JP2015103634A5 - - Google Patents

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Publication number
JP2015103634A5
JP2015103634A5 JP2013242425A JP2013242425A JP2015103634A5 JP 2015103634 A5 JP2015103634 A5 JP 2015103634A5 JP 2013242425 A JP2013242425 A JP 2013242425A JP 2013242425 A JP2013242425 A JP 2013242425A JP 2015103634 A5 JP2015103634 A5 JP 2015103634A5
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JP
Japan
Prior art keywords
light source
source according
wavelength tunable
tunable light
unit
Prior art date
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Application number
JP2013242425A
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English (en)
Japanese (ja)
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JP6271967B2 (ja
JP2015103634A (ja
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Priority to JP2013242425A priority Critical patent/JP6271967B2/ja
Priority claimed from JP2013242425A external-priority patent/JP6271967B2/ja
Priority to US14/528,791 priority patent/US9513106B2/en
Publication of JP2015103634A publication Critical patent/JP2015103634A/ja
Publication of JP2015103634A5 publication Critical patent/JP2015103634A5/ja
Application granted granted Critical
Publication of JP6271967B2 publication Critical patent/JP6271967B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013242425A 2013-11-23 2013-11-23 波長可変光源 Expired - Fee Related JP6271967B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013242425A JP6271967B2 (ja) 2013-11-23 2013-11-23 波長可変光源
US14/528,791 US9513106B2 (en) 2013-11-23 2014-10-30 Wavelength tunable light source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013242425A JP6271967B2 (ja) 2013-11-23 2013-11-23 波長可変光源

Publications (3)

Publication Number Publication Date
JP2015103634A JP2015103634A (ja) 2015-06-04
JP2015103634A5 true JP2015103634A5 (enExample) 2017-01-12
JP6271967B2 JP6271967B2 (ja) 2018-01-31

Family

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Family Applications (1)

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JP2013242425A Expired - Fee Related JP6271967B2 (ja) 2013-11-23 2013-11-23 波長可変光源

Country Status (2)

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US (1) US9513106B2 (enExample)
JP (1) JP6271967B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6608203B2 (ja) * 2015-07-13 2019-11-20 キヤノン株式会社 面発光レーザ、情報取得装置及び撮像装置
JP6608202B2 (ja) * 2015-07-13 2019-11-20 キヤノン株式会社 面発光レーザ、情報取得装置及び撮像装置
WO2017069780A1 (en) * 2015-10-23 2017-04-27 Hewlett-Packard Development Company, L.P. Microelectromechanical device with multiple hinges
JP7358154B2 (ja) 2019-09-25 2023-10-10 キヤノン株式会社 半導体発光装置、露光ヘッド及び画像形成装置
JP7716163B2 (ja) 2020-12-18 2025-07-31 キヤノン株式会社 画像形成装置
JP7699925B2 (ja) 2020-12-18 2025-06-30 キヤノン株式会社 画像形成装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5629951A (en) * 1995-10-13 1997-05-13 Chang-Hasnain; Constance J. Electrostatically-controlled cantilever apparatus for continuous tuning of the resonance wavelength of a fabry-perot cavity
US7756168B2 (en) * 2003-07-25 2010-07-13 Neophotonics Corporation Method for improving high frequency operation of a vertical cavity surface emitting laser (VCSEL) with monolithically integrated bridge arm
JP2005309099A (ja) * 2004-04-21 2005-11-04 Seiko Epson Corp 波長可変フィルタ及びその製造方法
JP2006216722A (ja) 2005-02-02 2006-08-17 Tokyo Institute Of Technology 変調器集積面発光レーザ
JP2007178597A (ja) 2005-12-27 2007-07-12 Topcon Corp 反射ユニット及び反射ユニットの製作方法
US7468997B2 (en) * 2006-01-20 2008-12-23 Praevium Research, Inc. System for swept source optical coherence tomography
JP4898263B2 (ja) * 2006-04-07 2012-03-14 サンテック株式会社 光干渉断層画像表示システム
JP2010211032A (ja) * 2009-03-11 2010-09-24 Anritsu Corp 平行移動ミラーおよびそれを用いた光モジュール
WO2011024968A1 (ja) 2009-08-28 2011-03-03 国立大学法人 東京大学 光素子
JP2011053520A (ja) * 2009-09-03 2011-03-17 Nec Corp 光通信システム及び光通信システムの製造方法
US20110280269A1 (en) * 2010-05-13 2011-11-17 The Regents Of The University Of California High contrast grating integrated vcsel using ion implantation
JP5177209B2 (ja) * 2010-11-24 2013-04-03 株式会社デンソー ファブリペロー干渉計
JP5834418B2 (ja) * 2011-02-04 2015-12-24 セイコーエプソン株式会社 光フィルター、光フィルターモジュール、分析機器及び光機器
JP5984693B2 (ja) * 2012-01-31 2016-09-06 キヤノン株式会社 光干渉断層撮像装置及び光干渉断層撮像方法
JP5906108B2 (ja) * 2012-03-23 2016-04-20 キヤノン株式会社 フォトニック結晶の製造方法及び面発光レーザの製造方法

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