-05-14 | 2013-05-14 | 荷電粒子マルチ小ビームリソグラフィシステム及び冷却装置製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP2850635B1 (https=) |
| JP (1) | JP5973061B2 (https=) |
| KR (1) | KR101945964B1 (https=) |
| CN (1) | CN104471669B (https=) |
| NL (1) | NL2010799C2 (https=) |
| WO (1) | WO2013171216A1 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11348756B2 (en) | 2012-05-14 | 2022-05-31 | Asml Netherlands B.V. | Aberration correction in charged particle system |
| CN104428866A (zh) | 2012-05-14 | 2015-03-18 | 迈普尔平版印刷Ip有限公司 | 带电粒子光刻系统和射束产生器 |
| JP6224252B2 (ja) * | 2013-09-07 | 2017-11-01 | マッパー・リソグラフィー・アイピー・ビー．ブイ． | 標的処理ユニット |
| CN108962708A (zh) * | 2013-11-14 | 2018-12-07 | 迈普尔平版印刷Ip有限公司 | 电极堆栈布置 |
| US10486232B2 (en) | 2015-04-21 | 2019-11-26 | Varian Semiconductor Equipment Associates, Inc. | Semiconductor manufacturing device with embedded fluid conduits |
| US9829804B1 (en) | 2016-07-28 | 2017-11-28 | Mapper Lithography Ip B.V. | Substrate holding device, method for manufacturing such a device, and use of such a device in a lithography system |
| CN108121164B (zh) | 2016-11-29 | 2020-12-01 | 中芯国际集成电路制造(上海)有限公司 | 光罩散热装置及其工作方法 |
| TWI842676B (zh) * | 2017-08-28 | 2024-05-21 | 荷蘭商Ａｓｍｌ荷蘭公司 | 半導體記憶裝置及其製造方法 |
| US12287151B2 (en) * | 2021-02-26 | 2025-04-29 | Teradyne, Inc. | Thermal plate having a fluid channel |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3157308A (en) | 1961-09-05 | 1964-11-17 | Clark Mfg Co J L | Canister type container and method of making the same |
| US3159408A (en) | 1961-10-05 | 1964-12-01 | Grace W R & Co | Chuck |
| US4524308A (en) | 1984-06-01 | 1985-06-18 | Sony Corporation | Circuits for accomplishing electron beam convergence in color cathode ray tubes |
| WO1994025880A1 (en) | 1993-04-30 | 1994-11-10 | Board Of Regents, The University Of Texas System | Megavoltage scanning imager and method for its use |
| EP0766405A1 (en) | 1995-09-29 | 1997-04-02 | STMicroelectronics S.r.l. | Successive approximation register without redundancy |
| US6046457A (en) * | 1998-01-09 | 2000-04-04 | International Business Machines Corporation | Charged particle beam apparatus having anticontamination means |
| JP2000348662A (ja) * | 1999-06-02 | 2000-12-15 | Nikon Corp | 荷電粒子線照射系、荷電粒子線露光装置及び半導体デバイス製造方法 |
| JP4355446B2 (ja) * | 2000-12-28 | 2009-11-04 | 株式会社アドバンテスト | 電子ビーム露光装置及び電子ビーム成形部材 |
| US6563124B2 (en) | 2001-03-21 | 2003-05-13 | Applied Materials, Inc. | Electron beam apparatus having traversing circuit boards |
| US6768125B2 (en) * | 2002-01-17 | 2004-07-27 | Ims Nanofabrication, Gmbh | Maskless particle-beam system for exposing a pattern on a substrate |
| ATE538412T1 (de) | 2002-10-25 | 2012-01-15 | Mapper Lithography Ip Bv | Lithographisches system |
| AU2003276779A1 (en) | 2002-10-30 | 2004-05-25 | Mapper Lithography Ip B.V. | Electron beam exposure system |
| KR101068607B1 (ko) | 2003-03-10 | 2011-09-30 | 마퍼 리쏘그라피 아이피 비.브이. | 복수 개의 빔렛 발생 장치 |
| JP4113032B2 (ja) * | 2003-04-21 | 2008-07-02 | キヤノン株式会社 | 電子銃及び電子ビーム露光装置 |
| ATE524822T1 (de) | 2003-05-28 | 2011-09-15 | Mapper Lithography Ip Bv | Belichtungsverfahren für strahlen aus geladenen teilchen |
| ATE381728T1 (de) | 2003-07-30 | 2008-01-15 | Mapper Lithography Ip Bv | Modulator-schaltkreise |
| US7145641B2 (en) * | 2003-12-31 | 2006-12-05 | Asml Netherlands, B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| JP3929459B2 (ja) * | 2004-11-11 | 2007-06-13 | 株式会社日立ハイテクノロジーズ | 荷電粒子線露光装置 |
| TWI345685B (en) * | 2005-09-06 | 2011-07-21 | Asml Netherlands Bv | Lithographic method |
| US7709815B2 (en) | 2005-09-16 | 2010-05-04 | Mapper Lithography Ip B.V. | Lithography system and projection method |
| KR101755577B1 (ko) * | 2010-11-13 | 2017-07-07 | 마퍼 리쏘그라피 아이피 비.브이. | 애퍼처 어레이 냉각장치를 갖춘 하전 입자 리소그래피 시스템 |
| US8586949B2 (en) * | 2010-11-13 | 2013-11-19 | Mapper Lithography Ip B.V. | Charged particle lithography system with intermediate chamber |
| JP5253532B2 (ja) * | 2011-03-01 | 2013-07-31 | キヤノン株式会社 | 偏向器アレイ、偏向器アレイの製造方法、描画装置、および物品の製造方法 |
| NL2007604C2 (en) * | 2011-10-14 | 2013-05-01 | Mapper Lithography Ip Bv | Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams. |
| WO2016158421A1 (ja) | 2015-04-03 | 2016-10-06 | 株式会社日立ハイテクノロジーズ | 光量検出装置、それを用いた免疫分析装置および荷電粒子線装置 |
-
2013
- 2013-05-14 KR KR1020147035213A patent/KR101945964B1/ko active Active
- 2013-05-14 WO PCT/EP2013/059948 patent/WO2013171216A1/en not_active Ceased
- 2013-05-14 NL NL2010799A patent/NL2010799C2/en active
- 2013-05-14 EP EP13722748.4A patent/EP2850635B1/en active Active
- 2013-05-14 JP JP2015512034A patent/JP5973061B2/ja active Active
- 2013-05-14 CN CN201380037560.8A patent/CN104471669B/zh active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2015521385A5 (https=) | ||
| WO2013171216A4 (en) | Charged particle multi-beamlet lithography system and cooling arrangement manufacturing method | |
| JP2013544030A5 (https=) | ||
| US10873115B2 (en) | Housing for accommodation of a plurality of battery cells having a cooling device integrated in the housing | |
| US9980415B2 (en) | Configurable double-sided modular jet impingement assemblies for electronics cooling | |
| JP2018503057A (ja) | エレクトロニクス機器を冷却する受動的及び能動的な流れ制御を伴うモジュール式の噴流衝当アセンブリ | |
| US20120063091A1 (en) | Cooling Apparatuses and Power Electronics Modules | |
| US20150229009A1 (en) | Cooling device, in particular for a battery of a motor vehicle | |
| JP2016156823A5 (https=) | ||
| JP2013544031A5 (https=) | ||
| CN103281890B (zh) | 一种水冷板 | |
| TW201236045A (en) | Charged particle lithography system with aperture array cooling | |
| US20140029199A1 (en) | Cooling apparatuses and electronics modules having branching microchannels | |
| MY151856A (en) | Evaporative cooling device | |
| CN105308739A (zh) | 液冷散热器 | |
| Han et al. | Package-level Si-based micro-jet impingement cooling solution with multiple drainage micro-trenches | |
| JP6567344B2 (ja) | 伝熱プレート | |
| JP2022535642A (ja) | 液体冷却冷却板及び通信装置 | |
| CN108091899A (zh) | 燃料电池 | |
| CN103296330A (zh) | 一种电源冷却装置 | |
| CN108452541A (zh) | 蒸发器和燃料电池装置 | |
| KR20180131220A (ko) | 전기소자 냉각용 열교환기 | |
| JP2016025354A (ja) | 伝熱板 | |
| JP6295455B2 (ja) | 光照射装置 | |
| US9837671B2 (en) | Fuel cell fluid distribution |