JP2015197385A5 - - Google Patents
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- JP2015197385A5 JP2015197385A5 JP2014075880A JP2014075880A JP2015197385A5 JP 2015197385 A5 JP2015197385 A5 JP 2015197385A5 JP 2014075880 A JP2014075880 A JP 2014075880A JP 2014075880 A JP2014075880 A JP 2014075880A JP 2015197385 A5 JP2015197385 A5 JP 2015197385A5
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- 238000000034 method Methods 0.000 claims 17
- 238000005259 measurement Methods 0.000 claims 7
- 239000012528 membrane Substances 0.000 claims 6
- 239000013076 target substance Substances 0.000 claims 6
- 239000000126 substance Substances 0.000 claims 5
- 239000003792 electrolyte Substances 0.000 claims 3
- 239000008151 electrolyte solution Substances 0.000 claims 3
- 230000001678 irradiating effect Effects 0.000 claims 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 239000012491 analyte Substances 0.000 claims 1
- 238000001514 detection method Methods 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 claims 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 1
- 229910000449 hafnium oxide Inorganic materials 0.000 claims 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 229920006254 polymer film Polymers 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims 1
- 229910052845 zircon Inorganic materials 0.000 claims 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014075880A JP6209122B2 (ja) | 2014-04-02 | 2014-04-02 | 孔形成方法及び測定装置 |
| PCT/JP2015/059424 WO2015152003A1 (ja) | 2014-04-02 | 2015-03-26 | 孔形成方法及び測定装置 |
| US15/129,854 US11181502B2 (en) | 2014-04-02 | 2015-03-26 | Hole formation method and measurement device |
| CN201580015959.5A CN106133507B (zh) | 2014-04-02 | 2015-03-26 | 孔形成方法以及测量装置 |
| GB1616120.0A GB2538482B (en) | 2014-04-02 | 2015-03-26 | Hole formation method and measurement device |
| DE112015001642.2T DE112015001642B4 (de) | 2014-04-02 | 2015-03-26 | Verfahren zur Lochbildung und Messvorrichtung |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014075880A JP6209122B2 (ja) | 2014-04-02 | 2014-04-02 | 孔形成方法及び測定装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015197385A JP2015197385A (ja) | 2015-11-09 |
| JP2015197385A5 true JP2015197385A5 (enExample) | 2017-02-23 |
| JP6209122B2 JP6209122B2 (ja) | 2017-10-04 |
Family
ID=54240329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014075880A Active JP6209122B2 (ja) | 2014-04-02 | 2014-04-02 | 孔形成方法及び測定装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11181502B2 (enExample) |
| JP (1) | JP6209122B2 (enExample) |
| CN (1) | CN106133507B (enExample) |
| DE (1) | DE112015001642B4 (enExample) |
| GB (1) | GB2538482B (enExample) |
| WO (1) | WO2015152003A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7071825B2 (ja) * | 2015-02-24 | 2022-05-19 | ジ ユニバーシティ オブ オタワ | 制御破壊時におけるレーザー照明による膜でのナノポア作製の局所化 |
| GB201508669D0 (en) | 2015-05-20 | 2015-07-01 | Oxford Nanopore Tech Ltd | Methods and apparatus for forming apertures in a solid state membrane using dielectric breakdown |
| WO2017082089A1 (ja) * | 2015-11-13 | 2017-05-18 | コニカミノルタ株式会社 | 表面プラズモン共鳴蛍光分析方法および表面プラズモン共鳴蛍光分析装置 |
| US10908121B2 (en) | 2016-04-28 | 2021-02-02 | Hitachi, Ltd. | Membrane device, measurement device, and method for producing membrane device |
| DE102016222613B3 (de) * | 2016-11-17 | 2018-05-03 | Universität Ulm | Messzelle für die Raman-Spektroskopie an einer Fest-Flüssig-Grenzfläche und Verwendungen hiervon |
| JP6730171B2 (ja) * | 2016-12-07 | 2020-07-29 | 株式会社日立製作所 | 液槽形成方法，測定装置及び分析デバイス |
| CN109890497B (zh) * | 2016-12-09 | 2021-03-02 | 株式会社日立高新技术 | 纳米孔隙形成方法、纳米孔隙形成装置以及生物分子测量装置 |
| US10443146B2 (en) | 2017-03-30 | 2019-10-15 | Lam Research Corporation | Monitoring surface oxide on seed layers during electroplating |
| JP6846309B2 (ja) * | 2017-08-09 | 2021-03-24 | 株式会社日立製作所 | 溶液槽デバイス |
| US20190094179A1 (en) * | 2017-09-22 | 2019-03-28 | Applied Materials, Inc. | Method for simple fluidic addressing of a nanopore |
| JP6959121B2 (ja) | 2017-12-05 | 2021-11-02 | 株式会社日立ハイテク | 孔形成方法及び孔形成装置 |
| JP7440375B2 (ja) * | 2020-08-19 | 2024-02-28 | 株式会社日立製作所 | 孔形成方法及び孔形成装置 |
| US12208400B2 (en) | 2021-05-25 | 2025-01-28 | Arizona Board Of Regents On Behalf Of Arizona State University | Systems and methods for non-destructive isolation, concentration, and detection for unbiased characterization of nano- and bioparticles |
| JP1732280S (ja) * | 2022-01-07 | 2022-12-15 | ラマン顕微鏡 | |
| CN114705743A (zh) * | 2022-04-01 | 2022-07-05 | 南京师范大学 | 一种基于纳米孔的实验装置及实验方法 |
| WO2024092035A1 (en) * | 2022-10-26 | 2024-05-02 | Molariti, Inc. | Devices, systems, and methods for processing samples |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7258838B2 (en) * | 1999-06-22 | 2007-08-21 | President And Fellows Of Harvard College | Solid state molecular probe device |
| JP2006523144A (ja) * | 2003-02-03 | 2006-10-12 | プレジデント アンド フェロウズ オブ ハーバード カレッジ | 制御された導電性構造体のギャップの製造法 |
| WO2006005014A2 (en) * | 2004-06-30 | 2006-01-12 | Valtronics, Inc. | Gas sample conditioning system |
| JP2009063402A (ja) * | 2007-09-06 | 2009-03-26 | Canon Inc | センサ素子の作製装置、センサ素子の作製方法、及びセンサ素子を備えたセンシング装置 |
| EP2196796A1 (en) | 2008-12-09 | 2010-06-16 | Imec | Single molecule optical spectroscopy in solid-state nanopores in a transmission-based approach |
| CN103069267B (zh) * | 2010-09-29 | 2016-05-11 | 株式会社日立高新技术 | 生物聚合物的光学的解析装置以及方法 |
| JP5819183B2 (ja) * | 2011-02-03 | 2015-11-18 | アークレイ株式会社 | 分析装置、センサの検査装置、検査方法、及び検査プログラム |
| JP2013090576A (ja) * | 2011-10-24 | 2013-05-16 | Hitachi Ltd | 核酸分析デバイス及びそれを用いた核酸分析装置 |
| AU2013257756B2 (en) * | 2012-05-07 | 2017-05-04 | The University Of Ottawa | Method for controlling the size of solid-state nanopores |
| WO2014153047A1 (en) * | 2013-03-14 | 2014-09-25 | The Trustees Of Boston University | Optoelectronic control of solid-state nanopores |
| CA2906781C (en) * | 2013-03-15 | 2021-06-08 | President And Fellows Of Havard College | Fabrication of nanopores in atomically-thin membranes by ultra-short electrical pulsing |
-
2014
- 2014-04-02 JP JP2014075880A patent/JP6209122B2/ja active Active
-
2015
- 2015-03-26 GB GB1616120.0A patent/GB2538482B/en not_active Expired - Fee Related
- 2015-03-26 CN CN201580015959.5A patent/CN106133507B/zh active Active
- 2015-03-26 US US15/129,854 patent/US11181502B2/en active Active
- 2015-03-26 WO PCT/JP2015/059424 patent/WO2015152003A1/ja not_active Ceased
- 2015-03-26 DE DE112015001642.2T patent/DE112015001642B4/de not_active Expired - Fee Related
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