JP2015153213A - Gui device for pattern drawing device, pattern drawing system, job ticket update method and program - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a GUI device for pattern drawing device capable of easily selecting a desired job ticket to perform update work when updating job tickets according to the update of design data, a pattern drawing system, a job ticket update method and a program.SOLUTION: The GUI device for pattern drawing device used when updating job tickets defining a set of processes for generating drawing data from design data comprises: a display unit which has a screen; an operation unit which operates the screen of the display unit; and a display control unit which controls screen display of the display unit. An input unit 82 is displayed for inputting an update design data name which has been updated, a job ticket list 83 is displayed in association with the update design data name which has been input, and an update button 91 is displayed for performing an instruction for replacing design data with update design data with respect to a job ticket to be updated which has been highlighted from among job tickets 83.

Description

  The present invention relates to a graphical user interface device (GUI device) used in a pattern drawing device for drawing a pattern such as a wiring pattern on a substrate on which a photoresist film is formed.

  Conventionally, a pattern is formed by irradiating various substrates such as a semiconductor substrate, a printed wiring substrate, and a glass substrate with light via a photomask. In recent years, in order to cope with the formation of various patterns, a technique has been used in which exposure is performed by drawing a pattern by directly irradiating a substrate with spatially modulated light without using a photomask.

  The pattern drawing apparatus that performs the exposure processing as described above is called a direct drawing apparatus. For example, Patent Document 1 describes a GUI apparatus used for a direct drawing apparatus. This GUI device is used when a job ticket is updated. A job ticket defines a series of operations for generating raster data, which is drawing data, by developing RIP (Raster Image Processing) vector design data designed by CAD (Computer Aided Design). is there.

JP2013-77718A (for example, paragraph 0043, FIG. 1)

  When updating a job ticket with design data update, if there are multiple job tickets related to the design data, there is a problem that the design data is updated even for job tickets that do not need to be updated To do. In order to prevent this problem from occurring, a corresponding method of creating a new job ticket when the design data is updated can be considered, but this method increases the number of job tickets. In order to reduce the number of job tickets, a corresponding method of deleting job tickets that are no longer necessary can be considered. However, another problem that the work of the deletion process increases occurs.

  SUMMARY OF THE INVENTION In view of the above-described points, an object of the present invention is for a pattern drawing apparatus that can easily select a desired job ticket and perform an update operation when updating a job ticket with design data update. A GUI device, a pattern drawing system, a job ticket updating method, and a program are provided.

  A first invention according to claim 1 is a GUI device for a pattern drawing device used when updating a job ticket that defines a series of processes for generating drawing data from design data, a display unit having a screen; An operation unit for operating the screen of the display unit, and a display control unit for controlling the screen display of the display unit, and the display control unit displays an input unit for inputting information relating to updated update design data. The design data information input unit to be displayed on the screen, the job ticket information display unit to display information on the job ticket related to the information input to the design data information input unit by the operation unit, and the job ticket information display unit to the screen The job ticket selected from the displayed job ticket by the operation unit as the job ticket that should replace the design data with the updated design data A job ticket highlight display section that is highlighted on the screen and an input section for inputting an instruction to replace design data with update design data for the job ticket highlighted on the screen by the job ticket highlight display section on the screen And a replacement instruction input display unit for displaying.

  According to a second aspect of the present invention, in the first aspect, the display control unit is information regarding update candidate design data that is update design data that can be updated according to the job ticket highlighted by the job ticket highlighting display unit. Is further provided with an update candidate display unit.

  According to a third aspect of the present invention based on the second aspect, the display control unit further includes a narrowing information input display unit that displays a narrowing information input unit for narrowing update candidate design data on the screen.

  According to a fourth aspect of the present invention (pattern drawing system), the GUI apparatus for the pattern drawing apparatus according to any one of the first to third aspects and the updated design data according to the job ticket updated by the GUI apparatus. A pattern drawing device for drawing a pattern on a substrate based on the generated drawing data.

  According to a fifth aspect of the present invention, in the fourth aspect of the present invention, the pattern drawing apparatus is a direct drawing apparatus for drawing a pattern by scanning a spatially modulated light beam on a photoresist film formed on a substrate.

  A sixth invention described in claim 6 is a job ticket updating method for updating a job ticket that defines a series of processes for generating drawing data from design data, and is displayed on a screen of a display unit provided in the GUI device. In the design data information input unit, information on the updated design data is input on the screen according to the update design data input process in which information related to the updated design data is input by the operation unit of the GUI device, and the information input in the update design data input process. The design data is updated by the operation unit for the job ticket selection step for selecting the job ticket to be replaced with the design data by the operation unit and the job ticket selected by the job ticket selection step. And a replacement step for replacing with design data.

  According to a seventh aspect of the present invention, a computer-readable program provided in a GUI device for a pattern drawing device used when updating a job ticket that defines a series of processes for generating drawing data from design data A design data information input unit display function for displaying an input unit for inputting information relating to updated update design data on a screen of a display unit provided in the GUI device, and design data by an operation unit provided in the GUI device. The job ticket information display function that displays information on the job ticket related to the information input in the information input unit on the screen, and the job ticket displayed on the screen by the job ticket information display function, which is selected by the operation unit Selected by the operation unit as a job ticket to replace design data with updated design data Job ticket highlighting function that highlights job tickets on the screen and an input unit for inputting instructions to replace design data with updated design data for job tickets highlighted on the screen by the job ticket highlighting function And a replacement instruction input display function for displaying on the screen.

  According to an eighth aspect of the present invention, in the seventh aspect, information on update candidate design data, which is update design data that can be updated, is displayed on the screen according to the job ticket highlighted on the screen by the job ticket highlight display function. The computer further exhibits the update candidate display function to be displayed.

  According to a ninth aspect of the present invention, in the eighth aspect, the computer further exhibits a narrowed information input display function for displaying a narrowed information input unit for narrowing update candidate design data on the screen.

  According to the invention according to any one of claims 1 to 9, a pattern drawing that allows a user to easily select a desired job ticket and execute an update operation when the job ticket is updated as the design data is updated. A GUI device, a pattern drawing system, a job ticket update method, and a program for the device can be provided.

It is a figure which shows the figure drawing system containing a pattern drawing system. It is a block diagram which shows the hardware constitutions of a GUI apparatus. It is a block diagram which shows the function structure of a GUI apparatus. It is a flowchart which shows the flow from design data update to drawing execution. It is a flowchart which shows the flow of the update operation | work of a job ticket. It is a figure for demonstrating an initial screen. It is a figure which shows the GUI screen at the time of job ticket selection. It is a figure which shows the GUI screen at the time of job ticket update. It is a side view of a direct drawing apparatus. It is a top view of a direct drawing apparatus. It is a figure which shows an illumination optical system and a projection optical system. It is a figure which expands and shows a spatial light modulator. It is the block diagram which showed the connection structure of each part and control part of a direct drawing apparatus. It is a block diagram which shows the control part which controls drawing operation | movement. It is a flowchart of operation | movement of a direct drawing apparatus.

Embodiments of the present invention will be described below with reference to the accompanying drawings.
<Overall system configuration>
FIG. 1 is a diagram showing a figure drawing system 400 including a pattern drawing system 4 according to an embodiment of the present invention. The figure drawing system 400 directly draws a figure corresponding to a circuit pattern on a photoresist film by selectively exposing, for example, a photoresist film on a circular semiconductor substrate (hereinafter simply referred to as “substrate”). System.

  The graphic drawing system 400 includes a design data creation device 1, an image processing device 3, and a direct drawing device 100 connected to each other via a network N such as a LAN. The image processing device 3 includes a GUI device 2.

  The design data creation device 1 is a device that creates and edits data describing a pattern area to be drawn on a substrate that is a drawing target. Specifically, the data is created as graphic data described in vector format by CAD (Computer Aided Design). The design data D0 created by the design data creation device 1 is transmitted to the image processing device 3 and the direct drawing device 100 via the network N, respectively. Further, the design data creation apparatus 1 creates updated design data D1 (D2...) By changing the pattern shape and line width dimension indicated by the initial design data D0. The design data creation device 1 may create update design data by further updating the update design data having an update history. In the present specification, the design data D0 or the updated design data D1 may be simply referred to as “design data”. Design data D0, D1 and the like created by the design data creation device 1 are transmitted to the image processing device 3 and the direct drawing device 100 via the network N, respectively.

  The image processing device 3 creates a job ticket JT for the design data D0, the update design data D1, and the like transmitted via the network N. The job ticket JT defines a series of operations for generating raster data, which is drawing data, by developing the design data D0, the updated design data D1, and the like by RIP (Raster Image Processing). For example, when the drawing data is generated by changing the line width or the like of the pattern by thickening or thinning and generating drawing data during RIP development, there are a plurality of different RIP development processes depending on the process. The job ticket JT is defined by associating and defining which RIP deployment process of the plurality of RIP deployment processes the RIP deployment of the design data D0, the updated design data D1, and the like. The job ticket JT created by the image processing apparatus 3 is transmitted directly to the drawing apparatus 100 via the network N.

<Configuration of GUI device>
The GUI device 2 is provided in the image processing device 3 and functions as a graphical user interface for the operator. FIG. 2 is a block diagram showing a hardware configuration of the GUI device 2.

  The GUI device 2 is, for example, a computer 5 and includes a CPU 230, a ROM 231, a memory 232, a media drive 233, a display unit 200, an operation unit 234, and the like. These hardwares are electrically connected to each other by a bus line 235.

  The CPU 230 controls each part of the hardware based on a program (or a program read by the media drive 233) P stored in the ROM 231 to realize the function of the computer 5 (GUI device 2). The program P can be read by the computer 5 and causes the computer 5 to perform each function.

  The ROM 231 is a read-only storage device that stores in advance a program P and data necessary for controlling the GUI device 2. The memory 232 is a storage device that can be read and written, and temporarily stores data generated during arithmetic processing by the CPU 230. The memory 232 is configured by SRAM, DRAM, or the like. The memory 232 stores design data D0, updated design data D1, and the like and information related to the job ticket JT.

  The media drive 233 has a function of reading information stored in the recording medium M. Part. The recording medium M is a portable recording medium such as a CD-ROM, a DVD (Digital Versatile Disk), or a flexible disk.

  The display unit 200 includes a display such as a color LCD, and variably displays an image for GUI operation, various data, an operation state, and the like on the screen.

  The operation unit 234 is an input device having a keyboard and a mouse, and accepts user operations such as input of commands and various data. Using the operation unit 234, the operator inputs various information to the GUI operation screen displayed on the display unit 200 and operates the screen of the display unit 200.

  FIG. 3 is a block diagram showing a functional configuration of the GUI device 2. FIG. 3 is a block diagram showing the functions exhibited by the hardware configuration of the GUI device 2 by the program P shown in FIG. 2, but these functional blocks can be changed in various forms depending on the combination of hardware and software. Can be realized.

  As shown in FIG. 3, the GUI device 2 includes a display control unit 240. The display control unit 240 controls the screen display of the display unit 200, and includes a design data information input unit 241, a job ticket information display unit 242, a job ticket highlight display unit 243, a replacement instruction input display unit 244, an update A candidate display unit 245, a narrowed-down information input display unit 246, and a layout display unit 247 are provided. The display control unit 2 realizes the function of each unit by the operation of the operation unit 234 on the display unit 200 by the operator, details of which will be described later in the description of the operation.

<Overall flow from design data update>
FIG. 4 is a flowchart showing a flow from design data update to drawing execution. First, in step S10, when updating the design data D0, the operator modifies the design data D0 using the design data creation device 1 and creates updated design data D1 and the like (design data update process). As described above, update design data may be created by further updating the update design data. The created updated design data D1 and the like are transmitted from the design data creation device 1 to the image processing device 3 and the direct drawing device 100 via the network N, respectively.

  Next, in the job ticket update process in step S20, the operator uses the GUI device 2 to select the job ticket JT to which the update design data D1 and the like transmitted to the image processing device 3 are applied, and the design in the job ticket. The job ticket JT is updated by replacing the data with the update design data D1 or the like. Details of the job ticket update process will be described later. The updated job ticket JT is transmitted directly from the image processing apparatus 3 to the drawing apparatus 100 via the network N.

  Next, in the drawing data generation process in step S30, the direct drawing apparatus 100 generates drawing data by executing RIP development processing defined by the job ticket JT on the updated design data D1 and the like. Using the drawing data, the direct drawing apparatus 100 executes a drawing operation on the substrate that is the drawing target (step S40 drawing execution step). The configuration and operation of the direct drawing apparatus 100 will be described later. Note that the drawing data generation step of step S30 may be executed by the image processing apparatus 3 instead of the direct drawing apparatus 100. In this case, the drawing data generated by the image processing apparatus 3 is directly transmitted to the drawing apparatus 100 via the network N.

<Job ticket update work>
Details of the job ticket update step (step S20) shown in FIG. 4 will be described with reference to FIG. FIG. 5 is a flowchart showing the flow of job ticket update work.

  First, in step S210 shown in FIG. 5, the GUI device 2 displays an initial screen on the screen of the display unit 200 (initial screen display step). The initial screen is, for example, the screen shown in FIG. As shown in FIG. 6, the initial screen includes a type input unit 81, a data name input unit 82, a ticket list display unit 83, an After input unit 84, a Before input unit 85, an Upper input unit 86, an Under input unit 87, and a Search button 88. , A type change unit 89, a history display unit 90, an update button 91, a confirmation display unit 92, an OK button 93, a Cancel button 94, and the like.

  The initial screen is displayed by each functional unit of the display control unit 240 shown in FIG. 3. For example, the type input unit 81 and the data name input unit 82 of FIG. 6 are displayed on the screen by the function of the design data information input unit 241. The Further, the ticket list display unit 83 is displayed on the screen by the function of the job ticket information display unit 242.

  Further, the update button 91, the OK button 93, and the Cancel button 94, which are input units, are displayed on the screen by the function of the replacement instruction input display unit 244, and the history display unit 90 is displayed on the screen by the update candidate display unit 245. Further, an after input unit 84, a before input unit 85, an upper input unit 86, an under input unit 87, and a search button 88, which are input units, are displayed on the screen by the function of the narrowing down information input display unit 246, and the functions of the layout display unit 247 are displayed. As a result, the confirmation display unit 92 is displayed on the screen.

  Returning to FIG. 5, the update design data input process of step S220, which is the next process, will be described. In this process, the operator inputs the type (CAD Data Type) to which the design data D0 or the updated design data D1 before update is applied to the type input unit 81 on the initial screen using the operation unit 234. This type of input may be omitted. Next, the operator uses the operation unit 234 to input a data name (CAD Data Name) such as the design data D0 or the design update data D1 to the data name input unit 82. At this time, if a type is input in the type input unit 81, a list of data names belonging to the input type is displayed in a pull-down menu linked to the data name input unit 82. You may select and enter a data name. The data name is a type of information related to the updated design data D1 and the like.

  FIG. 7 shows a state in which the type “A” is input to the type input unit 81 and the data name “AAA.gds” is input to the data name input unit 82. When the data name “AAA.gds” is input to the data name input unit 82, a list (Ticket (Referenced CAD Data) List) of job tickets JT related to the data name is displayed on the ticket list display unit 83. Displayed by the function of the unit 242. In other words, the ticket list display unit 83 displays a list of job tickets JT that define a series of operations such as RIP expansion of the design data with the data names.

  In FIG. 7, three job tickets “AA1”, “AA2”, and “AA3” are displayed. One line in the list indicates one job ticket JT. The first column of the list shows the ticket name (Ticket Name). The chip layout (Chip Layout) in the second column indicates whether or not a layout operation such as changing the pattern shape or line width in the chip has been performed by the image processing apparatus 3, and “True” is displayed as shown in FIG. Indicates that layout work has been performed. “False” is displayed when no layout work is performed.

  Similarly, the third-row substrate layout (Wafer Layout) indicates whether or not the image processing apparatus 3 has performed layout work for determining the arrangement positions of a plurality of chips with respect to a substrate that is a drawing target. When “True” is displayed, it means that the layout work has been performed. “False” is displayed when no layout work is performed.

  The RIP name (Rip Name) in the fourth column is displayed. The RIP name is assigned according to the type of RIP development processing. In the example of FIG. 7, in the job ticket JT with the ticket name “AA1” on the first line, the RIP expansion process with the RIP name “AA1.gds-123” is applied to the design data D0, the update design data D1, etc. It is defined to be executed. Similarly, the job ticket JT of “AA2” on the second line is defined to execute the RIP expansion process of “AA2.gds-345”, and “AA3.gds” is defined on the job ticket JT of “AA3” on the third line. -6785 "is defined to be executed.

  The plurality of RIP development processes described above are, for example, RIP development processes in which pattern line width thickening processing and thinning processing are different from each other. In other words, it is defined that a plurality of job tickets JT (AA1, AA2, AA3) are subjected to different RIP development processes for the same design data D0, update design data D1, and the like.

  The update date (Modified Day) in the fourth column displays the date when the job ticket JT was updated. The items defined in the job ticket JT are not limited to the items shown in FIG. 7, and for example, the name of the worker who performed the update work may be included as an item.

  As shown in FIG. 7, since the job ticket information display unit 242 displays a list of job tickets JT related to the data names that are information related to the updated design data D1 and the like updated in the ticket list display unit 83, the design data Thus, it is possible to easily select a desired job ticket JT that needs to be updated.

  Returning to FIG. 5, in the job ticket selection step in step S230, the operator selects a job ticket to be updated from the list of job tickets displayed on the screen. In FIG. 7, the operator selects “AA2”, which is the job ticket JT on the second line, from the three job tickets JT displayed on the ticket list display unit 83 by the operation unit 234 as the job ticket JT to be updated. Indicates the state. In FIG. 7, hatching is applied to the second line. However, in the actual screen, the job ticket JT selected by adding a shading, for example, expressing it darker than other lines by the function of the job ticket highlighting display unit 243. Is used to express highlighting. The highlighting method may be any method as long as the distinction between the selected job ticket and the unselected job ticket JT can be visually recognized on the screen.

  When the job ticket JT to be updated is selected, the function of the update candidate display unit 245 can update the design data history of the selected job ticket JT in the history display unit 90 of FIG. 7 in conjunction with this selection operation. Is displayed on the screen as the update candidate design data that is the update design data by the function of the update candidate display unit 245. In the example of FIG. 7, four update histories (update candidate design data) are shown in four rows, but the design data whose data name is “AAA.gds” is the update date (Date) in the job ticket JT. It is updated four times on the day shown in (1) and each is given a serial number (Serial No.).

  Here, the initial design data D0 is the design data “AAA.gds” with the serial number “1”, and the updated design data D1 after the first update is the design data “AAA.gds” with the serial number “2”. The serial number of the update design data D2 is “3” and the serial number of the update design data D3 is “4”.

  In conjunction with the selection operation of the job ticket JT in the ticket list display unit 83, the current design data in the selected job ticket JT is highlighted on the history display unit 90 by the function of the update candidate display unit 245. In the example of FIG. 7, the current design data in the selected job ticket JT is highlighted and shown as the update design data D1 with the serial number “2” in the second row displayed on the history display unit 90. ing. In FIG. 7, the second line is hatched, but on the actual screen, the current design data is highlighted with a shading such as expressing it darker than the other lines. Since the current design data is highlighted by the function of the update candidate display unit 245 as described above, the operator can easily grasp the current design data.

  As described above, since the current design data (design data before update) in the job ticket JT is the update design data D1 with the serial number “2”, the update candidate design data has the serial number of other design data “ 1 ”design data D0, update design data D2 with serial number“ 3 ”, and update design data D3 with serial number“ 4 ”.

  Further, in conjunction with the selection operation of the job ticket JT in the ticket list display unit 83, as shown in FIG. 7, an image of a chip layout in which a pattern is drawn on the confirmation display unit 92 according to the job ticket JT is displayed on the layout display unit 247. Displayed by function. This layout image includes a circular substrate outer shape 95 which is a drawing object and a plurality of chips (blocks) 96 laid out in the substrate.

  FIG. 7 shows a state in which the chips 96 are laid out in an area 97 where the plurality of chips 96 are completely included in the substrate. Further, the chip 96 can be enlarged and displayed in a pattern in the chip 96 by the function of the layout display unit 247. By confirming the image displayed on the confirmation display unit 92, the operator can easily grasp the pattern shape in the chip 96 on which the pattern is drawn and the layout of the chip 96 according to the job ticket JT.

  Next, the replacement process in step S240 shown in FIG. 5 will be described. In the example illustrated in FIG. 7, in the job ticket JT of “AA2” on the second line selected in the ticket list display unit 83, the current design data has the serial number highlighted in the history display unit 90 being “2”. "AAA.gds", and this design data corresponds to the update design data D1 as described above.

  When the update design data D1 is replaced with “AAA.gds” whose serial number corresponding to the update design data D3 is “4”, the operator uses the operation unit 234 as shown in FIG. Select “AAA.gds” with the serial number “4” in the fourth row. Although the selected fourth line is hatched in FIG. 8, it is highlighted on the actual screen, for example, by expressing it darker than other lines by the function of the update candidate display unit 245. .

  In this state, the operator clicks the update button 91 (Replace CAD Data) with the mouse or the like of the operation unit 234 and inputs an instruction using the function of the replacement instruction input display unit 244. As a result, the design data in the job ticket JT “AA2” is replaced with the updated design data D2 from the updated design data D1. In conjunction with this replacement operation, the content displayed on the confirmation display unit 92 is switched to the content based on the updated design data D2, for example, the display content in the chip 96 is changed.

  When the operator confirms the contents of the confirmation display unit 92 and decides to replace the design data, the operator clicks the OK button 93 with the mouse or the like of the operation unit 234 to input an instruction to complete the replacement process. The job ticket JT update operation is completed. When considering replacement with other design data without determining the replacement of the design data, the operator clicks the Cancel button 94 with the mouse or the like of the operation unit 234 to input an instruction, and then displays the history display unit. Returning to the operation of selecting design data (AAA.gds) of another serial number displayed at 90.

  The after input unit 84, the before input unit 85, the upper input unit 86, the under input unit 87, and the search button 88, which are input units displayed on the screen by the function of the narrowing information input display unit 246 shown in FIG. This is used when the design data of update candidates displayed in 90 is narrowed down. For example, after checking the check box of the After input unit 84 and inputting a date and clicking the Search button 88, only updated design data updated after the date is displayed on the history display unit 90. Similarly, when a date is input to the Before input unit 85, only updated design data updated before the date is displayed on the history display unit 90. When a date is input to both the After input unit 84 and the Before input unit 85, only updated design data updated within a predetermined period is displayed on the history display unit 90.

  Further, for example, when the checkbox of the Upper input unit 86 is checked and a serial number is input and then the Search button 88 is clicked, only updated design data having a serial number equal to or higher than the serial number is displayed on the history display unit 90. . Similarly, when a serial number is input to the Under input unit 87, only updated design data having a serial number equal to or lower than the serial number is displayed on the history display unit 90. When serial numbers are input to both the upper input unit 86 and the under input unit 87, only the updated design data having the serial number within the predetermined number is displayed on the history display unit 90. If there is such a function of the narrowed-down information input display unit 246, when there are a lot of replaceable update design data, the number can be narrowed down and reduced, so that the update operation can be performed efficiently.

  The type change unit 89 shown in FIG. 6 and the like sets the type name when the type to which the design data D0 or the updated design data D1 input to the data name input unit 82 belongs is changed or when the type name is not set. It is used for cases, and the type name after change and the initial type name are input.

<Configuration of direct drawing apparatus>
Next, the configuration of the direct drawing apparatus 100 will be described with reference to FIGS. 9 and 10. FIG. 9 is a side view of the direct drawing apparatus 100 according to an embodiment of the present invention, and FIG. 10 is a plan view of the direct drawing apparatus 100 shown in FIG. Since the direct drawing apparatus 100 is an exposure apparatus that does not use a photomask, it can suitably cope with various pattern drawing. Further, in the pattern drawing system 4 having the direct drawing apparatus 100, the GUI apparatus 2 is preferably used because design data is frequently updated to cope with various patterns.

  The direct drawing apparatus 100 is an apparatus for drawing an exposure pattern by scanning a spatially modulated light beam on the surface of a substrate W such as a semiconductor substrate or a glass substrate provided with a photoresist film (photosensitive material). is there. Specifically, in the manufacturing process of the multichip module, a wiring pattern is drawn on a photosensitive photoresist film formed on the surface of a support substrate (hereinafter simply referred to as “substrate”) W that is a drawing target. It is a device for doing. The substrate W has a circular shape, and a notch called a notch is formed in a part of the outer peripheral edge thereof. An orientation flat may be provided on a part of the outer peripheral edge of the substrate W instead of the notch. The direct drawing apparatus 100 is a pattern drawing apparatus that performs pattern drawing processing in units of blocks (chips) that divide the substrate W. Note that the drawing operation of the direct drawing apparatus 100 is executed using the above-described job ticket JT.

  As shown in FIGS. 9 and 10, the direct drawing apparatus 100 mainly measures the stage 10 that holds the substrate W, the stage moving mechanism 20 that moves the stage 10, and the position parameter corresponding to the position of the stage 10. A position parameter measuring mechanism 30, an optical head unit 50 that irradiates the surface of the substrate W with pulsed light, one alignment camera 60, and a control unit 70.

  Further, in the direct drawing apparatus 100, each part of the apparatus is arranged inside the main body formed by attaching the cover 102 to the main body frame 101 to form the main body, and outside the main body (in this embodiment, As shown in FIG. 9, a substrate storage cassette 110 is disposed on the right hand side of the main body. The substrate storage cassette 110 stores an unprocessed substrate W to be subjected to exposure processing, and is loaded into the main body by a transfer robot 120 disposed inside the main body. Further, after the exposure process (pattern drawing process) is performed on the unprocessed substrate W, the substrate W is unloaded from the main body by the transfer robot 120 and returned to the substrate storage cassette 110. Thus, the transfer robot 120 functions as a transfer unit.

  In this main body, as shown in FIG. 10, the transfer robot 120 is arranged at the right hand end inside the main body surrounded by the cover 102. A base 130 is disposed on the left hand side of the transfer robot 120. One end side region (the right hand side region in FIGS. 9 and 10) of the base 130 is a substrate delivery region for delivering the substrate W to and from the transfer robot 120, whereas the other end side region (Left-hand side region in FIG. 9 and FIG. 10) is a pattern drawing region for pattern drawing on the substrate W. On the base 130, a head support 140 is provided at the boundary position between the substrate delivery area and the pattern drawing area. In the head support portion 140, as shown in FIG. 10, two leg members 141 and 142 are erected upward from the base 130, and a beam is formed so as to bridge the top portions of the leg members 141 and 142. A member 143 is provided horizontally. Then, as shown in FIG. 9, an alignment camera (imaging unit) 60 is fixed on the opposite side of the beam drawing member 143 from the pattern drawing region side, and the surface of the substrate W (drawn) held on the stage 10 as will be described later. A plurality of alignment marks and lower layer patterns on the surface and the exposed surface).

  The stage 10, which is a support unit that supports the substrate W, is moved in the X direction, the Y direction, and the θ direction by the stage moving mechanism 20 on the base 130. That is, the stage moving mechanism 20 positions the stage 10 by moving it two-dimensionally in the horizontal plane and adjusting the relative angle with respect to the optical head unit 50 described later by rotating it around the θ axis (vertical axis). To do.

  Further, the optical head unit 50 is attached to the head support unit 140 configured in this manner so as to be movable in the vertical direction. As described above, the alignment camera 60 and the optical head unit 50 are attached to the head support unit 140, and the positional relationship between the two in the XY plane is fixed. The optical head unit 50 performs pattern drawing on the substrate W, and is moved in the vertical direction by a head moving mechanism (not shown). When the head moving mechanism operates, the optical head unit 50 moves in the vertical direction, and the distance between the optical head unit 50 and the substrate W held on the stage 10 can be adjusted with high accuracy. Thus, the optical head unit 50 functions as a drawing head.

  Two leg members 141 and 142 are also erected at the end of the base 130 opposite to the substrate delivery side (the left-hand side end in FIGS. 9 and 10). And the box 172 which accommodated the optical system of the optical head part 50 is provided so that the beam member 143 and the top part of the two leg members 141 and 142 may be bridged, and the pattern drawing area | region of the base 130 is provided from upper direction. Covering.

  The stage 10 has a cylindrical outer shape, and is a holding unit for placing and holding the substrate W in a horizontal posture on the upper surface thereof. A plurality of suction holes (not shown) are formed on the upper surface of the stage 10. For this reason, when the substrate W is placed on the stage 10, the substrate W is attracted and fixed to the upper surface of the stage 10 by the suction pressure of the plurality of suction holes. In the present embodiment, a photoresist (photosensitive material) film is formed in advance on the surface (main surface) of the substrate W to be subjected to the drawing process by a spin coating method (rotary coating method) or the like.

  The stage moving mechanism 20 moves the stage 10 in the main scanning direction (Y-axis direction), sub-scanning direction (X-axis direction), and rotation direction (rotation direction around the Z-axis) with respect to the base 130 of the direct drawing apparatus 100. It is a mechanism for moving. The stage moving mechanism 20 includes a rotation mechanism 21 that rotates the stage 10, a support plate 22 that rotatably supports the stage 10, a sub-scanning mechanism 23 that moves the support plate 22 in the sub-scanning direction, and a sub-scanning mechanism 23. And a main scanning mechanism 25 for moving the base plate 24 in the main scanning direction.

  The rotation mechanism 21 has a motor constituted by a rotor attached inside the stage 10. A rotary bearing mechanism is provided between the lower surface side of the center portion of the stage 10 and the support plate 22. For this reason, when the motor is operated, the rotor moves in the θ direction, and the stage 10 rotates within a predetermined angle range around the rotation axis of the rotary bearing mechanism.

  The sub-scanning mechanism 23 has a linear motor 23 a that generates a propulsive force in the sub-scanning direction by a mover attached to the lower surface of the support plate 22 and a stator laid on the upper surface of the base plate 24. The sub-scanning mechanism 23 has a pair of guide rails 23 b that guide the support plate 22 along the sub-scanning direction with respect to the base plate 24. For this reason, when the linear motor 23a is operated, the support plate 22 and the stage 10 move in the sub-scanning direction along the guide rail 23b on the base plate 24.

  The main scanning mechanism 25 has a linear motor 25 a that generates a propulsive force in the main scanning direction by a moving element attached to the lower surface of the base plate 24 and a stator laid on the upper surface of the head support portion 140. The main scanning mechanism 25 has a pair of guide rails 25b for guiding the base plate 24 along the main scanning direction with respect to the head support portion 140. For this reason, when the linear motor 25a is operated, the base plate 24, the support plate 22, and the stage 10 move in the main scanning direction along the guide rail 25b on the base 130. As such a stage moving mechanism 20, a conventionally used XY-θ axis moving mechanism can be used.

  The position parameter measuring mechanism 30 is a mechanism for measuring a position parameter of the stage 10 using laser beam interference. The position parameter measurement mechanism 30 mainly includes a laser beam emitting unit 31, a beam splitter 32, a beam bender 33, a first interferometer 34, and a second interferometer 35.

  The laser beam emitting unit 31 is a light source device for emitting a measurement laser beam. The laser beam emitting unit 31 is installed at a fixed position, that is, a position fixed to the base 130 and the optical head unit 50 of the present apparatus. The laser light emitted from the laser light emitting unit 31 first enters the beam splitter 32 and travels from the beam splitter 32 to the beam bender 33 and from the beam splitter 32 to the second interferometer 35. The light is branched to the second branched light.

  The first branched light is reflected by the beam bender 33 and is incident on the first interferometer 34, and at the same time, a first part (here, the −Y side end of the stage 10 from the first interferometer 34). Irradiated to the central portion 10a of the end on the -Y side. Then, the first branched light reflected by the first part 10a is incident on the first interferometer 34 again. The first interferometer 34 determines a positional parameter corresponding to the position of the first portion 10a of the stage 10 based on the interference between the first branched light traveling toward the stage 10 and the first branched light reflected from the stage 10. measure.

  On the other hand, the second branched light is incident on the second interferometer 35, and the second part (different from the first part 10a) on the −Y side end of the stage 10 from the second interferometer 35. Part) 10b is irradiated. Then, the second branched light reflected at the second portion 10 b is incident on the second interferometer 35 again. The second interferometer 35 sets a positional parameter corresponding to the position of the second portion 10b of the stage 10 based on the interference between the second branched light traveling toward the stage 10 and the second branched light reflected from the stage 10. measure. The first interferometer 34 and the second interferometer 35 transmit the position parameters acquired by the respective measurements to the control unit 70.

  The optical head unit 50 is a light irradiation unit that emits pulsed light toward the surface of the substrate W held on the stage 10. The optical head unit 50 includes a beam member 143 laid on the base 130 so as to straddle the stage 10 and the stage moving mechanism 20, and one optical head provided on the beam member 143 substantially at the center in the sub-scanning direction. Part 50. The optical head unit 50 is connected to one laser oscillator 54 via the illumination optical system 53. Further, a laser drive unit 55 that drives the laser oscillator 54 is connected to the laser oscillator 54 that is a light source. When the laser driving unit 55 is operated, pulsed light is emitted from the laser oscillator 54, and the pulsed light is introduced into the optical head unit 50 through the illumination optical system 53.

  In the optical head unit 50, pulse light is introduced from the illumination optical system 53 into the optical head unit 50 from the introduction unit, and the introduced pulse light is converted into a light beam shaped into a predetermined pattern shape. A pattern is drawn on the surface of the substrate W by irradiating the surface of the substrate W and exposing the photoresist film (photosensitive layer) on the substrate W.

  In the direct drawing apparatus 100 of FIG. 9, a laser oscillator 54 that is a light source is provided in the box 172, and light from the laser oscillator 54 is introduced into the optical head unit 50 through the illumination optical system 53. In this embodiment, a photoresist (photosensitive material) film that is exposed to ultraviolet rays is formed in advance on the main surface of the substrate W, and the laser oscillator 54 uses ultraviolet rays (i-line) having a wavelength λ of about 365 nm. It is a laser light source which radiates | emits. Of course, the laser oscillator 54 may emit light of other wavelengths included in the wavelength band in which the photosensitive material of the substrate W is exposed.

  FIG. 11 is a diagram showing the illumination optical system 53 and the projection optical system 517 of the direct drawing apparatus 100. Light from the laser oscillator 54 shown in FIG. 9 is applied to the spatial light modulator 511 of the light modulation unit 512 via the illumination optical system 53 and the mirror 516 shown in FIG. The light spatially modulated by the spatial light modulator 511 is irradiated onto the substrate W supported by the stage 10 via the projection optical system 517.

  The illumination optical system 53 includes a telescope 540, a condenser lens 541, an attenuator 542, and a focusing lens 543. The telescope 540 has a function of expanding the beam diameter (cross-sectional shape) of light (laser beam) in the X and Z directions, and is composed of three lenses. The condenser lens 541 has a function of expanding the laser beam in the X direction. The attenuator 542 adjusts the energy amount (transmission amount) of the laser beam that passes therethrough. The focusing lens 543 has a function of reducing the cross-sectional dimension of the laser beam in the Z direction. Light (laser beam) emitted from the focusing lens 543 is applied to the spatial light modulator 511 as linear illumination light that extends in the X direction and is reduced in the Y direction via the mirror 516. The illumination optical system 53 does not necessarily have to be configured as shown in FIG. 11, and other optical elements may be added.

  The light irradiated from the illumination optical system 53 to the spatial modulator 511 passes through the opening of the shielding plate 521 of the projection optical system, which will be described later, from the specularly reflected light (zeroth-order light) reflected from the spatial light modulator 511. Since the (± 1) -order diffracted light generated from the modulator 511 is shielded by the shielding plate 521, it is preferably closer to parallel light. For this reason, the numerical aperture NA1 of the illumination optical system 53 is set to be larger than 0 (zero) and 0.06 or less. The numerical aperture NA1 is obtained by NA1 = n · sin θ1, where θ1 is the maximum angle with respect to the optical axis of the illumination light in the YZ plane through which linear illumination light extending in the X direction passes. However, n is the refractive index of the medium. In the present embodiment, the medium is air, so the refractive index n is 1.

  The projection optical system 517 includes four lenses 518, 519, 520, and 522, a shielding plate (aperture member) 521, a zoom lens 523, and a focusing lens 524. The lenses 518, 519, 520, and 522 and the shielding plate 521 of the projection optical system 517 constitute a Schlieren optical system that is telecentric on both sides, and the light that has passed through the lens 520 is guided to the shielding plate 521 having an aperture. In addition, a part of the light (regular reflection light (0th order light)) is guided to the lens 522 through the opening, and the remaining light ((± 1) order diffracted light) is shielded by the shielding plate 521. The light that has passed through the lens 522 is guided to the zoom lens 523, and is guided to the photoresist film (photosensitive material) on the substrate W at a predetermined magnification via the focusing lens 524. Note that the projection optical system 517 is not necessarily configured as shown in FIG. 11, and other optical elements may be added.

  In order to reduce the change in the diameter (width) of light irradiated onto the substrate W according to the focal position (focus position), it is necessary to set the depth of field of the projection optical system 517 to be long (deep). For this reason, the numerical aperture NA2 of the projection optical system 517 is preferably small, and is set to 0.1, for example. The numerical aperture NA2 is obtained by NA2 = n · sin θ2, where θ2 is the maximum angle with respect to the optical axis of the projection light on the YZ plane through which linear projection light extending in the X direction passes. However, n is the refractive index of the medium. In the present embodiment, the medium is air, so the refractive index n is 1.

  The value (σ value) obtained by dividing the numerical aperture NA1 of the illumination optical system 53 by the numerical aperture NA2 of the projection optical system 517 is a substrate in which the specularly reflected light reflected by the spatial light modulator 511 is formed in a desired shape as described above. In order to irradiate on W, it is preferable to be close to 0, for example, larger than 0 and set to 0.6 or less.

  A drawing controller 515 that performs modulation control of the light modulation unit 512 is electrically connected to the spatial light modulator 511. The drawing control unit 515 and the projection optical system 517 are built in the optical head unit 50. An exposure control unit 514 and a drawing signal processing unit 513 are electrically connected to the drawing control unit 515, respectively. A drawing signal processing unit 513 and the stage moving mechanism 20 are electrically connected to the exposure control unit 514. The exposure control unit 514 and the drawing signal processing unit 513 are provided in the control unit 70 of FIG.

  FIG. 12 is an enlarged view showing the spatial light modulator 511. The spatial light modulator 511 shown in FIG. 12 is manufactured using a semiconductor device manufacturing technique, and is a diffraction grating capable of changing the depth of the grating. In the spatial light modulator 511, a plurality of movable ribbons 530a and fixed ribbons 531b are alternately arranged in parallel. As will be described later, the movable ribbon 530a can be moved up and down individually with respect to the reference plane behind, and fixed. The ribbon 531b is fixed with respect to the reference plane. For example, GLV (Grating Light Valve) (registered trademark of Silicon Light Machines (San Jose, Calif.)) Is known as a diffraction grating type spatial light modulator.

  A fixed reflection surface is provided on the upper surface of the fixed ribbon 531b, and a movable reflection surface is provided on the upper surface of the movable ribbon 530a. A plurality of movable ribbons 530a and fixed ribbons 531b are irradiated with linear light whose light beam cross section is long in the arrangement direction. In the spatial light modulator 511, if each of the adjacent movable ribbon 530a and fixed ribbon 531b has a single ribbon pair as a lattice element, three or more adjacent lattice elements are drawn in one pixel of a pattern to be drawn. Correspond. In this embodiment, a set of four lattice elements adjacent to each other is a modulation element corresponding to one pixel, and in FIG. 12, a set of ribbon pairs constituting one modulation element is denoted by reference numeral 535. Surrounded by a thick rectangle.

  The driver circuit unit 536 deflects the movable ribbon 530a toward the reference plane side by applying a voltage (potential difference) between the movable ribbon 530a and the reference plane. As a result, the movable ribbon 530a moves up and down between an initial position separated from the reference plane and a position in contact with the reference plane, and the height position of the movable ribbon 530a is set.

  A control unit 70 illustrated in FIG. 9 is an information processing unit for directly controlling the operation of each unit in the drawing apparatus 100 while executing various arithmetic processes. FIG. 13 is a block diagram illustrating a connection configuration between the above-described units of the direct drawing apparatus 100 and the control unit 70. As shown in FIG. 13, the control unit 70 includes the rotation mechanism 21, the linear motors 23a and 25a, the laser light emitting unit 31, the first interferometer 34, the second interferometer 35, the illumination optical system 53, and the laser. The drive unit 55, the projection optical system 517, and the alignment camera 60 are electrically connected. The control unit 70 is configured by, for example, a computer having a CPU and a memory, and performs operation control of the above-described units when the computer operates according to a program installed in the computer.

  Further, in order to control the drawing operation of the control unit 70 configured as described above, a computer 71 as the control unit 70 includes a CPU, a memory 72, and the like as shown in FIG. Arranged in an electrical rack (not shown). FIG. 14 is a block diagram illustrating a control unit that controls the drawing operation. The rasterization unit 73 and the data generation unit 75 are realized by the CPU in the computer 71 performing arithmetic processing according to a predetermined program.

  For example, pattern data corresponding to one semiconductor package is pattern data generated by an external CAD or the like, which is prepared in advance in the memory 72 as wiring pattern data 76, and is stored in the wiring pattern data 76 and the data generation unit 75. The drawing pattern of the semiconductor package is drawn on the substrate W as described later. Here, the computer 71 plays a role of the drawing signal processing unit 513 shown in FIG.

  The wiring pattern data 76 corresponds to the above-described design data D0 or updated design data D1 transmitted directly from the design data creation device 1 shown in FIG. The memory 72 also stores the above-described job ticket JT transmitted directly from the image processing apparatus 2 to the drawing apparatus 100 via the network N.

  The rasterizing unit 73 divides and rasterizes the unit area indicated by the drawing data generated by the data generating unit 75, generates raster data 77, and stores it in the memory 72. In this way, the unprocessed substrate W is drawn after the preparation of the raster data 77 or in parallel with the preparation of the raster data 77. The rasterization described above is executed in accordance with the RIP development process defined by the job ticket JT, and raster data 77 corresponding to the drawing data of the present invention is generated.

  The drawing data generated in this way is sent from the data generation unit 75 to the exposure control unit 514, and the exposure control unit 514 controls each part of the light modulation unit 512 and the stage moving mechanism 20, thereby drawing one stripe. Is called. Control of the light modulation unit 512 by the exposure control unit 514 is executed via the drawing control unit 515 as shown in FIG. When the exposure recording for one stripe is completed, the same processing is performed for the next divided region, and drawing is repeated for each stripe. In the present embodiment, the control unit of the present invention is realized by the control unit 70, the drawing control unit 515, the exposure control unit 514, the driver circuit unit 536, and the like.

  Further, the direct drawing apparatus 100 divides a plurality of substrates W by controlling the light modulation unit 512 by the exposure control unit 514 executed via the drawing control unit 515 shown in FIG. 11 during the drawing operation for each stripe. The exposure operation is executed in units of blocks based on the exposure conditions set for each block (chip). This block (chip) corresponds to the chip 96 displayed on the confirmation display unit 92 shown in FIG.

  In the present embodiment, the computer 71 shown in FIG. 14 is directly provided in the drawing apparatus 100. However, the computer 71 may be provided in the image processing apparatus 3 shown in FIG. In this case, the rasterization (RIP development) or the like is executed by the image processing apparatus 3, and the generated raster data (drawing data) is directly transmitted to the drawing apparatus 100 via the network N.

<Stage position control>
The direct drawing apparatus 100 has a function of controlling the position of the stage 10 based on the measurement results of the first interferometer 34 and the second interferometer 35. Hereinafter, such position control of the stage 10 will be described.

  As described above, the first interferometer 34 and the second interferometer 35 measure position parameters corresponding to the positions of the first part 10a and the second part 10b of the stage 10, respectively. The first interferometer 34 and the second interferometer 35 transmit the position parameters P1 and P2 acquired by the respective measurements to the control unit 70. As illustrated in FIG. 14, the control unit 70 includes a computer 71 as a calculation unit. The function of the computer 71 is realized by the CPU of the computer 71 operating according to a predetermined program, for example.

  On the other hand, the control unit 70 calculates the position of the stage 10 (the position in the Y-axis direction and the rotation angle around the Z-axis) based on the position parameters transmitted from the first interferometer 34 and the second interferometer 35. . Next, the control unit 70 accurately controls the position of the stage 10 and the moving speed of the stage 10 by operating the stage moving mechanism 20 while referring to the calculated position of the stage 10. Here, the control unit 70 also corrects the tilt of the stage 10 (shift in the rotation angle around the Z axis) accompanying the movement in the main scanning direction by rotating the stage 10 around the Z axis. Further, the control unit 70 accurately controls the irradiation position of the pulsed light on the surface of the substrate W by operating the laser driving unit 55 while referring to the calculated position of the stage 10.

<Operation of direct drawing device>
Next, an example of the operation of the direct drawing apparatus 100 will be described with reference to the flowchart of FIG.

  When processing the substrate W in the direct drawing apparatus 100, first, calibration processing for adjusting the position and light amount of the pulsed light emitted from the optical head unit 50 is performed (step S1). In the calibration process, first, the CCD camera (not shown) is arranged below the optical head unit 50 by moving the base plate 24. Then, while moving the CCD camera in the sub-scanning direction, the optical head unit 50 emits pulsed light, and the emitted pulsed light is photographed by the CCD camera. The control unit 70 operates the illumination optical system 53 of the optical head unit 50 based on the acquired image data, and thereby adjusts the position and amount of pulsed light emitted from the optical head unit 50.

  When the calibration process is completed, the operator or the transfer robot 120 next carries the substrate W and places it on the upper surface of the stage 10 (step S2).

  Subsequently, the direct drawing apparatus 100 performs an alignment process for adjusting the relative position between the substrate W placed on the stage 10 and the optical head unit 50 (step S3). In step S2, the substrate W is placed at a substantially predetermined position on the stage 10, but the positional accuracy for drawing a fine pattern is often not sufficient. For this reason, by performing the alignment process, the position and inclination of the substrate W are finely adjusted to improve the accuracy of the subsequent drawing process.

  In the alignment process, first, alignment marks formed at the four corners of the upper surface of the substrate W are photographed by the alignment camera 60, respectively. Based on the position of each alignment mark in the image acquired by the alignment camera 60, the control unit 70 shifts the substrate W from the ideal position (a positional shift amount in the X-axis direction, a positional shift amount in the Y-axis direction, And the amount of inclination around the Z axis). And the position of the board | substrate W is correct | amended by operating the stage moving mechanism 20 in the direction which reduces the calculated deviation | shift amount.

  Subsequently, the direct drawing apparatus 100 performs a drawing process on the substrate W after the alignment process (step S4). That is, the direct drawing apparatus 100 irradiates the upper surface of the substrate W with the pulsed light from the optical head unit 50 toward the upper surface of the substrate W while moving the stage 10 in the main scanning direction and the sub-scanning direction. A pattern is drawn for each of a plurality of blocks that partition the substrate W. This drawing operation is executed based on the drawing data.

  When the drawing process is completed, the direct drawing apparatus 100 operates the stage moving mechanism 20 to move the stage 10 and the substrate W to the carry-out position. Then, the worker or the transfer robot 120 unloads the substrate W from the upper surface of the stage 10 (step S5).

<Deformation implementation>
In the direct drawing apparatus 100 of the above embodiment, the substrate W is moved with respect to the optical head unit 50 and the like, but the relative movement is realized by moving the optical head unit 50 and the like with respect to the solid-supported substrate W. You may let them.

  The pattern drawing apparatus is not limited to the direct drawing apparatus 100 that draws a pattern on the substrate W on which a chip or the like is formed as described above. For example, the pattern drawing apparatus draws a pattern on a substrate to be used as a photomask used for exposure processing. It may be a pattern drawing device.

DESCRIPTION OF SYMBOLS 2 GUI apparatus 4 Pattern drawing system 5 Computer 82 Data name input part 83 Ticket list display part 90 History display part 91 Update button 100 Direct drawing apparatus (pattern drawing apparatus)
200 Display Unit 234 Operation Unit 240 Display Control Unit 241 Design Data Information Input Unit 242 Job Ticket Information Display Unit 243 Job Ticket Highlight Display Unit 244 Replacement Instruction Input Display Unit 245 Update Candidate Display Unit W Substrate P Program

Claims (9)

A GUI device for a pattern drawing device used when updating a job ticket that defines a series of processes for generating drawing data from design data,
A display unit having a screen;
An operation unit for operating the screen of the display unit;
A display control unit for controlling the screen display of the display unit;
With
The display control unit
A design data information input unit for displaying on the screen an input unit for inputting information on the updated update design data;
A job ticket information display unit for displaying information on a job ticket related to information input to the design data information input unit by the operation unit on the screen;
A job ticket highlighting display unit that highlights on the screen the job ticket selected by the operation unit as a job ticket to be replaced with the updated design data from the job ticket displayed by the job ticket information display unit;
A replacement instruction input display unit for displaying an input unit on the screen for inputting an instruction to replace design data with updated design data for the job ticket highlighted on the screen by the job ticket highlighting unit;
A GUI apparatus for a pattern drawing apparatus, comprising: The GUI apparatus for a pattern drawing apparatus according to claim 1,
The display control unit further includes an update candidate display unit that displays information related to update candidate design data, which is update design data that can be updated, on the screen according to the job ticket highlighted on the screen by the job ticket highlighting display unit. A GUI device for a pattern drawing device. The GUI apparatus for a pattern drawing apparatus according to claim 2,
The display control unit is a GUI device for a pattern drawing device further including a narrowing information input display unit that displays a narrowing information input unit for narrowing update candidate design data on a screen. A GUI apparatus for a pattern drawing apparatus according to any one of claims 1 to 3,
A pattern drawing device for drawing a pattern on a substrate based on drawing data generated from the updated design data according to the job ticket updated by the GUI device;
A pattern drawing system comprising: The pattern drawing system according to claim 4, wherein
A pattern drawing system, which is a direct drawing device in which a pattern drawing device draws a pattern by scanning a spatially modulated light beam on a photoresist film formed on a substrate. A job ticket update method for updating a job ticket that defines a series of processes for generating drawing data from design data,
An update design data input step for inputting information related to the updated update design data to the design data information input unit displayed on the screen of the display unit included in the GUI device by the operation unit included in the GUI device;
A job ticket selection step for selecting a job ticket to be replaced with update design data by the operation unit from among job tickets displayed on the screen according to the information input in the update design data input step;
For the job ticket selected in the job ticket selection step, a replacement step for replacing the design data with the updated design data by the operation unit,
Job ticket update method including A computer-readable program provided in a GUI device for a pattern drawing device used when updating a job ticket that defines a series of processes for generating drawing data from design data,
A design data information input unit display function for displaying an input unit for inputting information on the updated design data updated on the screen of the display unit provided in the GUI device;
A job ticket information display function for displaying information on a job ticket related to information input to the design data information input unit by an operation unit included in the GUI device;
From the job ticket displayed on the screen by the job ticket information display function, the job ticket selected by the operation unit is highlighted on the screen as the job ticket to be replaced with the updated design data selected by the operation unit. Job ticket highlighting function,
Replacement instruction input display function for displaying on the screen an input unit for inputting an instruction to replace design data with updated design data for the job ticket highlighted on the screen by the job ticket highlight display function,
A program characterized by causing a computer to demonstrate. In the program according to claim 7,
A program for causing a computer to further display an update candidate display function for displaying information on update candidate design data, which is update design data that can be updated, on the screen in accordance with the job ticket highlighted on the screen by the job ticket highlight display function. In the program according to claim 8,
A program that causes a computer to further exert a narrowed-down information input display function for displaying a narrowed-down information input unit for narrowing update candidate design data on a screen.

Images