JP2015516862A5 - - Google Patents

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Publication number
JP2015516862A5
JP2015516862A5 JP2015508998A JP2015508998A JP2015516862A5 JP 2015516862 A5 JP2015516862 A5 JP 2015516862A5 JP 2015508998 A JP2015508998 A JP 2015508998A JP 2015508998 A JP2015508998 A JP 2015508998A JP 2015516862 A5 JP2015516862 A5 JP 2015516862A5
Authority
JP
Japan
Prior art keywords
scrubber brush
mandrel
sleeve
scrubber
brush
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2015508998A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015516862A (ja
Filing date
Publication date
Priority claimed from US13/456,796 external-priority patent/US9119461B2/en
Application filed filed Critical
Publication of JP2015516862A publication Critical patent/JP2015516862A/ja
Publication of JP2015516862A5 publication Critical patent/JP2015516862A5/ja
Pending legal-status Critical Current

Links

JP2015508998A 2012-04-26 2013-04-08 高剛性スリップ防止スクラバ用ブラシアセンブリ、高剛性マンドレル、サブアセンブリ、および組み立て方法 Pending JP2015516862A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/456,796 2012-04-26
US13/456,796 US9119461B2 (en) 2012-04-26 2012-04-26 High stiffness, anti-slip scrubber brush assembly, high-stiffness mandrel, subassemblies, and assembly methods
PCT/US2013/035682 WO2013162864A1 (en) 2012-04-26 2013-04-08 High stiffness, anti-slip scrubber brush assembly, high-stiffness mandrel, subassemblies, and assembly methods

Publications (2)

Publication Number Publication Date
JP2015516862A JP2015516862A (ja) 2015-06-18
JP2015516862A5 true JP2015516862A5 (enExample) 2016-06-02

Family

ID=49476037

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015508998A Pending JP2015516862A (ja) 2012-04-26 2013-04-08 高剛性スリップ防止スクラバ用ブラシアセンブリ、高剛性マンドレル、サブアセンブリ、および組み立て方法

Country Status (5)

Country Link
US (1) US9119461B2 (enExample)
JP (1) JP2015516862A (enExample)
KR (1) KR102194652B1 (enExample)
TW (1) TWI577311B (enExample)
WO (1) WO2013162864A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9202723B2 (en) 2011-11-29 2015-12-01 Illinois Tool Works, Inc. Brush with cantilevered nodules
US20140059913A1 (en) * 2012-03-14 2014-03-06 Advanced Innovation and Manufacturing, Inc. Suppressor sleeves and heat resistant weapon accessories
US9140511B2 (en) * 2012-03-14 2015-09-22 Frank J. Michal Barrel and suppressor sleeves and heat resistant weapon accessories
US8778087B2 (en) 2012-04-03 2014-07-15 Illinois Tool Works Inc. Conical sponge brush for cleaning semiconductor wafers
CN110216088A (zh) * 2019-04-30 2019-09-10 广东隽诺环保科技股份有限公司 一种清洗刀辊以及具有清洗刀辊的清洗机
CN110335837A (zh) * 2019-07-05 2019-10-15 北京理工大学 一种半导体晶圆清洗用多孔亲水材料和组件的制备方法
KR102366741B1 (ko) * 2019-10-15 2022-02-22 윤정혜 기판세정장치
CN114438552B (zh) * 2022-02-08 2022-09-16 广东嘉元科技股份有限公司 一种电解铜箔生产表面处理装置
KR102831850B1 (ko) * 2022-05-31 2025-07-10 엔테그리스, 아이엔씨. 반도체 제조 프로세스용 세정 브러시
KR102664024B1 (ko) * 2022-06-17 2024-05-13 주식회사 브러쉬텍 내경이 확장된 웨이퍼 세정용 브러쉬
KR20240176171A (ko) * 2023-06-15 2024-12-24 윤스랩 주식회사 웨이퍼 세정용 브러쉬

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6299698B1 (en) 1998-07-10 2001-10-09 Applied Materials, Inc. Wafer edge scrubber and method
SG99307A1 (en) * 1999-06-01 2003-10-27 Applied Materials Inc Brush core for disk scrubbing apparatus and method for use thereof
US6728989B2 (en) 2001-01-27 2004-05-04 Applied Materials Inc. Labyrinth seal for bearing in brush mounting assembly for semiconductor wafer scrubber
US7955693B2 (en) 2001-04-20 2011-06-07 Tolland Development Company, Llc Foam composition roller brush with embedded mandrel
US6904637B2 (en) 2001-10-03 2005-06-14 Applied Materials, Inc. Scrubber with sonic nozzle
EP1680260B1 (en) * 2003-08-08 2014-04-30 Entegris, Inc. Methods and materials for making a monolithic porous pad cast onto a rotatable base
US20050109371A1 (en) 2003-10-27 2005-05-26 Applied Materials, Inc. Post CMP scrubbing of substrates
CN101339898B (zh) * 2004-01-29 2010-09-29 应用材料公司 在心轴上安装洗涤器刷子的方法和设备
JP2007289878A (ja) 2006-04-26 2007-11-08 Hitachi High-Technologies Corp ディスク洗浄ブラシ、ディスク洗浄機構およびディスク洗浄装置
US8407846B2 (en) 2006-03-07 2013-04-02 Applied Materials, Inc. Scrubber brush with sleeve and brush mandrel for use with the scrubber brush
TW200809936A (en) 2006-06-05 2008-02-16 Applied Materials Inc Methods and apparatus for supporting a substrate in a horizontal orientation during cleaning
JP2008004618A (ja) * 2006-06-20 2008-01-10 Renesas Technology Corp 半導体装置の製造方法
KR101119951B1 (ko) 2009-09-29 2012-03-16 방선정 반도체 웨이퍼용 브러쉬 롤
TWI594811B (zh) 2010-05-19 2017-08-11 湯瑪士衛斯特公司 用於擦洗基材的裝置與方法

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