JP2015197385A5 - - Google Patents
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- JP2015197385A5 JP2015197385A5 JP2014075880A JP2014075880A JP2015197385A5 JP 2015197385 A5 JP2015197385 A5 JP 2015197385A5 JP 2014075880 A JP2014075880 A JP 2014075880A JP 2014075880 A JP2014075880 A JP 2014075880A JP 2015197385 A5 JP2015197385 A5 JP 2015197385A5
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- 238000000034 method Methods 0.000 claims 17
- 238000005259 measurement Methods 0.000 claims 7
- 239000012528 membrane Substances 0.000 claims 6
- 239000013076 target substance Substances 0.000 claims 6
- 239000000126 substance Substances 0.000 claims 5
- 239000003792 electrolyte Substances 0.000 claims 3
- 239000008151 electrolyte solution Substances 0.000 claims 3
- 230000001678 irradiating effect Effects 0.000 claims 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 239000012491 analyte Substances 0.000 claims 1
- 238000001514 detection method Methods 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 claims 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 1
- 229910000449 hafnium oxide Inorganic materials 0.000 claims 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 229920006254 polymer film Polymers 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims 1
- 229910052845 zircon Inorganic materials 0.000 claims 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014075880A JP6209122B2 (ja) | 2014-04-02 | 2014-04-02 | 孔形成方法及び測定装置 |
| DE112015001642.2T DE112015001642B4 (de) | 2014-04-02 | 2015-03-26 | Verfahren zur Lochbildung und Messvorrichtung |
| PCT/JP2015/059424 WO2015152003A1 (ja) | 2014-04-02 | 2015-03-26 | 孔形成方法及び測定装置 |
| CN201580015959.5A CN106133507B (zh) | 2014-04-02 | 2015-03-26 | 孔形成方法以及测量装置 |
| GB1616120.0A GB2538482B (en) | 2014-04-02 | 2015-03-26 | Hole formation method and measurement device |
| US15/129,854 US11181502B2 (en) | 2014-04-02 | 2015-03-26 | Hole formation method and measurement device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014075880A JP6209122B2 (ja) | 2014-04-02 | 2014-04-02 | 孔形成方法及び測定装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015197385A JP2015197385A (ja) | 2015-11-09 |
| JP2015197385A5 true JP2015197385A5 (enExample) | 2017-02-23 |
| JP6209122B2 JP6209122B2 (ja) | 2017-10-04 |
Family
ID=54240329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014075880A Active JP6209122B2 (ja) | 2014-04-02 | 2014-04-02 | 孔形成方法及び測定装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11181502B2 (enExample) |
| JP (1) | JP6209122B2 (enExample) |
| CN (1) | CN106133507B (enExample) |
| DE (1) | DE112015001642B4 (enExample) |
| GB (1) | GB2538482B (enExample) |
| WO (1) | WO2015152003A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2804175T3 (es) * | 2015-02-24 | 2021-02-04 | Univ Ottawa | Localizar fabricación de nanoporo sobre una membrana por iluminación láser durante descomposición controlada |
| GB201508669D0 (en) | 2015-05-20 | 2015-07-01 | Oxford Nanopore Tech Ltd | Methods and apparatus for forming apertures in a solid state membrane using dielectric breakdown |
| US20180313756A1 (en) * | 2015-11-13 | 2018-11-01 | Konica Minolta, Inc. | Method for surface plasmon resonance fluorescence analysis and device for surface plasmon resonance fluorescence analysis |
| US10908121B2 (en) | 2016-04-28 | 2021-02-02 | Hitachi, Ltd. | Membrane device, measurement device, and method for producing membrane device |
| DE102016222613B3 (de) * | 2016-11-17 | 2018-05-03 | Universität Ulm | Messzelle für die Raman-Spektroskopie an einer Fest-Flüssig-Grenzfläche und Verwendungen hiervon |
| JP6730171B2 (ja) * | 2016-12-07 | 2020-07-29 | 株式会社日立製作所 | 液槽形成方法，測定装置及び分析デバイス |
| GB2570849B (en) * | 2016-12-09 | 2022-03-16 | Hitachi High Tech Corp | Nanopore-forming method, nanopore-forming device and biomolecule measurement device |
| US10443146B2 (en) * | 2017-03-30 | 2019-10-15 | Lam Research Corporation | Monitoring surface oxide on seed layers during electroplating |
| JP6846309B2 (ja) * | 2017-08-09 | 2021-03-24 | 株式会社日立製作所 | 溶液槽デバイス |
| US20190094179A1 (en) * | 2017-09-22 | 2019-03-28 | Applied Materials, Inc. | Method for simple fluidic addressing of a nanopore |
| JP6959121B2 (ja) * | 2017-12-05 | 2021-11-02 | 株式会社日立ハイテク | 孔形成方法及び孔形成装置 |
| JP7440375B2 (ja) * | 2020-08-19 | 2024-02-28 | 株式会社日立製作所 | 孔形成方法及び孔形成装置 |
| WO2022251314A1 (en) * | 2021-05-25 | 2022-12-01 | Arizona Board Of Regents On Behalf Of Arizona State University | Systems and methods for non-destructive isolation, concentration, and detection for unbiased characterization of nano- and bio-particles |
| JP1732280S (ja) * | 2022-01-07 | 2022-12-15 | ラマン顕微鏡 | |
| CN114705743A (zh) * | 2022-04-01 | 2022-07-05 | 南京师范大学 | 一种基于纳米孔的实验装置及实验方法 |
| CN120418650A (zh) * | 2022-10-26 | 2025-08-01 | 莫拉里蒂公司 | 用于处理样品的设备、系统和方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7258838B2 (en) * | 1999-06-22 | 2007-08-21 | President And Fellows Of Harvard College | Solid state molecular probe device |
| WO2004077503A2 (en) * | 2003-02-03 | 2004-09-10 | President And Fellows Of Harvard College | Controlled fabrication of gaps in electrically conducting structures |
| AU2005260719B2 (en) * | 2004-06-30 | 2010-07-22 | Mustang Sampling, Llc | Gas sample conditioning system |
| JP2009063402A (ja) * | 2007-09-06 | 2009-03-26 | Canon Inc | センサ素子の作製装置、センサ素子の作製方法、及びセンサ素子を備えたセンシング装置 |
| EP2196796A1 (en) | 2008-12-09 | 2010-06-16 | Imec | Single molecule optical spectroscopy in solid-state nanopores in a transmission-based approach |
| EP2623960B1 (en) * | 2010-09-29 | 2020-11-11 | Hitachi High-Tech Corporation | Biopolymer optical analysis device and method |
| JP5819183B2 (ja) * | 2011-02-03 | 2015-11-18 | アークレイ株式会社 | 分析装置、センサの検査装置、検査方法、及び検査プログラム |
| JP2013090576A (ja) * | 2011-10-24 | 2013-05-16 | Hitachi Ltd | 核酸分析デバイス及びそれを用いた核酸分析装置 |
| JP6298450B2 (ja) * | 2012-05-07 | 2018-03-20 | ジ ユニバーシティ オブ オタワ | 固体ナノポアの大きさを制御するための方法 |
| WO2014153047A1 (en) * | 2013-03-14 | 2014-09-25 | The Trustees Of Boston University | Optoelectronic control of solid-state nanopores |
| EP3730205B1 (en) * | 2013-03-15 | 2024-05-01 | President and Fellows of Harvard College | Method of surface wetting |
-
2014
- 2014-04-02 JP JP2014075880A patent/JP6209122B2/ja active Active
-
2015
- 2015-03-26 US US15/129,854 patent/US11181502B2/en active Active
- 2015-03-26 CN CN201580015959.5A patent/CN106133507B/zh active Active
- 2015-03-26 WO PCT/JP2015/059424 patent/WO2015152003A1/ja not_active Ceased
- 2015-03-26 GB GB1616120.0A patent/GB2538482B/en not_active Expired - Fee Related
- 2015-03-26 DE DE112015001642.2T patent/DE112015001642B4/de not_active Expired - Fee Related
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