JP2015088963A - Manufacturing method of vibration piece, vibrator, electronic apparatus, and mobile body - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of a vibration piece that suppresses a variation of a vibration arm width caused by side face corrosion during groove part etching.SOLUTION: The manufacturing method of a vibration piece includes: an outer shape etching process of forming an outer shape of a vibration arm; an IPA immersion process of immersing at least a side face of the vibration arm into isopropyl alcohol after the outer shape etching process; and a groove etching process of forming a groove part after the IPA immersion process.

Description

  The present invention relates to a method for manufacturing a resonator element, a vibrator including the resonator element, an electronic apparatus, and a moving body.

  Conventionally, as a vibrating piece corresponding to a vibrator that is required to be small and thin, a vibrating piece having a groove portion in a vibrating arm has been proposed. For example, Patent Literature 1 discloses a vibrating piece having a pair of vibrating arms and grooves formed on the vibrating arms from the front and back sides, and Patent Literature 2 discloses a vibrating piece including a vibrating arm using a piezoelectric substrate. Has been. In any of the vibrating pieces, a method of forming the outer shape and the groove of the vibrating piece using wet etching is disclosed. Specifically, a photoresist film is applied on a substrate having a metal film formed on the surface, and the applied resist film is patterned into the outer shape of the resonator element. Then, the metal film and the substrate are etched using the patterned photoresist film as a mask to form the outer shape of the resonator element. Thereafter, the photoresist film is removed, and the substrate exposed in the opening formed in the metal film is etched using the metal film as a mask, thereby forming the resonator element having the groove.

JP 2002-76806 A JP 2004-289217 A

  In the above-described method for manufacturing a resonator element, when the groove is etched, the side surface of the vibrating arm is eroded because the etching solution also touches the side surface of the vibrating arm. However, the vibrating arm has a small distance between the vibrating arm and the adjacent vibrating arm, or foreign substances (for example, bubbles) adhering to the surface of the vibrating arm cause the etching solution to vary in the side surface of the vibrating arm. The arm width will vary. In other words, there is a possibility that the arm width of the vibrating arm after the etching of the groove portion varies and the vibration characteristics of the vibrating piece are deteriorated.

  SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.

  Application Example 1 A method for manufacturing a resonator element according to this application example is a method for manufacturing a resonator element including a resonator arm provided with a groove, and an outer shape etching step for forming an outer shape of the resonator arm; After the outer shape etching step, an IPA immersion step of immersing at least a side surface of the vibrating arm in isopropyl alcohol, and a groove etching step of forming the groove portion after the IPA immersion step are characterized.

  According to this application example, by immersing the side surface of the vibrating arm in isopropyl alcohol after the outer shape etching step, wettability with the etching solution on the side surface of the vibrating arm during groove etching is improved, and the side surface of the vibrating arm is increased. As a result, the arm width of the vibrating arm after the etching of the groove is stabilized, and it is possible to prevent deterioration of the characteristics of the vibrating piece.

  Application Example 2 A method for manufacturing a resonator element according to this application example is a method for manufacturing a resonator element including a resonator arm provided with a groove, and includes an outer shape etching step for forming an outer shape of the resonator arm, A cleaning solution immersion step of immersing at least a side surface of the vibrating arm in a cleaning solution after the etching step; and a groove etching step of forming the groove after the cleaning solution immersion step and before the cleaning solution is dried. To do.

  According to this application example, after the outer shape etching step, the side surface of the vibrating arm is immersed in the cleaning solution, and before the cleaning solution is dried, the surface of the vibrating arm is etched during the groove etching. The wettability with the etching solution is improved, and the etching state of the side surface of the vibrating arm is stabilized, which makes it possible to stabilize the arm width of the vibrating arm after etching the groove and to prevent deterioration of the characteristics of the vibrating piece. Become.

  Application Example 3 In the method for manufacturing a resonator element according to the application example described above, it is preferable that the vibrating arm is placed in a spray atmosphere of the cleaning liquid.

  According to this application example, since the cleaning liquid adheres to the vibrating arm in the sprayed mist state, it is difficult to vaporize and is immersed in the groove etching liquid in a state before drying. For this reason, the wettability with the etching solution on the side surface of the vibrating arm during groove etching is improved, and the etching state on the side surface of the vibrating arm is stabilized. Thereby, the arm width of the vibrating arm after the groove etching is stabilized, and it becomes possible to prevent the characteristics of the vibrating piece from deteriorating.

  Application Example 4 In the method for manufacturing a resonator element according to the application example described above, it is preferable that in the groove etching step, the vibration arm immersed in an etching solution is defoamed.

  According to this application example, by performing the defoaming process, it is possible to remove bubbles or the like adhering to the surface of the vibrating arm. It is possible to suppress variations in the arm width of the vibrating arm due to the above.

  Application Example 5 In the method for manufacturing a resonator element according to the application example described above, in the groove etching step, it is preferable that vibration is applied to the vibrating arm immersed in an etching solution.

  According to this application example, by applying vibration to the vibrating arm immersed in the groove etching solution, it is possible to remove bubbles or foreign matters attached to the surface of the vibrating arm. The wettability with the groove etching solution becomes good, that is, the groove etching solution enters the side surface of the vibrating arm better, and the arm width of the vibrating arm due to the groove etching can be suppressed.

  Application Example 6 A vibrator according to this application example includes the resonator element formed by the method for manufacturing a resonator element according to any one of the above application examples, and a package that stores the resonator element. It is characterized by that.

  According to this application example, variation in arm width of the vibrating arm due to groove etching is suppressed, and the resonator element having stable characteristics is housed in the package. Therefore, a vibrator having stable characteristics can be provided.

  Application Example 7 An electronic apparatus according to this application example includes a resonator element formed by the method for manufacturing a resonator element according to any one of the above application examples.

  According to this application example, since the variation in the arm width of the vibrating arm due to the groove etching is suppressed and the vibration piece having stable characteristics is provided, an electronic apparatus having stable characteristics can be provided.

  Application Example 8 A moving body according to this application example includes a resonator element formed by the method for manufacturing a resonator element according to any one of the above application examples.

  According to this application example, since the variation of the arm width of the vibrating arm due to the groove etching is suppressed and the vibration piece having stable characteristics is provided, it is possible to provide a moving body having stable characteristics.

The perspective view which shows the outline of the tuning fork type crystal vibrating piece which concerns on 1st Embodiment of the vibrating piece of this invention. The schematic perspective view which shows the state by which the electrode was formed in the tuning fork type crystal vibrating piece which concerns on 1st Embodiment. The schematic cross section of the tuning fork type crystal vibrating piece which concerns on 1st Embodiment is shown, and AA sectional drawing of FIG. FIG. 5 is a process flow diagram illustrating a schematic manufacturing method of the tuning-fork type crystal vibrating piece according to the first embodiment. The specific process of the manufacturing method of a tuning fork type crystal vibrating piece is shown, (a) is the outline pattern (exposure) state by a photoresist, (b) is a schematic perspective view which shows the state from which the photoresist was removed. The process flow figure which shows the outline manufacturing method of the tuning fork type crystal vibrating piece which concerns on 1st Embodiment, and shows the process of following FIG. The process flow figure which shows the outline manufacturing method of the tuning fork type | mold crystal vibrating piece which concerns on 2nd Embodiment of the vibrating piece of this invention. The process flow figure showing the outline manufacturing method of the tuning fork type crystal vibrating piece concerning a 3rd embodiment of the vibrating piece of the present invention. FIG. 5A is a schematic cross-sectional view showing a configuration of a ceramic package crystal oscillator as an example of a vibrator, and FIG. 5B is a schematic cross-sectional view showing a configuration of a ceramic package crystal oscillator as an example of an oscillator. The perspective view which shows the structure of the mobile type personal computer as an example of an electronic device. The perspective view which shows the structure of the mobile telephone as an example of an electronic device. The perspective view which shows the structure of the digital still camera as an example of an electronic device. The perspective view which shows the structure of the motor vehicle as an example of a mobile body.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, preferred embodiments of the invention will be described with reference to the accompanying drawings.

<First Embodiment>
The resonator element according to the first embodiment of the resonator element of the invention will be described with reference to FIGS. 1 to 3 show an outline of a tuning fork type crystal vibrating piece, and FIGS. 4 to 6 show an outline of a manufacturing process of the vibrating piece. FIG. 1 is a perspective view showing a schematic configuration of the tuning fork type crystal vibrating piece according to the first embodiment before electrode formation. FIG. 2 is a schematic perspective view showing a state in which electrodes are formed on the tuning fork type quartz vibrating piece. 3 is a cross-sectional view taken along the line AA of FIG. 1 showing a schematic cross section of a tuning fork type crystal vibrating piece. FIG. 4 is a process flow diagram showing a schematic manufacturing method of the tuning-fork type crystal vibrating piece. 5A and 5B show specific steps of a method for manufacturing a tuning-fork type crystal vibrating piece, where FIG. 5A is a schematic perspective view showing a state of external patterning (exposure) using a photoresist, and FIG. 5B is a state where the photoresist is removed. It is. FIG. 6 is a process flow diagram showing a schematic manufacturing method of the tuning-fork type crystal vibrating piece according to the first embodiment and showing processes subsequent to FIG.

(Configuration of tuning-fork type crystal vibrating piece)
As shown in FIG. 1, the tuning fork type quartz vibrating piece 100 is cut out from, for example, a single crystal of quartz and processed into a tuning fork type. The tuning-fork type crystal vibrating piece 100 is cut out from a single crystal of crystal so that the X axis is an electric axis, the Y axis is a mechanical axis, and the Z axis is an optical axis. By arranging the electric shaft in the X-axis direction in this way, the tuning-fork type crystal vibrating piece 100 suitable for all electronic devices such as mobile phone devices that require high accuracy is obtained. Further, when cutting from a single crystal of quartz, in the orthogonal coordinate system composed of the X-axis, Y-axis, and Z-axis described above, the XY plane composed of the X-axis and the Y-axis is about 1 degree counterclockwise around the X-axis. In addition, a tuning fork type crystal vibrating piece 100 is formed as a so-called crystal Z plate tilted by 5 degrees.

  The tuning-fork type crystal vibrating piece 100 includes a base portion 130 and arm portions 120 and 121 that are, for example, two vibrating arms formed so as to protrude from the base portion 130 in the Y-axis direction. A groove part 120a is provided on the surface side of the arm part 120, and a groove part 121a is provided on the surface side of the arm part 121 as a vibrating arm. A groove 120a (see FIG. 3) is also provided on the back side of the arm 120 as a vibrating arm, and a groove 121a (see FIG. 3) is also provided on the back of the arm 121.

In the tuning fork type crystal vibrating piece 100 shown in FIG. 1, the arm width (width in the X-axis direction) of the arm portions 120 and 121 is about 0.1 mm. The interval between the arm part 120 and the arm part 121 is about 0.1 mm.
Further, the groove width (width in the X-axis direction) of the groove portions 120a and 121a is, for example, about 0.07 mm, and the groove depth (depth in the Z-axis direction) is, for example, about 0.02 to 0.045 mm. It has become.

  In the tuning-fork type crystal vibrating piece 100 formed in this way, electrodes 140 and 141 are formed in the portions indicated by hatching in FIG. That is, the electrodes 140 and 141 are disposed from the base portion 130 to the two arm portions 120 and 121, and the electrodes 140 and 141 are also disposed on the side surfaces of the arm portions 120 and 121 and the groove portions 120a and 121a. The electrodes 140 and 141 arranged in this way generate an electric field when an electric current is applied from the outside, and vibrate the crystal arm portions 120 and 121 which are piezoelectric bodies.

  The tuning-fork type crystal vibrating piece 100 formed as described above is smaller than a conventional tuning-fork type crystal vibrating piece of 32.768 kHz that does not have a groove, for example, although the resonance frequency is 32.768 kHz. be able to.

  As shown in FIG. 3, the arm 120 is provided with a groove 120a, and the arm 121 is provided with a groove 121a on the front and back surfaces (in the vertical direction in the figure). Yes. Since the cross-sectional shape is substantially H-shaped in this way, the quartz crystal vibrating piece having the configuration in the present embodiment may be referred to as a substantially H-shaped tuning fork type quartz vibrating piece.

  The front and back grooves 120a are each provided with an electrode 140, and the front and back grooves 121a are each provided with an electrode 141. In addition, electrodes 140 are provided on both side surfaces of the arm portion 120, and electrodes 141 are provided on both side surfaces of the arm portion 121. The electrodes 140 and 141 are connected to a power source (not shown), and voltages having different polarities are alternately applied to the side electrodes 140 and 141 and the groove side electrodes 140 and 141. It is like that. For example, when a positive voltage is applied to the groove-side electrode 140 and a negative voltage is applied to the side electrode 140, an electric field is generated.

  When the electric field is generated, the arm portion 120 vibrates. However, the tuning fork type crystal vibrating piece 100 has groove portions 120a and 121a in the arm portions 120 and 121, respectively, and the electrodes 140 and 121 are provided in the groove portions 120a and 121a. 141 is provided, the generated electric field is widely distributed inside the arms 120 and 121. For this reason, the vibration loss of the arm portions 120 and 121 is small, and the resonator element can suppress the CI value. Therefore, as described above, the vibration piece is small and highly accurate as compared with the conventional tuning-fork type crystal vibration piece having no groove.

(Manufacturing method of tuning-fork type crystal vibrating piece)
A method for manufacturing the tuning-fork type crystal vibrating piece 100 having the above-described configuration will be described with reference to FIGS.

  First, as shown in FIG. 4A, a so-called quartz Z plate substrate is processed into a plate shape to form a quartz Z plate substrate 101. In addition, as described above, this quartz Z-plate is about 1 in the counterclockwise direction on the XY plane composed of the X axis and the Y axis around the X axis in the orthogonal coordinate system composed of the X axis, the Y axis, and the Z axis. It is cut from a single crystal of quartz at an angle of 5 to 5 degrees.

  Next, as shown in FIG. 4B, a Cr (chromium) or Au (gold) metal film is formed on the front surface and the back surface of the quartz Z-plate substrate 101 using, for example, a sputtering device (not shown). 102 is formed. In the drawing, the metal film 102 is illustrated without distinguishing Cr (chrome) and Au (gold) for convenience. In the description, the two metals (Cr (chromium) and Au (gold)) are collectively referred to as a metal film 102.

  Next, as shown in FIG. 4C, a photoresist layer 103 is formed on the metal film 102 formed above using, for example, a spin coater. Then, as shown in FIG. 4D, exposure and development are performed so that the photoresist layer 103 remains on the inner side 104 and the frame portion 105 of the outer shape of the tuning-fork type crystal vibrating piece 100 (see FIG. 1). A part of the photoresist layer 103 is removed, and external patterning is performed. Thereafter, the developer is washed (rinsed) and dried to complete the outer shape patterning step. The cleaning liquid used here uses pure water, and is used in the same manner in the cleaning process described below. In addition to pure water, the cleaning liquid is, for example, water or ultrapure water, a lower alcohol such as ethanol or isopropyl alcohol, a mixed liquid of a surfactant and pure water, or a mixed liquid of a lower alcohol and pure water. There may be. About the washing | cleaning liquid shown here, it can use similarly also in the washing | cleaning (washing process) mentioned later.

  FIG. 4 (d) shows a state where the photoresist layer 103 is partially removed, and FIG. 5 (a) shows a perspective view. In this state, as shown in FIG. 5A, the photoresist layer 103 is formed so that the tuning-fork type crystal vibrating piece 100 (see FIG. 1) is raised.

  Next, the quartz crystal Z plate substrate 101 in the state of FIG. 4D is immersed in a metal layer etching solution, and as shown in FIG. 4E, the photoresist layer 103 is formed in FIG. The portion of the metal film 102 that has not been removed is removed by etching. Therefore, as shown in FIG. 5B, the quartz crystal Z plate substrate 101 is exposed at the portion where the metal film 102 has been removed. Thereafter, the metal etchant is washed (rinse treatment) and dried to complete the metal film removal step.

  Next, as shown in FIG. 4F, all of the photoresist layer 103 remaining in FIG. 4E is removed using a stripping solution (not shown) or the like. Thereafter, the stripping solution is washed (rinse treatment) and dried to complete the photoresist stripping step.

  Next, as shown in FIG. 6G, for example, using a spin coater so as to cover the entire surface of the quartz crystal Z plate substrate 101, that is, the exposed surface of the quartz crystal Z plate substrate 101 and the exposed surface of the metal film 102. A photoresist layer 103 is formed.

  Then, as shown in FIG. 6H, a part of the photoresist layer 103 is removed. Specifically, the inner side 104 of the outer shape of the tuning-fork type crystal vibrating piece 100 shown in FIG. 5 and the photoresist layer 103 other than the frame portion 105, and the photoresist corresponding to the grooves 120a and 121a shown in FIG. A patterning process (including exposure and development processes) for removing the layer 103 is performed. By this process, as shown in FIG. 6 (h), the photoresist layer 103 is removed from the inside 104 of the outer shape of the tuning-fork type crystal vibrating piece 100 and the portions other than the frame portion 105 and the portions corresponding to the groove portions 120a and 121a. Is done. Therefore, the quartz Z plate substrate 101 surface is exposed at portions other than the inner side 104 and the frame portion 105 of the tuning fork type crystal vibrating piece 100, and the metal film 102 surface is exposed at portions corresponding to the groove portions 120a and 121a. Thereafter, the developing solution is washed (rinse treatment), dried, and the step of removing a part of the photoresist layer 103 is completed.

  In the above-described process, the photoresist layer 103 used for the outer shape etching of the quartz crystal Z plate substrate 101 and the photoresist layer 103 used for the etching of the groove portions 120a and 121a have been formed. Therefore, the photoresist layer 103 can be formed using the spin coater as described above. The spin coater does not require an advanced coating technique and can apply the photoresist in the most widely used spin coater, so that the film thickness uniformity of the photoresist layer 103 can be improved. At the same time, the photoresist layer 103 can be easily formed, and not only the quality of the product is improved but also the productivity is improved.

  Next, as shown in FIG. 6I, outer shape etching is performed. That is, the external etching is performed by immersing the crystal Z plate substrate 101 in the crystal etching solution so that only the inner side 104 and the frame portion 105 of the outer shape of the tuning-fork type crystal vibrating piece 100 shown in FIG. At this time, etching is performed for a sufficient period of time so that no fins as protrusions remain on the outer shape of the tuning-fork type crystal vibrating piece 100. In this embodiment, in the outer shape etching step, etching is not performed for forming the groove portions 120a and 121a of the arm portions 120 and 121. Therefore, the groove portions 120a and 121a are formed too deeply, or the groove portions 120a and 120a are accidentally formed. Sufficient etching can be performed without considering that 121a is a through hole. Thereafter, the etching solution is washed (rinse treatment) and dried to finish the outer shape etching process.

  Next, as shown in FIG. 6 (j), the metal film 102 corresponding to the groove portions 120 a and 121 a of the arm portions 120 and 121 of the tuning fork type crystal vibrating piece 100 is removed. The removal of the metal film 102 is performed by immersing the quartz Z plate substrate 101 in a metal layer etchant and etching the exposed metal film 102. Therefore, as shown in FIG. 6 (j), the quartz crystal Z plate substrate 101 at the time when this process is completed has an outer side surface of the tuning fork type quartz vibrating piece 100 and a quartz substrate surface corresponding to the grooves 120a and 121a. Exposed. Thereafter, the etching solution is washed with a washing solution (rinsing treatment) to complete the removal of the metal film 102. In addition, it is preferable to dry after washing | cleaning and to dry a washing | cleaning liquid. By providing the drying process in this way and drying the cleaning liquid, the cleaning liquid is not brought into the isopropyl alcohol 150 when the quartz Z plate substrate 101 as a subsequent process is immersed in the isopropyl alcohol (IPA) 150. The composition change of isopropyl alcohol 150 can be prevented.

  Next, as shown in FIG. 6 (k), the outer shape etching and the metal film 102 etching are finished, and the outer side surface (including the side surface of the arm portion as a vibrating arm) of the tuning fork type crystal vibrating piece 100 and the groove portions 120a and 121a. The quartz Z-plate substrate 101 where the quartz substrate surface of the portion corresponding to is exposed is immersed in isopropyl alcohol (IPA) 150 (IPA immersion step).

  Then, the quartz Z plate substrate 101 taken out from isopropyl alcohol (IPA) 150 is immersed in a groove etching solution (quartz etching solution) and etched to a depth of about 0.02 to 0.045 mm, for example. Grooves 120a and 121a as shown in FIG. 6 (m) are formed on both surfaces (groove etching step). Thereafter, the etching solution is washed (rinse treatment) and dried to complete the groove etching process. By doing in this way, the tuning fork type crystal vibrating piece 100 in which the cross-sectional shape of the arm portions 120 and 121 is formed in a substantially H shape as illustrated is formed.

  Thus, after the outer shape etching step, in other words, before the groove etching step, the side surfaces of the arm portions 120 and 121 in the groove etching are immersed in the isopropyl alcohol 150 by immersing the side surfaces of the arm portions 120 and 121. The wettability with the groove etching solution 161 is improved. That is, by immersing the side surfaces of the arm portions 120 and 121 in isopropyl alcohol 150, surface impurities repelling the etching solution can be removed. This makes it easier for the etching solution to come into contact with the side surfaces of the arm portions 120 and 121 where the groove etching solution 161 is difficult to enter, with the interval being as narrow as about 0.1 mm, and the etching state of the side surfaces of the arm portions 120 and 121 is stabilized. The arm widths of the arm portions 120 and 121 after etching are stabilized, and the characteristics of the tuning fork type crystal vibrating piece 100 can be stabilized.

  In this way, the outer shape of the tuning-fork type quartz vibrating piece 100 in which the cross-sectional shapes of the arms 120 and 121 shown in FIG.

  Next, although the electrode 140 shown in FIG. 2 is formed, a detailed description of the forming process will be omitted, and an outline will be described. First, a metal film is formed on the entire surface of the tuning fork type crystal vibrating piece 100 by sputtering or the like, and a photoresist layer is provided thereon. Thereafter, the portion of the photoresist layer corresponding to the portion where the electrode is not formed is removed, and etching is performed to remove the portion of the metal film where the photoresist layer is not provided. Then, if the remaining photoresist layer is peeled off, an electrode 140 as shown in FIGS. 2 and 3 can be formed.

  Then, by separating the tuning fork type crystal vibrating piece 100 in which the outer shape as described above and the electrode 140 are formed from the frame part 105, the tuning fork type crystal vibration in which the cross-sectional shapes of the arm parts 120 and 121 are substantially H-shaped. A piece 100 is manufactured.

  Since the manufactured tuning fork type crystal vibrating piece 100 is not formed with fins or the like which are side protrusions, the tuning fork type crystal vibrating piece 100 in which the cross-sectional shapes of the arm portions 120 and 121 are substantially H-shaped originally has. The characteristics can be fully exhibited. Further, after the outer shape etching process, in other words, before the groove etching process, the side surfaces of the arm parts 120 and 121 and the side surfaces of the arm parts 120 and 121 in the groove etching are etched by immersing the side surfaces of the arm parts 120 and 121 in isopropyl alcohol 150. The wettability with the liquid 161 is improved. This makes it easier for the groove etching solution 161 to touch the side surfaces of the arm portions 120 and 121, stabilizes the etching state of the side surfaces of the arm portions 120 and 121, stabilizes the arm width of the arm portions 120 and 121 after groove etching, It becomes possible to stabilize the characteristics of the tuning-fork type crystal vibrating piece 100.

Second Embodiment
The resonator element according to the second embodiment will be described with reference to FIG. FIG. 7 is a process flow diagram illustrating a schematic manufacturing method of a tuning-fork type crystal vibrating piece according to the second embodiment of the vibrating piece of the present invention. The configuration of the tuning-fork type crystal vibrating piece used during the description of the manufacturing method will be described with reference to FIGS.

(Configuration of tuning-fork type crystal vibrating piece)
The configuration of the tuning fork type crystal vibrating piece in the second embodiment is the same as that of the tuning fork type crystal vibrating piece 100 of the first embodiment described above. In the orthogonal coordinate system including the X axis, the Y axis, and the Z axis, the X axis A tuning fork type crystal vibrating piece 100 is formed as a so-called crystal Z plate in which an XY plane composed of an X axis and a Y axis is inclined about 1 to 5 degrees counterclockwise. Therefore, the same reference numerals are given to the configurations and the description thereof is omitted.

(Manufacturing method of tuning-fork type crystal vibrating piece)
A method for manufacturing the tuning-fork type crystal vibrating piece 100 of the second embodiment will be described with reference to FIG. In addition, description here abbreviate | omits description about the process same as the process flow demonstrated in the above-mentioned 1st Embodiment, and demonstrates a different process.

  In the manufacturing method of the tuning fork type crystal vibrating piece 100 according to the second embodiment, the so-called quartz Z plate substrate is processed into a plate shape to form the quartz Z plate substrate 101 (see FIG. 4A) to FIG. The outer shape is etched so that only the inner side 104 and the frame portion 105 of the tuning fork type crystal vibrating piece 100 shown in FIG. 6 are left (see FIG. 6I), and then the arm portions 120 and 121 of the tuning fork type crystal vibrating piece 100 are left. A similar process is performed until the process of removing the metal film 102 corresponding to the grooves 120a and 121a (see FIG. 4J). Therefore, description of the process in the meantime is omitted.

  The crystal Z plate substrate 101 from which the metal film 102 corresponding to the groove portions 120a and 121a of the arm portions 120 and 121 of the tuning-fork type crystal vibrating piece 100 is removed after the outer shape etching is completed is the first embodiment described above. Similarly to the above, the outer side surface of the tuning-fork type crystal vibrating piece 100 and the quartz substrate surface corresponding to the grooves 120a and 121a are exposed. In the manufacturing method according to the second embodiment, the quartz crystal Z plate substrate 101 in this state is immersed in a groove etching solution 161 (quartz etching solution) as shown in FIG. Etching is performed to a depth of about 0.045 mm to form groove portions 120a and 121a on both the front and back surfaces as shown in FIG. 7B (groove etching step). At this time, an ultrasonic wave (ultra-sonic) 162 is applied to the quartz crystal Z plate substrate 101 from the ultrasonic wave generator 160 to perform etching while finely vibrating the quartz crystal Z plate substrate 101. Thereafter, the groove etching solution 161 is washed (rinsed) and dried to finish the groove etching process. By doing in this way, the cross-sectional shape of the arm parts 120 and 121 is formed in a substantially H shape as illustrated.

  As described above, an ultrasonic wave is applied to the quartz crystal Z plate substrate 101 in the etching solution to cause the quartz crystal Z plate substrate 101 to vibrate finely, whereby the surface of the quartz crystal Z plate substrate 101, particularly the side surfaces of the arm portions 120 and 121, It is possible to remove foreign matters or fine bubbles adhering to the vicinity of the corner where the side surface and the front and back surfaces intersect. As a result, the wettability between the side surfaces of the arm portions 120 and 121 and the groove etching solution 161 during groove etching is improved, and the etching solution easily enters between the arm portion 120 and the arm portion 121. Thus, the groove etching solution 161 is easy to touch the side surfaces of the arm portions 120 and 121 where the gap is as narrow as about 0.1 mm and the groove etching solution 161 is difficult to enter, and the etching state of the side surfaces of the arm portions 120 and 121 is stabilized. Therefore, the arm widths of the arm portions 120 and 121 after the groove etching are stabilized, and the characteristics of the tuning fork type crystal vibrating piece 100 can be stabilized.

  In this way, the outer shape of the tuning-fork type quartz vibrating piece 100 in which the cross-sectional shapes of the arms 120 and 121 shown in FIG.

  Next, the electrode 140 shown in FIG. 2 is formed. Since the formation method of the electrode 140 is the same as that in the first embodiment, the description thereof is omitted. Then, by separating the tuning fork type crystal vibrating piece 100 in which the outer shape as described above and the electrode 140 are formed from the frame part 105, the tuning fork type crystal vibration in which the cross-sectional shapes of the arm parts 120 and 121 are substantially H-shaped. A piece 100 is manufactured.

  As in the first embodiment, the manufactured tuning-fork type crystal vibrating piece 100 is not formed with fins or the like that are protrusions on the side surfaces. Therefore, the tuning-fork in which the cross-sectional shapes of the arms 120 and 121 are substantially H-shaped. The characteristics inherent to the quartz crystal vibrating piece 100 can be sufficiently exhibited. Further, the wettability between the side surfaces of the arm portions 120 and 121 and the groove etching solution 161 is improved by the fine vibration of the quartz crystal Z plate substrate 101 generated by applying the ultrasonic wave 162 during the groove etching, and the groove etching solution. 161 easily enters between the arm portion 120 and the arm portion 121. As a result, the etching solution can easily touch the side surfaces of the arm portions 120 and 121, the etching state of the side surfaces of the arm portions 120 and 121 is stabilized, the arm width of the arm portions 120 and 121 after the groove etching is stabilized, and the tuning fork type It becomes possible to stabilize the characteristics of the crystal vibrating piece 100.

(Application example of the second embodiment)
In the groove etching step shown in FIG. 7A, in the second embodiment, an example is described in which ultrasonic waves are applied and the quartz crystal Z plate substrate 101 is finely vibrated, but instead of the method of applying ultrasonic waves, A similar effect can be obtained by performing the defoaming treatment. Specifically, after the outer shape etching is finished, the quartz Z plate substrate 101 from which the metal film 102 corresponding to the groove portions 120a and 121a of the arm portions 120 and 121 of the tuning fork type quartz vibrating piece 100 has been removed, It is immersed in a crystal etching solution and etched to a depth of about 0.02 to 0.045 mm, for example, to form groove portions 120a and 121a on both the front and back surfaces as shown in FIG. 7B (groove etching step). . At this time, a so-called defoaming process is performed on the etching solution, for example, a decompression process. And after performing a defoaming process, it etches. Thereafter, the etching solution is washed (rinse treatment) and dried to complete the groove etching process. By doing in this way, the tuning fork type crystal vibrating piece 100 in which the cross-sectional shape of the arm portions 120 and 121 is formed in a substantially H shape as illustrated is formed.

  As described above, the surface of the quartz crystal Z plate substrate 101, in particular, the side surfaces and the side surfaces of the arm portions 120 and 121 intersect the front and back surfaces by defoaming the etching solution in which the quartz crystal plate plate 101 is immersed. It is possible to remove fine bubbles adhering to the vicinity of the corners. As a result, the wettability between the side surfaces of the arm portions 120 and 121 and the groove etching solution 161 during groove etching is improved, and the etching solution easily enters between the arm portion 120 and the arm portion 121. As a result, the groove etching solution 161 is easy to touch the side surfaces of the arm portions 120 and 121 where the distance is as narrow as about 0.1 mm and the etching solution is difficult to enter, and the etching state of the side surfaces of the arm portions 120 and 121 is stabilized. The arm widths of the arm portions 120 and 121 after etching are stabilized, and the characteristics of the tuning fork type crystal vibrating piece 100 can be stabilized.

<Third Embodiment>
A resonator element according to the third embodiment will be described with reference to FIG. FIG. 8 is a process flow diagram showing a schematic manufacturing method of a tuning-fork type crystal vibrating piece according to the third embodiment of the vibrating piece of the present invention. The configuration of the tuning-fork type crystal vibrating piece used during the description of the manufacturing method will be described with reference to FIGS.

(Configuration of tuning-fork type crystal vibrating piece)
The configuration of the tuning fork type crystal vibrating piece in the third embodiment is the same as that of the tuning fork type crystal vibrating piece 100 of the first embodiment described above. In the orthogonal coordinate system including the X axis, the Y axis, and the Z axis, the X axis A tuning fork type crystal vibrating piece 100 is formed as a so-called crystal Z plate in which an XY plane composed of an X axis and a Y axis is inclined about 1 to 5 degrees counterclockwise. Therefore, the same reference numerals are given to the configurations and the description thereof is omitted.

(Manufacturing method of tuning-fork type crystal vibrating piece)
A method for manufacturing the tuning-fork type crystal vibrating piece 100 of the third embodiment will be described with reference to FIG. In addition, description here abbreviate | omits description about the process same as the process flow demonstrated in the above-mentioned 1st Embodiment, and demonstrates a different process.

  In the method of manufacturing the tuning-fork type quartz vibrating piece 100 according to the third embodiment, the so-called quartz Z plate substrate is processed into a plate shape to form the quartz Z plate substrate 101 (see FIG. 4A) to FIG. The outer shape is etched so that only the inner side 104 and the frame portion 105 of the tuning fork type crystal vibrating piece 100 shown in FIG. 6 are left (see FIG. 6I), and then the arm portions 120 and 121 of the tuning fork type crystal vibrating piece 100 are left. A similar process is performed until the process of removing the metal film 102 corresponding to the grooves 120a and 121a (see FIG. 6J). Therefore, description of the process in the meantime is omitted.

  In the manufacturing method according to the third embodiment, the outer shape etching and the metal film 102 etching are finished (see FIG. 6J), and the outer side surface of the tuning-fork type crystal vibrating piece 100 (the side surfaces of the arm portions 120 and 121 as the vibrating arms). And the quartz Z plate substrate 101 where the quartz substrate surface corresponding to the grooves 120a and 121a is exposed is immersed in a cleaning liquid (rinsing liquid) 164 as shown in FIG.

  Then, the quartz crystal Z plate substrate 101 taken out from the cleaning liquid 164 is immersed in the groove etching liquid as shown in FIG. 8B before the cleaning liquid 164 is dried, for example, about 0.02 to 0.045 mm. Etching is performed to a certain depth to form groove portions 120a and 121a on both the front and back surfaces as shown in FIG. 8C (groove etching step). Thereafter, the etching solution is washed (rinse treatment) and dried to complete the groove etching process. By doing in this way, the tuning fork type crystal vibrating piece 100 in which the cross-sectional shape of the arm portions 120 and 121 is formed in a substantially H shape as illustrated is formed.

  As described above, after being taken out from the cleaning liquid 164 and before the cleaning liquid 164 is dried, in other words, by putting it in the groove etching liquid 161 in a state where the quartz Z-plate substrate 101 is wet, The wettability between the side surfaces of 120 and 121 and the etching solution is improved. As a result, the groove etching solution 161 is easy to touch the side surfaces of the arm portions 120 and 121 where the distance is as narrow as about 0.1 mm and the etching solution is difficult to enter, and the etching state of the side surfaces of the arm portions 120 and 121 is stabilized. The arm widths of the arm portions 120 and 121 after etching are stabilized, and the characteristics of the tuning fork type crystal vibrating piece 100 can be stabilized.

  Thus, the outer shape of the tuning-fork type crystal vibrating piece 100 in which the cross-sectional shapes of the arm portions 120 and 121 shown in FIG. 1 are substantially H-shaped is substantially formed.

  Next, the electrode 140 shown in FIG. 2 is formed. Since the formation method of the electrode 140 is the same as that in the first embodiment, the description thereof is omitted. Then, by separating the tuning fork type crystal vibrating piece 100 in which the outer shape as described above and the electrode 140 are formed from the frame part 105, the tuning fork type crystal vibration in which the cross-sectional shapes of the arm parts 120 and 121 are substantially H-shaped. A piece 100 is manufactured.

  As in the first embodiment, the manufactured tuning-fork type crystal vibrating piece 100 is not formed with fins or the like that are protrusions on the side surfaces. Therefore, the tuning-fork in which the cross-sectional shapes of the arms 120 and 121 are substantially H-shaped. The characteristics inherent to the quartz crystal vibrating piece 100 can be sufficiently exhibited. Further, when the groove is etched, the wettability between the side surfaces of the arm portions 120 and 121 and the etching solution is improved, so that the etching solution can easily touch the side surfaces of the arm portions 120 and 121. The etching state is stabilized, the arm widths of the arm portions 120 and 121 after the groove etching are stabilized, and the characteristics of the tuning-fork type crystal vibrating piece 100 can be stabilized.

(Application example of the third embodiment)
In the third embodiment described above, the method of immersing the quartz Z-plate substrate 101 in the cleaning liquid 164 as shown in FIG. 8A has been described. However, in place of this, the quartz crystal in the spraying atmosphere of the cleaning liquid is used. A method of loading the Z plate substrate 101 may also be used. Note that, even in the method in which the crystal Z plate substrate 101 is placed in such a cleaning liquid spray atmosphere, the crystal Z plate substrate 101 taken out from the cleaning liquid spray atmosphere is dried before the cleaning liquid is dried. ) Soaked in a groove etchant 161 and etched to a depth of about 0.02 to 0.045 mm, for example, so that the grooves 120a and 121a as shown in FIG. Form (groove etching step). Thereafter, the etching solution is washed (rinse treatment) and dried to complete the groove etching process. By doing in this way, the tuning fork type crystal vibrating piece 100 in which the cross-sectional shape of the arm portions 120 and 121 is formed in a substantially H shape as illustrated is formed.

  According to such a method, the quartz crystal Z plate substrate 101 is put into the spraying atmosphere of the cleaning liquid after the outer shape etching process, in other words, before the groove etching process. Since the cleaning liquid in the spray atmosphere has a small mist diameter, it has a property that it is difficult to evaporate even if it adheres to the crystal Z plate substrate 101. Before the cleaning liquid is easily vaporized, the crystal Z plate substrate 101 is used as a groove etching solution. It becomes possible to immerse. As a result, the etching solution can easily touch the side surfaces of the arm portions 120 and 121, the etching state of the side surfaces of the arm portions 120 and 121 is stabilized, the arm width of the arm portions 120 and 121 after the groove etching is stabilized, and the tuning fork type It becomes possible to stabilize the characteristics of the crystal vibrating piece 100.

  In the present embodiment, a tuning fork type crystal resonator having a resonance frequency of 32.768 kHz has been described as an example. However, it is apparent that the present invention can be applied to a tuning fork type crystal resonator of 15 kHz to 155 kHz, or another resonator such as a gyro element. is there.

  The manufacturing methods described in the first to third embodiments may be used in combination. For example, after the IPA immersion process used in the first embodiment, the groove etching process for applying the ultrasonic wave used in the second embodiment can be combined.

[Electronic device]
The tuning fork type crystal vibrating piece 100 as described above can be used for an electronic device such as a vibrator or an oscillator. With reference to FIG. 9, a ceramic package type crystal oscillator as an example of an oscillator and a ceramic package type crystal oscillator as an example of an oscillator will be described. FIG. 9A is a schematic cross-sectional view showing a configuration of a ceramic package type crystal resonator as an example of a resonator, and FIG. 9B is a schematic view showing a configuration of a ceramic package type crystal oscillator as an example of an oscillator. It is sectional drawing.

(Ceramic package type crystal unit)
First, a schematic configuration of the ceramic package type crystal resonator will be described with reference to FIG. As shown in FIG. 9A, the ceramic package type crystal resonator 200 has a box-shaped package 210 having a space inside thereof. The package 210 has a base portion 211 at the bottom thereof. The base portion 211 is formed of ceramics such as alumina, for example.

  A sealing portion 212 is provided on the base portion 211, and the sealing portion 212 is formed from the same material as the base portion 211. A lid 213 is placed on the sealing portion 212, and the base portion 211, the sealing portion 212, and the lid 213 form a hollow box.

  A package-side electrode 214 is provided on the base portion 211 of the package 210 thus formed. On the package-side electrode 214, the end of the tuning-fork type crystal vibrating piece 100 on which the electrode 140 (see FIG. 2) is formed is fixed via a conductive adhesive or the like. The tuning fork type crystal vibrating piece 100 is configured to vibrate when a constant driving voltage is applied from the package side electrode 214.

(Ceramic package crystal oscillator)
Next, a schematic configuration of the ceramic package type crystal oscillator will be described with reference to FIG. FIG. 9B shows a ceramic package type crystal oscillator 400 using the tuning fork type crystal vibrating piece 100 described above as an example of the crystal oscillator. The ceramic package type crystal oscillator 400 includes an integrated circuit as shown in FIG. 9B on the base portion 211 below the tuning fork type crystal resonator element 100 of the ceramic package type crystal resonator 200 shown in FIG. 410 is arranged.

  That is, in the ceramic package type crystal oscillator 400, when the tuning fork type crystal vibrating piece 100 disposed inside vibrates, the vibration is input to the integrated circuit 410, and then a predetermined frequency signal is taken out, Will function as.

  According to the ceramic package type crystal resonator 200 and the ceramic package type crystal oscillator 400 as such an electronic device, since the tuning fork type crystal resonator element 100 having stable characteristics is used, the ceramic package type crystal vibration having stable characteristics is used. The child 200 and the ceramic package type crystal oscillator 400 can be obtained.

[Electronics]
Next, an electronic apparatus to which the tuning fork type crystal vibrating piece 100 is applied as an electronic device according to an embodiment of the present invention will be described in detail with reference to FIGS. In the description, an example in which a ceramic package tuning fork resonator 200 including the tuning fork crystal resonator element 100 is applied is shown.

  FIG. 10 is a perspective view schematically illustrating the configuration of a mobile (or notebook) personal computer as an electronic apparatus including the ceramic package tuning fork type resonator 200 as an electronic device according to an embodiment of the present invention. In this figure, a personal computer 1100 includes a main body portion 1104 provided with a keyboard 1102 and a display unit 1106 provided with a display portion 1101. The display unit 1106 is rotated with respect to the main body portion 1104 via a hinge structure portion. It is supported movably. Such a personal computer 1100 incorporates a ceramic package tuning fork vibrator 200.

  FIG. 11 is a perspective view showing an outline of the configuration of a mobile phone (including PHS) as an electronic apparatus including the ceramic package tuning fork vibrator 200 as an electronic device according to an embodiment of the present invention. In this figure, a cellular phone 1200 includes a plurality of operation buttons 1202, an earpiece 1204, and a mouthpiece 1206, and a display unit 1201 is disposed between the operation buttons 1202 and the earpiece 1204. Such a cellular phone 1200 incorporates a ceramic package tuning fork vibrator 200.

  FIG. 12 is a perspective view schematically showing a configuration of a digital still camera as an electronic apparatus including the ceramic package tuning fork type vibrator 200 as an electronic device according to an embodiment of the present invention. In this figure, connection with an external device is also simply shown. Here, an ordinary camera sensitizes a silver halide photographic film with a light image of a subject, whereas a digital still camera 1300 photoelectrically converts a light image of a subject with an image sensor such as a CCD (Charge Coupled Device). An imaging signal (image signal) is generated.

  A display unit 1301 is provided on the back of a case (body) 1302 in the digital still camera 1300, and is configured to perform display based on an imaging signal from the CCD. The display unit 1301 displays an object as an electronic image. Functions as a viewfinder. A light receiving unit 1304 including an optical lens (imaging optical system), a CCD, and the like is provided on the front side (the back side in the drawing) of the case 1302.

  When the photographer confirms the subject image displayed on the display unit 1301 and presses the shutter button 1306, the CCD image pickup signal at that time is transferred and stored in the memory 1308. In the digital still camera 1300, a video signal output terminal 1312 and an input / output terminal 1314 for data communication are provided on the side surface of the case 1302. As shown in the figure, a television monitor 1430 is connected to the video signal output terminal 1312 and a personal computer 1440 is connected to the input / output terminal 1314 for data communication as necessary. Further, the imaging signal stored in the memory 1308 is output to the television monitor 1430 or the personal computer 1440 by a predetermined operation. Such a digital still camera 1300 incorporates a ceramic package tuning fork vibrator 200.

  In addition to the personal computer (mobile personal computer) in FIG. 10, the mobile phone in FIG. 11, and the digital still camera in FIG. Inkjet ejection device (for example, inkjet printer), laptop personal computer, TV, video camera, video tape recorder, car navigation device, pager, electronic notebook (including communication function), electronic dictionary, calculator, electronic game device, Word processor, workstation, videophone, security TV monitor, electronic binoculars, POS terminal, medical equipment (eg electronic thermometer, blood pressure monitor, blood glucose meter, electrocardiogram measuring device, ultrasonic diagnostic device, electronic endoscope), fish finder Various measuring machines , Instruments (e.g., gages for vehicles, aircraft, and ships), can be applied to electronic devices such as flight simulators.

[Moving object]
FIG. 13 is a perspective view schematically showing an automobile as an example of a moving body. The automobile 506 is equipped with a ceramic package tuning fork vibrator 200 as an electronic device according to the present invention. For example, as shown in the figure, an automobile 506 as a moving body is equipped with a vehicle body 507 with an electronic control unit 508 that incorporates a ceramic package tuning fork vibrator 200 and controls a tire 509 and the like. In addition, ceramic package tuning fork type vibrator 200 includes keyless entry, immobilizer, car navigation system, car air conditioner, antilock brake system (ABS), airbag, tire pressure monitoring system (TPMS: Tire Pressure Monitoring). System), engine control, battery monitors of hybrid vehicles and electric vehicles, vehicle body attitude control systems, and other electronic control units (ECUs) can be widely applied.

  DESCRIPTION OF SYMBOLS 100 ... Tuning fork type crystal vibrating piece, 101 ... Quartz Z board substrate, 102 ... Metal film, 103 ... Photoresist layer, 104 ... Inside the outer shape of vibrating piece, 105 ... Frame part, 120, 121 ... Arm part as a vibrating arm , 120a, 121a ... groove, 130 ... base, 140, 141 ... electrode, 150 ... isopropyl alcohol (IPA), 160 ... ultrasonic generator, 161 ... groove etching solution (crystal etching solution), 162 ... ultrasonic, 164 ... Cleaning liquid (rinsing liquid), 200... Ceramic package type crystal resonator, 210... Package, 211... Base part, 212... Sealing part, 213. ... cars as mobiles, 1100 ... mobile personal computers as electronic devices, 1200 ... electric Mobile phone as the device, 1300 ... digital still camera as an electronic device.

Claims (8)

A method of manufacturing a resonator element including a vibrating arm provided with a groove,
An outer shape etching step for forming an outer shape of the vibrating arm;
After the outer shape etching step, at least an IPA immersion step of immersing at least a side surface of the vibrating arm in isopropyl alcohol;
And a groove etching step for forming the groove after the IPA dipping step. A method of manufacturing a resonator element including a vibrating arm provided with a groove,
An outer shape etching step for forming an outer shape of the vibrating arm;
After the etching step, a cleaning solution immersion step of immersing at least the side surface of the vibrating arm in the cleaning solution;
A groove etching step for forming the groove after the cleaning liquid immersion step and before the cleaning liquid is dried. In the manufacturing method of the resonator element according to claim 2,
The method of manufacturing a vibrating piece, wherein the vibrating arm is put into an atmosphere of spraying the cleaning liquid. In the method of manufacturing a resonator element according to any one of claims 1 to 3,
In the groove etching step, a defoaming process of the vibrating arm immersed in an etching solution is performed. In the method of manufacturing a resonator element according to any one of claims 1 to 3,
In the groove etching step, a vibration is applied to the vibrating arm immersed in an etching solution. A vibrating piece formed by the vibrating piece manufacturing method according to any one of claims 1 to 5,
And a package for housing the resonator element.   An electronic device comprising the resonator element formed by the method for manufacturing a resonator element according to claim 1.   A moving body comprising the resonator element formed by the method for manufacturing a resonator element according to claim 1.

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