JP2015505205A - 共振器を作成する方法 - Google Patents
共振器を作成する方法 Download PDFInfo
- Publication number
- JP2015505205A JP2015505205A JP2014548036A JP2014548036A JP2015505205A JP 2015505205 A JP2015505205 A JP 2015505205A JP 2014548036 A JP2014548036 A JP 2014548036A JP 2014548036 A JP2014548036 A JP 2014548036A JP 2015505205 A JP2015505205 A JP 2015505205A
- Authority
- JP
- Japan
- Prior art keywords
- resonator
- arm
- groove
- laser
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 238000005530 etching Methods 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 claims description 59
- 239000000463 material Substances 0.000 claims description 47
- 239000000919 ceramic Substances 0.000 claims description 7
- 230000008859 change Effects 0.000 claims description 7
- 239000011521 glass Substances 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 230000005684 electric field Effects 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 claims description 5
- 239000010453 quartz Substances 0.000 claims description 5
- 239000013078 crystal Substances 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 2
- 230000001154 acute effect Effects 0.000 claims 1
- 239000013043 chemical agent Substances 0.000 description 13
- 230000008901 benefit Effects 0.000 description 12
- 238000003486 chemical etching Methods 0.000 description 11
- 230000004048 modification Effects 0.000 description 8
- 238000012986 modification Methods 0.000 description 8
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 230000008878 coupling Effects 0.000 description 5
- 238000010168 coupling process Methods 0.000 description 5
- 238000005859 coupling reaction Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000009471 action Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000000386 athletic effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000011009 synthetic ruby Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/0027—Ion-implantation, ion-irradiation or ion-injection
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/19—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator consisting of quartz
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/62605—Treating the starting powders individually or as mixtures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00555—Achieving a desired geometry, i.e. controlling etch rates, anisotropy or selectivity
- B81C1/00595—Control etch selectivity
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
- C04B35/5607—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on refractory metal carbides
- C04B35/5611—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on refractory metal carbides based on titanium carbides
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
- C04B35/565—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/584—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/628—Coating the powders or the macroscopic reinforcing agents
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/628—Coating the powders or the macroscopic reinforcing agents
- C04B35/62802—Powder coating materials
- C04B35/62828—Non-oxide ceramics
- C04B35/62836—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/628—Coating the powders or the macroscopic reinforcing agents
- C04B35/62844—Coating fibres
- C04B35/62857—Coating fibres with non-oxide ceramics
- C04B35/62865—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/628—Coating the powders or the macroscopic reinforcing agents
- C04B35/62844—Coating fibres
- C04B35/62857—Coating fibres with non-oxide ceramics
- C04B35/62865—Nitrides
- C04B35/62871—Silicon nitride
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/628—Coating the powders or the macroscopic reinforcing agents
- C04B35/62844—Coating fibres
- C04B35/62878—Coating fibres with boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/628—Coating the powders or the macroscopic reinforcing agents
- C04B35/62884—Coating the powders or the macroscopic reinforcing agents by gas phase techniques
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V17/00—Fastening of component parts of lighting devices, e.g. shades, globes, refractors, reflectors, filters, screens, grids or protective cages
- F21V17/02—Fastening of component parts of lighting devices, e.g. shades, globes, refractors, reflectors, filters, screens, grids or protective cages with provision for adjustment
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/04—Oscillators acting by spring tension
- G04B17/06—Oscillators with hairsprings, e.g. balance
- G04B17/066—Manufacture of the spiral spring
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/32—Component parts or constructional details, e.g. collet, stud, virole or piton
- G04B17/34—Component parts or constructional details, e.g. collet, stud, virole or piton for fastening the hairspring onto the balance
- G04B17/345—Details of the spiral roll
-
- G—PHYSICS
- G04—HOROLOGY
- G04C—ELECTROMECHANICAL CLOCKS OR WATCHES
- G04C3/00—Electromechanical clocks or watches independent of other time-pieces and in which the movement is maintained by electric means
- G04C3/08—Electromechanical clocks or watches independent of other time-pieces and in which the movement is maintained by electric means wherein movement is regulated by a mechanical oscillator other than a pendulum or balance, e.g. by a tuning fork, e.g. electrostatically
- G04C3/12—Electromechanical clocks or watches independent of other time-pieces and in which the movement is maintained by electric means wherein movement is regulated by a mechanical oscillator other than a pendulum or balance, e.g. by a tuning fork, e.g. electrostatically driven by piezoelectric means; driven by magneto-strictive means
-
- G—PHYSICS
- G04—HOROLOGY
- G04F—TIME-INTERVAL MEASURING
- G04F5/00—Apparatus for producing preselected time intervals for use as timing standards
- G04F5/04—Apparatus for producing preselected time intervals for use as timing standards using oscillators with electromechanical resonators producing electric oscillations or timing pulses
- G04F5/06—Apparatus for producing preselected time intervals for use as timing standards using oscillators with electromechanical resonators producing electric oscillations or timing pulses using piezoelectric resonators
- G04F5/063—Constructional details
-
- G—PHYSICS
- G04—HOROLOGY
- G04G—ELECTRONIC TIME-PIECES
- G04G17/00—Structural details; Housings
- G04G17/02—Component assemblies
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/21—Crystal tuning forks
- H03H9/215—Crystal tuning forks consisting of quartz
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/08—Shaping or machining of piezoelectric or electrostrictive bodies
- H10N30/082—Shaping or machining of piezoelectric or electrostrictive bodies by etching, e.g. lithography
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/87—Electrodes or interconnections, e.g. leads or terminals
- H10N30/875—Further connection or lead arrangements, e.g. flexible wiring boards, terminal pins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0271—Resonators; ultrasonic resonators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/0118—Cantilevers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/019—Suspended structures, i.e. structures allowing a movement characterized by their profile
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0128—Processes for removing material
- B81C2201/0143—Focussed beam, i.e. laser, ion or e-beam
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
- C04B2235/54—Particle size related information
- C04B2235/5418—Particle size related information expressed by the size of the particles or aggregates thereof
- C04B2235/5436—Particle size related information expressed by the size of the particles or aggregates thereof micrometer sized, i.e. from 1 to 100 micron
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/95—Products characterised by their size, e.g. microceramics
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Optics & Photonics (AREA)
- Acoustics & Sound (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Geometry (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Composite Materials (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Micromachines (AREA)
- Laser Beam Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
Description
Claims (42)
- 基材に共振器(300、400)を製造する方法であって、
(a)前記少なくとも1つの領域をより選択的にするために、前記基材の少なくとも1つの領域の構造を加工するステップと、
(b)共振器を選択的に製造するために、前記少なくとも1つの領域をエッチングするステップと
を有することを特徴にする製造方法。 - (c)前記基材から前記共振器を分離するステップをさらに有する
ことを特徴にする請求項1に記載の製造方法。 - 前記少なくとも1つの領域の構造は、レーザー(L)によって加工される
ことを特徴にする請求項1又は2に記載の製造方法。 - 前記基材は、レーザー波長に対して透過性を有する材料で作られる
ことを特徴にする前の請求項のいずれかに記載の製造方法。 - 前記レーザー(L)のパルス持続時間は、1フェムト秒〜1ピコ秒の範囲内である
ことを特徴にする請求項3又は4に記載の製造方法。 - 前記基材は、単結晶材料で作られる
ことを特徴にする請求項4に記載の製造方法。 - 前記基材は、多結晶材料で作られる
ことを特徴にする請求項4に記載の製造方法。 - 前記基材は、高分子で作られる
ことを特徴にする請求項4に記載の製造方法。 - 前記基材は、セラミック又はガラスのようなアモルファス物質で作られる
ことを特徴にする請求項4に記載の製造方法。 - 前記共振器は、支持ベース(302)を有する共振器(300)であり、この支持ベース(302)から少なくとも2つの平行なアーム(304)が延在し、
これらアーム(304)のそれぞれは、上部表面(314)及び下部表面(316)を有し、
前記共振器(300)は、さらに、前記少なくとも2つの平行なアーム(304)の少なくとも1つの表面の一方に作られる少なくとも1つの凹部(310)を有する
ことを特徴にする請求項1〜9のいずれかに記載の製造方法。 - 前記少なくとも1つの凹部(310)は、少なくとも1つの垂直方向の側面(312)がある溝の形態である
ことを特徴にする請求項10に記載の製造方法。 - 前記共振器は、1つのアーム当たり1つの溝(310)を有する
ことを特徴にする請求項10又は11に記載の製造方法。 - 前記共振器は、各アームの前記上部表面(314)上に1つの溝(310)を有し、各アーム(304)の前記下部表面(316)上に1つの溝(310)を有する
ことを特徴にする請求項10又は11に記載の製造方法。 - 前記共振器は、1つのアーム当たり2つの溝(310)を有する
ことを特徴にする請求項10又は11に記載の製造方法。 - 前記共振器は、各アームの前記上部表面上の2つの溝(310)を有し、各アームの前記下部表面上の2つの溝(310)を有する
ことを特徴にする請求項10又は11に記載の製造方法。 - 前記共振器は、スパイラル体を形成するように渦巻き状の棒体によって形成される構成体(100)につながれた慣性ブロックを有する共振器(400)であり、
前記構成体は、少なくとも1つの中空部分(310)を有し、これは、前記構成体の剛性を局所的に変更し、前記共振器の周波数の調整及び/又は等時性ずれの調整が行われる
ことを特徴にする請求項1〜9のいずれかに記載の製造方法。 - 前記少なくとも1つの中空部分は、少なくとも2つの平行な垂直方向の側面を有する
ことを特徴にする請求項16に記載の製造方法。 - 前記構成体は、石英又はセラミック又はガラスで作られており、局所的に平行であり、当該構成体の全長にわたって垂直方向である側面を有する
ことを特徴にする請求項16又は17に記載の製造方法。 - 前記構成体は、渦巻き状の棒体によって形成される他のコイルの平面よりも高さが高い外側コイルを有する
ことを特徴にする請求項16〜18のいずれかに記載の製造方法。 - 前記構成体(100)は、少なくとも1つの発光性エネルギー源によって発光される光を透過し拡散させる
ことを特徴にする請求項16〜19のいずれかに記載の製造方法。 - 前記構成体(100)の構造は、材料の屈折率を局所的に変更するようにレーザーによって加工される
ことを特徴にする請求項20に記載の製造方法。 - 材料の屈折率がレーザーによって変更された前記構成体(100)の構造は、鏡を形成するために用いられる
ことを特徴にする請求項20に記載の製造方法。 - 材料の屈折率がレーザーによって変更された前記構成体(100)の構造は、光導波路を形成するために用いられる
ことを特徴にする請求項20に記載の製造方法。 - 支持ベース(302)を有する共振器(300)であって、この支持ベース(302)から少なくとも2つの平行なアーム(304)が延在し、
このアーム(304)はそれぞれ、上部表面(314)及び下部表面(316)を有し、
前記少なくとも2つの平行なアーム(304)の1つの上に少なくとも1つの電極群が位置して、前記少なくとも2つの平行なアーム(304)の前記1つを電気的に励起し、
当該共振器は、少なくとも2つのまっすぐな垂直方向の平行な側面(311、312)を有する
ことを特徴とする共振器。 - 前記少なくとも2つの平行なアーム(304)の1つの表面の一方は、垂直方向の側面(312)を有する溝の形態である少なくとも1つの凹部(310)を有する
ことを特徴にする請求項24に記載の共振器。 - 当該共振器は、1つのアーム当たり1つの溝(310)を有する
ことを特徴とする請求項24に記載の共振器。 - 当該共振器は、各アームの上部表面に1つの溝(310)と、及び各アームの下部表面に1つの溝(310)とを有する
ことを特徴とする請求項24に記載の共振器。 - 当該共振器は、1つのアーム当たり2つの溝(310)を有する
ことを特徴とする請求項24に記載の共振器。 - 当該共振器は、各アームの上部表面に2つの溝(310)と、及び各アームの下部表面に2つの溝(310)とを有する
ことを特徴とする請求項24に記載の共振器。 - 前記溝は、位置合わせを容易にし、かつ、電場を最適化する突出部分(315)を有する
ことを特徴とする請求項24〜29のいずれかに記載の共振器。 - 当該共振器の側面(311、312)はすべて、まっすぐで垂直方向にある
ことを特徴とする請求項24に記載の共振器。 - 当該共振器のすべての角度は直角である
ことを特徴とする請求項24に記載の共振器。 - 当該共振器の角度はすべて、鋭角をなす
ことを特徴とする請求項24に記載の共振器。 - スパイラルを形成するような渦巻き状の棒体で作られる構成体(100)につながれた慣性ブロックを有する共振器(400)であって、
前記構成体は、前記構成体の剛性を局所的に変更するための少なくとも1つの中空部分(310)を有し、これによって、当該共振器の周波数の調整及び/又は等時性ずれの調整が行われる
ことを特徴とする共振器。 - 前記少なくとも1つの中空部分は、少なくとも2つの平行な垂直方向の側面を有する
ことを特徴とする請求項34に記載の共振器(400)。 - 前記構成体は、石英又はセラミック又はガラスで作られ、局所的に平行であり前記構成体の全長にわたって垂直方向に延在する複数の側面を有する
ことを特徴とする請求項34又は35に記載の共振器。 - 前記構成体は、渦巻き状の棒体で形成される他のコイルの平面よりも高さが高い外側コイルを有する
ことを特徴とする請求項34〜36のいずれかに記載の共振器。 - 前記構成体(100)は、少なくとも1つの光エネルギーによって発光された光を透過し分散させる
ことを特徴とする請求項34〜36のいずれかに記載の共振器。 - 前記構成体(100)の前記構造は、前記材料の屈折率が局所的に変更されるようにレーザーによって加工される
ことを特徴とする請求項36に記載の共振器。 - レーザーによって材料の屈折率が変更された前記構成体(100)の前記構造が、鏡を形成するために用いられる
ことを特徴とする請求項39に記載の共振器。 - レーザーによって材料の屈折率が変更された前記構成体(100)の前記構造が、光導波路を形成するために用いられる
ことを特徴とする請求項39に記載の共振器。 - 当該共振器は、さらに、前記構成体(100)と一体的であるコレット(401)を有し、
前記コレットは、当該共振器をアーバー(700)に取り付けるように構成する穴(402)を有し、
前記穴(402)は、少なくとも1つの側面(403)を有し、この側面(403)には、前記コレットと前記アーバーの間に中間要素(702)を挿入できるように少なくとも1つの溝(701)が配置される
ことを特徴とする請求項34〜41のいずれかに記載の共振器(400)。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP11195420.2 | 2011-12-22 | ||
EP11195420.2A EP2607974A1 (fr) | 2011-12-22 | 2011-12-22 | Procede de realisation d'un résonateur |
PCT/EP2012/076498 WO2013092920A2 (fr) | 2011-12-22 | 2012-12-20 | Procede de realisation d'un resonateur |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015505205A true JP2015505205A (ja) | 2015-02-16 |
JP6110403B2 JP6110403B2 (ja) | 2017-04-05 |
Family
ID=47522557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014548036A Active JP6110403B2 (ja) | 2011-12-22 | 2012-12-20 | 共振器を作成する方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9755612B2 (ja) |
EP (3) | EP2607974A1 (ja) |
JP (1) | JP6110403B2 (ja) |
CN (1) | CN104126153B (ja) |
HK (1) | HK1203650A1 (ja) |
WO (1) | WO2013092920A2 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH711962B1 (fr) | 2015-12-18 | 2017-10-31 | Csem Centre Suisse D'electronique Et De Microtechnique Sa – Rech Et Développement | Procédé de fabrication d'un spiral d'une raideur prédéterminée avec retrait localisé de matière. |
EP3181939B1 (fr) | 2015-12-18 | 2019-02-20 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Procede de fabrication d'un spiral d'une raideur predeterminee par ajout de matiere |
EP3181938B1 (fr) | 2015-12-18 | 2019-02-20 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Procede de fabrication d'un spiral d'une raideur predeterminee par retrait de matiere |
EP3457224B1 (fr) * | 2017-09-14 | 2020-10-28 | The Swatch Group Research and Development Ltd | Element piezoelectrique pour un circuit d'autoregulation de frequence, systeme mecanique oscillant et dispositif le comprenant, et procede de fabrication de l'element piezoelectrique |
EP3457223A1 (fr) * | 2017-09-14 | 2019-03-20 | The Swatch Group Research and Development Ltd | Element piezoelectrique pour un circuit d'autoregulation de frequence, et systeme mecanique oscillant et dispositif le comprenant |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006060727A (ja) * | 2004-08-24 | 2006-03-02 | River Eletec Kk | 音叉型水晶振動子及びその製造方法 |
JP2009526215A (ja) * | 2006-02-09 | 2009-07-16 | ザ スウォッチ グループ リサーチ アンド ディベロップメント リミティド. | 耐衝撃性ひげ玉 |
JP2010183138A (ja) * | 2009-02-03 | 2010-08-19 | Seiko Epson Corp | 音叉型水晶振動片の製造方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2001287401A1 (en) * | 2000-08-21 | 2002-03-04 | National Research Council Of Canada | Methods for creating optical structures in dielectrics using controlled energy deposition from a femtosecond laser |
US6932933B2 (en) * | 2001-03-30 | 2005-08-23 | The Aerospace Corporation | Ultraviolet method of embedding structures in photocerams |
US6939475B2 (en) * | 2001-08-31 | 2005-09-06 | Daishinku Corporation | Etching method, etched product formed by the same, and piezoelectric vibration device, method for producing the same |
CA2428187C (en) * | 2002-05-08 | 2012-10-02 | National Research Council Of Canada | Method of fabricating sub-micron structures in transparent dielectric materials |
EP1445670A1 (fr) * | 2003-02-06 | 2004-08-11 | ETA SA Manufacture Horlogère Suisse | Spiral de résonateur balancier-spiral et son procédé de fabrication |
JP4375399B2 (ja) * | 2004-07-20 | 2009-12-02 | 株式会社村田製作所 | 圧電フィルタ |
US7528342B2 (en) * | 2005-02-03 | 2009-05-05 | Laserfacturing, Inc. | Method and apparatus for via drilling and selective material removal using an ultrafast pulse laser |
US7419915B2 (en) * | 2005-02-17 | 2008-09-02 | The Aerospace Corporation | Laser assisted chemical etching method for release microscale and nanoscale devices |
EP1791039A1 (fr) * | 2005-11-25 | 2007-05-30 | The Swatch Group Research and Development Ltd. | Spiral en verre athermique pour mouvement d'horlogerie et son procédé de fabrication |
CH702708B1 (fr) * | 2007-04-27 | 2011-08-31 | Sigatec S A | Ensemble oscillateur balancier-spiral avec éléments détachables et procédé d'ajustement de sa fréquence d'oscillation. |
DE102007020288B4 (de) * | 2007-04-30 | 2013-12-12 | Epcos Ag | Elektrisches Bauelement |
JP5151400B2 (ja) * | 2007-11-04 | 2013-02-27 | 日亜化学工業株式会社 | 半導体素子の製造方法 |
EP2105807B1 (fr) | 2008-03-28 | 2015-12-02 | Montres Breguet SA | Spiral à élévation de courbe monobloc et son procédé de fabrication |
JP4915440B2 (ja) * | 2009-08-07 | 2012-04-11 | 株式会社デンソー | 半導体装置の製造方法 |
EP2317407A1 (fr) | 2009-10-29 | 2011-05-04 | Nivarox-FAR S.A. | Système de fixation d'une pièce sans chassage ni collage |
JP2011114844A (ja) * | 2009-11-30 | 2011-06-09 | Seiko Instruments Inc | 圧電振動片の製造方法及び圧電振動片、圧電振動子、発振器、電子機器並びに電波時計 |
US20110304412A1 (en) * | 2010-06-10 | 2011-12-15 | Hao Zhang | Acoustic Wave Resonators and Methods of Manufacturing Same |
GB201009810D0 (en) | 2010-06-11 | 2010-07-21 | Univ Heriot Watt | A method of forming an optical device |
CH704906B1 (fr) * | 2011-05-09 | 2020-06-30 | Lvmh Swiss Mft Sa C/O Zenith Succursale De Lvmh Swiss Mft Sa | Ressort spiral en silicium pour montre mécanique. |
-
2011
- 2011-12-22 EP EP11195420.2A patent/EP2607974A1/fr not_active Withdrawn
-
2012
- 2012-12-20 EP EP12812966.5A patent/EP2795411B1/fr active Active
- 2012-12-20 EP EP21183278.7A patent/EP3985456A1/fr active Pending
- 2012-12-20 US US14/367,803 patent/US9755612B2/en active Active
- 2012-12-20 WO PCT/EP2012/076498 patent/WO2013092920A2/fr active Application Filing
- 2012-12-20 JP JP2014548036A patent/JP6110403B2/ja active Active
- 2012-12-20 CN CN201280070384.3A patent/CN104126153B/zh active Active
-
2015
- 2015-04-27 HK HK15104043.2A patent/HK1203650A1/xx unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006060727A (ja) * | 2004-08-24 | 2006-03-02 | River Eletec Kk | 音叉型水晶振動子及びその製造方法 |
JP2009526215A (ja) * | 2006-02-09 | 2009-07-16 | ザ スウォッチ グループ リサーチ アンド ディベロップメント リミティド. | 耐衝撃性ひげ玉 |
JP2010183138A (ja) * | 2009-02-03 | 2010-08-19 | Seiko Epson Corp | 音叉型水晶振動片の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN104126153A (zh) | 2014-10-29 |
WO2013092920A3 (fr) | 2013-10-03 |
EP2795411B1 (fr) | 2021-11-03 |
US20150036346A1 (en) | 2015-02-05 |
US9755612B2 (en) | 2017-09-05 |
WO2013092920A2 (fr) | 2013-06-27 |
HK1203650A1 (en) | 2015-10-30 |
EP2795411A2 (fr) | 2014-10-29 |
CN104126153B (zh) | 2018-07-17 |
JP6110403B2 (ja) | 2017-04-05 |
EP3985456A1 (fr) | 2022-04-20 |
EP2607974A1 (fr) | 2013-06-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6110403B2 (ja) | 共振器を作成する方法 | |
JP6148771B2 (ja) | 部品を作成する方法 | |
JP5537081B2 (ja) | 加工対象物切断方法 | |
JP5476063B2 (ja) | 加工対象物切断方法 | |
JP2011178642A (ja) | 貫通電極付きガラス板の製造方法および電子部品 | |
JP2013042119A (ja) | 発光素子の製造方法 | |
KR101825238B1 (ko) | 광 흡수 기판의 제조 방법, 및 그것을 제조하기 위한 성형형의 제조 방법 | |
JP2010050499A (ja) | 音叉型水晶振動子及びその周波数調整方法 | |
TW201705561A (zh) | 一種新型具有雙凸結構的壓電石英晶片及其加工工藝 | |
JP2010136202A (ja) | 圧電振動片の製造方法、圧電振動片及び圧電振動子 | |
JP2010183138A (ja) | 音叉型水晶振動片の製造方法 | |
JP4349283B2 (ja) | エッチング方法 | |
JP2004054118A (ja) | 光コネクタおよびその製造方法 | |
CH705945A2 (fr) | Procédé de réalisation d'un résonateur et résonateur obtenu par un tel procédé | |
JP2023031298A (ja) | 溶融シリカからの慣性センサ用mems構造の製造 | |
KR101892651B1 (ko) | 일면이 볼록 구조를 갖는 압전 석영 웨이퍼 | |
JP2007288331A (ja) | 圧電振動片の製造方法、及び圧電振動片、並びに圧電振動子 | |
JP6168161B2 (ja) | 圧電振動子及び圧電振動子の周波数調整方法 | |
JP3885643B2 (ja) | 窪み孔を有するガラス基板の製造方法 | |
JP5316048B2 (ja) | 水晶基板の加工方法および音叉型水晶振動片の製造方法 | |
JP2010010955A (ja) | 圧電振動子の製造方法及び圧電振動子 | |
JP3761788B2 (ja) | シリコン基板のレーザー加工方法 | |
JP2006261746A (ja) | 圧電振動子の製造方法 | |
JPH09136178A (ja) | エネルギービーム加工用マスク、エネルギービーム加工方法および被加工材 | |
JP2013157455A (ja) | 半導体デバイスの製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20150917 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150929 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20160104 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20160129 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20160229 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160308 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160524 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20160824 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160923 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170207 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170309 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6110403 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |