JP2015054314A - Cleaning device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a cleaning device capable of cleaning with high efficiency.SOLUTION: A cleaning device 30 removes foreign objects adhering to a passage of a passage formation component 41 of an ink discharge head with a cleaning fluid. The cleaning device 30 includes: a recovery passage which recovers the cleaning fluid used for cleaning a cleaned surface; a foreign object sensor 72 which is disposed in a measurement passage of the recovery passage and detects the size and the number of foreign objects contained in the cleaning fluid flowing through a duct; and a sequencer 74 which determines whether to continue cleaning of a cleaned object or end the cleaning on the basis of the size and the number of the foreign objects that are detected by the foreign object sensor 72.

Description

  The present invention relates to a cleaning apparatus that removes foreign matter adhering to a surface to be cleaned of a target object with a cleaning liquid.

  In the semiconductor industry and precision equipment industry, cleanliness management on the micron order and submicron order is required. Here, as the size of the foreign matter to be cleaned becomes smaller, the adhesion to the object to be cleaned increases. For this reason, it is difficult to clean minute foreign matters on the micron order and submicron order, and a long time is required until the foreign matters are sufficiently removed to an acceptable level.

  In addition, if a sufficient cleaning time is set in anticipation of variations in the amount of foreign matter adhered to the object to be cleaned, the foreign object has already been removed to an acceptable level for the object to be cleaned with a small amount of foreign matter attached. Cleaning may be continued until a predetermined time elapses, resulting in waste. Furthermore, when the adhesion amount of the foreign object to be cleaned is larger than the assumed adhesion amount, the foreign object cannot be completely cleaned even if the cleaning is continued until a predetermined time elapses.

  In order to deal with this, Patent Document 1 calculates the total amount of foreign matter in the cleaning liquid that has passed through the object to be cleaned and mixed with foreign matter, and detects that the total amount of foreign matter has reached a preset threshold. In addition, it is described that the cleaning in the cleaning time is made efficient by terminating the cleaning.

  Similarly, Patent Document 2 measures the number of foreign matters by sampling the cleaning liquid in the tank, and ends the cleaning when the number of foreign matters is reduced to an allowable level, thereby allowing the amount of foreign matters to be cleaned to adhere. It is described that cleaning is performed in accordance with the variation in order to improve cleaning efficiency.

  Further, in Patent Documents 3, 4, and 5, the object to be cleaned is immersed in a cleaning tank containing a cleaning liquid, the number of foreign substances in the cleaning liquid is measured by a foreign substance sensor, and the cleaning is finished when the number of foreign substances falls below a predetermined number. An apparatus is described.

  In general, the size and number of foreign substances adhering to the object to be cleaned tend to be distributed. FIG. 12 is a graph showing the relationship between the size and the number of foreign matters in the cleaning waste liquid for inkjet parts. It can be seen that the larger the foreign object, the larger the number, and the smaller the foreign object, the smaller the number. Since the size and number of foreign substances allowed in each industrial field are different, if cleaning is performed using only the number of foreign substances as a criterion as in the past, cleaning is difficult even though large foreign objects are being cleaned. Since small foreign matter is detected, the cleaning time becomes excessive.

  In a conventional cleaning apparatus, cleaning control is performed using a foreign matter sensor. However, those described in Patent Documents 3, 4, and 5 perform cleaning control by detecting foreign matter in the cleaning liquid in which the entire object to be cleaned is immersed. For this reason, even foreign substances adhering to locations other than the surface to be cleaned are detected, and cleaning may be performed excessively.

  The present invention has been made in view of the above points, and an object thereof is to provide a cleaning apparatus capable of performing cleaning with high efficiency.

  The cleaning apparatus according to the present invention is a cleaning apparatus that removes foreign matter adhering to a surface to be cleaned with a cleaning liquid, a recovery path for recovering the cleaning liquid used for cleaning the surface to be cleaned, and a recovery path. The foreign object sensor that detects the size and number of foreign substances contained in the cleaning liquid that is disposed and flows in the pipe line, and the cleaning of the object to be cleaned is continued based on the size and number of foreign substances detected by the foreign substance sensor. Determining means for determining whether or not to end the cleaning.

  According to the present invention, since the size and number of foreign matters contained in the cleaning liquid used for cleaning the surface to be cleaned of the object to be cleaned are detected to determine whether or not the cleaning is continued, it is high without performing unnecessary cleaning. Washing can be performed efficiently.

It is a perspective view of the ink discharge head which is the cleaning object of the cleaning device according to the present invention. It is sectional drawing of the liquid chamber longitudinal direction of the ink discharge head. FIG. 3 is a cross-sectional view of the ink discharge head in the lateral direction of the liquid chamber. It is the schematic which shows the movement process procedure of the flow-path formation component in the cleaning apparatus which concerns on Embodiment 1 of the cleaning apparatus which concerns on this invention. It is a schematic diagram which shows the piping state of the washing | cleaning apparatus. FIG. 2 shows a cleaning stage of the cleaning apparatus, wherein (a) is a perspective view of the cleaning stage, (b) is a cross-sectional view corresponding to the AA line in (a), and (c) is in (a). It is sectional drawing equivalent to a BB line. It is a flowchart which shows the process process of the washing | cleaning apparatus. FIG. 2 shows a schematic configuration of the stage under cleaning and peripheral piping, (a) is a side view, (b) is a front view, (c) is a cross-sectional view corresponding to line CC in (b), d) is a sectional view corresponding to line DD in (a). FIG. 2 shows a schematic configuration of the cleaning upper stage and peripheral piping, (a) is a side view, (b) is a front view, (c) is a cross-sectional view corresponding to line CC in (b), ( d) is a sectional view corresponding to line DD in (a). FIG. 7 shows a cleaning upper stage according to Embodiment 2 of the cleaning apparatus according to the present invention, wherein (a) is a side view, (b) is a front view, and (c) is equivalent to a CC line in (b). (D) is sectional drawing equivalent to the DD line in (a). It is a perspective view which shows the external appearance structure of the washing | cleaning apparatus. It is the figure which showed an example of the distribution tendency of the magnitude | size and number of the foreign material in the washing | cleaning drainage of an inkjet head component.

  Hereinafter, a cleaning apparatus according to an embodiment for carrying out the present invention will be described. The cleaning device according to the embodiment cleans the flow path forming component of the ink discharge head as an object to be cleaned. First, an ink discharge head including a flow path forming component that is an object to be cleaned of a cleaning device will be described. 1 is an external perspective view of the ink discharge head, FIG. 2 is a cross-sectional explanatory view of the same ink discharge head in the longitudinal direction of the liquid chamber (direction perpendicular to the nozzle arrangement direction), and FIG. It is sectional explanatory drawing of a chamber short direction (nozzle arrangement direction).

  The ink discharge head is used in an ink jet printer. The ink discharge head includes a flow path plate 1, a vibration plate member 2 bonded to one surface of the flow path plate 1, and a nozzle plate 3 bonded to a surface of the flow path plate 1 opposite to the bonding surface of the vibration plate member 2. And comprising. The flow path plate 1 and the diaphragm member 2 form a flow path component in the assembled state, and the flow path component becomes an object to be cleaned that is cleaned by the cleaning device. In the ink ejection head, a plurality of pressure chambers 6 are formed in which a plurality of nozzles 4 that eject droplets communicate with each other via a nozzle communication path (hereinafter referred to as “communication pipe”) 5.

  A fluid resistance portion 7 and a liquid introduction portion 8 are respectively formed on the upstream side of the pressure chamber 6 in the ink flow direction. Ink is introduced into the liquid introduction part 8 from the common liquid chamber 10 formed in the frame member 17 described later through the filter part 21 formed in the diaphragm member 2. Ink is supplied from the liquid introduction unit 8 to the pressure chamber 6 through the fluid resistance unit 7.

  The flow path plate 1 anisotropically etches the silicon substrate to form openings and grooves such as the communication tube 5, the pressure chamber 6, and the fluid resistance portion 7. The portions left by etching that form the communication pipe 5 and the pressure chamber 6 form a flow path interval wall.

  The diaphragm member 2 is a wall surface member that forms wall surfaces such as the pressure chambers 6 and the fluid resistance portion 7, and the first layer 2A that is deformable and the first layer 2A that is thicker than the first layer 2A laminated on the first layer 2A. It consists of two layers 2B. Moreover, the diaphragm member 2 has a vibration region 2 a formed by a deformable first layer 2 </ b> A that forms the wall surface of each pressure chamber 6.

  In the diaphragm member 2, a driving element that generates energy for deforming the vibration region 2 a and ejecting droplets is joined to the island-shaped convex portion 2 b formed of the second layer 2 </ b> B in the vibration region 2 a. As this drive element, the piezoelectric element column 12A of the piezoelectric member 12 which is a laminated piezoelectric member is used.

  The piezoelectric member 12 is formed by forming piezoelectric element columns 12A and 12B in a comb-tooth shape by half-cut dicing. The piezoelectric element column 12A is applied with a driving waveform to become a driving piezoelectric column. The piezoelectric element column 12B is a non-driving piezoelectric column as a column that supports the flow path interval wall 6a without applying a driving waveform. That is, the piezoelectric element columns 12 </ b> A and 12 </ b> B of the piezoelectric member 12 have a so-called bi-pitch structure arranged at a density twice the arrangement density of the pressure chambers 6. The lower end surface of the piezoelectric member 12 is joined to the base member 13.

  The piezoelectric member 12 is formed by alternately stacking piezoelectric layers and internal electrode layers, and electrically connecting the internal electrodes to the individual electrodes and the common electrode, which are the end electrodes (external electrodes) on the end surfaces. The piezoelectric layer is made of, for example, lead zirconate titanate (PZT) having a thickness of 10 to 50 μm / layer. The common electrode is made of, for example, silver / palladium (AgPd) having a thickness of several μm / layer. An individual electrode line of an FPC (flexible printed circuit board) 15 is soldered to the individual electrode, and the common electrode is provided with an electrode layer at the end of the piezoelectric member 12 and is turned to the end surface on the individual electrode side. The electrode is connected. A driver IC (Integrated Circuit) (not shown) is mounted on the FPC 15 to control application of a driving voltage to the piezoelectric element column 12A.

  The nozzle plate 3 is formed from a nickel (Ni) metal plate, and is manufactured by an electroforming method (electroforming). A nozzle 4 having a diameter of 10 to 35 μm is formed on the nozzle plate 3 corresponding to each pressure chamber 6, and is bonded to the flow path plate 1 with an adhesive. A water repellent layer is provided on the droplet discharge side surface (surface in the discharge direction: discharge surface or the surface opposite to the pressure chamber 6 side) of the nozzle plate 3.

  Further, a frame member 17 formed by injection molding with an epoxy resin or polyphenylene sulfite is joined to the outer peripheral side of the piezoelectric actuator composed of the piezoelectric member 12 mounted with the FPC 15 and the base member 13. A common liquid chamber 10 is formed in the frame member 17, and a supply port 20 through which ink is supplied to the common liquid chamber 10 through the connecting pipe 19 is formed to supply ink to the common liquid chamber 10 from the outside. The connecting pipe 19 is further connected to an ink supply source such as a sub tank or an ink cartridge (not shown).

  In this ink discharge head, the piezoelectric members 12 are diced at an interval of 600 dpi, and are arranged in two rows facing each other, and the pressure chambers 6 and the nozzles 4 are arranged in a staggered manner at two intervals at an interval of 300 dpi. Aligned. With such a structure, this ink ejection head can obtain a resolution of 600 dpi in one scan.

  In this ink discharge head, ink is discharged from the nozzle 4 as follows. That is, for example, the piezoelectric element column 12A is contracted by lowering the voltage applied to the piezoelectric element column 12A from the reference potential. As a result, the vibration region 2 a forming the wall surface of the pressure chamber 6 of the vibration plate member 2 is lowered, the volume of the pressure chamber 6 is expanded, and ink flows into the pressure chamber 6. Thereafter, the voltage applied to the piezoelectric element column 12A is increased to extend the rear piezoelectric element column 12A in the stacking direction, and the diaphragm member 2 is deformed in the nozzle 4 direction to contract the volume of the pressure chamber 6. Thereby, the ink in the pressure chamber 6 is pressurized and ink droplets are ejected from the nozzle 4.

  When the voltage applied to the rear piezoelectric element column 12A is returned to the reference potential, the diaphragm member 2 is restored to the initial position, and the pressure chamber 6 expands to generate a negative pressure. At this time, ink is filled from the common liquid chamber 10 into the pressure chamber 6. Therefore, after the vibration of the meniscus surface of the nozzle 4 is attenuated and stabilized, the operation proceeds to the next droplet discharge.

  The driving method of the head is not limited to the above-described example (drawing-pushing), and it is also possible to perform striking, pushing, etc. depending on the direction of the drive waveform.

<Embodiment 1>
Next, the cleaning apparatus according to Embodiment 1 of the cleaning apparatus according to the present invention will be described in detail. The cleaning device 30 according to the first embodiment is configured to remove foreign matters that are formed in the flow path forming component 41 of the ink discharge head that is the cleaning target and mixed in the flow path that is a hole that penetrates the flow path forming component 41. Wash with cleaning solution. That is, the cleaning liquid is cleaned as a surface to be cleaned including the inner surface of the flow path. The flow path forming component 41 includes the flow path plate 1 and the diaphragm member 2. Examples of the foreign material include protein, cellulose, and silicon pieces attached at the time of manufacture.

  First, the movement process of the flow path forming component 41 in the cleaning device 30 will be described. FIG. 4 is a schematic view showing a flow processing procedure of the flow path forming component in the cleaning apparatus according to Embodiment 1 of the cleaning apparatus according to the present invention. For example, 15 flow path forming components 41 are disposed on the input tray 42 and are disposed on the tray input port 44.

  During the cleaning process, the arranged flow path forming components 41 are vacuum-sucked one by one by the tray loading hand 45 and conveyed to the alignment stage 46. In the alignment stage 46, pushers 46a in the X and Y directions are abutted and positioned. Next, the positioned flow path forming component 41 is vacuum-sucked by the cleaning stage loading hand 47 and conveyed to the cleaning stage 48. In the cleaning stage 48, the flow path forming component 41 is cleaned.

  The flow path forming component 41 cleaned by the cleaning stage 48 is vacuum-sucked by the cleaning stage discharge hand 49 and aligned on the discharge tray 50. Thereafter, the flow path forming components 41 arranged in an aligned manner are taken out from the tray discharge port 51. The movement state of the flow path forming component 41 and the movement of each hand are constantly monitored by sensors, and are driven in conjunction so that the time during which the flow path forming component 41 is not mounted on each stage is minimized.

  Next, processing at the cleaning stage 48 of the cleaning device 30 will be described. FIG. 5 is a schematic view showing a piping state of the cleaning device. The cleaning apparatus 30 includes a lower cleaning stage 52 on which the flow path forming component 41 is disposed, and an upper cleaning stage 53 that covers the lower cleaning stage 52 from above. The flow path forming component 41 is disposed between the lower cleaning stage 52 and the upper cleaning stage 53 and cleaned.

  On the downstream side of the lower cleaning stage 52, a tank 63 for storing the cleaning liquid and a diaphragm pump 65 for sending the cleaning liquid while holding the cleaning liquid at a positive pressure in the flow path in the cleaning device 30 are provided. Downstream of the diaphragm pump 65, a regulator 68 that adjusts the pressure of the cleaning liquid, a flow rate sensor 69 that measures the flow rate of the cleaning liquid, that is, a flow rate, a filter 70 that removes foreign substances from the cleaning liquid, and a cleaning valve 57 are connected. Yes. The tank 63 is provided with a cooler 64 for cooling the cleaning liquid and a pressure release valve 91 for bringing the tank to atmospheric pressure. A path for returning the cleaning liquid from the diaphragm pump 65 to the tank 63 is disposed, and a relief valve 66 and a filter 67 are disposed in this path.

  In addition, a pressurized air source 59, an air pressure adjusting regulator 61, a relief valve 66, and an air blow valve 58 are connected to the lower cleaning stage 52 in order to blow air after completion of cleaning.

  The cleaning liquid from the cleaning upper stage 53 is recovered in the tank 63 via the recovery path. The recovery path is branched into a measurement path where the foreign matter sensor 72 is arranged and a bypass path for returning the cleaning liquid to the tank 63. The cleaning liquid exceeding the measurement capacity of the foreign matter sensor 72 is returned to the tank 63 from the detour path. In the bypass path, a discharge path valve 56 and an electromagnetic flow rate adjustment valve 71 that is a flow rate adjustment mechanism are arranged. In the measurement path, a measurement path valve 54 and a foreign matter sensor 72 are arranged, and the flow rate of the cleaning liquid from the foreign matter sensor 72 is measured by the flow rate sensor 73 and returns to the tank 63. In addition, an air release path valve 55 and a pressure sensor 60 are arranged in the measurement path. The flow rate adjusting mechanism can be provided in at least one of the measurement path and the detour path.

Further, the cleaning apparatus 30 includes a sequencer 74 that is a determination unit. The sequencer 74 includes a CPU (Central Processing Unit), a RAM (Random Access).
Memory), ROM (Read Only Memory), and the like can be used. The determination is executed by executing the management software on the CPU. The measurement value signal 75 from the foreign matter sensor 72 and the abnormal signal 76 from the flow rate sensor 73 are input to the sequencer 74, and the sequencer 74 generates a flow rate increase / decrease signal 77 and an end signal 78 described later.

  In the cleaning apparatus 30 having such a configuration, the flow path forming component 41 transported to the cleaning stage 48 by the cleaning stage loading hand 47 is first arranged on the lower cleaning stage 52. Thereafter, as shown in FIGS. 6A and 6B, the upper cleaning stage 53 is lowered, the flow path forming component 41 is sandwiched between the lower cleaning stage 52, and the periphery of the opening of the flow path forming component 41 is sealed. To do. As a result, the cleaning liquid flows into and out of the flow path of the flow path forming component 41. For this reason, the flow path forming component 41 and the contact member of the lower cleaning stage 52 and the upper cleaning stage 53 are arranged. The contact member is preferably an elastic body that does not easily damage the flow path forming component 41.

  6A and 6B show a cleaning stage of the cleaning apparatus, wherein FIG. 6A is a perspective view of the cleaning stage, FIG. 6B is a cross-sectional view corresponding to the line AA in FIG. It is sectional drawing equivalent to the BB line in the inside. In this example, the lower cleaning stage sheet 79 and the upper cleaning stage sheet 81 are disposed as contact members. The under-washing stage sheet 79 and the over-washing stage sheet 81 are formed of silicon rubber, preventing damage to the flow path forming component 41 and ensuring good sealing performance. 6 (a) and 6 (b), a gap is drawn between the cleaning stage sheet 79 and the diaphragm member 2, and the cleaning stage sheet 81 and the flow path plate 1. Between these, it shall be in a close contact state.

  In such a state, the inner surface of the flow path of the flow path forming component 41 is set as a surface to be cleaned. A part of the lower side surface of the diaphragm member 2 disposed inside the stage sheet 79 under cleaning and a part of the upper side surface 1 disposed inside the stage sheet 81 above the cleaning also touch the cleaning liquid. The purpose is not to clean the part. If necessary, the shape of the stage sheet 79 under cleaning and the stage sheet 81 above cleaning can be changed to reduce the portion that comes into contact with the cleaning liquid.

  Thereafter, in order to confirm the sealing state, the air blow valve 58 is opened with the measurement path valve 54, the air release path valve 55, the discharge path valve 56, and the cleaning valve 57 closed, and air is supplied from the pressurized air source 59. Let it flow. Then, after confirming that the air has reached the set pressure, the air blow valve 58 is closed. During the set time, the pressure sensor 60 monitors the transition of the pressure value, and when the pressure decrease amount is equal to or less than the threshold value, it is determined that the sealing has been performed, and the process proceeds to the next step. Air from the pressurized air source 59 is pressure-controlled by the regulator 61, and foreign matter in the air from the pressurized air source 59 is captured by the filter 62.

  In the cleaning apparatus 30, a fluorinated organic solvent that has a short drying time and can be dried at room temperature is used as the cleaning liquid. The cleaning liquid is stored in the tank 63 and is always cooled by a cooler 64 installed in the tank 63 in order to reduce the transpiration amount. Further, in a state where the cleaning liquid is not passed through the flow path forming component 41, the cleaning liquid sent by the diaphragm pump 65 that is always operating reaches the filter 67 that captures foreign matter via the relief valve 66. The cleaning liquid can always be filtered by constantly circulating so as to return to the tank 63, and a clean state can be maintained.

  Subsequently, the foreign matter is removed by passing the cleaning liquid through the flow path of the flow path forming component 41 (arrows in FIGS. 6A and 6B). The discharge path valve 56 and the cleaning valve 57 are opened with the measurement path valve 54, the air release path valve 55, and the air blow valve 58 closed, and the cleaning liquid in the tank 63 is sent by the diaphragm pump 65. The regulator 68 adjusts the pressure, and the flow rate sensor 69 monitors that there is no abnormality in the cleaning state. After the foreign substance is captured by the filter 70, the cleaning liquid flows into the cleaning stage 48 through the cleaning valve 57, passes through the cleaning valve 57 and the electromagnetic flow rate adjustment valve 71, and is discharged to the tank 63. The electromagnetic flow rate adjusting valve 71 changes the cross-sectional area in the path stepwise.

  Here, air is mixed in the piping when the cleaning device 30 starts to flow. For this reason, after passing the air set in advance by the experiment until the air is discharged, the measurement path valve 54 is opened to pass the flow path forming component 41 to the foreign matter sensor 72 and the cleaning solution containing foreign matter. Measure the size and number of foreign matter contained therein. The cleaning liquid that has passed through the foreign matter sensor 72 passes through the flow rate sensor 73 for measuring the flow rate flowing through the foreign matter sensor 72 and returns to the tank 63. The foreign matter sensor 72 measures the size and number of foreign matters by irradiating the cleaning liquid passing therethrough with laser light and observing this state with a light receiving element. A measurement value signal 75 is transmitted from the foreign matter sensor 72, and the sequencer 74 that has received the measurement value signal 75 determines whether to continue the cleaning or to end the cleaning. When the sequencer 74 determines that the cleaning is finished, it sends an end signal 78 to each valve, and the open / close state of each valve shifts to the next step.

  The ratio of the flow rate A flowing into the foreign matter sensor 72 and the flow rate B flowing into the discharge path valve 56 can be adjusted by the electromagnetic flow rate adjustment valve 71. In the cleaning apparatus 30 according to the first embodiment, the flow rate sensor 73 measures the flow rate A, and the flow rate sensor 73 transmits an abnormal signal 76 to the sequencer 74 when the flow rate A deviates from the measurement specification of the foreign matter sensor 72. The sequencer 74 transmits a flow rate increase / decrease signal 77 to the electromagnetic flow rate adjustment valve 71 so that it falls within the measurement specification range of the foreign matter sensor 72, and the electromagnetic flow rate adjustment valve 71 that receives it automatically changes the flow rate according to the flow rate increase / decrease signal 77. A feedback mechanism for adjustment is provided. Therefore, the flow rate A can be suppressed within the measurement specification range of the foreign matter sensor 72, the flow rate B can be increased, and the foreign matter removal capability can be improved.

  When an end signal 78 instructing the end of cleaning is output from the sequencer 74, the measurement path valve 54 and the cleaning valve 57 that were opened during the cleaning are closed, and the air blow valve 58 is discharged to discharge the cleaning liquid in the pipe. Opened. At this time, the pressure release valve 91 connected to the tank 63 and communicated with the atmosphere is opened to prevent the pressure in the tank 63 from being increased by the air from the pressurized air source 59. Air discharge is performed for a preset time, and the discharge path valve 56, the air blow valve 58, and the pressure release valve 91 are closed in a state where the cleaning liquid in the pipe has been removed, and the atmosphere release path valve 55 is returned to return the inside of the pipe to atmospheric pressure. Is released. The operation procedure of these valves can be changed as necessary.

  The flow path forming component 41 is cleaned with the above-described series of flows. After the cleaning, the flow path forming component 41 is transported to the discharge tray 50 by the cleaning stage discharge hand 49, and the flow path forming component 41 to be subsequently cleaned is transported to the cleaning stage 48 by the cleaning stage loading hand 47.

  Next, the flow of foreign matter measurement during cleaning will be described. FIG. 7 is a flowchart showing the processing steps of the cleaning apparatus. The foreign matter in the cleaning liquid mixed with foreign matter that has passed through the flow path forming component 41 is measured by the foreign matter sensor 72 attached to the cleaning upper stage 53. First, “n” as the number of measurements is set to “0” (step S1). Then, the size of the foreign matter that has passed through the foreign matter sensor 72 within the set measurement time is detected (step S2), and whether or not the number of detected foreign matters is equal to or less than the number set within the predetermined time. Determine (step S3). Then, “1” is added to the number of times “n” (step S4), and when the number of times that the number of allowable foreign substances is less than or equal to the allowable number continues for the set number of times (N) (YES in step S5). The sequencer 74 transmits a cleaning end signal 78. In the first embodiment, a cleaning end signal is generated when the number of foreign matters of 10 μm or more reaches the number “0” twice. The size, number, and number of foreign matters can be changed as necessary.

  Here, the foreign matter sensor 72 cannot determine whether the measured foreign matter is a foreign matter or other bubbles, for example. For this reason, mixing of bubbles directly leads to measurement errors. Therefore, in order to obtain a correct measurement result, a piping configuration that suppresses the generation of bubbles is important. Hereinafter, the structure which can suppress a bubble is demonstrated.

  First, the configuration of the lower cleaning stage 52 will be described. FIG. 8 shows a schematic configuration of the stage under cleaning and peripheral piping, (a) is a side view, (b) is a front view, and (c) is a cross-section corresponding to line CC in (b). FIG. 4D is a cross-sectional view corresponding to the line DD in FIG. The lower cleaning stage 52 is made of stainless steel that is chemically stable and hardly corroded by the cleaning liquid. In the lower cleaning stage 52, a lower cleaning stage sheet 79 having a discharge port formed in accordance with the opening of the flow path forming component 41 is formed by a lining process in order to ensure sealing performance with the flow path forming component 41. Yes.

  When the cleaning valve 57 is opened, the cleaning liquid is passed from the lower side of the T-shaped joint 80. An air blow valve 58 for supplying air from the pressurized air source 59 is provided laterally with respect to the T-shaped joint 80 when the sealing state is confirmed before the cleaning liquid is passed and when the cleaning liquid is discharged from the pipe after the liquid is passed. It is connected. When the cleaning valve 57 is installed in the lateral direction, the accumulated cleaning liquid is gradually pushed out by air blow. On the other hand, if it is arranged in the downward direction, the accumulated cleaning liquid is difficult to be pushed out by air blow.

  For this reason, if the discharge time of the cleaning liquid is not sufficiently long, the flow path forming component may get wet with the cleaning liquid when the flow path forming component 41 is released from the cleaning stage 48 after completion of the cleaning. Accordingly, the positional relationship between the cleaning valve 57 and the air blow valve 58 is preferably downward. In addition, in order to reduce the amount of bubbles that become measurement noise, the shorter the piping length between the lower cleaning stage 52, the cleaning valve 57, and the air blow valve 58, the better.

  Next, the configuration of the cleaning upper stage 53 will be described. FIG. 9 shows a schematic configuration of the cleaning upper stage and peripheral piping, (a) is a side view, (b) is a front view, and (c) is a cross-section corresponding to the line CC in (b). FIG. 4D is a cross-sectional view corresponding to the line DD in FIG. The upper cleaning stage 53 is made of stainless steel like the lower cleaning stage 52. On the cleaning upper stage 53, a cleaning upper stage sheet 81 having a discharge port formed in accordance with the opening of the flow path forming component 41 is formed by lining processing.

  In the upper cleaning stage 53, the flow path is branched by a T-shaped joint 82, the measurement path valve 54 is installed on the upper side, and the foreign matter sensor 72 is installed on the downstream side. The measurement path valve 14 is closed at the start of liquid flow, the cleaning liquid passes through the branch path in the horizontal direction, and the foreign substance sensor 72 is opened by opening the measurement path valve 54 when bubbles that become measurement noise are discharged from the pipe-type path. Can suppress the invasion of bubbles. However, when air bubbles that have accumulated in the concavo-convex portion of the piping path have entered the foreign matter sensor 72, the above-described configuration makes it easier for the air bubbles to be discharged because they receive upward force due to buoyancy.

<Embodiment 2>
Next, the cleaning apparatus 30 according to the second embodiment will be described. The cleaning apparatus 30 according to the embodiment has a different cleaning stage from that of the first embodiment. FIG. 10 shows a cleaning upper stage according to Embodiment 2 of the cleaning apparatus according to the present invention, where (a) is a side view, (b) is a front view, and (c) is CC in (b). Sectional drawing equivalent to a line, (d) is sectional drawing equivalent to the DD line in (a). The upper cleaning stage 53 is stainless steel. On the cleaning upper stage 53, a cleaning upper stage sheet 81 having a discharge port formed in accordance with the opening of the flow path forming component 41 is formed by lining processing. At the outlet of the upper cleaning stage 53, a branch is made by a T-shaped joint 82, a measurement path valve 54 is installed, and a foreign substance sensor 72 is installed further downstream. For this reason, the cleaning liquid flows from the upper side to the lower side of the foreign matter sensor 72. A measurement path valve 54 that is an open / close valve is disposed between the cleaning upper stage 53 and the foreign matter sensor 72. The measurement path valve 54 can be opened and closed at any timing during cleaning. In this example, the liquid is closed at the start of liquid passage, the cleaning liquid passes through the branch path in the horizontal direction, and the measurement path valve 54 is opened at the stage where bubbles that become measurement noise are discharged from the pipe-type path. As a result, the entry of bubbles into the foreign matter sensor 72 can be suppressed. In this example, since the bubbles receive upward force due to buoyancy, it is difficult to enter the measurement path.

  FIG. 11 is a perspective view showing an external configuration of the cleaning apparatus. The cleaning device 30 includes an input module 85, a cleaning module 86, a discharge module 87, a pneumatic circuit 88, a liquid circuit 89, and a switchboard 90, and is configured integrally. As a result, it is possible to provide a cleaning apparatus capable of performing cleaning that can achieve an acceptable level of cleanliness with a minimum required cleaning time.

  As described above, according to the cleaning device according to the embodiment, both the size and number of foreign matters in the cleaning liquid are measured at an arbitrary time or at an arbitrary measurement volume, and the allowable size and number of foreign matters are measured. A signal is output based on the threshold value. Therefore, it is possible to inform the operator of the cleaning process state of how much foreign matter of a desired size remains.

  In addition, when the permissible cleanliness can be achieved, the cleaning can be quickly completed, so that efficient cleaning without waste is possible.

  Also, since the cleaning liquid is injected into and discharged from the object to be cleaned to remove the dirt adhering to the surface to be cleaned, the cleaning liquid that has passed through only the surface to be cleaned when cleaning an object that requires cleanliness only on the surface to be cleaned Can be measured. For this reason, the cleaning can be completed based on the measurement result that is not affected by the foreign matter adhering to the surface other than the surface to be cleaned.

  Moreover, since the installation position of the foreign matter sensor is installed in the piping path for collecting all the cleaning liquid discharged from the subject to be cleaned, all foreign matters removed from the subject to be cleaned can be measured. Furthermore, when the required cleanliness is high and several foreign substances cannot be allowed, measurement can be performed with only a part of the cleaning liquid discharged from the object to be cleaned. This is effective in the case where several foreign matters exist in the remaining cleaning liquid that has not been measured at this time, and the case where no foreign substances exist in the sampled cleaning liquid occurs stochastically.

  In addition, when the flow rate specifications that can be measured differ depending on the foreign matter sensor, a flow rate adjustment mechanism is installed in the piping path, and the flow rate can be adjusted within the specification range of the foreign matter sensor, so that accurate measurement can be performed.

  In addition, when the cleaning liquid is allowed to flow through the foreign matter sensor at a flow rate that exceeds the specifications, the path for discharging the cleaning liquid after cleaning branches between the object to be cleaned and the foreign matter sensor, and is divided into a measurement route with the foreign matter sensor and a discharge route without the foreign matter sensor. Can be divided. Accordingly, by providing a flow rate adjusting mechanism in any of the paths, the specified flow rate is allowed to flow in the measurement path, and the remaining cleaning liquid is allowed to flow in the discharge path, thereby increasing the flow rate and cleaning without reducing the measurement accuracy.

  In addition, when measuring foreign matter, bubbles in the cleaning liquid that cause measurement noise can be suppressed by setting the inside of the pipe to a positive pressure, and a change in the state of the cleaning liquid to the gas due to the negative pressure of the cleaning liquid can be prevented. Thereby, the influence of the bubble in a foreign material sensor is excluded, and a foreign material can be measured reliably.

  Further, since the flow rate is adjusted by changing the pipe resistance according to the change in the cross-sectional area, the flow rate can be adjusted while preventing bubbles from being mixed into the pipe, and measurement noise is not generated. In addition, even if the specification of the foreign matter sensor is changed, it can be easily handled.

  Also, by setting the flow direction of the liquid to the foreign matter sensor from the lower side to the upper side of the foreign matter sensor, when bubbles that become measurement noise enter the measurement system, the bubbles can be easily discharged due to the influence of buoyancy. .

  Moreover, when the inflow of the liquid to the foreign matter sensor is changed from the upper side to the lower side of the foreign matter sensor, an opening / closing valve can be provided between the object to be cleaned and the foreign matter sensor. Thereby, it is possible to prevent bubbles from entering the measurement system by opening the valve in a state where the inside of the pipe is filled with the cleaning liquid.

  In addition, since the open / close valve can be opened and closed at any timing during cleaning, the cleaning liquid can be passed through the foreign matter sensor without bubbles that become measurement noise in the pipe, and measurement noise can be reduced.

  In each of the above-described embodiments, the flow path forming component of the ink discharge head is targeted as an object to be cleaned, and the flow path inner surface of the flow path forming component is cleaned as an example of the surface to be cleaned. The surface to be cleaned is not limited to this.

30: Cleaning device 41: Flow path forming component 42: Input tray 44: Tray input port 45: Tray input hand 46: Alignment stage 46a: Pusher 47: Cleaning stage input hand 48: Cleaning stage 49: Cleaning stage discharge hand 50: Discharge Tray 51: Tray discharge port 52: Lower cleaning stage 53: Upper cleaning stage 54: Measurement path valve (open / close valve)
55: Air release path valve 56: Discharge path valve 57: Cleaning valve 58: Air blow valve 59: Pressurized air source 60: Pressure sensor 61: Regulator 62: Filter 63: Tank 64: Cooler 65: Diaphragm pump 66: Relief valve 67: Filter 68: Regulator 69: Flow rate sensor 70: Filter 71: Electromagnetic flow rate adjustment valve (flow rate adjustment mechanism)
72: Foreign matter sensor 73: Flow rate sensor 74: Sequencer (determination means)

See JP-A-2003-93991 See JP-A-11-233478 See JP 2001-276760 A See JP-A-11-233478 See JP-A-2-157070

Claims (10)

In a cleaning device that removes foreign matter adhering to the surface to be cleaned with a cleaning liquid,
A recovery path for recovering the cleaning liquid used for cleaning the surface to be cleaned;
A foreign matter sensor that detects the size and number of foreign matter contained in the cleaning liquid that is arranged in the recovery passage and flows through the recovery passage;
Based on the size and number of foreign matter detected by the foreign matter sensor, determination means for determining whether to continue cleaning the object to be cleaned or to end the cleaning;
A cleaning apparatus comprising:   The surface to be cleaned of the object to be cleaned includes an inner surface of a hole penetrating the object to be cleaned, and foreign matter is removed by injecting and discharging the cleaning liquid into the hole. The cleaning apparatus according to claim 1.   2. The cleaning according to claim 1, wherein the determination unit determines that the cleaning is finished when the predetermined size of foreign matter is continuously measured for a predetermined number of times or less in advance. apparatus.   The cleaning apparatus according to claim 1, wherein the recovery path includes a measurement path including the foreign matter sensor and a detour path not including the foreign matter sensor.   The cleaning apparatus according to claim 4, further comprising a flow rate adjusting mechanism that adjusts a flow rate within a measurement specification range of the foreign matter sensor in at least one of the measurement path and the bypass path.   The cleaning apparatus according to claim 5, wherein the flow rate adjusting mechanism includes a mechanism that changes a cross-sectional area in the path in a stepwise manner. The cleaning apparatus according to claim 1, further comprising a mechanism that holds the cleaning liquid at a positive pressure in the flow path of the cleaning liquid.
  The cleaning apparatus according to claim 1, wherein the cleaning liquid is allowed to flow into the foreign matter sensor from below to above the foreign matter sensor.   2. The foreign matter sensor according to claim 1, further comprising an open / close valve between the object to be cleaned and the foreign matter sensor. Cleaning device.   The cleaning device according to claim 9, wherein the opening / closing valve can be opened and closed at an arbitrary timing during cleaning.