JP2015197385A5 - - Google Patents

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Publication number
JP2015197385A5
JP2015197385A5 JP2014075880A JP2014075880A JP2015197385A5 JP 2015197385 A5 JP2015197385 A5 JP 2015197385A5 JP 2014075880 A JP2014075880 A JP 2014075880A JP 2014075880 A JP2014075880 A JP 2014075880A JP 2015197385 A5 JP2015197385 A5 JP 2015197385A5
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JP
Japan
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voltage
electrode
applying
film
current value
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JP2014075880A
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English (en)
Japanese (ja)
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JP2015197385A (ja
JP6209122B2 (ja
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Priority claimed from JP2014075880A external-priority patent/JP6209122B2/ja
Priority to JP2014075880A priority Critical patent/JP6209122B2/ja
Priority to US15/129,854 priority patent/US11181502B2/en
Priority to CN201580015959.5A priority patent/CN106133507B/zh
Priority to DE112015001642.2T priority patent/DE112015001642B4/de
Priority to GB1616120.0A priority patent/GB2538482B/en
Priority to PCT/JP2015/059424 priority patent/WO2015152003A1/ja
Publication of JP2015197385A publication Critical patent/JP2015197385A/ja
Publication of JP2015197385A5 publication Critical patent/JP2015197385A5/ja
Publication of JP6209122B2 publication Critical patent/JP6209122B2/ja
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Expired - Fee Related legal-status Critical Current
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JP2014075880A 2014-04-02 2014-04-02 孔形成方法及び測定装置 Expired - Fee Related JP6209122B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2014075880A JP6209122B2 (ja) 2014-04-02 2014-04-02 孔形成方法及び測定装置
GB1616120.0A GB2538482B (en) 2014-04-02 2015-03-26 Hole formation method and measurement device
CN201580015959.5A CN106133507B (zh) 2014-04-02 2015-03-26 孔形成方法以及测量装置
DE112015001642.2T DE112015001642B4 (de) 2014-04-02 2015-03-26 Verfahren zur Lochbildung und Messvorrichtung
US15/129,854 US11181502B2 (en) 2014-04-02 2015-03-26 Hole formation method and measurement device
PCT/JP2015/059424 WO2015152003A1 (ja) 2014-04-02 2015-03-26 孔形成方法及び測定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014075880A JP6209122B2 (ja) 2014-04-02 2014-04-02 孔形成方法及び測定装置

Publications (3)

Publication Number Publication Date
JP2015197385A JP2015197385A (ja) 2015-11-09
JP2015197385A5 true JP2015197385A5 (enExample) 2017-02-23
JP6209122B2 JP6209122B2 (ja) 2017-10-04

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Family Applications (1)

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JP2014075880A Expired - Fee Related JP6209122B2 (ja) 2014-04-02 2014-04-02 孔形成方法及び測定装置

Country Status (6)

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US (1) US11181502B2 (enExample)
JP (1) JP6209122B2 (enExample)
CN (1) CN106133507B (enExample)
DE (1) DE112015001642B4 (enExample)
GB (1) GB2538482B (enExample)
WO (1) WO2015152003A1 (enExample)

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Publication number Priority date Publication date Assignee Title
US10753009B2 (en) * 2015-02-24 2020-08-25 The University Of Ottawa Localizing nanopore fabrication on a membrane by laser illumination during controlled breakdown
WO2016142925A1 (en) * 2015-03-12 2016-09-15 Ecole Polytechnique Federale De Lausanne (Epfl) Nanopore forming method and uses thereof
GB201508669D0 (en) 2015-05-20 2015-07-01 Oxford Nanopore Tech Ltd Methods and apparatus for forming apertures in a solid state membrane using dielectric breakdown
EP3376209B1 (en) * 2015-11-13 2019-11-20 Konica Minolta, Inc. Method for surface plasmon resonance fluorescence analysis and device for surface plasmon resonance fluorescence analysis
US10908121B2 (en) 2016-04-28 2021-02-02 Hitachi, Ltd. Membrane device, measurement device, and method for producing membrane device
DE102016222613B3 (de) * 2016-11-17 2018-05-03 Universität Ulm Messzelle für die Raman-Spektroskopie an einer Fest-Flüssig-Grenzfläche und Verwendungen hiervon
JP6730171B2 (ja) * 2016-12-07 2020-07-29 株式会社日立製作所 液槽形成方法，測定装置及び分析デバイス
CN109890497B (zh) * 2016-12-09 2021-03-02 株式会社日立高新技术 纳米孔隙形成方法、纳米孔隙形成装置以及生物分子测量装置
US10443146B2 (en) 2017-03-30 2019-10-15 Lam Research Corporation Monitoring surface oxide on seed layers during electroplating
JP6846309B2 (ja) * 2017-08-09 2021-03-24 株式会社日立製作所 溶液槽デバイス
US20190094179A1 (en) * 2017-09-22 2019-03-28 Applied Materials, Inc. Method for simple fluidic addressing of a nanopore
JP6959121B2 (ja) * 2017-12-05 2021-11-02 株式会社日立ハイテク 孔形成方法及び孔形成装置
JP7440375B2 (ja) * 2020-08-19 2024-02-28 株式会社日立製作所 孔形成方法及び孔形成装置
US12208400B2 (en) 2021-05-25 2025-01-28 Arizona Board Of Regents On Behalf Of Arizona State University Systems and methods for non-destructive isolation, concentration, and detection for unbiased characterization of nano- and bioparticles
JP1732280S (ja) * 2022-01-07 2022-12-15 ラマン顕微鏡
CN114705743A (zh) * 2022-04-01 2022-07-05 南京师范大学 一种基于纳米孔的实验装置及实验方法
WO2024092035A1 (en) * 2022-10-26 2024-05-02 Molariti, Inc. Devices, systems, and methods for processing samples

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7258838B2 (en) * 1999-06-22 2007-08-21 President And Fellows Of Harvard College Solid state molecular probe device
EP1592641B1 (en) * 2003-02-03 2018-03-07 President and Fellows of Harvard College Controlled fabrication of gaps in electrically conducting structures
US7162933B2 (en) * 2004-06-30 2007-01-16 Valtronics, Inc. Gas sample conditioning system
JP2009063402A (ja) * 2007-09-06 2009-03-26 Canon Inc センサ素子の作製装置、センサ素子の作製方法、及びセンサ素子を備えたセンシング装置
EP2196796A1 (en) 2008-12-09 2010-06-16 Imec Single molecule optical spectroscopy in solid-state nanopores in a transmission-based approach
EP2623960B1 (en) * 2010-09-29 2020-11-11 Hitachi High-Tech Corporation Biopolymer optical analysis device and method
JP5819183B2 (ja) * 2011-02-03 2015-11-18 アークレイ株式会社 分析装置、センサの検査装置、検査方法、及び検査プログラム
JP2013090576A (ja) * 2011-10-24 2013-05-16 Hitachi Ltd 核酸分析デバイス及びそれを用いた核酸分析装置
MX353370B (es) * 2012-05-07 2018-01-09 Univ Ottawa Metodo para controlar el tamaño de nanoporos de estado solido.
US10613076B2 (en) * 2013-03-14 2020-04-07 The Trustees Of Boston University Optoelectronic control of solid-state nanopores
EP2969918B1 (en) * 2013-03-15 2018-08-22 President and Fellows of Harvard College Fabrication of nanopores in atomically-thin membranes by ultra-short electrical pulsing

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