JP2014529566A5 - - Google Patents

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Publication number
JP2014529566A5
JP2014529566A5 JP2014526220A JP2014526220A JP2014529566A5 JP 2014529566 A5 JP2014529566 A5 JP 2014529566A5 JP 2014526220 A JP2014526220 A JP 2014526220A JP 2014526220 A JP2014526220 A JP 2014526220A JP 2014529566 A5 JP2014529566 A5 JP 2014529566A5
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JP
Japan
Prior art keywords
ingot
heating element
dopant
portions
moving
Prior art date
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JP2014526220A
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English (en)
Japanese (ja)
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JP6087923B2 (ja
JP2014529566A (ja
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Priority claimed from US13/210,786 external-priority patent/US20130044779A1/en
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Publication of JP2014529566A publication Critical patent/JP2014529566A/ja
Publication of JP2014529566A5 publication Critical patent/JP2014529566A5/ja
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Publication of JP6087923B2 publication Critical patent/JP6087923B2/ja
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JP2014526220A 2011-08-16 2012-08-16 ゾーン処理を用いてレーザー結晶内のドーパントプロファイルを調節する方法 Active JP6087923B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/210,786 2011-08-16
US13/210,786 US20130044779A1 (en) 2011-08-16 2011-08-16 Method for tailoring the dopant profile in a laser crystal using zone processing
PCT/US2012/051189 WO2013025926A1 (en) 2011-08-16 2012-08-16 Method for tailoring the dopant profile in a laser crystal using zone processing

Publications (3)

Publication Number Publication Date
JP2014529566A JP2014529566A (ja) 2014-11-13
JP2014529566A5 true JP2014529566A5 (https=) 2015-06-18
JP6087923B2 JP6087923B2 (ja) 2017-03-01

Family

ID=47712638

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014526220A Active JP6087923B2 (ja) 2011-08-16 2012-08-16 ゾーン処理を用いてレーザー結晶内のドーパントプロファイルを調節する方法

Country Status (5)

Country Link
US (3) US20130044779A1 (https=)
EP (1) EP2744930B1 (https=)
JP (1) JP6087923B2 (https=)
IL (1) IL230316A (https=)
WO (1) WO2013025926A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103436966B (zh) * 2013-08-13 2016-05-04 安徽环巢光电科技有限公司 熔盐法键合掺杂或纯钇铝石榴石与掺杂钇铝石榴石晶体的方法
US9726820B2 (en) * 2014-08-14 2017-08-08 Raytheon Company End pumped PWG with tapered core thickness
RU2591253C1 (ru) * 2015-04-30 2016-07-20 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Кубанский государственный университет" (ФГБОУ ВПО "КубГУ") Монокристаллический материал с неоднородным распределением оптических примесей для активного лазерного элемента
CZ306311B6 (cs) * 2015-07-16 2016-11-23 Fyzikální Ústav Av Čr, V. V. I. Optické elementy pro konstrukci výkonových laserových systémů a jejich příprava
JP6502285B2 (ja) * 2016-04-28 2019-04-17 日本電信電話株式会社 単結晶ファイバの製造方法
US10840668B2 (en) 2016-06-17 2020-11-17 Lawrence Livermore National Security, Llc Laser gain media fabricated via direct ink writing (DIW) and ceramic processing
CN106329301A (zh) * 2016-11-09 2017-01-11 上海卫星工程研究所 纳米阶梯掺杂结构的阳光泵浦激光工作晶体的制备方法
US20220140206A1 (en) * 2019-03-27 2022-05-05 Tdk Corporation Phosphor and light irradiation device
CN113463195B (zh) * 2021-07-09 2022-09-02 中国电子科技集团公司第二十六研究所 一种生长梯度掺杂Yb: YAG单晶的方法
US20230110835A1 (en) * 2021-10-12 2023-04-13 Lawrence Livermore National Security, Llc Transparent ceramics fabricated by material jet printing
DE102023108160A1 (de) * 2023-03-30 2024-10-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Verfahren zur Herstellung eines einkristallinen Körpers durch Festkörper-Umkristallisation

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3108073A (en) * 1961-10-26 1963-10-22 Grace W R & Co Process for doping semiconductive bodies
US3671330A (en) * 1970-10-21 1972-06-20 Gen Electric Removal of acceptor impurities from high purity germanium
US4040890A (en) * 1975-06-27 1977-08-09 Bell Telephone Laboratories, Incorporated Neodymium oxide doped yttrium aluminum garnet optical fiber
US4186046A (en) * 1976-09-29 1980-01-29 The United States Of America As Represented By The Secretary Of The Army Growing doped single crystal ceramic materials
EP0450494B1 (en) * 1990-03-30 1996-06-19 Sumitomo Sitix Corporation Manufacturing method for single-crystal silicon
US5114528A (en) * 1990-08-07 1992-05-19 Wisconsin Alumni Research Foundation Edge-defined contact heater apparatus and method for floating zone crystal growth
US5321711A (en) * 1992-08-17 1994-06-14 Alliedsignal Inc. Segmented solid state laser gain media with gradient doping level
JP2922078B2 (ja) * 1993-03-17 1999-07-19 株式会社トクヤマ シリコンロッドの製造方法
JP3443639B2 (ja) * 2000-01-27 2003-09-08 独立行政法人産業技術総合研究所 傾斜型機能物質および製造方法
JP4161051B2 (ja) * 2003-06-16 2008-10-08 独立行政法人産業技術総合研究所 傾斜材料の製造方法
JP2005327997A (ja) * 2004-05-17 2005-11-24 Akio Ikesue 複合レーザー素子及びその素子を用いたレーザー発振器
EP1739210B1 (de) * 2005-07-01 2012-03-07 Freiberger Compound Materials GmbH Verfahren zur Herstellung von dotierten Halbleiter-Einkristallen, und III-V-Halbleiter-Einkristall
KR100827028B1 (ko) * 2006-10-17 2008-05-02 주식회사 실트론 쵸크랄스키법을 이용한 반도체 단결정 제조 방법, 및 이방법에 의해 제조된 반도체 단결정 잉곳 및 웨이퍼
US9074298B2 (en) * 2008-08-18 2015-07-07 Sumco Techxiv Corporation Processes for production of silicon ingot, silicon wafer and epitaxial wafer, and silicon ingot
WO2011125897A1 (ja) * 2010-03-31 2011-10-13 独立行政法人産業技術総合研究所 金属化合物結晶の製造方法、装飾品の製造方法および金属化合物結晶

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