JP2014524597A5 - - Google Patents

Download PDF

Info

Publication number
JP2014524597A5
JP2014524597A5 JP2014526352A JP2014526352A JP2014524597A5 JP 2014524597 A5 JP2014524597 A5 JP 2014524597A5 JP 2014526352 A JP2014526352 A JP 2014526352A JP 2014526352 A JP2014526352 A JP 2014526352A JP 2014524597 A5 JP2014524597 A5 JP 2014524597A5
Authority
JP
Japan
Prior art keywords
regions
processing step
wafer
layer
spacer wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014526352A
Other languages
English (en)
Japanese (ja)
Other versions
JP6282225B2 (ja
JP2014524597A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/CH2012/000201 external-priority patent/WO2013026175A1/en
Publication of JP2014524597A publication Critical patent/JP2014524597A/ja
Publication of JP2014524597A5 publication Critical patent/JP2014524597A5/ja
Application granted granted Critical
Publication of JP6282225B2 publication Critical patent/JP6282225B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2014526352A 2011-08-25 2012-08-24 前方焦点距離訂正を有する光学装置のウェハレベルの製作 Active JP6282225B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161527355P 2011-08-25 2011-08-25
US61/527,355 2011-08-25
PCT/CH2012/000201 WO2013026175A1 (en) 2011-08-25 2012-08-24 Wafer-level fabrication of optical devices with front focal length correction

Publications (3)

Publication Number Publication Date
JP2014524597A JP2014524597A (ja) 2014-09-22
JP2014524597A5 true JP2014524597A5 (enExample) 2015-09-24
JP6282225B2 JP6282225B2 (ja) 2018-02-21

Family

ID=46969906

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2014526351A Active JP6223975B2 (ja) 2011-08-25 2012-08-24 光学装置の、特にコンピュテーショナルカメラ用モジュールのウェハレベルの製作
JP2014526352A Active JP6282225B2 (ja) 2011-08-25 2012-08-24 前方焦点距離訂正を有する光学装置のウェハレベルの製作

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2014526351A Active JP6223975B2 (ja) 2011-08-25 2012-08-24 光学装置の、特にコンピュテーショナルカメラ用モジュールのウェハレベルの製作

Country Status (8)

Country Link
US (2) US20140307081A1 (enExample)
EP (2) EP2748854B1 (enExample)
JP (2) JP6223975B2 (enExample)
KR (2) KR101966480B1 (enExample)
CN (2) CN103890949B (enExample)
SG (4) SG2014008718A (enExample)
TW (3) TWI620310B (enExample)
WO (2) WO2013026175A1 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130122247A1 (en) * 2011-11-10 2013-05-16 Omnivision Technologies, Inc. Spacer Wafer For Wafer-Level Camera And Method For Manufacturing Same
US9595553B2 (en) 2012-11-02 2017-03-14 Heptagon Micro Optics Pte. Ltd. Optical modules including focal length adjustment and fabrication of the optical modules
WO2015076750A1 (en) * 2013-11-22 2015-05-28 Heptagon Micro Optics Pte. Ltd. Compact optoelectronic modules
WO2015119571A1 (en) * 2014-02-07 2015-08-13 Heptagon Micro Optics Pte. Ltd. Stacks of arrays of beam shaping elements including stacking, self-alignment and/or self-centering features
US9887221B2 (en) 2014-02-18 2018-02-06 Heptagon Micro Optics Pte. Ltd. Optical modules including customizable spacers for focal length adjustment and/or reduction of tilt, and fabrication of the optical modules
WO2015191001A1 (en) 2014-06-10 2015-12-17 Heptagon Micro Optics Pte. Ltd. Optoelectronic modules including hybrid arrangements of beam shaping elements, and imaging devices incorporating the same
US9711552B2 (en) * 2014-08-19 2017-07-18 Heptagon Micro Optics Pte. Ltd. Optoelectronic modules having a silicon substrate, and fabrication methods for such modules
US9507143B2 (en) 2014-09-19 2016-11-29 Intel Corporation Compact illumination system
CN106817910B (zh) 2014-10-14 2019-12-13 赫普塔冈微光有限公司 光学元件堆叠组件
US20160307881A1 (en) * 2015-04-20 2016-10-20 Advanced Semiconductor Engineering, Inc. Optical sensor module and method for manufacturing the same
WO2016182152A1 (ko) * 2015-05-12 2016-11-17 삼성전자 주식회사 샘플값 보상을 위한 영상 부호화 방법과 그 장치, 및 샘플값 보상을 위한 영상 복호화 방법과 그 장치
WO2016191142A2 (en) 2015-05-27 2016-12-01 Verily Life Sciences Llc Nanophotonic hyperspectral/lightfield superpixel imager
JP6619174B2 (ja) * 2015-07-31 2019-12-11 ソニーセミコンダクタソリューションズ株式会社 製造装置および方法
US10475830B2 (en) 2015-08-06 2019-11-12 Ams Sensors Singapore Pte. Ltd. Optical modules including customizable spacers for focal length adjustment and/or reduction of tilt, and fabrication of the optical modules
DE102015215833A1 (de) 2015-08-19 2017-02-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Multiaperturabbildungsvorrichtung mit Optiksubstrat
CN108700721B (zh) 2015-11-12 2021-12-31 赫普塔冈微光有限公司 光学元件堆叠组件
KR20170073910A (ko) 2015-12-21 2017-06-29 에스케이하이닉스 주식회사 라이트 필드 이미징 장치 및 그 제조방법
DE102016200285A1 (de) * 2016-01-13 2017-07-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Multiaperturabbildungsvorrichtung, Abbildungssystem und Verfahren zum Erfassen eines Objektbereichs
CN108941932A (zh) * 2017-05-23 2018-12-07 东莞东阳光科研发有限公司 人工晶体制备方法
US10677964B2 (en) * 2017-10-23 2020-06-09 Omnivision Technologies, Inc. Lens wafer assembly and associated method for manufacturing a stepped spacer wafer
CN113366359B (zh) 2019-03-12 2022-11-15 奥林巴斯株式会社 内窥镜用摄像装置及内窥镜
WO2021153629A1 (ja) 2020-01-30 2021-08-05 古河電気工業株式会社 光モジュールおよび光学装置
US11664399B2 (en) * 2021-02-01 2023-05-30 Visera Technologies Company Limited Solid-state image sensor

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5232549A (en) * 1992-04-14 1993-08-03 Micron Technology, Inc. Spacers for field emission display fabricated via self-aligned high energy ablation
DE10058305A1 (de) * 2000-11-24 2002-06-06 Wacker Siltronic Halbleitermat Verfahren zur Oberflächenpolitur von Siliciumscheiben
ATE551624T1 (de) * 2001-02-09 2012-04-15 Digitaloptics Corp East Kompensation und/oder variation von auf wafern produzierten linsen und daraus resultierenden strukturen
CN100440544C (zh) * 2002-09-17 2008-12-03 安特约恩股份有限公司 照相装置、制造照相装置的方法以及晶片尺度的封装
DE102005002545A1 (de) 2005-01-19 2006-07-20 Airbus Deutschland Gmbh Energiepuffereinrichtung für ein Flugzeug
US8053705B2 (en) * 2005-09-07 2011-11-08 Purdue Research Foundation Laser assisted machining process with distributed lasers
JP2007110588A (ja) * 2005-10-17 2007-04-26 Funai Electric Co Ltd 複眼撮像装置
CN101009779B (zh) 2006-01-24 2010-06-16 采钰科技股份有限公司 高精密度成像控制的影像感应模块
US7721564B2 (en) 2006-11-21 2010-05-25 B/E Aerospace, Inc. Wild frequency avionic refrigeration system and controller therefor
US7692256B2 (en) * 2007-03-23 2010-04-06 Heptagon Oy Method of producing a wafer scale package
US7812869B2 (en) * 2007-05-11 2010-10-12 Aptina Imaging Corporation Configurable pixel array system and method
US20110031510A1 (en) * 2007-11-27 2011-02-10 Heptagon Oy Encapsulated lens stack
US20090159200A1 (en) * 2007-12-19 2009-06-25 Heptagon Oy Spacer element and method for manufacturing a spacer element
WO2009076787A1 (en) 2007-12-19 2009-06-25 Heptagon Oy Optical module for a camera device, baffle substrate, wafer scale package, and manufacturing methods therefor
TWI478808B (zh) * 2007-12-19 2015-04-01 Heptagon Micro Optics Pte Ltd 製造光學元件的方法
US8319301B2 (en) * 2008-02-11 2012-11-27 Omnivision Technologies, Inc. Self-aligned filter for an image sensor
WO2009120346A1 (en) * 2008-03-27 2009-10-01 Tessera North America, Inc. Optical device including at least one replicated surface and associated methods
WO2010074743A1 (en) * 2008-12-22 2010-07-01 Tessera North America, Inc. Focus compensation for thin cameras
WO2010108041A1 (en) 2009-03-18 2010-09-23 Artificial Muscle, Inc. Wafer level optical system
JP2011018974A (ja) * 2009-07-07 2011-01-27 Renesas Electronics Corp D/aコンバータ
US8193599B2 (en) * 2009-09-02 2012-06-05 Himax Semiconductor, Inc. Fabricating method and structure of a wafer level module
US8059341B2 (en) * 2009-09-23 2011-11-15 Visera Technologies Company Limited Lens assembly and method for forming the same
US8848301B2 (en) 2009-10-20 2014-09-30 Flir Systems Trading Belgium Bvba Focus compensation for optical elements and applications thereof
US8885257B2 (en) * 2009-10-20 2014-11-11 Flir Systems Trading Belgium Bvba Focus compensation for optical elements and applications thereof
WO2011063347A2 (en) 2009-11-20 2011-05-26 Pelican Imaging Corporation Capturing and processing of images using monolithic camera array with heterogeneous imagers
US9485397B2 (en) 2010-06-14 2016-11-01 Heptagon Micro Optics Pte. Ltd. Camera, and method of manufacturing a plurality of cameras

Similar Documents

Publication Publication Date Title
JP2014524597A5 (enExample)
JP2014526067A5 (enExample)
KR101882033B1 (ko) 기판 처리 장치를 세정하기 위한 세정 지그와 세정 방법, 및 기판 처리 시스템
WO2017067813A3 (en) A method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle
EP2830403A4 (en) METHOD FOR PRODUCING A SUBSTRATE WITH AN INTEGRATED RADIATOR AND SUBSTRATE WITH THE INTEGRATED RADIATOR
EP2426795A4 (en) COOLING MODULE FOR LASER, METHOD OF MANUFACTURING THEM AND SEMICONDUCTOR LASER THEREWITH
JP2012109357A5 (enExample)
EP3363046A4 (en) ARRAY SUBSTRATE, MANUFACTURING METHOD AND DISPLAY DEVICE
EP2804207A4 (en) METHOD FOR PRODUCING A TFT ARRAY SUBSTRATE
EP2727672A4 (en) CUTTING INSERT, CUTTING TOOL AND MANUFACTURING PROCESS FOR A CUTTING PRODUCT WITH THE CUTTING TOOL
EP2720519A4 (en) METAL FILM STRUCTURED LAMINATE, METAL FOIL LAMINATE, METAL FOIL LAMINATE SUBSTRATE, SOLAR CELL MODULE AND METHOD OF MANUFACTURING METAL FILM-STRUCTURED LAMINATE
EP2932532A4 (en) THIN-LAYER TRANSISTOR, MANUFACTURING METHOD AND DISPLAY DEVICE THEREFOR
EP3101681A4 (en) Wafer workpiece, provisional adhesive material for wafer working, and thin wafer manufacturing method
FI20075507L (fi) Menetelmä optisen tuotteen valmistamiseksi ja laitteisto
EP3286752A4 (en) Array substrate, display panel and display apparatus containing the same, and method for driving the same
IT201700081306A1 (it) Gruppo di affilatura per una lama di taglio, macchina comprendente detto gruppo e metodo
MA53311A (fr) Procédés de production de couches à effets optiques
JP2013184270A5 (enExample)
GB201802102D0 (en) Manufacturing method for IPS TFT-LCD array substrate, and IPS TFT-LCD array substrate
EP3264175A4 (en) Pellicle film, pellicle frame, and pellicle and method for producing same
EP3424082A4 (en) CARBON NANOTUBE THIN-LAYER TRANSISTOR AND MANUFACTURING METHOD THEREFOR
EP3121861A3 (en) Piezoelectric drive device, robot, and method for driving piezoelectric drive device
MY166589A (en) Methods for annealing semiconductor window layers
EP4113208A4 (en) Pellicle film, pellicle, film, graphene sheet and method for producing same
TWI799388B (zh) 保護膜用支撐框及保護膜及其製造方法