JP2014216367A - Electrode built-in ceramics sintered compact and process of manufacturing the same - Google Patents

Electrode built-in ceramics sintered compact and process of manufacturing the same Download PDF

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JP2014216367A
JP2014216367A JP2013090169A JP2013090169A JP2014216367A JP 2014216367 A JP2014216367 A JP 2014216367A JP 2013090169 A JP2013090169 A JP 2013090169A JP 2013090169 A JP2013090169 A JP 2013090169A JP 2014216367 A JP2014216367 A JP 2014216367A
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electrode
sintered body
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ceramic
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JP6208972B2 (en
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石田 弘徳
Hironori Ishida
弘徳 石田
博志 畠山
Hiroshi Hatakeyama
博志 畠山
篤 菅家
Atsushi Sugaya
篤 菅家
梅木俊哉
Toshiya Umeki
俊哉 梅木
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Taiheiyo Cement Corp
NTK Ceratec Co Ltd
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Nihon Ceratec Co Ltd
Taiheiyo Cement Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02NELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect

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  • Jigs For Machine Tools (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an electrode built-in ceramics sintered compact whose arrangement accuracy of an electrode is improved and to provide a process of manufacturing the same.SOLUTION: Electrodes 21, 22 that are extending along a plane parallel to a wafer mounting surface 100 included in a ceramics sintered compact 10 is built in the ceramics sintered compact 10. Claw parts 212, 222 having a height equal to or less than 1.0 times the size of the electrodes 21, 22 in a normal direction of the mounting surface 100 are provided at the electrodes 21, 22.

Description

本発明は、半導体製造装置に使用される静電チャック電極、ヒータ電極もしくはプラズマ電極、またはこれらの組み合わせ等、一または複数の電極が内蔵されているセラミックス焼結体およびその製造方法に関する。   The present invention relates to a ceramic sintered body in which one or a plurality of electrodes such as an electrostatic chuck electrode, a heater electrode or a plasma electrode, or a combination thereof used in a semiconductor manufacturing apparatus is incorporated, and a method for manufacturing the same.

電極内蔵セラミックス焼結体の製法として、成形体の上に電極と、他の成形体または粉末を順に重ねたうえで、当該成形体または当該成形体および粉末を当該重ね方向に加圧焼成する手法が提案されている(特許文献1〜3参照)。   As a method for producing a ceramic sintered body with built-in electrode, a method in which an electrode and another molded body or powder are sequentially stacked on the molded body, and then the molded body or the molded body and the powder are pressure-fired in the stacking direction. Has been proposed (see Patent Documents 1 to 3).

特許第2766443号公報Japanese Patent No. 2766443 特開2003−100422号公報Japanese Patent Laid-Open No. 2003-1000042 特開2003−077995号公報JP 2003-077995 A

しかし、成形体に圧力が印加されたときに電極が所定位置からずれる可能性が無視できない程度に高い。このため、セラミックス焼結体の電極に由来する性能(加熱性能または静電吸着性能など)が所望の形態からずれるほか、当該焼結体に対して電極と干渉しないようなリフトピン穴等を加工することが困難になる事態が招かれる。   However, the possibility that the electrode is displaced from the predetermined position when pressure is applied to the molded body is so high that it cannot be ignored. For this reason, the performance derived from the electrode of the ceramic sintered body (heating performance or electrostatic adsorption performance, etc.) deviates from the desired form, and lift pin holes or the like that do not interfere with the electrode are processed into the sintered body. The situation will be difficult.

そこで、本発明は、電極の配置精度の向上が図られている電極内蔵セラミックス焼結体およびその製造方法を提供することを目的とする。   Then, an object of this invention is to provide the electrode built-in ceramic sintered compact by which the improvement of the arrangement | positioning precision of an electrode is aimed at, and its manufacturing method.

本発明の電極内蔵セラミックス焼結体は、平面に沿って延在する電極が内蔵されているセラミックス焼結体であって、前記平面の法線方向について、前記電極のサイズまたは厚さの1.0倍以下の高さを有する爪部が前記電極に設けられていることを特徴とする。   The electrode-embedded ceramic sintered body according to the present invention is a ceramic sintered body in which an electrode extending along a plane is built-in, and the size or thickness of the electrode is 1. The nail | claw part which has a height of 0 times or less is provided in the said electrode, It is characterized by the above-mentioned.

前記セラミックス焼結体がウエハを載置するための前記平面と平行な載置面を有し、前記爪部が前記載置面に対して反対方向に前記電極から延在または突出するように設けられていることが好ましい。前記電極が少なくとも前記セラミックス焼結体において前記載置面の側にプラズマを発生させるための電極または前記載置面に載置された前記ウエハを前記セラミックス焼結体に対し平面に沿って延在する電極が内蔵されているセラミックス焼結体であって、前記平面の法線方向について、前記電極のサイズまたは厚さの1.0倍以下の高さを有する爪部が前記電極に設けられていることが好ましい。   The ceramic sintered body has a mounting surface parallel to the plane for mounting a wafer, and the claw portion is provided so as to extend or protrude from the electrode in the opposite direction to the mounting surface. It is preferable that The electrode extends at least along the plane of the ceramic sintered body with respect to the electrode for generating plasma on the placement surface side or the wafer placed on the placement surface in the ceramic sintered body. And a claw portion having a height not more than 1.0 times the size or thickness of the electrode in the normal direction of the plane. Preferably it is.

前記セラミックス焼結体がウエハを載置するための前記平面と平行な載置面を有し、前記爪部が前記載置面に対して反対方向に前記電極から延在または突出するように設けられていることが好ましい。前記電極が少なくとも前記セラミックス焼結体において前記載置面の側にプラズマを発生させるための電極または前記載置面に載置された前記ウエハを前記セラミックス焼結体に対して静電吸着させるための電極であることが好ましい。前記爪部が前記電極の縁部に設けられていることが好ましい。前記電極の中心を基準として複数の前記爪部が異なる方位にまたは等方的に配置されていることが好ましい。   The ceramic sintered body has a mounting surface parallel to the plane for mounting a wafer, and the claw portion is provided so as to extend or protrude from the electrode in the opposite direction to the mounting surface. It is preferable that In order for the electrode to electrostatically attract the electrode for generating plasma on the mounting surface side or the wafer placed on the mounting surface to the ceramic sintered body at least in the ceramic sintered body It is preferable that it is an electrode. It is preferable that the nail | claw part is provided in the edge part of the said electrode. The plurality of claw portions are preferably arranged in different directions or isotropically with respect to the center of the electrode.

本発明の方法は、平面に沿って延在する電極が内蔵されているセラミックス焼結体の製造方法であって、前記電極を間に挟むように複数のセラミックス成形体を前記平面の法線方向に重ねる、または、前記電極を一のセラミックス成形体に埋設する工程と、前記複数のセラミックス成形体または前記一のセラミックス成形体を前記平面の法線方向について加圧しながら焼成する工程と、を含み、前記電極がその厚さの1.0倍以下の高さを有する爪部を有することを特徴とする。   The method of the present invention is a method for manufacturing a ceramic sintered body in which an electrode extending along a plane is incorporated, and a plurality of ceramic molded bodies are arranged in a normal direction of the plane so as to sandwich the electrode therebetween. Or embedding the electrode in one ceramic molded body, and firing the plurality of ceramic molded bodies or the one ceramic molded body while pressing them in the normal direction of the plane. The electrode has a claw portion having a height not more than 1.0 times its thickness.

金属板、金属箔、金属メッシュまたは金属線を加工して形状を調節し、かつ、当該加工時に生じたバリの高さを調節することにより前記爪部を形成することによって前記電極を作製する工程をさらに含んでいることが好ましい。前記セラミックス焼結体がウエハを載置するための前記平面と平行な載置面を有し、前記爪部が前記載置面に対して反対方向に前記電極から延在または突出するように前記複数のセラミックス成形体の間に挟まれるように配置されることが好ましい。   A step of producing the electrode by forming a claw portion by adjusting a shape by processing a metal plate, a metal foil, a metal mesh or a metal wire, and adjusting a height of a burr generated during the processing. It is preferable that it is further included. The ceramic sintered body has a mounting surface parallel to the plane for mounting a wafer, and the claw portion extends or protrudes from the electrode in a direction opposite to the mounting surface. It is preferable to arrange so as to be sandwiched between a plurality of ceramic molded bodies.

本発明の電極内蔵セラミックス焼結体およびその製造方法によれば、平面に沿って延在する電極に設けられている爪部の高さが当該電極の厚さの1.0倍以下に調節されている。このため、爪部の存在に由来して加圧焼成時に成形体または電極に割れまたは変形を生じさせることが防止されうる。その上で、電極を挟むように重ねられている複数の成形体もしくは電極が埋設されている一の成形体、またはその焼成結果としてのセラミックス焼結体に当該爪部を食い込ませることができる。これにより、電極の位置ずれが確実に防止され、その配置精度の向上が図られる。   According to the electrode-embedded ceramic sintered body and the method for manufacturing the same according to the present invention, the height of the claw portion provided on the electrode extending along the plane is adjusted to 1.0 times or less the thickness of the electrode. ing. For this reason, it can prevent that a crack or a deformation | transformation arises in a molded object or an electrode at the time of pressurization baking derived from presence of a nail | claw part. In addition, the claw portion can be made to bite into a plurality of molded bodies that are stacked so as to sandwich the electrodes, one molded body in which the electrodes are embedded, or a ceramic sintered body as a result of firing. Thereby, the positional deviation of the electrode is reliably prevented, and the arrangement accuracy is improved.

本発明の一実施形態としての電極内蔵セラミックス焼結体の構成説明図。BRIEF DESCRIPTION OF THE DRAWINGS Structure explanatory drawing of the electrode built-in ceramic sintered compact as one Embodiment of this invention. 図1のセラミックス焼結体に内蔵されている電極の構成説明図。FIG. 2 is a configuration explanatory diagram of an electrode built in the ceramic sintered body of FIG. 1. 図1のセラミックス焼結体の製造方法に関する説明図。Explanatory drawing regarding the manufacturing method of the ceramic sintered compact of FIG. 電極の爪部に関する説明図。Explanatory drawing regarding the nail | claw part of an electrode.

(電極内蔵セラミックス焼結体の構成)
図1に示されている本発明の一実施形態としての電極内蔵セラミックス焼結体10(電極内蔵セラミックス部品)は略円盤状のヒータ付静電チャックである。セラミックス焼結体10の一対の端面のうち一方が、ウエハが載置される載置面100を構成する。セラミックス焼結体10には、載置面100に対して平行な2つの平面のそれぞれに沿って延在する「第1電極」としての静電チャック電極21および「第2電極」としてのヒータ電極22が内蔵されている。
(Configuration of ceramic sintered body with built-in electrode)
The electrode-embedded ceramic sintered body 10 (electrode-embedded ceramic part) as an embodiment of the present invention shown in FIG. 1 is a substantially disc-shaped electrostatic chuck with a heater. One of the pair of end surfaces of the ceramic sintered body 10 constitutes a mounting surface 100 on which the wafer is mounted. The ceramic sintered body 10 includes an electrostatic chuck electrode 21 as a “first electrode” and a heater electrode as a “second electrode” that extend along two planes parallel to the mounting surface 100. 22 is built-in.

ヒータ電極22は静電チャック電極21よりも載置面100から遠くに配置されている。載置面100に対する静電チャック電極21およびヒータ電極22の遠近関係は逆であってもよい。静電チャック電極21およびヒータ電極22は、ともに金属板、金属箔、金属メッシュまたは金属線により構成されている。金属箔にはパンチングが施されていてもよい。静電チャック電極21およびヒータ電極22は、セラミックス成形体の焼成温度を経験するため、高融点金属が用いられる。例えば、セラミックスとして窒化アルミニウム、アルミナまたは窒化珪素が用いられる場合、モリブデンまたはタングステンが電極21および22として用いられる。   The heater electrode 22 is disposed farther from the mounting surface 100 than the electrostatic chuck electrode 21. The perspective relationship between the electrostatic chuck electrode 21 and the heater electrode 22 with respect to the mounting surface 100 may be reversed. Both the electrostatic chuck electrode 21 and the heater electrode 22 are made of a metal plate, a metal foil, a metal mesh, or a metal wire. The metal foil may be punched. Since the electrostatic chuck electrode 21 and the heater electrode 22 experience the firing temperature of the ceramic molded body, a refractory metal is used. For example, when aluminum nitride, alumina, or silicon nitride is used as the ceramic, molybdenum or tungsten is used as the electrodes 21 and 22.

セラミックス焼結体10に内蔵される電極の数は1つであってもよく、3つ以上であってもよい。一または複数の電極は、セラミックス焼結体10の使用目的に応じてその形状等が適宜変更されうる。   The number of electrodes incorporated in the ceramic sintered body 10 may be one, or may be three or more. The shape or the like of one or a plurality of electrodes can be appropriately changed according to the purpose of use of the ceramic sintered body 10.

静電チャック電極21は、図2(a)に示されているように、略円形状に形成されている。静電チャック電極21は、その厚さの1.0倍以下の高さを有する4個の爪部212を備えている。4個の爪部212は、静電チャック電極21の中心X1を基準として略等方的に配置されている。爪部212の個数および配置形態は、これに限定されず、さまざまな形態に変更されてもよい。   The electrostatic chuck electrode 21 is formed in a substantially circular shape as shown in FIG. The electrostatic chuck electrode 21 includes four claw portions 212 having a height of 1.0 times or less of the thickness. The four claw portions 212 are arranged approximately isotropic with the center X1 of the electrostatic chuck electrode 21 as a reference. The number and arrangement form of the claw portions 212 are not limited to this, and may be changed to various forms.

ヒータ電極22は、図2(b)に示されているように、一端部から間隔をおいて外側に拡がりながら略同心円状に延びる一対の線が他端部で連結されたような形状に形成されている。ヒータ電極22は、その厚さ方向または当該平面の法線方向についてそのサイズの1.0倍以下の高さを有する10個の爪部222を備えている。10個の爪部222は、ヒータ電極22の中心X2を基準として複数の方位に配置されている。爪部222の個数および配置形態は、これに限定されず、さまざまな形態に変更されてもよい。   As shown in FIG. 2 (b), the heater electrode 22 is formed in a shape in which a pair of lines extending in a concentric manner while extending outward from one end portion are connected at the other end portion. Has been. The heater electrode 22 includes ten claw portions 222 having a height of 1.0 times or less of the size in the thickness direction or the normal direction of the plane. The ten claw portions 222 are arranged in a plurality of directions with the center X2 of the heater electrode 22 as a reference. The number and arrangement form of the claw portions 222 are not limited to this, and may be changed to various forms.

図1に示されているように、爪部212および爪部222はともに静電チャック電極21およびヒータ電極22のそれぞれから下方(載置面100に対して反対方向)に延出または突出するように設けられている。これにより、静電チャック電極21により、載置面100に載置されたウエハをセラミックス焼結体10に対して静電吸着させる力が、当該爪部212または222に由来して局所的に不均一が解消または軽減される。これは、電極21および22のうち一方に代えて、または、電極21および22に加えて、プラズマ発生用の電極がセラミックス焼結体10に内蔵される場合も同様である。   As shown in FIG. 1, the claw portion 212 and the claw portion 222 both extend or project downward from the electrostatic chuck electrode 21 and the heater electrode 22 (in the opposite direction to the mounting surface 100). Is provided. As a result, the electrostatic chuck electrode 21 causes the force that causes the wafer placed on the placement surface 100 to be electrostatically attracted to the ceramic sintered body 10 locally from the claw portions 212 or 222. Uniformity is eliminated or reduced. This is the same when the electrode for plasma generation is built in the ceramic sintered body 10 instead of one of the electrodes 21 and 22 or in addition to the electrodes 21 and 22.

そのほか、爪部212および爪部222はともに静電チャック電極21およびヒータ電極22のそれぞれから上方に突出するように設けられていてもよい。爪部212および爪部222の突出方向が異なっていてもよい。載置面100の法線方向または上下方向について、爪部212および爪部222が重ならないように配置されていてもよい。   In addition, both the claw portion 212 and the claw portion 222 may be provided so as to protrude upward from each of the electrostatic chuck electrode 21 and the heater electrode 22. The protruding directions of the claw portion 212 and the claw portion 222 may be different. The nail | claw part 212 and the nail | claw part 222 may be arrange | positioned about the normal line direction or the up-down direction of the mounting surface 100 so that it may not overlap.

電極の縁部は、内部に当該電極が含まれている閉曲線に沿って延在している「外縁部」のほか、内部に当該電極が含まれない閉曲線に沿って延在している「内縁部」も包含する概念である。金属板または金属箔等にパンチングが施されている場合、当該パンチ孔の縁部は内縁部に該当する。   In addition to the “outer edge” that extends along the closed curve that includes the electrode inside, the edge of the electrode extends to the inner edge that extends along the closed curve that does not include the electrode inside. "Part". When punching is performed on a metal plate or metal foil, the edge of the punch hole corresponds to the inner edge.

(電極内蔵セラミックス焼結体の製造方法)
(第1実施形態)
爪部212を有する第1電極(静電チャック電電極)21および爪部222を有する第2電極(ヒータ電極)22が作製される。具体的には、金属板等が、打ち抜き、または、刃物もしくはレーザーによる切断によって所定形状または設計形状に加工される(図2(a)および図2(b)参照)。この加工時に所定形状の金属板等の縁部に沿ってバリが生じる。
(Method for manufacturing electrode-embedded ceramic sintered body)
(First embodiment)
A first electrode (electrostatic chuck electrode) 21 having a claw portion 212 and a second electrode (heater electrode) 22 having a claw portion 222 are produced. Specifically, a metal plate or the like is processed into a predetermined shape or a design shape by punching or cutting with a blade or a laser (see FIGS. 2A and 2B). During this processing, burrs are generated along the edges of a metal plate or the like having a predetermined shape.

第1電極21および第2電極22が延在する平面に対するバリの高さは不均一であるため、当該高さを調整するようにバリに加工が施されることで爪部212および222が形成される。バリの加工法としては、研磨法またはウエットエッチング法などが採用される。ウエットエッチング法によるバリの加工に際して、所定箇所に曲げまたは打撃により当該張りが起立することで爪部212および222が形成されうる。   Since the height of the burr with respect to the plane in which the first electrode 21 and the second electrode 22 extend is uneven, the claw portions 212 and 222 are formed by processing the burr so as to adjust the height. Is done. As a burr processing method, a polishing method or a wet etching method is employed. When the burrs are processed by the wet etching method, the claws 212 and 222 can be formed by raising the tension by bending or striking a predetermined portion.

爪部212および222の高さは、電極21および22を構成するタングステンまたはモリブデンの変形性と、当該爪部212および222のそれぞれが食い込む対象である成形体31および32のそれぞれの柔らかさとの関係で決定される。成形体31、32の密度が低いほど、爪部212、222が当該成形体31、32に対して食い込みやすい(図4(a)参照)。   The height of the claw portions 212 and 222 is a relationship between the deformability of tungsten or molybdenum constituting the electrodes 21 and 22 and the softness of the molded bodies 31 and 32 to which the claw portions 212 and 222 are bite. Determined by As the density of the molded bodies 31 and 32 is lower, the claw portions 212 and 222 are likely to bite into the molded bodies 31 and 32 (see FIG. 4A).

成形体31、32の密度が理論密度(約65%)に近いほど硬いが、これに爪部212、222が刺さったときに電極21、22にシワもしくは割れ(図4(b)参照)が生じない、または成形体31、32に割れが生じないという観点から、爪部212および222の高さが決定されている。電極21および22が延在する平面に平行な方向に、当該電極21および22の変位を防止するという目標が達成されれば足りるので、爪部212および222は低いことが好ましい。   The closer the density of the molded bodies 31 and 32 is to the theoretical density (about 65%), the harder, but when the claw portions 212 and 222 are pierced there, the electrodes 21 and 22 are wrinkled or cracked (see FIG. 4B). The height of the claw portions 212 and 222 is determined from the viewpoint that it does not occur or the molded bodies 31 and 32 do not crack. The claws 212 and 222 are preferably low, as long as the goal of preventing displacement of the electrodes 21 and 22 is achieved in a direction parallel to the plane in which the electrodes 21 and 22 extend.

電極21、22の形状および性能が損なわれないことを前提として、電極21、22がその外縁部から外れた箇所でキリまたはポンチ等の工具により打ち抜かれ、その際に生じたバリが加工されることにより当該電極21、22の内縁部に爪部が形成されてもよい。   Assuming that the shape and performance of the electrodes 21 and 22 are not impaired, the electrodes 21 and 22 are punched out with a tool such as a drill or a punch at a place where the electrodes 21 and 22 are removed from the outer edge portion, and burrs generated at that time are processed. Accordingly, a claw portion may be formed on the inner edge portion of the electrodes 21 and 22.

電極21、22の縁部から外れた位置に爪部のうち少なくとも一部が設けられてもよい。たとえば、電極21、22の縁部から外れた箇所が局所的に突出するように加工され、当該突出部が爪部として形成されてもよい。このような爪部は、電極21、22を構成する金属板等の圧延時などにおいて形成されうる。ただし、コスト低減の観点からは、電極21、22の縁部、特に外縁部に爪部が形成されることが好ましい。   At least a part of the claw portions may be provided at a position deviated from the edge portions of the electrodes 21 and 22. For example, it is processed so that the location which deviated from the edge of electrodes 21 and 22 may project locally, and the projection concerned may be formed as a claw part. Such a nail | claw part can be formed at the time of rolling of the metal plate etc. which comprise the electrodes 21 and 22. However, from the viewpoint of cost reduction, it is preferable that claw portions are formed at the edge portions of the electrodes 21 and 22, particularly at the outer edge portion.

図3(a)左側に示されているように、略円盤状の成形体31(略円筒状の焼成さや(図示略)の内部に配置されている。)の上に爪部212が上方に向くように静電チャック電極21が載置される。図3(a)中央に示されているように、静電チャック電極21の上に略円盤状の成形体32が載置され、その上に爪部222が上方に向くようにヒータ電極22が載置される。図3(a)右側に示されているように、ヒータ電極22の上に略円盤状の成形体33が載置される。   As shown on the left side of FIG. 3 (a), the claw portion 212 is located above the substantially disc-shaped molded body 31 (arranged inside the substantially cylindrical fired sheath (not shown)). The electrostatic chuck electrode 21 is placed so as to face. As shown in the center of FIG. 3 (a), a substantially disc-shaped molded body 32 is placed on the electrostatic chuck electrode 21, and the heater electrode 22 is placed so that the claw portion 222 faces upward. Placed. As shown on the right side of FIG. 3A, a substantially disk-shaped molded body 33 is placed on the heater electrode 22.

静電チャック電極21およびヒータ電極22を間に挟むように重ねられている3つの成形体31〜33が、当該重なり方向に加圧されながら焼成されることにより、図1に示されている構成のセラミックス焼結体10が得られる。成形体31〜33は、一軸プレス、CIP、鋳込みまたは射出成形等、一般的なセラミックスの成形方法によって得られる。   The three molded bodies 31 to 33 stacked so as to sandwich the electrostatic chuck electrode 21 and the heater electrode 22 are baked while being pressed in the overlapping direction, whereby the configuration shown in FIG. The ceramic sintered body 10 is obtained. The compacts 31 to 33 are obtained by a general ceramic molding method such as uniaxial press, CIP, casting, or injection molding.

(第2実施形態)
図3(b)左側に示されているように、略円盤状の成形体31(略円筒状の焼成さや(図示略)の内部に配置されている。)の上に爪部212が上方に向くように静電チャック電極21が載置される。さらに、静電チャック電極21を上から覆うように焼成さやにセラミックス粉末32’が投入され、当該セラミックス粉末32’が下方に加圧される。
(Second Embodiment)
As shown in the left side of FIG. 3 (b), the claw portion 212 is located above the substantially disc-shaped molded body 31 (arranged inside the substantially cylindrical fired sheath (not shown)). The electrostatic chuck electrode 21 is placed so as to face. Further, the ceramic powder 32 ′ is introduced into the fired sheath so as to cover the electrostatic chuck electrode 21 from above, and the ceramic powder 32 ′ is pressed downward.

これにより、図3(b)中央に示されているように、成形体31よりも厚く、かつ、静電チャック電極21が埋設されている略円盤状の新たな成形体63が形成される。成形体32の上に爪部222が上方に向くようにヒータ電極22が載置される。さらに、ヒータ電極22を上から覆うように焼成さやにセラミックス粉末33’が投入され、当該セラミックス粉末33’が下方に加圧される。   As a result, as shown in the center of FIG. 3B, a new shaped body 63 that is thicker than the shaped body 31 and in which the electrostatic chuck electrode 21 is embedded is formed. The heater electrode 22 is placed on the molded body 32 so that the claw portion 222 faces upward. Further, the ceramic powder 33 ′ is introduced into the fired sheath so as to cover the heater electrode 22 from above, and the ceramic powder 33 ′ is pressed downward.

これにより、図3(b)右側に示されているように、成形体63よりも厚く、かつ、静電チャック電極21およびヒータ電極22が埋設されている略円盤状の新たな成形体96が形成される。当該成形体96が、下方に加圧されながら焼成されることにより、図1に示されている構成のセラミックス焼結体10が得られる。   As a result, as shown on the right side of FIG. 3B, a new substantially-disc shaped molded body 96 that is thicker than the molded body 63 and in which the electrostatic chuck electrode 21 and the heater electrode 22 are embedded is obtained. It is formed. The molded body 96 is fired while being pressed downward, whereby the ceramic sintered body 10 having the configuration shown in FIG. 1 is obtained.

(実施例)
窒化アルミニウム粉末に対して酸化イットリウム粉末が5[wt%]だけ添加され、さらに分散剤、バインダおよびイソプロピルアルコールが加えられたうえで、ボールミルを用いて混合された。当該混合物から、スプレードライ法により窒化アルミニウム顆粒が得られた。原料粉末としての当該顆粒がCIPにより成形されたうえで生加工されることでφ320[mm]×10[mm]の略円盤状の成形体が作製された。
(Example)
Only 5 wt% of yttrium oxide powder was added to the aluminum nitride powder, and further, a dispersant, a binder and isopropyl alcohol were added, and then mixed using a ball mill. From the mixture, aluminum nitride granules were obtained by spray drying. The granule as a raw material powder was molded by CIP and then raw-processed to produce a substantially disc-shaped molded body of φ320 [mm] × 10 [mm].

静電チャック電極21は、線径0.1[mm]のモリブデンメッシュがレーザーを用いて所定形状に加工された。この際、所定形状のモリブデンメッシュの縁部に生じたバリが、ウエットエッチング加工されることにより爪部212が形成された。ヒータ電極22は、厚さ0.1[mm]のモリブデン箔がレーザーを用いて所定形状に加工された。この際、所定形状のモリブデンメッシュの縁部に生じたバリが、研磨加工により爪部222が形成された。爪部212および222のそれぞれの高さは、光学顕微鏡を用いて測定されうる。   For the electrostatic chuck electrode 21, a molybdenum mesh having a wire diameter of 0.1 [mm] was processed into a predetermined shape using a laser. At this time, the burrs generated at the edges of the molybdenum mesh having a predetermined shape were wet-etched to form the claws 212. For the heater electrode 22, a molybdenum foil having a thickness of 0.1 [mm] was processed into a predetermined shape using a laser. At this time, burrs generated at the edges of the molybdenum mesh having a predetermined shape formed the claw portions 222 by polishing. The height of each of the claw portions 212 and 222 can be measured using an optical microscope.

前記のように作製された成形体および電極を用いて、第1実施形態の方法にしたがって実施例1および2の電極内蔵セラミックス焼結体が製造された(図3(a)参照)。前記のように準備された顆粒および成形体を用いて、第2実施形態の方法にしたがって実施例3および4の電極内蔵セラミックスが製造された(図3(b)参照)。   Using the molded body and the electrode produced as described above, the electrode-embedded ceramic sintered bodies of Examples 1 and 2 were manufactured according to the method of the first embodiment (see FIG. 3A). Using the granules and the molded body prepared as described above, the electrode built-in ceramics of Examples 3 and 4 were manufactured according to the method of the second embodiment (see FIG. 3B).

各実施例の焼結体10の上下面が平面研削された上で、X線検査装置を用いて静電チャック電極21とヒータ電極22との相対的な位置ずれ量が測定された。爪部212および222の割れの有無が調べられた。爪部212および222の近傍におけるセラミックス焼結体10の割れの有無が超音波探傷機を用いて調べられた。   After the upper and lower surfaces of the sintered body 10 of each example were subjected to surface grinding, the relative displacement between the electrostatic chuck electrode 21 and the heater electrode 22 was measured using an X-ray inspection apparatus. The presence or absence of cracks in the claws 212 and 222 was examined. The presence or absence of cracks in the ceramic sintered body 10 in the vicinity of the claw portions 212 and 222 was examined using an ultrasonic flaw detector.

表1には、各実施例の焼結体の特徴の測定結果がまとめて示されている。   Table 1 summarizes the measurement results of the characteristics of the sintered bodies of the respective examples.

表1から次のことがわかる。実施例1〜4のセラミックス焼結体において、載置面100の法線方向について静電チャック電極21のサイズ(厚さ)の1.0倍以下の0.2〜0.9倍の範囲に含まれるように爪部212の高さが調節されている。同方向について静電チャック電極22のサイズ(厚さ)の1.0倍以下の0.2〜1.0倍の範囲に含まれるように爪部222の高さが調節されている。電極21および22の相対的ずれ量が0.04〜0.06[mm]の範囲である。電極21および22に割れが生じておらず、焼結体10にも割れが生じていない。   Table 1 shows the following. In the ceramic sintered bodies of Examples 1 to 4, the normal direction of the mounting surface 100 is in the range of 0.2 to 0.9 times that is 1.0 times or less the size (thickness) of the electrostatic chuck electrode 21. The height of the claw portion 212 is adjusted so as to be included. The height of the claw portion 222 is adjusted so that it is included in the range of 0.2 to 1.0 times that is 1.0 times or less of the size (thickness) of the electrostatic chuck electrode 22 in the same direction. The relative displacement amount of the electrodes 21 and 22 is in the range of 0.04 to 0.06 [mm]. The electrodes 21 and 22 are not cracked, and the sintered body 10 is not cracked.

(比較例)
実施例1と同様に作製された成形体および電極を用いて、第1実施形態の方法にしたがって比較例1〜4の電極内蔵セラミックス焼結体が製造された(図3(a)参照)。実施例1と同様に準備された顆粒および成形体を用いて、第2実施形態の方法にしたがって比較例5の電極内蔵セラミックスが製造された(図3(b)参照)。
(Comparative example)
Using the molded body and electrodes produced in the same manner as in Example 1, the electrode built-in ceramic sintered bodies of Comparative Examples 1 to 4 were manufactured according to the method of the first embodiment (see FIG. 3A). Using the granules and molded bodies prepared in the same manner as in Example 1, the electrode built-in ceramic of Comparative Example 5 was manufactured according to the method of the second embodiment (see FIG. 3B).

表2には、各比較例の焼結体の特徴の測定結果がまとめて示されている。   Table 2 summarizes the measurement results of the characteristics of the sintered bodies of the comparative examples.

表2から次のことがわかる。比較例1のセラミックス焼結体において、載置面100の法線方向について、爪部212の高さが静電チャック電極21のサイズの1.0倍を超える1.4倍である。このため、成形体31〜33が重ね合わせられた状態で加圧される際、爪部212が成形体32に過度に食い込んで割れを生じさせ、その結果として第1電極21(正確にはその爪部212)の近傍において焼結体10に割れが生じている。   Table 2 shows the following. In the ceramic sintered body of Comparative Example 1, the height of the claw portion 212 is 1.4 times larger than 1.0 times the size of the electrostatic chuck electrode 21 in the normal direction of the mounting surface 100. For this reason, when the molded bodies 31 to 33 are pressed in a state of being overlaid, the claw portion 212 excessively bites into the molded body 32 to cause a crack, and as a result, the first electrode 21 (to be exact, In the vicinity of the claw 212), the sintered body 10 is cracked.

比較例2のセラミックス焼結体において、載置面100の法線方向について、爪部222の高さがヒータ電極22のサイズの1.0倍を超える1.2倍である。このため、爪部222が成形体33に食い込む際に当該爪部222に負荷がかかり、ヒータ電極22に割れが生じている(図4(b)参照)。同様に、比較例5のセラミックス焼結体において、載置面100の法線方向について、爪部212の高さが静電チャック電極21のサイズの1.0倍を超える1.5倍である。このため、爪部212が成形体32に食い込む際に当該爪部212に負荷がかかり、静電チャック電極21に割れが生じている(図4(b)参照)。   In the ceramic sintered body of Comparative Example 2, the height of the claw portion 222 is 1.2 times larger than 1.0 times the size of the heater electrode 22 in the normal direction of the mounting surface 100. For this reason, when the nail | claw part 222 bites into the molded object 33, the said nail | claw part 222 is loaded and the heater electrode 22 has cracked (refer FIG.4 (b)). Similarly, in the ceramic sintered body of Comparative Example 5, the height of the claw portion 212 is 1.5 times greater than 1.0 times the size of the electrostatic chuck electrode 21 in the normal direction of the mounting surface 100. . For this reason, when the nail | claw part 212 bites into the molded object 32, the said nail | claw part 212 is loaded and the electrostatic chuck electrode 21 is cracked (see FIG. 4B).

比較例3のセラミックス焼結体において、電極21および22のそれぞれに爪部が存在していない。このため、成形体31〜33が重ね合わせられた状態で加圧される際、電極21および22が載置面100に対して平行な方向に変位し、相対的ずれ量が0.04〜0.06[mm]の上限を大きく超えた1.15[mm]になっている。   In the ceramic sintered body of Comparative Example 3, there are no claws on each of the electrodes 21 and 22. For this reason, when it pressurizes in the state in which the molded objects 31-33 were piled up, the electrodes 21 and 22 are displaced in the direction parallel to the mounting surface 100, and the relative deviation | shift amount is 0.04-0. It is 1.15 [mm] which greatly exceeds the upper limit of 0.06 [mm].

比較例4のセラミックス焼結体において、電極21に爪部が存在していない。このため、成形体31〜33が重ね合わせられた状態で加圧される際、電極21が載置面100に対して平行な方向に変位し、相対的ずれ量が0.04〜0.06[mm]の上限を大きく超えた0.78[mm]になっている。   In the ceramic sintered body of Comparative Example 4, the electrode 21 has no claw portion. For this reason, when it pressurizes in the state in which the molded objects 31-33 were piled up, the electrode 21 displaces in the direction parallel to the mounting surface 100, and the relative deviation | shift amount is 0.04-0.06. It is 0.78 [mm] which greatly exceeds the upper limit of [mm].

10‥セラミックス焼結体、21‥静電チャック電極(第1電極)、22‥ヒータ電極(第2電極)、212‥爪部、222‥爪部。 DESCRIPTION OF SYMBOLS 10 ... Ceramic sintered body, 21 ... Electrostatic chuck electrode (1st electrode), 22 ... Heater electrode (2nd electrode), 212 ... Claw part, 222 ... Claw part.

Claims (8)

平面に沿って延在する電極が内蔵されているセラミックス焼結体であって、
前記平面の法線方向について、前記電極のサイズまたは厚さの1.0倍以下の高さを有する爪部が前記電極に設けられていることを特徴とする電極内蔵セラミックス焼結体。
A ceramic sintered body containing an electrode extending along a plane,
A ceramic sintered body with a built-in electrode, wherein a claw portion having a height of 1.0 times or less the size or thickness of the electrode is provided on the electrode in the normal direction of the plane.
請求項1記載の電極内蔵セラミックス焼結体において、
前記セラミックス焼結体がウエハを載置するための前記平面と平行な載置面を有し、前記爪部が前記載置面に対して反対方向に前記電極から延在または突出するように設けられていることを特徴とする電極内蔵セラミックス焼結体。
In the electrode-containing ceramic sintered body according to claim 1,
The ceramic sintered body has a mounting surface parallel to the plane for mounting a wafer, and the claw portion is provided so as to extend or protrude from the electrode in the opposite direction to the mounting surface. A ceramic sintered body with a built-in electrode, characterized in that
請求項2記載の電極内蔵セラミックス焼結体において、
前記電極が少なくとも前記セラミックス焼結体において前記載置面の側にプラズマを発生させるための電極または前記載置面に載置された前記ウエハを前記セラミックス焼結体に対して静電吸着させるための電極であることを特徴とする電極内蔵セラミックス焼結体。
In the electrode built-in ceramic sintered body according to claim 2,
In order for the electrode to electrostatically attract the electrode for generating plasma on the mounting surface side or the wafer placed on the mounting surface to the ceramic sintered body at least in the ceramic sintered body An electrode built-in ceramic sintered body characterized by being an electrode.
請求項1〜3のうちいずれか1つに記載の電極内蔵セラミックス焼結体において、
前記爪部が前記電極の縁部に設けられていることを特徴とする電極内蔵セラミックス焼結体。
In the electrode built-in ceramic sintered body according to any one of claims 1 to 3,
The electrode built-in ceramic sintered body, wherein the claw portion is provided at an edge of the electrode.
請求項1〜4のうちいずれか1つに記載の電極内蔵セラミックス焼結体において、
前記電極の中心を基準として複数の前記爪部が異なる方位にまたは等方的に配置されていることを特徴とする電極内蔵セラミックス焼結体。
In the electrode built-in ceramic sintered body according to any one of claims 1 to 4,
A ceramic sintered body with a built-in electrode, wherein the plurality of claw portions are arranged in different directions or isotropically with respect to the center of the electrode.
平面に沿って延在する電極が内蔵されているセラミックス焼結体の製造方法であって、
前記電極を間に挟むように複数のセラミックス成形体を前記平面の法線方向に重ねる、または、前記電極を一のセラミックス成形体に埋設する工程と、
前記複数のセラミックス成形体または前記一のセラミックス成形体を前記平面の法線方向について加圧しながら焼成する工程と、を含み、
前記電極がその厚さの1.0倍以下の高さを有する爪部を有することを特徴とする方法。
A method for producing a ceramic sintered body in which an electrode extending along a plane is incorporated,
Overlaying a plurality of ceramic molded bodies in the normal direction of the plane so as to sandwich the electrodes, or embedding the electrodes in one ceramic molded body,
Firing while pressing the plurality of ceramic molded bodies or the one ceramic molded body in the normal direction of the plane,
The electrode has a claw portion having a height of 1.0 times or less of the thickness.
請求項6記載の方法において、
金属板、金属箔、金属メッシュまたは金属線を加工して形状を調節し、かつ、当該加工時に生じたバリの高さを調節することにより前記爪部を形成することによって前記電極を作製する工程をさらに含んでいることを特徴とする方法。
The method of claim 6 wherein:
A step of producing the electrode by forming a claw portion by adjusting a shape by processing a metal plate, a metal foil, a metal mesh or a metal wire, and adjusting a height of a burr generated during the processing. A method characterized by further comprising:
請求項6または7記載の方法において、
前記セラミックス焼結体がウエハを載置するための前記平面と平行な載置面を有し、前記爪部が前記載置面に対して反対方向に前記電極から延在または突出するように前記複数のセラミックス成形体の間に挟まれるように配置されることを特徴とする方法。
The method according to claim 6 or 7, wherein
The ceramic sintered body has a mounting surface parallel to the plane for mounting a wafer, and the claw portion extends or protrudes from the electrode in a direction opposite to the mounting surface. A method characterized by being arranged to be sandwiched between a plurality of ceramic molded bodies.
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