JP2014507015A5 - - Google Patents

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Publication number
JP2014507015A5
JP2014507015A5 JP2013553879A JP2013553879A JP2014507015A5 JP 2014507015 A5 JP2014507015 A5 JP 2014507015A5 JP 2013553879 A JP2013553879 A JP 2013553879A JP 2013553879 A JP2013553879 A JP 2013553879A JP 2014507015 A5 JP2014507015 A5 JP 2014507015A5
Authority
JP
Japan
Prior art keywords
actuator
mechanism according
damping
damping element
optical element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013553879A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014507015A (ja
JP6091434B2 (ja
Filing date
Publication date
Priority claimed from DE102011004299A external-priority patent/DE102011004299A1/de
Priority claimed from DE201110082994 external-priority patent/DE102011082994A1/de
Application filed filed Critical
Priority claimed from PCT/EP2012/052259 external-priority patent/WO2012110406A1/en
Publication of JP2014507015A publication Critical patent/JP2014507015A/ja
Publication of JP2014507015A5 publication Critical patent/JP2014507015A5/ja
Application granted granted Critical
Publication of JP6091434B2 publication Critical patent/JP6091434B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2013553879A 2011-02-17 2012-02-10 光学マウント及びｅｕｖ露光装置 Active JP6091434B2 (ja)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US201161443843P 2011-02-17 2011-02-17
US61/443,843 2011-02-17
DE102011004299.7 2011-02-17
DE102011004299A DE102011004299A1 (de) 2011-02-17 2011-02-17 Anordnung zur Halterung eines optischen Elementes, insbesondere in einer EUV-Projektionsbelichtungsanlage
US201161536655P 2011-09-20 2011-09-20
DE201110082994 DE102011082994A1 (de) 2011-09-20 2011-09-20 Anordnung zur Halterung eines optischen Elementes, insbesondere in einer EUV-Projektionsbelichtungsanlage
DE102011082994.6 2011-09-20
US61/536,655 2011-09-20
PCT/EP2012/052259 WO2012110406A1 (en) 2011-02-17 2012-02-10 Optical mount and euv exposure apparatus

Publications (3)

Publication Number Publication Date
JP2014507015A JP2014507015A (ja) 2014-03-20
JP2014507015A5 true JP2014507015A5 (enExample) 2015-04-02
JP6091434B2 JP6091434B2 (ja) 2017-03-08

Family

ID=46671959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013553879A Active JP6091434B2 (ja) 2011-02-17 2012-02-10 光学マウント及びｅｕｖ露光装置

Country Status (3)

Country Link
US (1) US9410662B2 (enExample)
JP (1) JP6091434B2 (enExample)
WO (1) WO2012110406A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012221831A1 (de) 2012-11-29 2014-06-05 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung wenigstens eines optischen Elementes in einem optischen System
CN104049337B (zh) * 2014-07-01 2016-07-06 中国科学院长春光学精密机械与物理研究所 超高真空试验腔中光路精密调节及转换装置
US9920874B2 (en) * 2015-07-30 2018-03-20 Nec Corporation Linkage rod including limited-displacement flexible mechanism
US10161561B2 (en) 2015-07-30 2018-12-25 Nec Corporation Linkage rod including limited-displacement flexible mechanism
DE102016208008A1 (de) * 2016-05-10 2017-11-16 Carl Zeiss Smt Gmbh Lageranordnung für eine Lithographieanlage sowie Lithographieanlage
JP2021009274A (ja) * 2018-07-09 2021-01-28 レーザーテック株式会社 光源、検査装置、ｅｕｖ光の生成方法及び検査方法
DE102019200388A1 (de) * 2019-01-15 2019-03-07 Carl Zeiss Smt Gmbh Schutzvorrichtung für Leitungen in einer Projektionsbelichtungsanlage für die Halbleiterlithographie
DE102019218280A1 (de) 2019-11-26 2020-01-16 Carl Zeiss Smt Gmbh Optisches system und lithographieanlage
DE102021202893A1 (de) * 2021-03-24 2022-09-29 Carl Zeiss Smt Gmbh Lagerung für eine lithographieanlage und lithographieanlage

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2183361B (en) * 1985-11-23 1990-08-01 Jj Lloyd Instr Ltd Adjustable optical apparatus and spectrometers
JPH03242613A (ja) * 1990-02-20 1991-10-29 Mitsubishi Electric Corp ミラーサポート用アクチユエータ
US5160112A (en) * 1991-08-13 1992-11-03 Pritchard Anton E Moving mirror carriage
US5402258A (en) * 1992-04-17 1995-03-28 Tokyo Electric Co., Ltd. Optical scanning device for scanning laser beam focused on image-forming surface
JP2996900B2 (ja) * 1995-07-21 2000-01-11 三菱電機株式会社 望遠鏡の振動抑制機構
DE19951176A1 (de) 1999-10-23 2001-04-26 Zeiss Carl Fa Rotationslager
JP4649136B2 (ja) * 2003-07-31 2011-03-09 キヤノン株式会社 アクチュエータ、露光装置及びデバイス製造方法
JP5041810B2 (ja) 2003-09-12 2012-10-03 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子操作装置
GB2411288B (en) * 2004-02-20 2006-01-04 Melles Griot Ltd Positioner device
EP1836518B1 (en) * 2005-01-12 2013-10-30 Trimble Jena GmbH Translational positioning device
KR101428817B1 (ko) 2005-07-14 2014-08-08 칼 짜이스 에스엠테 게엠베하 광학 요소 진동 감쇄 장치, 대물렌즈, 투사 노출 기계 및 이들을 사용하는 방법
JP4106392B2 (ja) * 2005-12-27 2008-06-25 ピー・エス・シー株式会社 気体圧制御アクチュエータ、気体圧制御アクチュエータ用気体軸受機構及び気体圧制御アクチュエータを用いた微小変位出力装置
JP2007245643A (ja) * 2006-03-17 2007-09-27 Fujifilm Corp 溶液製膜方法及び設備
JP5043468B2 (ja) 2007-02-23 2012-10-10 キヤノン株式会社 保持装置
DE102008041310A1 (de) 2007-08-31 2009-03-05 Carl Zeiss Smt Ag Optisches Element
US20090213445A1 (en) * 2008-02-25 2009-08-27 Olympus Corporation Optical scanning device and optical reading system provided with the optical scanning device
DE102009008965A1 (de) 2008-02-28 2009-09-03 Carl Zeiss Smt Ag Optische Einrichtung mit steifem Gehäuse
DE102009005954B4 (de) 2009-01-20 2010-10-21 Carl Zeiss Smt Ag Dämpfungsvorrichtung

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