JP2014216648A - ウェハハンドリングをモニタリングするためのシステム及び方法並びにウェハハンドリングマシン - Google Patents
ウェハハンドリングをモニタリングするためのシステム及び方法並びにウェハハンドリングマシン Download PDFInfo
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- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
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- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/4184—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by fault tolerance, reliability of production system
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- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/41875—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by quality surveillance of production
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- H01L21/67005—Apparatus not specifically provided for elsewhere
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- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
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- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
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- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
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- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45031—Manufacturing semiconductor wafers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
Description
Claims (20)
- ウェハハンドリングをモニタリングするためのシステムであって、
組み立てられたウェハハンドリングマシンに固定されることが可能なセンサと、
前記センサと電子的に通信する制御器と、を備え、
前記制御器は、
前記ウェハハンドリングマシンが位置合わせされているときに前記センサの基準出力を記憶することと、
前記基準出力と前記センサの現在出力の差がスレッショルドを超えるときに表示信号を生成することと、のための制御ロジックを含むシステム。 - 組み立てられたウェハハンドリングマシンに固定された傾斜センサを含む請求項1に記載のシステム。
- 前記センサは、振動センサ、温度センサ及び高調波センサを含む複数のセンサを備える請求項2に記載のシステム。
- 撮像デバイスを更に備え、
前記制御器は、
ハンドリング周期の一部分の間に前記ウェハハンドリングマシンの部品の基準高さを示す前記撮像デバイスからの基準画像を記憶することと、
別のハンドリング周期の当該一部分の間に前記撮像デバイスからの照合画像を捕捉することと、
前記基準高さと前記照合画像における当該ウェハハンドリング部品の高さの差がスレッショルドを超えていることを前記基準画像と前記照合画像の差が示すときに前記表示信号を生成することと、のための制御ロジックを更に含む請求項1に記載のシステム。 - 前記制御器は前記ウェハハンドリングマシンへの半導体ウェハの自動化された配送の禁止を前記表示信号に基づき指令することのための制御ロジックを更に含む請求項1に記載のシステム。
- 前記制御器は前記表示信号を通信するためのワイヤレスモデムを更に含む請求項1に記載のシステム。
- 前記制御器はボタンを更に含み、前記制御ロジックは前記ボタンが押されているときに前記基準出力を記憶するように更に構成される請求項1に記載のシステム。
- ウェハを保持することが可能なロードポートと、
前記ウェハを拾うこと及び動かすことが可能なロボットアームと、
前記ロードポート及び前記ロボットアームの少なくとも一方の外側に固定されたセンサと、
前記ウェハハンドリングマシンが位置合わせされているときに前記センサの基準出力を記憶することと、前記基準出力と前記センサの現在出力の差がスレッショルドを超えるときに表示信号を生成することと、のための制御ロジックを含む制御器と、
前記ロボットアームの動きを制御するための自動制御モジュールと、を備え、
前記自動制御モジュールは前記制御器から分離されているウェハハンドリングマシン。 - 前記センサは傾斜センサを含む請求項8に記載のウェハハンドリングマシン。
- 前記センサは、振動センサ、温度センサ及び高調波センサを含む複数のセンサを備える請求項8に記載のウェハハンドリングマシン。
- 撮像デバイスを更に備え、
前記制御器は、
ハンドリング周期の一部分の間に前記ロボットアームが基準高さにあるときに前記撮像デバイスからの基準画像を記憶することと、
別のハンドリング周期の当該一部分の間に前記撮像デバイスからの照合画像を捕捉することと、
前記基準高さと前記照合画像における前記ロボットアームの高さの差がスレッショルドを超えていることを前記基準画像と前記照合画像の差が示すときに前記表示信号を生成することと、のための制御ロジックを更に含む請求項8に記載のウェハハンドリングマシン。 - 前記制御器は前記ウェハハンドリングマシンへの半導体ウェハの自動化された配送の禁止を前記表示信号に基づき指令することのための制御ロジックを更に含む請求項8に記載のウェハハンドリングマシン。
- 前記制御器は前記表示信号を通信するためのワイヤレスモデムを更に含む請求項8に記載のウェハハンドリングマシン。
- 前記制御器はボタンを更に含み、前記制御ロジックは前記ボタンが押されているときに前記基準出力を記憶するように更に構成される請求項8に記載のウェハハンドリングマシン。
- ウェハハンドリングをモニタリングする方法であって、
ウェハハンドリングマシンが位置合わせされているときに、前記ウェハハンドリングマシンに固定されるセンサの基準出力を記憶することと、
前記基準出力と前記センサの現在出力の差がスレッショルドを超えるときに表示信号を生成することと、を備える方法。 - 組み立てられた半導体ウェハハンドリングマシンの部品に前記センサを固定することを更に備える請求項15に記載の方法。
- 前記センサを固定することは、傾斜センサ、振動センサ、温度センサ及び高調波センサの少なくとも1つを固定することを更に含む請求項16に記載の方法。
- 組み立てられた半導体ウェハハンドリングマシンに撮像デバイスを固定することと、
ハンドリング周期の一部分の間に前記ウェハハンドリングマシンのウェハハンドリング部品が基準位置にあるときに前記撮像デバイスからの基準画像を記憶することと、
別のハンドリング周期の当該一部分の間に前記撮像デバイスからの照合画像を捕捉することと、
前記基準高さと前記照合画像における前記ウェハハンドリング部品の高さの差がスレッショルドを超えていることを前記基準画像と前記照合画像の差が示すときに前記表示信号を生成することと、を更に備える請求項15に記載の方法。 - 前記ウェハハンドリングマシンへの半導体ウェハの自動化された配送を前記表示信号に基づき禁止することを更に備える請求項15に記載の方法。
- 前記ウェハハンドリングマシンのロボットアームに傾斜センサを固定することと、前記ウェハハンドリングマシンのロードポートに傾斜センサを固定することとを更に備える請求項15に記載の方法。
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US13/872,734 | 2013-04-29 | ||
US13/872,734 US9442482B2 (en) | 2013-04-29 | 2013-04-29 | System and method for monitoring wafer handling and a wafer handling machine |
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JP2014216648A true JP2014216648A (ja) | 2014-11-17 |
JP6325325B2 JP6325325B2 (ja) | 2018-05-16 |
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US (2) | US9442482B2 (ja) |
EP (2) | EP3185282B1 (ja) |
JP (1) | JP6325325B2 (ja) |
KR (2) | KR20140128861A (ja) |
CN (1) | CN104124189B (ja) |
DE (1) | DE102014204945A1 (ja) |
TW (1) | TWI670154B (ja) |
Cited By (1)
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DE102014204945A1 (de) | 2014-11-13 |
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US20140324208A1 (en) | 2014-10-30 |
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CN104124189B (zh) | 2017-09-12 |
KR20140128861A (ko) | 2014-11-06 |
TWI670154B (zh) | 2019-09-01 |
CN104124189A (zh) | 2014-10-29 |
KR102128995B1 (ko) | 2020-07-02 |
US9442482B2 (en) | 2016-09-13 |
EP2800132A1 (en) | 2014-11-05 |
JP6325325B2 (ja) | 2018-05-16 |
EP2800132B1 (en) | 2017-06-28 |
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