JP2014524597A5 - - Google Patents

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Publication number
JP2014524597A5
JP2014524597A5 JP2014526352A JP2014526352A JP2014524597A5 JP 2014524597 A5 JP2014524597 A5 JP 2014524597A5 JP 2014526352 A JP2014526352 A JP 2014526352A JP 2014526352 A JP2014526352 A JP 2014526352A JP 2014524597 A5 JP2014524597 A5 JP 2014524597A5
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JP
Japan
Prior art keywords
regions
processing step
wafer
layer
spacer wafer
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JP2014526352A
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English (en)
Japanese (ja)
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JP2014524597A (ja
JP6282225B2 (ja
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Priority claimed from PCT/CH2012/000201 external-priority patent/WO2013026175A1/en
Publication of JP2014524597A publication Critical patent/JP2014524597A/ja
Publication of JP2014524597A5 publication Critical patent/JP2014524597A5/ja
Application granted granted Critical
Publication of JP6282225B2 publication Critical patent/JP6282225B2/ja
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JP2014526352A 2011-08-25 2012-08-24 前方焦点距離訂正を有する光学装置のウェハレベルの製作 Active JP6282225B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161527355P 2011-08-25 2011-08-25
US61/527,355 2011-08-25
PCT/CH2012/000201 WO2013026175A1 (en) 2011-08-25 2012-08-24 Wafer-level fabrication of optical devices with front focal length correction

Publications (3)

Publication Number Publication Date
JP2014524597A JP2014524597A (ja) 2014-09-22
JP2014524597A5 true JP2014524597A5 (enExample) 2015-09-24
JP6282225B2 JP6282225B2 (ja) 2018-02-21

Family

ID=46969906

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2014526351A Active JP6223975B2 (ja) 2011-08-25 2012-08-24 光学装置の、特にコンピュテーショナルカメラ用モジュールのウェハレベルの製作
JP2014526352A Active JP6282225B2 (ja) 2011-08-25 2012-08-24 前方焦点距離訂正を有する光学装置のウェハレベルの製作

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2014526351A Active JP6223975B2 (ja) 2011-08-25 2012-08-24 光学装置の、特にコンピュテーショナルカメラ用モジュールのウェハレベルの製作

Country Status (8)

Country Link
US (2) US20140307081A1 (enExample)
EP (2) EP2748853B1 (enExample)
JP (2) JP6223975B2 (enExample)
KR (2) KR101966480B1 (enExample)
CN (2) CN103890948B (enExample)
SG (4) SG2014008726A (enExample)
TW (3) TWI582969B (enExample)
WO (2) WO2013026174A2 (enExample)

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WO2015119571A1 (en) * 2014-02-07 2015-08-13 Heptagon Micro Optics Pte. Ltd. Stacks of arrays of beam shaping elements including stacking, self-alignment and/or self-centering features
EP3108505B1 (en) 2014-02-18 2019-04-10 Heptagon Micro Optics Pte. Ltd. Optical modules including customizable spacers for focal length adjustment and/or reduction of tilt, and fabrication of the optical modules
WO2015191001A1 (en) 2014-06-10 2015-12-17 Heptagon Micro Optics Pte. Ltd. Optoelectronic modules including hybrid arrangements of beam shaping elements, and imaging devices incorporating the same
US9711552B2 (en) 2014-08-19 2017-07-18 Heptagon Micro Optics Pte. Ltd. Optoelectronic modules having a silicon substrate, and fabrication methods for such modules
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US20160307881A1 (en) * 2015-04-20 2016-10-20 Advanced Semiconductor Engineering, Inc. Optical sensor module and method for manufacturing the same
JP2018522445A (ja) 2015-05-12 2018-08-09 サムスン エレクトロニクス カンパニー リミテッド サンプル値補償のための映像符号化方法及びその装置、並びにサンプル値補償のための映像復号方法及びその装置
WO2016191142A2 (en) 2015-05-27 2016-12-01 Verily Life Sciences Llc Nanophotonic hyperspectral/lightfield superpixel imager
JP6619174B2 (ja) * 2015-07-31 2019-12-11 ソニーセミコンダクタソリューションズ株式会社 製造装置および方法
WO2017023211A1 (en) * 2015-08-06 2017-02-09 Heptagon Micro Optics Pte. Ltd. Optical modules including customizable spacers for focal length adjustment and/or reduction of tilt, and fabrication of the optical modules
DE102015215833A1 (de) 2015-08-19 2017-02-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Multiaperturabbildungsvorrichtung mit Optiksubstrat
WO2017082820A1 (en) 2015-11-12 2017-05-18 Heptagon Micro Optics Pte. Ltd. Optical element stack assemblies
KR20170073910A (ko) 2015-12-21 2017-06-29 에스케이하이닉스 주식회사 라이트 필드 이미징 장치 및 그 제조방법
DE102016200285A1 (de) * 2016-01-13 2017-07-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Multiaperturabbildungsvorrichtung, Abbildungssystem und Verfahren zum Erfassen eines Objektbereichs
CN108941932A (zh) * 2017-05-23 2018-12-07 东莞东阳光科研发有限公司 人工晶体制备方法
US10677964B2 (en) * 2017-10-23 2020-06-09 Omnivision Technologies, Inc. Lens wafer assembly and associated method for manufacturing a stepped spacer wafer
CN113366359B (zh) 2019-03-12 2022-11-15 奥林巴斯株式会社 内窥镜用摄像装置及内窥镜
WO2021153629A1 (ja) * 2020-01-30 2021-08-05 古河電気工業株式会社 光モジュールおよび光学装置
US11664399B2 (en) * 2021-02-01 2023-05-30 Visera Technologies Company Limited Solid-state image sensor

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