JP2014183046A5 - - Google Patents

Download PDF

Info

Publication number
JP2014183046A5
JP2014183046A5 JP2014049959A JP2014049959A JP2014183046A5 JP 2014183046 A5 JP2014183046 A5 JP 2014183046A5 JP 2014049959 A JP2014049959 A JP 2014049959A JP 2014049959 A JP2014049959 A JP 2014049959A JP 2014183046 A5 JP2014183046 A5 JP 2014183046A5
Authority
JP
Japan
Prior art keywords
electrode
emitter
respect
extractor
suppressor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014049959A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014183046A (ja
JP5843909B2 (ja
Filing date
Publication date
Priority claimed from EP20130159528 external-priority patent/EP2779204A1/en
Application filed filed Critical
Publication of JP2014183046A publication Critical patent/JP2014183046A/ja
Publication of JP2014183046A5 publication Critical patent/JP2014183046A5/ja
Application granted granted Critical
Publication of JP5843909B2 publication Critical patent/JP5843909B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2014049959A 2013-03-15 2014-03-13 電子銃装置、ウェーハ画像化システム、及び電子銃装置のエクストラクタ電極の少なくとも１つの表面をクリーニングする方法 Active JP5843909B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP20130159528 EP2779204A1 (en) 2013-03-15 2013-03-15 Electron gun arrangement
EP13159528.2 2013-03-15

Publications (3)

Publication Number Publication Date
JP2014183046A JP2014183046A (ja) 2014-09-29
JP2014183046A5 true JP2014183046A5 (OSRAM) 2015-07-02
JP5843909B2 JP5843909B2 (ja) 2016-01-13

Family

ID=47900868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014049959A Active JP5843909B2 (ja) 2013-03-15 2014-03-13 電子銃装置、ウェーハ画像化システム、及び電子銃装置のエクストラクタ電極の少なくとも１つの表面をクリーニングする方法

Country Status (3)

Country Link
US (1) US8957390B2 (OSRAM)
EP (1) EP2779204A1 (OSRAM)
JP (1) JP5843909B2 (OSRAM)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2779201A1 (en) * 2013-03-15 2014-09-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High brightness electron gun, system using the same, and method of operating the same
JP6283423B2 (ja) * 2014-10-20 2018-02-21 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP6439620B2 (ja) * 2015-07-28 2018-12-19 株式会社ニューフレアテクノロジー 電子源のクリーニング方法及び電子ビーム描画装置
US10096447B1 (en) * 2017-08-02 2018-10-09 Kla-Tencor Corporation Electron beam apparatus with high resolutions
JP6943701B2 (ja) * 2017-09-15 2021-10-06 日本電子株式会社 冷陰極電界放出型電子銃の調整方法
EP3518268B1 (en) * 2018-01-30 2024-09-25 IMS Nanofabrication GmbH Charged-particle source and method for cleaning a charged-particle source using back-sputtering
US11244806B2 (en) * 2018-02-07 2022-02-08 Hitachi High-Tech Corporation Cleaning device
US11037753B2 (en) * 2018-07-03 2021-06-15 Kla Corporation Magnetically microfocused electron emission source
DE112019006988B4 (de) * 2019-04-18 2025-07-24 Hitachi High-Tech Corporation Elektronenquelle und mit einem Strahl geladener Teilchen arbeitende Vorrichtung
US10861666B1 (en) * 2020-01-30 2020-12-08 ICT Integrated Circuit Testing Gesellschaft für Halbletterprüftechnik mbH Method of operating a charged particle gun, charged particle gun, and charged particle beam device
US11830699B2 (en) * 2021-07-06 2023-11-28 Kla Corporation Cold-field-emitter electron gun with self-cleaning extractor using reversed e-beam current
KR20240043795A (ko) * 2021-10-19 2024-04-03 주식회사 히타치하이테크 하전 입자선 장치
US20230197399A1 (en) * 2021-12-21 2023-06-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron microscope, electron source for electron microscope, and methods of operating an electron microscope
EP4553885A1 (en) * 2023-11-09 2025-05-14 ASML Netherlands B.V. Source, assessment apparatus, method of cleaning a charged particle source, method of cleaning a component of an assessment apparatus

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63259948A (ja) * 1987-04-17 1988-10-27 Hitachi Ltd 電界放出形電子発生装置
EP1207545A3 (en) * 2000-11-17 2007-05-23 Denki Kagaku Kogyo Kabushiki Kaisha Method for determining and setting an operational condition of a thermal field electron emitter
EP1455380B1 (en) * 2003-03-03 2007-04-18 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Charged particle beam device with cleaning unit and method of operation thereof
DE112009003724B4 (de) * 2008-12-16 2017-07-13 Hitachi High-Technologies Corporation Verwendung eines Elektronenstrahlgeräts
EP2312609B1 (en) * 2009-10-13 2013-08-28 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Method and apparatus of pretreatment of an electron gun chamber
EP2365511B1 (en) * 2010-03-10 2013-05-08 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Feedback loop for emitter flash cleaning
EP2385542B1 (en) * 2010-05-07 2013-01-02 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron beam device with dispersion compensation, and method of operating same
US8736170B1 (en) * 2011-02-22 2014-05-27 Fei Company Stable cold field emission electron source

Similar Documents

Publication Publication Date Title
JP2014183046A5 (OSRAM)
JP5843909B2 (ja) 電子銃装置、ウェーハ画像化システム、及び電子銃装置のエクストラクタ電極の少なくとも１つの表面をクリーニングする方法
JP6114981B2 (ja) Ｘ線発生装置
WO2008120412A1 (ja) 電子銃及び電子ビーム露光装置
KR102139654B1 (ko) 고 및 저 빔 전류 둘 다에 의한 고분해능 이미징을 위한 듀얼 렌즈 총 전자 빔 장치 및 방법
CN103843104B (zh) 电子枪以及带电粒子束装置
JP7068117B2 (ja) 荷電粒子線装置
JP2016103451A5 (OSRAM)
EP2804199A3 (en) Scanning charged particle microscope, image acquisition method, and electron detection method
WO2012112894A3 (en) Focusing a charged particle imaging system
JP2008140687A (ja) Ｘ線源
US10269531B2 (en) Scanning electron microscope
WO2017174795A3 (de) Mikroskop und verfahren zur abbildung einer probe
JP2012089506A5 (OSRAM)
JP2012142269A5 (OSRAM)
KR20190008979A (ko) 전계 방사 장치 및 재생 처리 방법
JP2020518990A5 (OSRAM)
JP2020529702A5 (OSRAM)
JP5370967B2 (ja) Ｘ線管
JP2017135082A5 (ja) 電子銃、ｘ線発生管、ｘ線発生装置およびｘ線撮影システム
TWI773081B (zh) 用於操作帶電粒子槍的方法、帶電粒子槍，及帶電粒子束裝置
US20080073534A1 (en) Scanning electron microscope
EP2197016A3 (en) Electron beam apparatus and method of operating the same
JP2017054737A (ja) 質量分析装置および質量分析方法
JP2015028935A (ja) 粒子ビーム顕微鏡の操作方法及び粒子ビーム顕微鏡