JP2014193450A - 光照射装置 - Google Patents
光照射装置 Download PDFInfo
- Publication number
- JP2014193450A JP2014193450A JP2013071383A JP2013071383A JP2014193450A JP 2014193450 A JP2014193450 A JP 2014193450A JP 2013071383 A JP2013071383 A JP 2013071383A JP 2013071383 A JP2013071383 A JP 2013071383A JP 2014193450 A JP2014193450 A JP 2014193450A
- Authority
- JP
- Japan
- Prior art keywords
- lamp
- gas
- ultraviolet lamp
- ultraviolet
- light irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005855 radiation Effects 0.000 title abstract description 3
- 239000000843 powder Substances 0.000 abstract description 17
- 239000007789 gas Substances 0.000 description 91
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 21
- 229910001873 dinitrogen Inorganic materials 0.000 description 21
- 239000011521 glass Substances 0.000 description 18
- 239000000758 substrate Substances 0.000 description 17
- 238000004140 cleaning Methods 0.000 description 14
- 239000011261 inert gas Substances 0.000 description 13
- 238000011144 upstream manufacturing Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 230000007723 transport mechanism Effects 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013071383A JP2014193450A (ja) | 2013-03-29 | 2013-03-29 | 光照射装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013071383A JP2014193450A (ja) | 2013-03-29 | 2013-03-29 | 光照射装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014193450A true JP2014193450A (ja) | 2014-10-09 |
| JP2014193450A5 JP2014193450A5 (enrdf_load_stackoverflow) | 2015-09-24 |
Family
ID=51839135
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013071383A Pending JP2014193450A (ja) | 2013-03-29 | 2013-03-29 | 光照射装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2014193450A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017157458A (ja) * | 2016-03-03 | 2017-09-07 | ウシオ電機株式会社 | 紫外線照射装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5976814A (ja) * | 1982-10-22 | 1984-05-02 | Mitsubishi Heavy Ind Ltd | 冷却または加熱装置 |
| JP2001300451A (ja) * | 2000-04-25 | 2001-10-30 | Hoya Schott Kk | 紫外光照射装置 |
| WO2010032852A1 (ja) * | 2008-09-18 | 2010-03-25 | 株式会社ジーエス・ユアサコーポレーション | 紫外線照射装置 |
-
2013
- 2013-03-29 JP JP2013071383A patent/JP2014193450A/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5976814A (ja) * | 1982-10-22 | 1984-05-02 | Mitsubishi Heavy Ind Ltd | 冷却または加熱装置 |
| JP2001300451A (ja) * | 2000-04-25 | 2001-10-30 | Hoya Schott Kk | 紫外光照射装置 |
| WO2010032852A1 (ja) * | 2008-09-18 | 2010-03-25 | 株式会社ジーエス・ユアサコーポレーション | 紫外線照射装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017157458A (ja) * | 2016-03-03 | 2017-09-07 | ウシオ電機株式会社 | 紫外線照射装置 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150807 |
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| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150807 |
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| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160426 |
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| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20160428 |
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| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20161020 |