JP2020177952A - Substrate holding member - Google Patents

Substrate holding member Download PDF

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JP2020177952A
JP2020177952A JP2019077303A JP2019077303A JP2020177952A JP 2020177952 A JP2020177952 A JP 2020177952A JP 2019077303 A JP2019077303 A JP 2019077303A JP 2019077303 A JP2019077303 A JP 2019077303A JP 2020177952 A JP2020177952 A JP 2020177952A
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substrate
convex
main surface
holding member
convex portion
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JP7307582B2 (en
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貴志 手島
Takashi Tejima
貴志 手島
教夫 小野寺
Norio Onodera
教夫 小野寺
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Niterra Co Ltd
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NGK Spark Plug Co Ltd
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Abstract

To provide a substrate holding member capable of avoiding false recognition of a negative pressure state in the vacuum suction of a substrate, while achieving a reduction in a contact area between multiple projecting portions and the substrate, a suppression in generation of particles, and an improvement in substrate flatness.SOLUTION: Each of a plurality of projecting portions 10 projecting from a first main surface 101 of a substrate 1 includes: first projecting elements 111, 121; and second projecting elements 112, 122 projecting from end surfaces 1110, 1210 of the respective first projecting elements 111, 121, respectively, the second projecting elements having respective end surfaces 1120, 1220 with a smaller area than the end surfaces. Some projecting portions of the plurality of projecting portions 10 are formed as a second projecting portion 12 that is an expanded projecting portion where the volume of the first projecting element is larger than that of each of first projecting portions 11 that are other projecting portions.SELECTED DRAWING: Figure 3

Description

本発明は、半導体ウエハなどの基板を真空吸着保持するために用いられる基板保持部材に関する。 The present invention relates to a substrate holding member used for vacuum suction holding a substrate such as a semiconductor wafer.

半導体製造プロセスなどにおいて、基板を保持するために基体の表面に多数の凸部(ピン)を有し、基板の裏面と基体の表面の空間を真空排気することにより基板を保持する基板保持部材が知られている。
基体表面に形成された凸部は基板と直接的に接触する部分であり、凸部と基板との間にパーティクルが介在してしまうと、基板に局所的な盛り上がりが生じ、基板の面精度の悪化およびデフォーカスエラーの発生を招来する。近年、半導体の微細化及び高密度化が進んでおり、基板の面精度の悪化は歩留まりの低下に直接的に影響するため基板の面精度に対して高い精度が要求されている。
そこで、基体と基板との接触を原因とするパーティクル発生を極力少なくするための対策として、凸部の数の減少または先細り形状の凸部の設計などにより凸部と基板との接触面積を低減することが知られている(例えば、特許文献1参照)。
In a semiconductor manufacturing process or the like, a substrate holding member that has a large number of protrusions (pins) on the surface of a substrate to hold the substrate and holds the substrate by vacuum exhausting the space between the back surface of the substrate and the surface of the substrate. Are known.
The convex portion formed on the surface of the substrate is a portion that comes into direct contact with the substrate, and if particles intervene between the convex portion and the substrate, local swelling occurs on the substrate and the surface accuracy of the substrate is improved. It causes deterioration and occurrence of defocus error. In recent years, semiconductors have become finer and higher in density, and deterioration of the surface accuracy of the substrate directly affects the decrease in yield, so that high accuracy is required for the surface accuracy of the substrate.
Therefore, as a measure to minimize the generation of particles caused by the contact between the substrate and the substrate, the contact area between the convex portion and the substrate is reduced by reducing the number of convex portions or designing the tapered convex portion. It is known (see, for example, Patent Document 1).

特開平10−242255号公報Japanese Unexamined Patent Publication No. 10-242255

しかし、凸部の過度の細径化は、凸部の強度が低下するため、凸部の先端部の損傷によるパーティクル発生を誘発する可能性がある。さらに、凸部の数の減少および凸部の細径化の分だけ、基板保持部材とこれに載置された基板とにより画定された空間の体積が増大する。このため、当該空間における負圧状態の発現が遅延し、当該空間の真空発現状態に異常が生じたと判断されて真空吸引装置の動作が停止される場合もある。 However, excessive reduction in the diameter of the convex portion reduces the strength of the convex portion, which may induce particle generation due to damage to the tip portion of the convex portion. Further, the volume of the space defined by the substrate holding member and the substrate mounted on the substrate holding member increases by the amount of the decrease in the number of the convex portions and the reduction in the diameter of the convex portions. Therefore, the expression of the negative pressure state in the space may be delayed, and it may be determined that an abnormality has occurred in the vacuum expression state in the space, and the operation of the vacuum suction device may be stopped.

そこで、本発明は、複数の凸部と基板との接触面積の低減およびパーティクルの発生の抑制を図りながら、基板の真空吸引時における真空発現状態の誤認識を回避することができる基板保持部材を提供することを目的とする。 Therefore, the present invention provides a substrate holding member capable of avoiding erroneous recognition of a vacuum development state during vacuum suction of a substrate while reducing the contact area between a plurality of convex portions and the substrate and suppressing the generation of particles. The purpose is to provide.

本発明の基板保持部材は、基体と、前記基体の主面から突出する複数の凸部と、前記基体の内部を通り、前記基体の主面に開口部を有する少なくとも1つの通気経路と、前記基体の主面から突出し、前記複数の凸部および前記通気経路の開口部を取り囲む環状凸部と、を備える基板保持部材であって、前記複数の凸部のそれぞれが、前記基体の主面から突出している第1凸要素と、前記第1凸要素の端面から突出している、当該第1凸要素の端面より小面積の端面を有する第2凸要素と、を備え、前記複数の凸部のうち一部の凸部が、その他の凸部と比較して前記第1凸要素の体積が大きい拡大凸部として形成されていることを特徴とする。 The substrate holding member of the present invention includes a substrate, a plurality of convex portions protruding from the main surface of the substrate, at least one ventilation path that passes through the inside of the substrate and has an opening in the main surface of the substrate, and the above-mentioned A substrate holding member including the plurality of convex portions and an annular convex portion surrounding the opening of the ventilation path, which protrudes from the main surface of the substrate, and each of the plurality of convex portions is from the main surface of the substrate. A first convex element that protrudes and a second convex element that protrudes from the end face of the first convex element and has an end face having a smaller area than the end face of the first convex element. A part of the convex portion is formed as an enlarged convex portion having a larger volume of the first convex element than the other convex portion.

当該構成の基板保持部材によれば、基板が基板保持部材の主面側に載置され、基体の主面と基板の裏面とにより画定される空間が通気経路を通じて真空吸引されて負圧領域が形成されることにより、基板の裏面が複数の凸部のそれぞれの端面に接触した状態で基板が基板保持部材により保持される。各凸部が、基体の主面から突出している第1凸要素と、第1凸要素の端面から突出し、第1凸要素の端面よりも小面積の端面を有している第2凸要素と、により構成されている。このため、基板と各凸部との接触面積の低減を図りながら、各凸部の強度の向上が図られている。 According to the substrate holding member having this configuration, the substrate is placed on the main surface side of the substrate holding member, and the space defined by the main surface of the substrate and the back surface of the substrate is vacuum sucked through the ventilation path to create a negative pressure region. By being formed, the substrate is held by the substrate holding member in a state where the back surface of the substrate is in contact with each end surface of the plurality of convex portions. A first convex element in which each convex portion protrudes from the main surface of the substrate, and a second convex element that protrudes from the end surface of the first convex element and has an end surface having a smaller area than the end surface of the first convex element. , Consists of. Therefore, the strength of each convex portion is improved while reducing the contact area between the substrate and each convex portion.

複数の凸部のうち一部の凸部が選択的に拡大凸部、すなわち他の凸部と比較して第1凸要素の体積が大きい凸部として形成されている。このため、凸部と基板との接触面積のさらなる低減のために複数の凸部の数の減少を図りながらも、基体の主面と基板の裏面とにより画定される空間の体積の増大が抑制または回避され、当該空間の真空発現状態に異常が生じたと誤認識される事態が回避される。 A part of the convex portions among the plurality of convex portions is selectively formed as an enlarged convex portion, that is, a convex portion having a larger volume of the first convex element as compared with the other convex portions. Therefore, while reducing the number of a plurality of convex portions in order to further reduce the contact area between the convex portions and the substrate, the increase in the volume of the space defined by the main surface of the substrate and the back surface of the substrate is suppressed. Alternatively, it is avoided, and the situation where it is erroneously recognized that an abnormality has occurred in the vacuum expression state of the space is avoided.

本発明の基板保持部材において、前記基体の主面において、一または複数の前記拡大凸部が、前記通気経路の開口部の周辺に形成されていることが好ましい。ここで、通気経路の開口部の周辺とは、例えば、開口部の開口縁から4mm以内の領域を意味する。 In the substrate holding member of the present invention, it is preferable that one or more of the enlarged convex portions are formed around the opening of the ventilation path on the main surface of the substrate. Here, the periphery of the opening of the ventilation path means, for example, a region within 4 mm from the opening edge of the opening.

当該構成の基板保持部材によれば、通気経路の開口部の周辺に配置された複数の拡大凸部、特に当該拡大凸部を構成する第1凸要素によって、基体の主面と基板の裏面とにより画定される空間のうち、通気経路の開口部の周囲の少なくとも一の方位範囲の流体抵抗の増大が図られる。このため、当該空間の真空吸引時、特に初期段階において、当該空間の流体抵抗が過小であることに由来して真空発現状態に異常が生じたと誤認識される事態が回避される。 According to the substrate holding member having this configuration, a plurality of enlarged convex portions arranged around the opening of the ventilation path, particularly the first convex element constituting the enlarged convex portion, causes the main surface of the substrate and the back surface of the substrate to be formed. In the space defined by, the fluid resistance in at least one directional range around the opening of the ventilation path is increased. Therefore, at the time of vacuum suction in the space, especially in the initial stage, it is possible to avoid a situation in which it is erroneously recognized that an abnormality has occurred in the vacuum expression state due to the insufficient fluid resistance in the space.

本発明の基板保持部材において、前記基体の主面において、前記複数の拡大凸部が、前記通気経路の開口部を取り囲むように形成されていることが好ましい。 In the substrate holding member of the present invention, it is preferable that the plurality of enlarged convex portions are formed on the main surface of the substrate so as to surround the opening of the ventilation path.

当該構成の基板保持部材によれば、通気経路の開口部を取り囲むように配置された複数の拡大凸部、特に当該拡大凸部を構成する第1凸要素によって、基体の主面と基板の裏面とにより画定される空間のうち、通気経路の開口部の周囲の複数の方位範囲の流体抵抗の増大が図られる。このため、当該空間の真空吸引時、特に初期段階において、当該空間の流体抵抗が過小であることに由来して真空発現状態に異常が生じたと誤認識される事態がより確実に回避される。 According to the substrate holding member having the configuration, the main surface of the substrate and the back surface of the substrate are formed by a plurality of enlarged convex portions arranged so as to surround the opening of the ventilation path, particularly the first convex element constituting the enlarged convex portion. In the space defined by the above, the fluid resistance in a plurality of directional ranges around the opening of the ventilation path is increased. Therefore, at the time of vacuum suction in the space, especially in the initial stage, a situation in which it is erroneously recognized that an abnormality has occurred in the vacuum expression state due to the insufficient fluid resistance in the space can be more reliably avoided.

本発明の基板保持部材において、前記基体の主面において前記複数の凸部および前記通気経路の開口部を取り囲むように延在し、前記基体の主面から突出する外側環状凸部をさらに備え、前記基体の主面において、前記拡大凸部は、前記基体の主面から突出し、前記外側環状凸部の内側で前記通気経路の開口部を取り囲む内側環状凸部としての前記第1凸要素と前記第1凸要素の端面から突出している複数の第2凸要素とを有していることが好ましい。 The substrate holding member of the present invention further includes an outer annular convex portion extending from the main surface of the substrate so as to surround the plurality of protrusions and the opening of the ventilation path and projecting from the main surface of the substrate. On the main surface of the substrate, the enlarged convex portion protrudes from the main surface of the substrate, and the first convex element as an inner annular convex portion that surrounds the opening of the ventilation path inside the outer annular convex portion and the first convex element. It is preferable to have a plurality of second convex elements protruding from the end surface of the first convex element.

当該構成の基板保持部材によれば、通気経路の開口部の周辺に配置された複数の拡大凸部、特に複数の拡大凸部に共有の第1凸要素としての内側環状凸部によって、基体の主面と基板の裏面とにより画定される空間のうち、通気経路の開口部の周囲の全方位範囲の流体抵抗の増大が図られる。このため、当該空間の真空吸引時、特に初期段階において、当該空間の流体抵抗が過小であることに由来して真空発現状態に異常が生じたと誤認識される事態がさらに確実に回避される。 According to the substrate holding member having this configuration, the substrate is provided with a plurality of enlarged convex portions arranged around the opening of the ventilation path, particularly an inner annular convex portion as a first convex element shared by the plurality of enlarged convex portions. In the space defined by the main surface and the back surface of the substrate, the fluid resistance in the omnidirectional range around the opening of the ventilation path is increased. Therefore, at the time of vacuum suction in the space, especially in the initial stage, a situation in which it is erroneously recognized that an abnormality has occurred in the vacuum expression state due to the insufficient fluid resistance in the space can be more reliably avoided.

本発明の一実施形態としての基板保持部材の上面図。Top view of the substrate holding member as one embodiment of the present invention. 図1のII−II線に沿った基板保持部材の縦断面図。The vertical sectional view of the substrate holding member along the line II-II of FIG. 拡大凸部およびその他の凸部の構成に関する説明図。Explanatory drawing about composition of enlarged convex part and other convex part. 通気経路の開口部に対する拡大凸部の配置態様に関する説明図。Explanatory drawing about arrangement mode of the enlarged convex part with respect to the opening of a ventilation path. 拡大凸部の変形例に関する説明図。Explanatory drawing about the deformation example of the enlarged convex part.

(第1実施形態) (First Embodiment)

(構成)
図1および図2に示されている本発明の一実施形態としての基板保持部材は、基体1と、基体1の第1主面101から突出する複数の凸部10と、基体1の内部を通り、基体1の第1主面に開口部20を有する通気経路2と、基体1の第1主面101から突出する複数の凸部10および通気経路2の開口部20を取り囲む外側環状凸部14と、を備えている。
(Constitution)
The substrate holding member as an embodiment of the present invention shown in FIGS. 1 and 2 includes a substrate 1, a plurality of convex portions 10 protruding from the first main surface 101 of the substrate 1, and the inside of the substrate 1. A ventilation path 2 having an opening 20 on the first main surface of the substrate 1, a plurality of convex portions 10 protruding from the first main surface 101 of the substrate 1, and an outer annular convex portion surrounding the opening 20 of the ventilation path 2. It is equipped with 14.

基体1は、略円板形状のSiC、AlNまたはAl23等のセラミックス焼結体からなる。複数の凸部10、外側環状凸部14および通気経路2のそれぞれは、研削加工、ブラスト加工、ミリング加工もしくはレーザー加工またはこれらの組み合わせにより形成される。基体1の第1主面101および第2主面102のそれぞれは略平面状に形成されている。 The substrate 1 is made of a substantially disk-shaped ceramic sintered body such as SiC, AlN or Al 2 O 3 . Each of the plurality of convex portions 10, the outer annular convex portion 14, and the ventilation path 2 is formed by grinding, blasting, milling, laser processing, or a combination thereof. Each of the first main surface 101 and the second main surface 102 of the substrate 1 is formed in a substantially planar shape.

複数の凸部10のそれぞれは、大径の円柱の上に小径の円柱が同心に重なったような形状である。複数の凸部10は、基体1の第1主面101において三角格子もしくは正方格子等の格子の格子点を構成するように配置されるほか、複数の同心円のそれぞれに沿って配置され、あるいは、中心から延在する複数の放射線のそれぞれに沿って規則的に配置される等、規則的に配置されてもよく、不規則的に配置されていてもよい。複数の凸部10のうち、一の凸部群を構成する凸部10(例えば、通気経路2の開口部20の周囲に近接して配置された複数の凸部10)の配置態様または規則性と、当該一の群とは異なる他の凸部群(例えば、通気経路2の開口部20の周囲から離間して配置された複数の凸部10)を構成する凸部10の配置態様または規則性と、が相違していてもよい。 Each of the plurality of convex portions 10 has a shape in which a small-diameter cylinder is concentrically overlapped on a large-diameter cylinder. The plurality of convex portions 10 are arranged so as to form lattice points of a lattice such as a triangular lattice or a square lattice on the first main surface 101 of the substrate 1, and are arranged along each of the plurality of concentric circles, or It may be arranged regularly, such as being arranged regularly along each of a plurality of radiations extending from the center, or may be arranged irregularly. Of the plurality of convex portions 10, the arrangement mode or regularity of the convex portions 10 (for example, the plurality of convex portions 10 arranged close to the periphery of the opening 20 of the ventilation path 2) constituting one convex portion group. And the arrangement mode or rule of the convex portion 10 constituting another convex portion group different from the one group (for example, a plurality of convex portions 10 arranged apart from the periphery of the opening 20 of the ventilation path 2). Gender may be different.

複数の凸部10のそれぞれは、第1凸部11および第2凸部12に区分されて形成されている(図3参照)。第1凸部11は、基体1の第1主面101から突出している略円柱状の第1凸要素111と、第1凸要素111の端面1110から突出し、当該第1凸要素111の端面1110より小面積の端面1120を有する略円柱状の第2凸要素112と、を備えている。第2凸部12は、基体1の第1主面101から突出している略円柱状の第1凸要素121と、第1凸要素121の端面1210から突出し、当該第1凸要素121の端面1210より小面積の端面1220を有する略円柱状の第2凸要素122と、を備えている。 Each of the plurality of convex portions 10 is divided into a first convex portion 11 and a second convex portion 12 (see FIG. 3). The first convex portion 11 protrudes from the substantially columnar first convex element 111 protruding from the first main surface 101 of the substrate 1 and the end surface 1110 of the first convex element 111, and the end surface 1110 of the first convex element 111. It includes a substantially columnar second convex element 112 having a smaller area end face 1120. The second convex portion 12 protrudes from the substantially columnar first convex element 121 protruding from the first main surface 101 of the substrate 1 and the end surface 1210 of the first convex element 121, and the end surface 1210 of the first convex element 121. It includes a substantially columnar second convex element 122 having a smaller area end face 1220.

第1凸部11の第1凸要素111の高さH111および第2凸要素112の高さH112のそれぞれと、第2凸部12の第1凸要素121の高さH121および第2凸要素122の高さH122のそれぞれと、は等しい。すなわち、第1凸部11の高さH11(第1主面101からの突出量)と、第2凸部12の高さH12と、は等しい。 The height H111 of the first convex element 111 of the first convex portion 11 and the height H112 of the second convex element 112, and the height H121 and the second convex element 122 of the first convex element 121 of the second convex portion 12, respectively. Are equal to each of the heights H122 of. That is, the height H11 of the first convex portion 11 (the amount of protrusion from the first main surface 101) and the height H12 of the second convex portion 12 are equal.

第1凸部11の第2凸要素112の径W112と、第2凸部12の第2凸要素122の径W122と、は等しい。その一方、第1凸部11の第1凸要素111の径W111は、第2凸部12の第1凸要素121の径W121よりも小さい。これにより、拡大凸部としての第2凸部12の第1凸要素121の体積(=π(W121)2×(H121))は、その他の凸部としての第1凸部11の第1凸要素111の体積(=π(W111)2×(H111))よりも大きい。 The diameter W112 of the second convex element 112 of the first convex portion 11 and the diameter W122 of the second convex element 122 of the second convex portion 12 are equal. On the other hand, the diameter W111 of the first convex element 111 of the first convex portion 11 is smaller than the diameter W121 of the first convex element 121 of the second convex portion 12. As a result, the volume of the first convex element 121 of the second convex portion 12 as the enlarged convex portion (= π (W121) 2 × (H121)) becomes the first convex of the first convex portion 11 as the other convex portion. It is larger than the volume of element 111 (= π (W111) 2 × (H111)).

「W111<W121かつH111=H121」という関係のほか、「W111=W121かつH111<H121」、「W111<W121かつH111<H121」、「W111<W121かつH111>H121」または「W111>W121かつH111<H121」という関係にしたがって、第2凸部12の第1凸要素121の体積が第1凸部11の第1凸要素111の体積よりも大きくされてもよい。 In addition to the relationship of "W111 <W121 and H111 = H121", "W111 = W121 and H111 <H121", "W111 <W121 and H111 <H121", "W111 <W121 and H111> H121" or "W111> W121 and H111" According to the relationship <H121 ", the volume of the first convex element 121 of the second convex portion 12 may be larger than the volume of the first convex element 111 of the first convex portion 11.

第1凸部11および第2凸部12のそれぞれは、大径の円柱(第1凸要素111、121)の上に小径の円柱(第2凸要素112、122)が同心に重ねられたような形状のほか、円柱、角柱、円錐台および角錐台が任意に組み合わせられて重ねられたようなその他の形状など様々な形状であってもよい。第1凸部11の第1凸要素111の上端面と、略錐台状の第2凸要素112の下端面とが同一であって、第1凸要素111および第2凸要素112の連続箇所において、第1凸部11が段差を有していなくてもよい。第2凸部12の第1凸要素121の上端面と、略錐台状の第2凸要素122の下端面とが同一であって、第1凸要素121および第2凸要素122の連続箇所において、第2凸部12が段差を有していなくてもよい。 In each of the first convex portion 11 and the second convex portion 12, it seems that a small diameter cylinder (second convex elements 112, 122) is concentrically superposed on a large diameter cylinder (first convex elements 111, 121). It may have various shapes such as a cylinder, a prism, a truncated cone, and another shape in which a truncated cone is arbitrarily combined and stacked. The upper end surface of the first convex element 111 of the first convex portion 11 and the lower end surface of the substantially frustum-shaped second convex element 112 are the same, and the continuous portion of the first convex element 111 and the second convex element 112. The first convex portion 11 does not have to have a step. The upper end surface of the first convex element 121 of the second convex portion 12 and the lower end surface of the second convex element 122 having a substantially frustum shape are the same, and the continuous portion of the first convex element 121 and the second convex element 122. The second convex portion 12 does not have to have a step.

図4に示されているように、基体1の第1主面101において、通気経路2の開口部20を基準として広がる略円形の第1領域S1に含まれている複数(例えば6個)の凸部10のうち少なくとも1つが第2凸部12として形成されている。基体1の第1主面101において、通気経路2の開口部20を基準として広がる第1領域S1よりも大径の略円形の第2領域S2に含まれている複数(18個)の凸部10のうち少なくとも1つが第2凸部12として形成されていてもよい。 As shown in FIG. 4, a plurality (for example, 6 pieces) included in the substantially circular first region S1 extending with reference to the opening 20 of the ventilation path 2 on the first main surface 101 of the substrate 1. At least one of the convex portions 10 is formed as the second convex portion 12. On the first main surface 101 of the substrate 1, a plurality of (18) convex portions included in the second region S2 having a diameter larger than that of the first region S1 extending with reference to the opening 20 of the ventilation path 2. At least one of 10 may be formed as the second convex portion 12.

基板保持部材の縦断面図において外側環状凸部14の形状が略矩形状のほか、略台形状、半楕円形状、半円形状、または、矩形と当該矩形の一辺を直径とする半円形とが組み合わせられた形状など、様々な形状であってもよい。なお、外側環状凸部14が省略されてもよい。基体1の第1主面101を基準とした外側環状凸部14の上端面140の高さ位置(第1主面101からの突出量)が、第1凸部11の上端面1120および第2凸部12の上端面1220の高さ位置よりも低くまたは同一に設計されている。 In the vertical cross-sectional view of the substrate holding member, the outer annular convex portion 14 has a substantially rectangular shape, a substantially trapezoidal shape, a semi-elliptical shape, a semicircular shape, or a rectangular shape and a semicircular shape having one side of the rectangular shape as a diameter. It may have various shapes such as a combined shape. The outer annular convex portion 14 may be omitted. The height position of the upper end surface 140 of the outer annular convex portion 14 with respect to the first main surface 101 of the substrate 1 (the amount of protrusion from the first main surface 101) is the upper end surface 1120 and the second of the first convex portion 11. It is designed to be lower or the same as the height position of the upper end surface 1220 of the convex portion 12.

基体1には、中心に配置された1つの通気経路2の開口部20と、その外側で中心を基準とした6回対称性を有するように配置されている6つの通気経路2の開口部20と、が形成されている。通気経路20は、基体1の第1主面101から第2主面102に達するまで、基体1を貫通する略円柱状の孔により構成されている。通気経路2の個数および配置態様ならびに延在態様は任意に設計変更されてもよい。例えば、通気経路2が、基体1の第1主面101に垂直な平面を基準とした鏡像対称性を有するように配置されてもよく、回転対称性または鏡像対称性を有しないように非対称的に配置されてもよい。 The substrate 1 has an opening 20 of one ventilation path 2 arranged in the center and an opening 20 of six ventilation paths 2 arranged so as to have six-fold symmetry with respect to the center on the outside thereof. And are formed. The ventilation path 20 is composed of substantially columnar holes penetrating the substrate 1 from the first main surface 101 to the second main surface 102 of the substrate 1. The number, arrangement, and extension of the ventilation paths 2 may be arbitrarily redesigned. For example, the ventilation path 2 may be arranged so as to have mirror image symmetry with respect to a plane perpendicular to the first main surface 101 of the substrate 1, and is asymmetric so as not to have rotational symmetry or mirror image symmetry. May be placed in.

なお、図面では基板保持部材が概略的に表されており、当該基板保持部材の構成要素のアスペクト比、間隔、個数などは、原則的に実際の設計値とは異なっている。これは、すべての実施形態において同様である。 In the drawings, the substrate holding members are schematically shown, and the aspect ratio, spacing, number, and the like of the components of the substrate holding member are in principle different from the actual design values. This is the same in all embodiments.

(機能)
本発明の一実施形態としての基板保持部材によれば、基板Wが基板保持部材の第1主面101の側に載置され、基体1の第1主面101と基板Wの裏面とにより画定される空間が通気経路2を通じて真空吸引されて負圧領域が形成されることにより、基板Wの裏面が複数の凸部10のそれぞれの端面に接触した状態で基板Wが基板保持部材により保持される(図1および図2参照)。第1凸部11が、基体1の第1主面101から突出している第1凸要素111と、第1凸要素111の端面1110から突出し、第1凸要素111の端面1110よりも小面積の端面1120を有している第2凸要素112と、により構成されている(図3参照)。第2凸部12が、基体1の第1主面101から突出している第1凸要素121と、第1凸要素121の端面1210から突出し、第1凸要素121の端面1210よりも小面積の端面1220を有している第2凸要素122と、により構成されている(図3参照)。このため、基板Wと各凸部11、12との接触面積の低減を図りながら、各凸部11、12の強度の向上が図られている。凸部10の上端面に基板Wを均一に当接させることができ、基板保持部材に吸着保持されている際の基板Wの平面度の向上が図られる。そして、基板Wの表面(上面)において、所望のパターンの回路形成のための露光処理など、所定の処理が実施されうる。
(function)
According to the substrate holding member as one embodiment of the present invention, the substrate W is placed on the side of the first main surface 101 of the substrate holding member, and is defined by the first main surface 101 of the substrate 1 and the back surface of the substrate W. The space to be formed is vacuum-sucked through the ventilation path 2 to form a negative pressure region, so that the substrate W is held by the substrate holding member in a state where the back surface of the substrate W is in contact with each end surface of the plurality of convex portions 10. (See FIGS. 1 and 2). The first convex portion 11 protrudes from the first convex element 111 protruding from the first main surface 101 of the substrate 1 and the end surface 1110 of the first convex element 111, and has a smaller area than the end surface 1110 of the first convex element 111. It is composed of a second convex element 112 having an end face 1120 (see FIG. 3). The second convex portion 12 protrudes from the first convex element 121 projecting from the first main surface 101 of the substrate 1 and the end surface 1210 of the first convex element 121, and has a smaller area than the end surface 1210 of the first convex element 121. It is composed of a second convex element 122 having an end face 1220 (see FIG. 3). Therefore, the strength of the convex portions 11 and 12 is improved while reducing the contact area between the substrate W and the convex portions 11 and 12. The substrate W can be uniformly brought into contact with the upper end surface of the convex portion 10, and the flatness of the substrate W when it is attracted and held by the substrate holding member can be improved. Then, on the surface (upper surface) of the substrate W, a predetermined process such as an exposure process for forming a circuit of a desired pattern can be performed.

複数の凸部10のうち一部の凸部である第2凸部12(拡大凸部)の第1凸要素121の体積が、他の凸部である第1凸部11の第1凸要素111の体積よりも大きい。このため、凸部10と基板Wとの接触面積のさらなる低減のために複数の凸部10の数の減少を図りながらも、基体1の第1主面101と基板Wの裏面とにより画定される空間の体積の増大が抑制または回避され、当該空間の真空発現状態に異常が生じたと誤認識される事態が回避される。特に、通気経路2の開口部20の周辺に配置された複数の第2凸部12(図4参照)、特に当該第2凸部12を構成する第1凸要素121によって、基体1の第1主面101と基板Wの裏面とにより画定される空間のうち、通気経路2の開口部20の周囲の一または複数の方位範囲の流体抵抗の増大が図られる。このため、当該空間の真空吸引時、特に初期段階において、当該空間の流体抵抗が過小であることに由来して真空発現状態に異常が生じたと誤認識される事態が回避される。 The volume of the first convex element 121 of the second convex portion 12 (enlarged convex portion) which is a partial convex portion of the plurality of convex portions 10 is the volume of the first convex element of the first convex portion 11 which is another convex portion. It is larger than the volume of 111. Therefore, while reducing the number of the plurality of convex portions 10 in order to further reduce the contact area between the convex portions 10 and the substrate W, the first main surface 101 of the substrate 1 and the back surface of the substrate W are defined. The increase in the volume of the space is suppressed or avoided, and the situation in which it is erroneously recognized that an abnormality has occurred in the vacuum development state of the space is avoided. In particular, a plurality of second convex portions 12 (see FIG. 4) arranged around the opening 20 of the ventilation path 2, particularly the first convex element 121 constituting the second convex portion 12, causes the first of the substrate 1. In the space defined by the main surface 101 and the back surface of the substrate W, the fluid resistance in one or more directional ranges around the opening 20 of the ventilation path 2 is increased. Therefore, at the time of vacuum suction in the space, especially in the initial stage, it is possible to avoid a situation in which it is erroneously recognized that an abnormality has occurred in the vacuum expression state due to the insufficient fluid resistance in the space.

(実施例) (Example)

(実施例1)
基体1として、径φ300mm、厚さ5mmの略円盤状の炭化珪素焼結体からなる基体が準備された。基体1の第1主面101には、基体1の第1主面101の全体にわたり均一の密度となるように、間隔2.0mmの三角格子状に19900個の凸部10が配置された。第1凸部11は、径φ0.5mm、高さ0.25mmの略円柱状の第1凸要素111の上に、径φ0.2mm、高さ0.05mmの略円柱状の第2凸要素112が同心に重ねられたような段差付き円柱状に形成された。第2凸部12は、径φ1.0mm、高さ0.25mmの略円柱状の第1凸要素121の上に、径φ0.2mm、高さ0.05mmの略円柱状の第2凸要素122が同心に重ねられたような段差付き円柱状に形成された。
(Example 1)
As the substrate 1, a substrate made of a substantially disk-shaped silicon carbide sintered body having a diameter of φ300 mm and a thickness of 5 mm was prepared. On the first main surface 101 of the substrate 1, 19900 convex portions 10 are arranged in a triangular lattice pattern with an interval of 2.0 mm so as to have a uniform density over the entire first main surface 101 of the substrate 1. The first convex portion 11 is formed on a substantially cylindrical first convex element 111 having a diameter of φ0.5 mm and a height of 0.25 mm, and a substantially cylindrical second convex element having a diameter of φ0.2 mm and a height of 0.05 mm. It was formed in a stepped columnar shape in which 112 were concentrically stacked. The second convex portion 12 is a substantially cylindrical second convex element 121 having a diameter of φ0.2 mm and a height of 0.05 mm on a substantially cylindrical first convex element 121 having a diameter of φ1.0 mm and a height of 0.25 mm. The 122 was formed in a stepped columnar shape as if they were concentrically stacked.

基体1の第1主面101において、複数の凸部10を取り囲む内径φ299mm、幅0.5mm、高さ0.3mmの外側環状凸部14が形成された。基体1の第1主面101において、中心からの距離が異なる3つの円環状のそれぞれに沿って中心を基準として6回対称性を有するように配置された18個の径φ1.0mmの通気経路2の開口部20が形成された。ここで、各通気経路2の開口部20を基準とする略円形状の第1領域S1(図4 参照)に含まれ、当該開口部20を取り囲むように同心円上に配置されている6個(合計 108個)の凸部10のみが第2凸部12として形成された。
これにより、実施例1の基板保持装置が作製された。この場合、径φ300mmの円盤状の基板Wの裏面の面積に対する、複数の凸部10の上端面の面積の比率である接触面積比率は0.90%であった。真空ポンプを作動させ、基板保持部材の第1主面101と基板Wとの間の空間が真空吸引されることにより、複数の凸部10の先端部が損傷することなく当該基板Wが高い平面度で基板保持部材により吸着保持された。真空ポンプの作動開始から0.3秒経過しても圧力が−50kPaよりも大きいときに真空発現状態に異常が発生したと検知されるが、実施例1では真空吸引の際に異常が検知されることはなかった。
On the first main surface 101 of the substrate 1, an outer annular convex portion 14 having an inner diameter of φ299 mm, a width of 0.5 mm, and a height of 0.3 mm was formed so as to surround the plurality of convex portions 10. On the first main surface 101 of the substrate 1, 18 ventilation paths having a diameter of φ1.0 mm arranged so as to have 6-fold symmetry with respect to the center along each of three annular rings having different distances from the center. The opening 20 of 2 was formed. Here, six pieces (see FIG. 4) included in a substantially circular first region S1 (see FIG. 4) with reference to the opening 20 of each ventilation path 2 and arranged concentrically so as to surround the opening 20 (see FIG. 4). Only the convex portions 10 (108 in total) were formed as the second convex portions 12.
As a result, the substrate holding device of Example 1 was manufactured. In this case, the contact area ratio, which is the ratio of the area of the upper end surfaces of the plurality of convex portions 10 to the area of the back surface of the disk-shaped substrate W having a diameter of φ300 mm, was 0.90%. By operating the vacuum pump and vacuum-sucking the space between the first main surface 101 of the substrate holding member and the substrate W, the substrate W is a high flat surface without damaging the tips of the plurality of convex portions 10. It was adsorbed and held by the substrate holding member. Even if 0.3 seconds have passed from the start of operation of the vacuum pump, it is detected that an abnormality has occurred in the vacuum development state when the pressure is higher than -50 kPa, but in Example 1, an abnormality is detected during vacuum suction. It never happened.

(実施例2)
各通気経路2の開口部20を基準とする略円形状の第2領域S2(図4参照)に含まれ、当該開口部20を取り囲むように、中心からの距離が異なる3つの同心円上に6個ずつ配置されている18個(合計324個)の凸部10のみが第2凸部12として形成された。各吸引経路2の開口部20を取り囲むように配置されている18個の第2凸部12のうち、開口部20に最も近い(第1領域S1に含まれる)円上に配置されている6個の第2凸部12は、径φ1.0mm、高さ0.25mmの略円柱状の第1凸要素121の上に、径φ0.2mm、高さ0.05mmの略円柱状の第2凸要素122が同心に重ねられたような段差付き円柱状に形成された。開口部20に2番目に近い円上に配置されている6個の第2凸部12は、径φ0.9mm、高さ0.25mmの略円柱状の第1凸要素121の上に、径φ0.2mm、高さ0.05mmの略円柱状の第2凸要素122が同心に重ねられたような段差付き円柱状に形成された。開口部20から最も遠い円上に配置されている6個の第2凸部12は、径φ0.8mm、高さ0.25mmの略円柱状の第1凸要素121の上に、径φ0.2mm、高さ0.05mmの略円柱状の第2凸要素122が同心に重ねられたような段差付き円柱状に形成された。
(Example 2)
6 on three concentric circles that are included in the substantially circular second region S2 (see FIG. 4) with respect to the opening 20 of each ventilation path 2 and have different distances from the center so as to surround the opening 20. Only 18 convex portions 10 (324 in total) arranged one by one were formed as the second convex portions 12. Of the 18 second convex portions 12 arranged so as to surround the opening 20 of each suction path 2, 6 arranged on the circle closest to the opening 20 (included in the first region S1). The second convex portion 12 has a substantially cylindrical second convex element 121 having a diameter of φ0.2 mm and a height of 0.05 mm on the first convex element 121 having a diameter of φ1.0 mm and a height of 0.25 mm. The convex elements 122 were formed in a stepped columnar shape as if they were concentrically stacked. The six second convex portions 12 arranged on the circle second closest to the opening 20 have a diameter on the substantially cylindrical first convex element 121 having a diameter of 0.9 mm and a height of 0.25 mm. A substantially cylindrical second convex element 122 having a diameter of 0.2 mm and a height of 0.05 mm was formed into a stepped columnar shape as if they were concentrically overlapped. The six second convex portions 12 arranged on the circle farthest from the opening 20 have a diameter of φ0. On a substantially cylindrical first convex element 121 having a diameter of φ0.8 mm and a height of 0.25 mm. A substantially cylindrical second convex element 122 having a height of 2 mm and a height of 0.05 mm was formed into a stepped columnar shape as if they were concentrically overlapped.

そのほかは実施例1と同様の条件で実施例2の基板保持部材2が作製された。実施例1と同様に、真空ポンプを作動させ、基板保持部材の第1主面101と基板Wとの間の空間が真空吸引されることにより、複数の凸部10の先端部が損傷することなく当該基板Wが高い平面度で基板保持部材により吸着保持された。また、実施例2では真空吸引の際に異 常が検知されることはなかった。 Other than that, the substrate holding member 2 of Example 2 was produced under the same conditions as in Example 1. Similar to the first embodiment, the vacuum pump is operated and the space between the first main surface 101 of the substrate holding member and the substrate W is vacuum-sucked, so that the tips of the plurality of convex portions 10 are damaged. The substrate W was attracted and held by the substrate holding member with high flatness. Moreover, in Example 2, no abnormality was detected during vacuum suction.

(比較例)
第1凸部11および第2凸部12の区別なく、すべての凸部10が、径φ0.5mm、高さ0.25mmの略円柱状の第1凸要素111の上に、径φ0.2mm、高さ0.05mmの略円柱状の第2凸要素112が同心に重ねられたような段差付き円柱状に形成された。そのほかは実施例1と同様の条件で比較例1の基板保持部材2が作製された。真空ポンプを作動させ、基板保持部材の第1主面101と基板Wとの間の空間が真空吸引された際、負圧形成の遅延に由来すると推察される異常が検知され、真空ポンプの作動が停止された。
(Comparison example)
Regardless of the first convex portion 11 and the second convex portion 12, all the convex portions 10 have a diameter of φ0.2 mm on the substantially cylindrical first convex element 111 having a diameter of φ0.5 mm and a height of 0.25 mm. The second convex element 112 having a height of 0.05 mm and having a substantially cylindrical shape was formed into a stepped columnar shape in which the second convex elements 112 were concentrically overlapped. Other than that, the substrate holding member 2 of Comparative Example 1 was produced under the same conditions as in Example 1. When the vacuum pump is operated and the space between the first main surface 101 of the substrate holding member and the substrate W is evacuated, an abnormality presumed to be caused by a delay in the formation of negative pressure is detected, and the vacuum pump is operated. Was stopped.

(本発明の他の実施形態)
図5に示されているように、基体1の第1主面101から突出し、基体1の第1主面101において、外側環状凸部14の内側で通気経路2の開口部20を取り囲むように延在する内側環状凸部120が形成され、拡大凸部が、当該内側環状凸部120である第1凸要素と、当該内側環状凸部120(第1凸要素)の端面から突出している複数の第2凸要素122と、を有していてもよい。
(Other Embodiments of the present invention)
As shown in FIG. 5, it protrudes from the first main surface 101 of the base 1 and surrounds the opening 20 of the ventilation path 2 inside the outer annular convex portion 14 on the first main surface 101 of the base 1. An extending inner annular convex portion 120 is formed, and a plurality of enlarged convex portions projecting from a first convex element which is the inner annular convex portion 120 and an end surface of the inner annular convex portion 120 (first convex element). The second convex element 122 of the above may be provided.

当該構成の基板保持部材によれば、通気経路2の開口部20の周辺に配置された内側環状凸部120によって、基体1の第1主面101と基板Wの裏面とにより画定される空間のうち、通気経路2の開口部20の周囲の全方位範囲の流体抵抗の増大が図られる。このため、当該空間の真空吸引時、特に初期段階において、当該空間の流体抵抗が過小であることに由来して真空発現状態に異常が生じたと誤認識される事態がさらに確実に回避される。 According to the substrate holding member having the above configuration, the space defined by the first main surface 101 of the substrate 1 and the back surface of the substrate W by the inner annular convex portion 120 arranged around the opening 20 of the ventilation path 2. Among them, the fluid resistance in the omnidirectional range around the opening 20 of the ventilation path 2 is increased. Therefore, at the time of vacuum suction in the space, especially in the initial stage, a situation in which it is erroneously recognized that an abnormality has occurred in the vacuum expression state due to the insufficient fluid resistance in the space can be more reliably avoided.

1‥基体、2‥通気経路、10‥凸部、11‥第1凸部、12‥第2凸部(拡大凸部)、14‥外側環状凸部、20‥通気経路の開口部、101‥第1主面(上面)、102‥第2主面(下面)、111‥第1凸部の第1凸要素、112‥第1凸部の第2凸要素、120‥内側環状凸部、121‥第2凸部の第1凸要素、122‥第2凸部の第2凸要素、1200‥内側環状凸部の端面、1110‥第1凸部の第1凸要素の端面、1120‥第1凸部の第2凸要素の端面、1210‥第2凸部の第1凸要素の端面、1220‥第2凸部の第2凸要素の端面、W‥基板(ウエハ)。 1 ... Base, 2 ... Ventilation path, 10 ... Convex part, 11 ... 1st convex part, 12 ... 2nd convex part (enlarged convex part), 14 ... Outer annular convex part, 20 ... Ventilation path opening, 101 ... 1st main surface (upper surface), 102 ... 2nd main surface (lower surface), 111 ... 1st convex element of 1st convex part, 112 ... 2nd convex element of 1st convex part, 120 ... inner annular convex part, 121 First convex element of the second convex part, 122 Second convex element of the second convex part 1200 End face of the inner annular convex part 1110 End face of the first convex element of the first convex part 1120 First The end face of the second convex element of the convex portion, 1210 ... the end face of the first convex element of the second convex portion, 1220 ... the end face of the second convex element of the second convex portion, W ... substrate (wafer).

Claims (4)

基体と、
前記基体の主面から突出する複数の凸部と、
前記基体の内部を通り、前記基体の主面に開口部を有する少なくとも1つの通気経路と、
前記基体の主面から突出し、前記複数の凸部および前記通気経路の開口部を取り囲む環状凸部と、を備える基板保持部材であって、
前記複数の凸部のそれぞれが、前記基体の主面から突出している第1凸要素と、前記第1凸要素の端面から突出している、当該第1凸要素の端面より小面積の端面を有する第2凸要素と、を備え、
前記複数の凸部のうち一部の凸部が、その他の凸部と比較して前記第1凸要素の体積が大きい拡大凸部として形成されていることを特徴とする基板保持部材。
With the base
A plurality of convex portions protruding from the main surface of the substrate,
At least one ventilation path that passes through the interior of the substrate and has an opening on the main surface of the substrate.
A substrate holding member comprising a plurality of protrusions protruding from the main surface of the substrate and an annular protrusion surrounding the opening of the ventilation path.
Each of the plurality of convex portions has a first convex element projecting from the main surface of the substrate and an end surface having a smaller area than the end surface of the first convex element projecting from the end surface of the first convex element. With a second convex element,
A substrate holding member, characterized in that some of the plurality of convex portions are formed as enlarged convex portions having a larger volume of the first convex element than the other convex portions.
請求項1に記載の基板保持部材において、
前記基体の主面において、一または複数の前記拡大凸部が、前記通気経路の開口部の周辺に形成されていることを特徴とする基板保持部材。
In the substrate holding member according to claim 1,
A substrate holding member characterized in that one or a plurality of the enlarged convex portions are formed on the main surface of the substrate around the opening of the ventilation path.
請求項2に記載の基板保持部材において、
前記基体の主面において、前記複数の拡大凸部が、前記通気経路の開口部を取り囲むように形成されていることを特徴とする基板保持部材。
In the substrate holding member according to claim 2,
A substrate holding member characterized in that, on the main surface of the substrate, the plurality of enlarged convex portions are formed so as to surround the opening of the ventilation path.
請求項3に記載の基板保持部材において、
前記基体の主面において前記複数の凸部および前記通気経路の開口部を取り囲むように延在し、前記基体の主面から突出する外側環状凸部をさらに備え、
前記基体の主面において、前記拡大凸部は、前記基体の主面から突出し、前記外側環状凸部の内側で前記通気経路の開口部を取り囲む内側環状凸部としての前記第1凸要素と前記第1凸要素の端面から突出している複数の第2凸要素とを有していることを特徴とする基板保持部材。
In the substrate holding member according to claim 3,
An outer annular convex portion extending on the main surface of the substrate so as to surround the plurality of protrusions and an opening of the ventilation path and projecting from the main surface of the substrate is further provided.
On the main surface of the substrate, the enlarged convex portion protrudes from the main surface of the substrate, and the first convex element as an inner annular convex portion that surrounds the opening of the ventilation path inside the outer annular convex portion and the first convex element. A substrate holding member having a plurality of second convex elements protruding from the end faces of the first convex element.
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JP2022077533A (en) * 2011-06-06 2022-05-23 トルーデル メディカル インターナショナル Respiratory treatment apparatus

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JP2014241357A (en) * 2013-06-12 2014-12-25 レーザーテック株式会社 Substrate holding device, optical device, and substrate holding method
JP2017212374A (en) * 2016-05-26 2017-11-30 日本特殊陶業株式会社 Substrate holding device and manufacturing method of the same
JP2018110148A (en) * 2016-12-28 2018-07-12 日本特殊陶業株式会社 Vacuum suction member

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JPH10242255A (en) * 1997-02-28 1998-09-11 Kyocera Corp Vacuum chuck device
JP2014241357A (en) * 2013-06-12 2014-12-25 レーザーテック株式会社 Substrate holding device, optical device, and substrate holding method
JP2017212374A (en) * 2016-05-26 2017-11-30 日本特殊陶業株式会社 Substrate holding device and manufacturing method of the same
JP2018110148A (en) * 2016-12-28 2018-07-12 日本特殊陶業株式会社 Vacuum suction member

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Publication number Priority date Publication date Assignee Title
JP2022077533A (en) * 2011-06-06 2022-05-23 トルーデル メディカル インターナショナル Respiratory treatment apparatus

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