JP2015509662A5 - - Google Patents

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Publication number
JP2015509662A5
JP2015509662A5 JP2014558009A JP2014558009A JP2015509662A5 JP 2015509662 A5 JP2015509662 A5 JP 2015509662A5 JP 2014558009 A JP2014558009 A JP 2014558009A JP 2014558009 A JP2014558009 A JP 2014558009A JP 2015509662 A5 JP2015509662 A5 JP 2015509662A5
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JP
Japan
Prior art keywords
optical element
retardation
area
defect
partial
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JP2014558009A
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English (en)
Japanese (ja)
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JP2015509662A (ja
JP6315343B2 (ja
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Priority claimed from PCT/EP2012/052909 external-priority patent/WO2013123973A1/en
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Publication of JP2015509662A5 publication Critical patent/JP2015509662A5/ja
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JP2014558009A 2012-02-21 2012-02-21 光学系の少なくとも１つの欠陥を補償する方法 Active JP6315343B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2012/052909 WO2013123973A1 (en) 2012-02-21 2012-02-21 Method and apparatus for compensating at least one defect of an optical system

Publications (3)

Publication Number Publication Date
JP2015509662A JP2015509662A (ja) 2015-03-30
JP2015509662A5 true JP2015509662A5 (cg-RX-API-DMAC10.html) 2015-05-07
JP6315343B2 JP6315343B2 (ja) 2018-04-25

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JP2014558009A Active JP6315343B2 (ja) 2012-02-21 2012-02-21 光学系の少なくとも１つの欠陥を補償する方法

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US (1) US9798249B2 (cg-RX-API-DMAC10.html)
JP (1) JP6315343B2 (cg-RX-API-DMAC10.html)
WO (1) WO2013123973A1 (cg-RX-API-DMAC10.html)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012206287A1 (de) 2012-04-17 2013-10-17 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
KR101949571B1 (ko) 2014-03-04 2019-02-18 노바다크 테크놀러지즈 유엘씨 광대역 이미징을 위한 릴레이 렌즈 시스템
JP6479035B2 (ja) 2014-03-04 2019-03-06 ノバダック テクノロジーズ ユーエルシー 空間およびスペクトルフィルタリング開口およびそれを含む光学イメージングシステム
DK3238278T3 (da) * 2014-12-22 2020-06-08 Mag Instr Inc Forbedret effektivitetsbelysningsapparat med led direkte monteret til en køleindretning
EP3345024B1 (en) * 2015-08-31 2023-05-31 Stryker European Operations Limited Imaging system comprising a polarization filter and method of filtering polarized light in an imaging system
CN105444996A (zh) * 2015-11-25 2016-03-30 上海小糸车灯有限公司 一种皮纹散射检测支架
DE102017208340A1 (de) 2017-05-17 2018-11-22 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission
JP2021531502A (ja) * 2018-07-17 2021-11-18 カール ツァイス エスエムエス リミテッド フォトリソグラフィマスクの基板に導入される１つまたは複数のピクセルの効果を決定するための方法および装置
WO2025234336A1 (ja) * 2024-05-10 2025-11-13 Ａｇｃ株式会社 Ｅｕｖリソグラフィ用ガラス基板およびｅｕｖリソグラフィ用マスクブランク

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19535392A1 (de) 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit
US6728021B1 (en) * 2002-11-18 2004-04-27 Carl Zeiss Smt Ag Optical component and method of inducing a desired alteration of an optical property therein
US7289223B2 (en) 2003-01-31 2007-10-30 Carl Zeiss Smt Ag Method and apparatus for spatially resolved polarimetry
JP4018564B2 (ja) * 2003-03-14 2007-12-05 キヤノン株式会社 光学系、及びそれを用いた露光装置、デバイスの製造方法
DE60315986T2 (de) * 2003-10-09 2008-05-21 Asml Netherlands B.V. Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung
DE102004011733A1 (de) 2004-03-04 2005-09-22 Carl Zeiss Smt Ag Transmissionsfiltervorrichtung
JP5159027B2 (ja) 2004-06-04 2013-03-06 キヤノン株式会社 照明光学系及び露光装置
US7245353B2 (en) 2004-10-12 2007-07-17 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method
CN101467090A (zh) 2006-06-16 2009-06-24 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
DE102006032810A1 (de) 2006-07-14 2008-01-17 Carl Zeiss Smt Ag Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
KR100809329B1 (ko) * 2006-09-08 2008-03-07 삼성전자주식회사 광학계의 수차를 보정하기 위한 미러를 포함하는포토리소그래피 장치 및 수차 보정부를 포함하는 미러
JP5240190B2 (ja) 2007-04-09 2013-07-17 旭硝子株式会社 位相差板の製造方法
DE102008009601A1 (de) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
JP5722074B2 (ja) * 2010-02-25 2015-05-20 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置および方法
DE102011076435B4 (de) * 2011-05-25 2013-09-19 Carl Zeiss Smt Gmbh Verfahren sowie Vorrichtung zur Einstellung einer Beleuchtungsoptik

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