JP2015231035A5 - - Google Patents

Download PDF

Info

Publication number
JP2015231035A5
JP2015231035A5 JP2014118131A JP2014118131A JP2015231035A5 JP 2015231035 A5 JP2015231035 A5 JP 2015231035A5 JP 2014118131 A JP2014118131 A JP 2014118131A JP 2014118131 A JP2014118131 A JP 2014118131A JP 2015231035 A5 JP2015231035 A5 JP 2015231035A5
Authority
JP
Japan
Prior art keywords
original
exposure
stage
information
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014118131A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015231035A (ja
JP6541308B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2014118131A priority Critical patent/JP6541308B2/ja
Priority claimed from JP2014118131A external-priority patent/JP6541308B2/ja
Publication of JP2015231035A publication Critical patent/JP2015231035A/ja
Publication of JP2015231035A5 publication Critical patent/JP2015231035A5/ja
Application granted granted Critical
Publication of JP6541308B2 publication Critical patent/JP6541308B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2014118131A 2014-06-06 2014-06-06 露光方法、露光装置およびデバイス製造方法 Active JP6541308B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014118131A JP6541308B2 (ja) 2014-06-06 2014-06-06 露光方法、露光装置およびデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014118131A JP6541308B2 (ja) 2014-06-06 2014-06-06 露光方法、露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2015231035A JP2015231035A (ja) 2015-12-21
JP2015231035A5 true JP2015231035A5 (enrdf_load_stackoverflow) 2017-07-20
JP6541308B2 JP6541308B2 (ja) 2019-07-10

Family

ID=54887655

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014118131A Active JP6541308B2 (ja) 2014-06-06 2014-06-06 露光方法、露光装置およびデバイス製造方法

Country Status (1)

Country Link
JP (1) JP6541308B2 (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6792342B2 (ja) 2016-03-30 2020-11-25 キヤノン株式会社 リソグラフィ装置およびその制御方法、ならびに物品の製造方法
JP6861503B2 (ja) * 2016-11-17 2021-04-21 キヤノン株式会社 走査露光装置およびその制御方法ならびに物品製造方法
JP7105627B2 (ja) * 2018-06-15 2022-07-25 キヤノン株式会社 露光方法、露光装置、および物品の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11251228A (ja) * 1998-03-06 1999-09-17 Nec Corp スキャン型露光装置、スキャン露光方法及び記録媒体
US7633600B2 (en) * 2005-11-01 2009-12-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7525636B2 (en) * 2007-09-14 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and exposure method

Similar Documents

Publication Publication Date Title
KR102516180B1 (ko) 정보 처리 장치, 판정 방법, 프로그램, 리소그래피 시스템 및 물품의 제조 방법
TWI667550B (zh) 微影裝置之校準方法、使用該方法之微影裝置及元件製造方法
KR101950634B1 (ko) 형상 측정 장치 및 형상 측정 방법
JP2011238707A5 (enrdf_load_stackoverflow)
JP2015231035A5 (enrdf_load_stackoverflow)
RU2013130005A (ru) Устройство совмещения изображений
JP2015212775A5 (enrdf_load_stackoverflow)
JP2017129707A5 (enrdf_load_stackoverflow)
KR20190026958A (ko) 제조 공정에서 기판 상의 패턴들의 포지셔닝을 제어하기 위한 방법 및 컴퓨터 프로그램 제품
JP2016072507A5 (enrdf_load_stackoverflow)
JP5213783B2 (ja) レーザ加工装置およびレーザ加工方法
JP2018194616A5 (enrdf_load_stackoverflow)
JP6333081B2 (ja) 振動制御装置、リソグラフィ装置、および物品の製造方法
JP2018022114A5 (enrdf_load_stackoverflow)
JP2018045147A5 (enrdf_load_stackoverflow)
US9720334B2 (en) Stage apparatus, lithography apparatus, method of manufacturing an article, and determination method
WO2016161187A3 (en) System and method for reproducing molded insole
JP2012213970A5 (enrdf_load_stackoverflow)
US8493551B2 (en) Scanning exposure apparatus, control apparatus and method of manufacturing device
JP6541308B2 (ja) 露光方法、露光装置およびデバイス製造方法
US20150205211A1 (en) Patterning method, lithography apparatus and system, and article manufacturing method
JP2016127165A5 (enrdf_load_stackoverflow)
JP2014192254A5 (enrdf_load_stackoverflow)
JP2015070057A5 (enrdf_load_stackoverflow)
JP2013055256A5 (enrdf_load_stackoverflow)