JP2014164997A - Organic EL panel - Google Patents

Organic EL panel Download PDF

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JP2014164997A
JP2014164997A JP2013034642A JP2013034642A JP2014164997A JP 2014164997 A JP2014164997 A JP 2014164997A JP 2013034642 A JP2013034642 A JP 2013034642A JP 2013034642 A JP2013034642 A JP 2013034642A JP 2014164997 A JP2014164997 A JP 2014164997A
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electrode
electrode wiring
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JP6124058B2 (en
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Takashi Ikeda
貴 池田
Yotaro Shiraishi
洋太郎 白石
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Nippon Seiki Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
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    • Y02B20/00Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps
    • Y02B20/30Semiconductor lamps, e.g. solid state lamps [SSL] light emitting diodes [LED] or organic LED [OLED]

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Abstract

PROBLEM TO BE SOLVED: To provide an organic EL panel capable of suppressing short-circuiting on electrode wiring sections.SOLUTION: An organic EL panel 10 comprises: a light-emitting section 10a disposed on a support substrate 11 and formed of a first electrode 12, an organic layer 14, and a second electrode 15 laminated in sequence; first electrode wiring sections 16 connected to the first electrode 12; an insulating film 13 which is formed so as to cover ends of the first electrode and part of the first electrode wiring sections; and second electrode wiring sections 17 connected to the second electrode 15. The plurality of first electrode wiring sections 16 and second electrode wiring sections 17 are arranged so as to surround the light-emitting section 10a. The second electrode 15 is formed so that ends thereof overlap with the second electrode wiring sections 17. The organic layer 14 and the second electrode 15 are formed so that ends thereof intersect with each other between the first electrode wiring sections 16 and the second electrode wiring sections 17. The ends of the organic layer 14 protrude to the outside with respect to the ends of the second electrode 15 on the first electrode wiring sections 16.

Description

本発明は、有機EL(Electro Luminescence)パネルに関する。   The present invention relates to an organic EL (Electro Luminescence) panel.

従来、有機材料によって形成される自発光素子として知られる有機EL素子は、例えば、ITO(Indium Tin Oxide)等からなる陽極と、少なくとも発光層を有する有機層と、アルミニウム(Al)等からなる非透光性の陰極と、を順次積層してなるものである(例えば特許文献1参照)。   Conventionally, an organic EL element known as a self-luminous element formed of an organic material is, for example, an anode made of ITO (Indium Tin Oxide) or the like, an organic layer having at least a light emitting layer, and a non-light made of aluminum (Al) or the like. A light-transmitting cathode is sequentially laminated (see, for example, Patent Document 1).

かかる有機EL素子は、陽極から正孔を注入し、また、陰極から電子を注入して正孔及び電子が前記発光層にて再結合することによって光を発するものである。有機EL素子はディスプレイに採用されるほか、近年では面発光照明としても開発が進められている。   Such an organic EL element emits light by injecting holes from the anode and injecting electrons from the cathode, and the holes and electrons recombine in the light emitting layer. In addition to being employed in displays, organic EL elements have also been developed as surface-emitting lighting in recent years.

特開昭59−194393号公報JP 59-194393 A 特開2010−198980号公報JP 2010-198980 A

面発光照明として用いられる有機ELパネルは、発光面における輝度の均一性が求められる。これに対し、陽極と電気的に接続される陽極配線部(陽極給電部)と陰極と電気的に接続される陰極配線部(陰極給電部)とを発光部を囲むように支持基板の辺に沿って複数配置することで複数方向から発光部に電流を供給し輝度の均一性を向上させる方法が知られている(例えば特許文献2参照)。   An organic EL panel used as surface emitting illumination is required to have uniform luminance on the light emitting surface. On the other hand, the anode wiring part (anode feeding part) electrically connected to the anode and the cathode wiring part (cathode feeding part) electrically connected to the cathode are arranged on the side of the support substrate so as to surround the light emitting part. There is known a method of improving the uniformity of luminance by supplying a plurality of currents along a plurality of directions and supplying current to the light emitting unit (see, for example, Patent Document 2).

かかる方法においては、陰極を陰極配線部と接続させるために、陰極の端部が有機層の端部よりも外側となるように陰極の面積を有機層の面積よりも広く形成することとなる。この場合、陰極の端部は陽極配線部とも重なるため、従来は陽極配線部の一部を覆うように絶縁膜を形成して陰極と陽極配線部との短絡を防止していた。しかしながら、真空蒸着法によって有機層を形成する場合、蒸着マスクの開口部エッジに生じる1.0μm程度の突起が絶縁膜に接触して陽極配線部上の絶縁膜にキズ(孔)が生じることがあり、有機層の形成後に陰極を形成するとこのキズを介して陰極と陽極配線部とが短絡する恐れがあるという問題点があった。   In this method, in order to connect the cathode to the cathode wiring portion, the area of the cathode is formed wider than the area of the organic layer so that the end of the cathode is outside the end of the organic layer. In this case, since the end portion of the cathode also overlaps with the anode wiring portion, conventionally, an insulating film is formed so as to cover a part of the anode wiring portion to prevent a short circuit between the cathode and the anode wiring portion. However, when an organic layer is formed by a vacuum evaporation method, a protrusion of about 1.0 μm generated at the edge of the opening of the evaporation mask may come into contact with the insulating film, resulting in a scratch (hole) in the insulating film on the anode wiring portion. In addition, when the cathode is formed after the organic layer is formed, there is a problem that the cathode and the anode wiring portion may be short-circuited through the scratch.

そこで本発明は、この問題に鑑みてなされたものであり、電極配線部上での短絡を抑制することが可能な有機ELパネルを提供することを目的とする。   Then, this invention is made | formed in view of this problem, and it aims at providing the organic electroluminescent panel which can suppress the short circuit on an electrode wiring part.

本発明は、前述の課題を解決するために、支持基板と、前記支持基板上に配置され第一電極と少なくとも発光層を含む有機層と第二電極とを順に積層形成してなる発光部と、前記支持基板上に配置され前記第一電極と接続される第一電極配線部と、前記第一電極の端部と前記第一電極配線部の一部とを覆うように形成される絶縁膜と、前記支持基板上に配置され前記第二電極と接続される第二電極配線部と、を備え、前記第一電極配線部と前記第二電極配線部とが前記発光部を囲むようにそれぞれ複数配置されてなる有機ELパネルであって、
前記第二電極はその端部が前記第二電極配線部と重なるように形成され、また、前記有機層と前記第二電極とは前記第一電極配線部と前記第二電極配線部との間で互いの端部が交差するように形成され、前記第一電極配線部上において前記有機層の端部が前記第二電極の端部よりも外側に突出してなることを特徴とする有機ELパネル。
In order to solve the above-described problems, the present invention provides a support substrate, a light-emitting section that is formed by sequentially stacking a first electrode, an organic layer including at least a light-emitting layer, and a second electrode that are disposed on the support substrate. And an insulating film formed on the support substrate so as to cover the first electrode wiring part connected to the first electrode and the end of the first electrode and a part of the first electrode wiring part. And a second electrode wiring portion disposed on the support substrate and connected to the second electrode, and the first electrode wiring portion and the second electrode wiring portion surround the light emitting portion, respectively. A plurality of organic EL panels arranged,
The second electrode is formed such that an end thereof overlaps the second electrode wiring portion, and the organic layer and the second electrode are between the first electrode wiring portion and the second electrode wiring portion. The organic EL panel is formed so that the ends of the organic layer intersect with each other, and the end of the organic layer protrudes outward from the end of the second electrode on the first electrode wiring portion. .

また、前記有機層の端部と前記第二電極との端部とは、前記第一電極配線部と前記第二電極配線部の前記第二電極との接続個所との間の略中央で交差してなることを特徴とする。   Further, the end portion of the organic layer and the end portion of the second electrode intersect at a substantially center between the first electrode wiring portion and the connection portion of the second electrode wiring portion with the second electrode. It is characterized by becoming.

本発明によれば、電極配線部上での短絡を抑制することが可能となる。   According to the present invention, it is possible to suppress a short circuit on the electrode wiring portion.

本発明の実施形態である有機ELパネルを示す背面図。The rear view which shows the organic electroluminescent panel which is embodiment of this invention. 同上有機ELパネルを示す断面図。Sectional drawing which shows an organic electroluminescent panel same as the above. 同上有機ELパネルの製造工程を説明する図。The figure explaining the manufacturing process of an organic electroluminescent panel same as the above. 同上有機ELパネルの製造工程を説明する図。The figure explaining the manufacturing process of an organic electroluminescent panel same as the above. 同上有機ELパネルの製造工程を説明する図。The figure explaining the manufacturing process of an organic electroluminescent panel same as the above. 同上有機ELパネルの製造工程を説明する図。The figure explaining the manufacturing process of an organic electroluminescent panel same as the above.

以下、添付図面に基づいて本発明を適用した実施形態について説明する。   Embodiments to which the present invention is applied will be described below with reference to the accompanying drawings.

図1は、本発明の実施形態である有機ELパネル10を示す背面図であり、図2は、有機ELパネル10の断面図である。なお、図1においては封止部材18の配置個所を点線で示している。有機ELパネル10は、図1及び図2に示すように、支持基板11と、透明電極である第一電極12と、絶縁膜13と、有機層14と、反射電極である第二電極15と、第一電極配線部16と、第二電極配線部17と、封止部材18と、から主に構成される。第一電極12と第二電極15とで有機層14が狭持された略矩形状の領域は、発光部(有機EL素子)10aを構成する。発光部10aは、第一電極配線部16及び第二電極配線部17を介して両電極12,15間に電圧を印加すると有機層14(の有機発光層)が発光する。そして発光部10aから発せられた光Lは、支持基板11の表面(図2中の下面)側から外部に出射される。すなわち、有機ELパネル10は、いわゆるボトムエミッション型の有機ELパネルである。   FIG. 1 is a rear view showing an organic EL panel 10 according to an embodiment of the present invention, and FIG. 2 is a cross-sectional view of the organic EL panel 10. In addition, in FIG. 1, the arrangement | positioning location of the sealing member 18 is shown with the dotted line. As shown in FIGS. 1 and 2, the organic EL panel 10 includes a support substrate 11, a first electrode 12 that is a transparent electrode, an insulating film 13, an organic layer 14, and a second electrode 15 that is a reflective electrode. The first electrode wiring portion 16, the second electrode wiring portion 17, and the sealing member 18 are mainly configured. A substantially rectangular region in which the organic layer 14 is sandwiched between the first electrode 12 and the second electrode 15 constitutes a light emitting unit (organic EL element) 10a. When a voltage is applied between the electrodes 12 and 15 via the first electrode wiring part 16 and the second electrode wiring part 17, the light emitting part 10a emits light from the organic layer 14 (the organic light emitting layer). And the light L emitted from the light emission part 10a is radiate | emitted outside from the surface (lower surface in FIG. 2) side of the support substrate 11. FIG. That is, the organic EL panel 10 is a so-called bottom emission type organic EL panel.

支持基板11は、例えば透光性の無アルカリガラスからなる矩形状の基板である。なお、アルカリガラス等のその他のガラス基板を用いてもよく、ガラス厚についても特に限定されない。また、透明な樹脂基板を用いても良い。支持基板11の背面(図2中の上面)上には、第一電極12、第一電極配線部16及び第二電極配線部17が形成され、さらに、絶縁膜13、有機層14及び第二電極15が順に積層形成される。また、第一電極配線部16は第一電極12と電気的に接続され、第二電極配線部17は第二電極15と電気的に接続される。   The support substrate 11 is a rectangular substrate made of translucent non-alkali glass, for example. Other glass substrates such as alkali glass may be used, and the glass thickness is not particularly limited. A transparent resin substrate may be used. A first electrode 12, a first electrode wiring portion 16, and a second electrode wiring portion 17 are formed on the back surface (upper surface in FIG. 2) of the support substrate 11, and further, the insulating film 13, the organic layer 14, and the second electrode wiring portion 17 are formed. The electrodes 15 are sequentially stacked. Further, the first electrode wiring portion 16 is electrically connected to the first electrode 12, and the second electrode wiring portion 17 is electrically connected to the second electrode 15.

第一電極12は、本実施形態では正孔を注入する陽極となるものであり、支持基板11上にITOあるいはAZO(Aluminum Zinc Oxide)等の透明導電材料をスパッタリング法等の手段によって50〜500nmの膜厚で層状に形成し、フォトリソグラフィー法等の手段によって所定の形状にパターニングしてなる透明電極である。第一電極12は、第一電極配線部16及び第二電極配線部17と同一の透明導電材料を用いて同工程で形成され、第一電極配線部16と一体的に形成されることで第一電極配線部16と電気的に接続される。また、第一電極12、第一電極配線部16及び第二電極配線部17は、その表面がUV/O処理やプラズマ処理等の表面処理を施される。 In the present embodiment, the first electrode 12 serves as an anode for injecting holes, and a transparent conductive material such as ITO or AZO (Aluminum Zinc Oxide) is formed on the support substrate 11 by means of a sputtering method or the like by 50 to 500 nm. The transparent electrode is formed into a layer with a film thickness of and patterned into a predetermined shape by means such as photolithography. The first electrode 12 is formed in the same process using the same transparent conductive material as the first electrode wiring part 16 and the second electrode wiring part 17, and is formed integrally with the first electrode wiring part 16. It is electrically connected to the one-electrode wiring part 16. Moreover, the surface of the first electrode 12, the first electrode wiring portion 16, and the second electrode wiring portion 17 is subjected to surface treatment such as UV / O 3 treatment or plasma treatment.

絶縁膜13は、第一電極12のエッジ(外側領域)、第一電極配線部16の内側領域及び第二電極配線部17の内側領域を含む支持基板11の周辺領域を覆うものであり、例えばポリイミド系やフェノール系の絶縁材料をスピンコート法等の手段によって1.0μm程度の膜厚で層状に形成し、フォトリソグラフィー法で所望の形状にパターニングしてなる。絶縁膜13は、第一電極12の中央領域を平面視略矩形状に露出させて発光部10aの形状を画定する開口部13aと、第二電極配線部17の内側領域を一部露出させて第二電極15を第二電極配線部17と電気的に接続させる略L字のスリット状のコンタクトホール部13bと、を有する。なお、コンタクトホール部13bは、例えば矩形状に形成された孔部が複数略L字状に配置されるものであってもよい。   The insulating film 13 covers the peripheral region of the support substrate 11 including the edge (outer region) of the first electrode 12, the inner region of the first electrode wiring part 16, and the inner region of the second electrode wiring part 17, A polyimide-based or phenol-based insulating material is formed into a layer with a film thickness of about 1.0 μm by means such as spin coating, and is patterned into a desired shape by photolithography. The insulating film 13 exposes the central region of the first electrode 12 in a substantially rectangular shape in plan view, and partially exposes the opening 13 a that defines the shape of the light emitting portion 10 a and the inner region of the second electrode wiring portion 17. A substantially L-shaped slit-shaped contact hole portion 13 b that electrically connects the second electrode 15 to the second electrode wiring portion 17. In addition, the contact hole part 13b may be, for example, a plurality of holes formed in a rectangular shape arranged in a substantially L shape.

有機層14は、少なくとも有機材料からなる有機発光層を含む単層あるいは多層からなり、例えば60〜150nm程度の膜厚で第一電極12上に形成されるものである。多層構造の一例としては、第一電極12側から順に正孔注入輸送層、第一の発光層、第二の発光層、電子輸送層及び電子注入層が積層形成される。なお、発光層は単一でもよく、また、他に層が付加されても一部の層が含まれないものであってもよい。有機層14は、真空蒸着法によって形成され、所定の開口部を有する蒸着マスクを介して支持基板11の背面側に所望の形状で形成される。有機層14は、第一電極12を覆うと共に第二電極配線部17とコンタクトホール部13bを介して接触しないように、その端部が第一電極12と第二電極配線部17との間に位置するように平面視略矩形状に形成される(図1及び図2(b)参照)。また、有機層14は、第一電極配線部16上において外側に突出する突出部14aが設けられ、その端部が第一電極配線部16と第二電極配線部17との間で第二電極配線部17から第一電極配線部16に向かって徐々に外側に向かうように形成される(図1及び図2(a)参照)。   The organic layer 14 is composed of a single layer or multiple layers including at least an organic light emitting layer made of an organic material, and is formed on the first electrode 12 with a film thickness of, for example, about 60 to 150 nm. As an example of the multilayer structure, a hole injecting and transporting layer, a first light emitting layer, a second light emitting layer, an electron transporting layer, and an electron injecting layer are sequentially formed from the first electrode 12 side. Note that the light emitting layer may be a single layer or may be a layer that does not include a part of layers even if another layer is added. The organic layer 14 is formed by a vacuum deposition method, and is formed in a desired shape on the back side of the support substrate 11 through a deposition mask having a predetermined opening. The organic layer 14 covers the first electrode 12 and has an end portion between the first electrode 12 and the second electrode wiring portion 17 so as not to contact the second electrode wiring portion 17 via the contact hole portion 13b. It is formed in a substantially rectangular shape in plan view so as to be positioned (see FIGS. 1 and 2B). Further, the organic layer 14 is provided with a protruding portion 14 a that protrudes outward on the first electrode wiring portion 16, and an end portion of the organic layer 14 is between the first electrode wiring portion 16 and the second electrode wiring portion 17. It forms so that it may go outside gradually toward the 1st electrode wiring part 16 from the wiring part 17 (refer FIG.1 and FIG.2 (a)).

第二電極15は、本実施形態では電子を注入する陰極となるものであり、有機層14上に例えばAl,マグネシウム(Mg),コバルト(Co),Li,金(Au),銅(Cu),亜鉛(Zn)等の低抵抗導電材料を膜厚50〜200nmの層状に形成した導電膜からなる反射電極である。第二電極15は、真空蒸着法によって形成され、所定の開口部を有する蒸着マスクを介して支持基板11の背面側に所望の形状で形成される。第二電極15は、第一電極12を覆うと共に第二電極配線部17とコンタクトホール部13bを介して接触するように、その端部が第二電極配線部17の内側領域と重なるように平面視略矩形状に形成される(図1及び図2(b)参照)。また、第二電極15は、第一電極配線部16上において内側に凹んだ切り欠き部15aが設けられ、その端部が第一電極配線部16と第二電極配線部17との間で第二電極配線部17から第一電極配線部16に向かって徐々に内側に向かうように形成される(図1及び図2(a)参照)。有機層14と第二電極15とが上述のように形成されることによって、有機層14の端部と第二電極15の端部とは第一電極配線部16と第二電極配線部17との間で互いに交差し、第一電極配線部16上において有機層14の端部が第二電極15の端部よりも外側に突出する格好となる。なぜこのような形状に有機層14及び第二電極15を形成したかは後で詳述する。   In this embodiment, the second electrode 15 serves as a cathode for injecting electrons. On the organic layer 14, for example, Al, magnesium (Mg), cobalt (Co), Li, gold (Au), copper (Cu). , A reflective electrode made of a conductive film in which a low-resistance conductive material such as zinc (Zn) is formed into a layer having a thickness of 50 to 200 nm. The second electrode 15 is formed by a vacuum deposition method, and is formed in a desired shape on the back side of the support substrate 11 through a deposition mask having a predetermined opening. The second electrode 15 covers the first electrode 12 and is flat so that the end thereof overlaps the inner region of the second electrode wiring portion 17 so as to be in contact with the second electrode wiring portion 17 via the contact hole portion 13b. It is formed in a substantially rectangular shape (see FIGS. 1 and 2B). In addition, the second electrode 15 is provided with a notch 15 a that is recessed inwardly on the first electrode wiring portion 16, and an end thereof is between the first electrode wiring portion 16 and the second electrode wiring portion 17. It forms so that it may gradually go inward toward the 1st electrode wiring part 16 from the two-electrode wiring part 17 (refer FIG.1 and FIG.2 (a)). By forming the organic layer 14 and the second electrode 15 as described above, the end portion of the organic layer 14 and the end portion of the second electrode 15 are connected to the first electrode wiring portion 16 and the second electrode wiring portion 17. And the end portion of the organic layer 14 is projected outward from the end portion of the second electrode 15 on the first electrode wiring portion 16. The reason why the organic layer 14 and the second electrode 15 are formed in such a shape will be described in detail later.

第一電極配線部16は、前述のように第一電極12及び第二電極配線部17と同一の透明導電材料で同工程で形成される電極(陽極)配線部である。第一電極配線部16は、第一電極12と一体的に形成されることで第一電極12と電気的に接続される。第一電極配線部16は、平面視略矩形状の支持基板11の4つの端部(辺)に沿って、各端部の略中央領域に平面視略矩形状にそれぞれ形成され、支持基板11の背面上に複数(4つ)の第一電極配線部16が発光部10aをそれぞれ異なる方向(4方向)から囲むように配置される格好となる。   The first electrode wiring part 16 is an electrode (anode) wiring part formed of the same transparent conductive material as that of the first electrode 12 and the second electrode wiring part 17 in the same process as described above. The first electrode wiring part 16 is electrically connected to the first electrode 12 by being formed integrally with the first electrode 12. The first electrode wiring portion 16 is formed in a substantially rectangular shape in plan view in the substantially central region of each end portion along the four end portions (sides) of the support substrate 11 having a substantially rectangular shape in plan view. A plurality of (four) first electrode wiring portions 16 are arranged on the back surface of the light emitting portion 10a so as to surround the light emitting portions 10a from different directions (four directions).

第二電極配線部17は、前述のように第一電極12及び第一電極配線部16と同一の透明導電材料で同工程で形成される電極(陰極)配線部である。第二電極配線部17は、絶縁膜13の第二電極配線部17の内側領域と重なる個所に形成されるコンタクトホール部13bを介して第二電極15と接触することで第二電極15と電気的に接続される。第二電極配線部17は、支持基板11の4つの角部に沿って平面視略「L」字状にそれぞれ形成され、支持基板11の背面上に複数(4つ)の第二電極配線部17が発光部10aをそれぞれ異なる方向(4方向)から囲むように配置される格好となる。このように、第一電極配線部16と第二電極配線部17とがそれぞれ複数の方向で第一電極12と第二電極15と接続されることで、複数の方向から発光部10aに電流が供給され、第一電極12あるいは第二電極15の抵抗によって発光面に輝度ムラが生じることを抑止して輝度の均一化を向上させることができる。   The second electrode wiring part 17 is an electrode (cathode) wiring part formed in the same process with the same transparent conductive material as the first electrode 12 and the first electrode wiring part 16 as described above. The second electrode wiring portion 17 is in contact with the second electrode 15 through a contact hole portion 13b formed at a location overlapping the inner region of the second electrode wiring portion 17 of the insulating film 13 and thereby electrically connected to the second electrode 15. Connected. The second electrode wiring portion 17 is formed in a substantially “L” shape in plan view along the four corners of the support substrate 11, and a plurality of (four) second electrode wiring portions are formed on the back surface of the support substrate 11. 17 becomes the appearance arrange | positioned so that the light emission part 10a may be enclosed from a respectively different direction (4 directions). As described above, the first electrode wiring portion 16 and the second electrode wiring portion 17 are connected to the first electrode 12 and the second electrode 15 in a plurality of directions, respectively, so that a current flows from the plurality of directions to the light emitting unit 10a. It is possible to suppress the occurrence of uneven brightness on the light emitting surface due to the resistance of the first electrode 12 or the second electrode 15 and improve the uniformity of the brightness.

封止部材18は、例えばガラス材料からなり、成型、サンドブラスト、切削あるいはエッチング等の適宜方法で凹形状に形成してなるものである。封止部材18は、例えば紫外線硬化性エポキシ樹脂からなる接着剤18aを介して支持基板11上に気密的に配設され、発光部10aが封止される。支持基板11と封止部材18とで形成される封止空間内には例えば酸化ストロンチウム(SrO)や酸化カルシウム(CaO)あるいは酸化バリウム(BaO)等からなるシート状の吸湿剤(図示しない)が配設される。なお、封止部材18は平板状であってもよく、その場合封止部材18はスペーサーを介して支持基板11上に配設される。   The sealing member 18 is made of, for example, a glass material and is formed in a concave shape by an appropriate method such as molding, sandblasting, cutting, or etching. The sealing member 18 is hermetically disposed on the support substrate 11 via an adhesive 18a made of, for example, an ultraviolet curable epoxy resin, and the light emitting unit 10a is sealed. In a sealing space formed by the support substrate 11 and the sealing member 18, a sheet-like moisture absorbent (not shown) made of, for example, strontium oxide (SrO), calcium oxide (CaO), barium oxide (BaO), or the like is present. Arranged. The sealing member 18 may have a flat plate shape. In this case, the sealing member 18 is disposed on the support substrate 11 via a spacer.

以上のように、有機ELパネル10が構成される。   As described above, the organic EL panel 10 is configured.

次に、図1から図6を用いて有機ELパネル10の製造方法について説明する。   Next, a method for manufacturing the organic EL panel 10 will be described with reference to FIGS.

(第一電極、第一電極配線部及び第二電極配線部形成工程)
まず、図3に示すように、支持基板11の背面上に、前述の透明導電材料をスパッタリング法等によって50〜500nmの膜厚で層状に形成し、その後フォトリソグラフィー法等によってパターニングし、第一電極12、第一電極配線部16及び第二電極配線部17を形成する。そして、第一電極12、第一電極配線部16及び第二電極配線部17の表面に対してUV/O処理やプラズマ処理等の表面処理を施す。
(First electrode, first electrode wiring part and second electrode wiring part forming step)
First, as shown in FIG. 3, on the back surface of the support substrate 11, the above-mentioned transparent conductive material is formed in a layer shape with a film thickness of 50 to 500 nm by a sputtering method or the like, and then patterned by a photolithography method or the like. The electrode 12, the first electrode wiring part 16, and the second electrode wiring part 17 are formed. Then, surface treatment such as UV / O 3 treatment or plasma treatment is performed on the surfaces of the first electrode 12, the first electrode wiring portion 16, and the second electrode wiring portion 17.

(絶縁膜形成工程)
次に、図4に示すように、前述の絶縁材料をスピンコート法等によって1.0μm程度の膜厚で層状に形成し、フォトリソグラフィー法でパターニングし、開口部13aとコンタクトホール部13bとを有する絶縁膜13を形成する。絶縁膜13によって、第一電極12のエッジ(外側領域)、第一電極配線部16の内側領域及び第二電極配線部17の内側領域を含む支持基板11の周辺領域が覆われる。
(Insulating film formation process)
Next, as shown in FIG. 4, the insulating material described above is formed into a layer having a thickness of about 1.0 μm by spin coating or the like, and is patterned by photolithography to form the opening 13a and the contact hole 13b. An insulating film 13 is formed. The insulating film 13 covers the peripheral region of the support substrate 11 including the edge (outer region) of the first electrode 12, the inner region of the first electrode wiring portion 16, and the inner region of the second electrode wiring portion 17.

(有機層形成工程)
次に、図5に示すように、支持基板11の背面側に開口部を有する蒸着マスクM1を配置し、所定の有機材料を真空蒸着法によって蒸着マスクM1を介して支持基板11の背面側に層状に形成し、有機層14を形成する。なお、図5において、蒸着マスクM1は一点鎖線で開口部エッジ部分のみを図示している。また、有機層14が多層構造からなる場合は、層の数だけ蒸着が行われ、有機層14の総膜厚は層構造などによって任意に定められる。有機層14の外形形状は蒸着マスクM1の開口部形状で定まる。本実施形態において、蒸着マスクM1の開口部は、平面視略矩形状であって、有機層14に第一電極配線部16上において外側に突出する突出部14aを設けるべく、第一電極配線部16と第二電極配線部17との間で第二電極配線部17から第一電極配線部16に向かって徐々に外側に向かい、第一電極配線部16と重なる個所が外側に凹むように形成されている。蒸着マスクM1の開口部エッジには、開口部形成時に生じるバリなどによって絶縁膜13の膜厚である1.0μm程度の突起が生じる場合があり、有機層形成工程において蒸着マスクM1が支持基板11の背面側に設置される際にこの突起が絶縁膜13に接触すると絶縁膜13にキズ(孔)が生じる。したがって、蒸着マスクM1による絶縁膜13のキズは蒸着マスクM1の開口部エッジと絶縁膜13とが重なる個所、すなわち有機層14よりも外側に生じることとなる。
(Organic layer formation process)
Next, as shown in FIG. 5, a vapor deposition mask M1 having an opening is disposed on the back side of the support substrate 11, and a predetermined organic material is deposited on the back side of the support substrate 11 via the vapor deposition mask M1 by a vacuum vapor deposition method. The organic layer 14 is formed in layers. In FIG. 5, the vapor deposition mask M <b> 1 shows only the opening edge portion with a one-dot chain line. When the organic layer 14 has a multilayer structure, vapor deposition is performed by the number of layers, and the total film thickness of the organic layer 14 is arbitrarily determined by the layer structure or the like. The outer shape of the organic layer 14 is determined by the shape of the opening of the vapor deposition mask M1. In the present embodiment, the opening of the vapor deposition mask M1 has a substantially rectangular shape in plan view, and the first electrode wiring portion is provided on the organic layer 14 to provide a protruding portion 14a protruding outward on the first electrode wiring portion 16. 16 and the second electrode wiring part 17 are formed so as to gradually go outward from the second electrode wiring part 17 toward the first electrode wiring part 16 and the portion overlapping the first electrode wiring part 16 is recessed outward. Has been. A protrusion having a thickness of about 1.0 μm, which is the thickness of the insulating film 13, may be generated at the opening edge of the vapor deposition mask M <b> 1 due to burrs or the like generated when the opening is formed. When this projection comes into contact with the insulating film 13 when it is installed on the back side, scratches (holes) are generated in the insulating film 13. Therefore, the scratch of the insulating film 13 caused by the vapor deposition mask M1 occurs at a position where the opening edge of the vapor deposition mask M1 and the insulating film 13 overlap, that is, outside the organic layer 14.

(第二電極形成工程)
次に、図6に示すように、支持基板11の背面側に開口部を有する蒸着マスクM2を配置し、前述の低抵抗導電材料を真空蒸着法によって蒸着マスクM2を介して支持基板11の背面側に膜厚50〜200nmの層状に形成し、第二電極15を形成する。なお、図6において、蒸着マスクM2は一点鎖線で開口部エッジ部分のみを図示している。第二電極15の外形形状は、蒸着マスクM2の開口部形状で定まる。本実施形態において、蒸着マスクM2の開口部は、平面視略矩形状であって、そのエッジが第二電極配線部17の内側領域と重なるように形成される。また、蒸着マスクM2の開口部は、第二電極15に第一電極配線部16上において内側に凹んだ切り欠き部15aを設けるべく、第一電極配線部16と第二電極配線部17との間で第二電極配線部17から第一電極配線部16に向かって徐々に外側に向かい、第一電極配線部16と重なる個所が内側に突出するように形成されている。
(Second electrode forming step)
Next, as shown in FIG. 6, a vapor deposition mask M2 having an opening is disposed on the back side of the support substrate 11, and the back surface of the support substrate 11 is deposited on the low resistance conductive material through the vapor deposition mask M2 by a vacuum vapor deposition method. The second electrode 15 is formed on the side in the form of a layer having a thickness of 50 to 200 nm. In FIG. 6, the vapor deposition mask M <b> 2 shows only the opening edge portion with a one-dot chain line. The outer shape of the second electrode 15 is determined by the shape of the opening of the vapor deposition mask M2. In the present embodiment, the opening of the vapor deposition mask M <b> 2 has a substantially rectangular shape in plan view, and is formed so that the edge thereof overlaps with the inner region of the second electrode wiring portion 17. Further, the opening of the vapor deposition mask M <b> 2 is formed between the first electrode wiring portion 16 and the second electrode wiring portion 17 in order to provide the second electrode 15 with a notch 15 a that is recessed inwardly on the first electrode wiring portion 16. Between the second electrode wiring part 17 and the first electrode wiring part 16, the part is formed so as to gradually go outward and to overlap with the first electrode wiring part 16.

このようにして、有機層形成工程及び第二電極形成工程によって有機層14の端部と第二電極15の端部とを第一電極配線部16と第二電極配線部17との間で互いに交差させ、第一電極配線部16上において有機層14の端部が第二電極15の端部よりも外側に突出するようにすると、第二電極15は、その端部が第一電極配線部16上においては有機層14の端部よりも内側に位置するためキズが生じる恐れのある有機層14の外側には達しないこととなる。したがって、有機層14を形成するための蒸着マスクM1の開口部エッジによって絶縁膜13にキズが生じる場合であっても第二電極15と第一電極配線部16とが短絡することを抑制することができる。また、有機層14の端部と第二電極15の端部との交差個所を第一電極配線部16と第二電極配線部17との間とするため、両者を交差させても短絡や接続不良を生じさせることがない。なお、蒸着による有機層14及び第二電極15の形成位置の誤差を考慮すると、有機層14の端部と第二電極15の端部との交差個所は、第一電極配線部16との間の長さW1とコンタクトホール13bとの間の長さW2とが略等しい(W1=W2)個所、すなわち、第一電極配線部16と第二電極配線部17の第二電極15との接続個所との間の略中央であることが望ましい。交差個所が第一電極配線部16に近いと形成誤差によって第二電極15の端部が第一電極配線部16上で有機層14の端部よりも外側となる個所が生じて短絡が生じる恐れがあり、コンタクトホール部13bに近いと形成誤差によって有機層14がコンタクトホール部13bと重なって第二電極15と第二電極配線部17との接続が不十分となる恐れがあるためである。なお、「略中央」とは、完全な中央のほか、第二電極15と第一電極配線部16との短絡及び第二電極15と第二電極配線部17との接続不良が生じない程度に長さW1と長さW2との差が小さい位置を含む。   In this way, the end portion of the organic layer 14 and the end portion of the second electrode 15 are connected to each other between the first electrode wiring portion 16 and the second electrode wiring portion 17 by the organic layer forming step and the second electrode forming step. If the end of the organic layer 14 protrudes outside the end of the second electrode 15 on the first electrode wiring section 16, the end of the second electrode 15 is the first electrode wiring section. On 16, it is located on the inner side of the end of the organic layer 14, so that it does not reach the outside of the organic layer 14 where there is a risk of scratching. Therefore, even if the insulating film 13 is scratched by the opening edge of the vapor deposition mask M1 for forming the organic layer 14, it is possible to prevent the second electrode 15 and the first electrode wiring portion 16 from being short-circuited. Can do. In addition, since the intersection of the end portion of the organic layer 14 and the end portion of the second electrode 15 is between the first electrode wiring portion 16 and the second electrode wiring portion 17, even if both are intersected, short circuit or connection It does not cause defects. In consideration of errors in the formation positions of the organic layer 14 and the second electrode 15 by vapor deposition, the intersection between the end portion of the organic layer 14 and the end portion of the second electrode 15 is between the first electrode wiring portion 16. Length W1 and the length W2 between the contact holes 13b are substantially equal (W1 = W2), that is, the connection point between the first electrode wiring portion 16 and the second electrode 15 of the second electrode wiring portion 17 It is desirable to be approximately in the middle. If the crossing point is close to the first electrode wiring part 16, a short circuit may occur due to a formation error where the end of the second electrode 15 is outside the end of the organic layer 14 on the first electrode wiring part 16. This is because, if the contact hole portion 13b is close, the organic layer 14 may overlap the contact hole portion 13b due to a formation error, and the connection between the second electrode 15 and the second electrode wiring portion 17 may be insufficient. The “substantially center” means not only a complete center but also a short circuit between the second electrode 15 and the first electrode wiring part 16 and a connection failure between the second electrode 15 and the second electrode wiring part 17. A position where the difference between the length W1 and the length W2 is small is included.

(封止工程)
次に、図1及び図2に示すように、凹形状の封止部材18を例えば窒素雰囲気中で接着剤18aを介して支持基板11上に気密的に配設し、発光部10aを封止する。
(Sealing process)
Next, as shown in FIGS. 1 and 2, a concave sealing member 18 is hermetically disposed on the support substrate 11 via an adhesive 18a, for example, in a nitrogen atmosphere to seal the light emitting portion 10a. To do.

以上の工程によって、有機ELパネル10が製造される。   The organic EL panel 10 is manufactured through the above steps.

有機ELパネル10は、支持基板11と、支持基板11上に配置され第一電極12と少なくとも発光層を含む有機層14と第二電極15とを順に積層形成してなる発光部10aと、支持基板11上に配置され第一電極12と接続される第一電極配線部16と、少なくとも第一電極12の端部と第一電極配線部16の一部とを覆うように形成される絶縁膜13と、支持基板11上に配置され第二電極15と接続される第二電極配線部15と、を備え、第一電極配線部16と第二電極配線部17とが発光部10aを囲むようにそれぞれ複数配置されてなる有機ELパネルであって、
第二電極15はその端部が第二電極配線部17と重なるように形成され、また、有機層14と第二電極15とは第一電極配線部16と第二電極配線部17との間で互いの端部が交差するように形成され、第一電極配線部16上において有機層14の端部が第二電極15の端部よりも外側に突出してなることを特徴とする。
The organic EL panel 10 includes a support substrate 11, a light emitting unit 10 a that is formed by sequentially stacking a first electrode 12, an organic layer 14 including at least a light emitting layer, and a second electrode 15. A first electrode wiring portion 16 disposed on the substrate 11 and connected to the first electrode 12, and an insulating film formed to cover at least the end portion of the first electrode 12 and a part of the first electrode wiring portion 16 13 and a second electrode wiring part 15 disposed on the support substrate 11 and connected to the second electrode 15 so that the first electrode wiring part 16 and the second electrode wiring part 17 surround the light emitting part 10a. A plurality of organic EL panels arranged in each,
The second electrode 15 is formed so that the end thereof overlaps the second electrode wiring portion 17, and the organic layer 14 and the second electrode 15 are between the first electrode wiring portion 16 and the second electrode wiring portion 17. And the end portions of the organic layer 14 protrude outward from the end portions of the second electrode 15 on the first electrode wiring portion 16.

これによれば、第一電極配線部16と第二電極配線部17とが発光部10aを囲むようにそれぞれ複数配置されてなる有機ELパネル10において、有機層14を形成するための蒸着マスクM1の開口部エッジによって絶縁膜13にキズが生じる場合であっても第二電極15と第一電極配線部16とが短絡することを抑制することができる。   According to this, in the organic EL panel 10 in which a plurality of first electrode wiring parts 16 and second electrode wiring parts 17 are arranged so as to surround the light emitting part 10a, a vapor deposition mask M1 for forming the organic layer 14 is formed. Even if the insulating film 13 is scratched by the edge of the opening, the short-circuit between the second electrode 15 and the first electrode wiring portion 16 can be suppressed.

また、有機層14の端部と第二電極15との端部とは、第一電極配線部16と第二電極配線部17の第二電極15と接続個所(コンタクトホール部13b)との間の略中央で交差してなることを特徴とする。   Moreover, the edge part of the organic layer 14 and the edge part of the 2nd electrode 15 are between the 2nd electrode 15 of the 1st electrode wiring part 16 and the 2nd electrode wiring part 17, and a connection location (contact hole part 13b). It is characterized by crossing at approximately the center.

これによれば、有機層14及び第二電極15の形成位置に誤差が生じる場合であっても、第二電極15と第一電極配線部16との短絡や第二電極15と第二電極配線部17との接続不良を生じさせることがない。   According to this, even if an error occurs in the formation position of the organic layer 14 and the second electrode 15, a short circuit between the second electrode 15 and the first electrode wiring portion 16, or the second electrode 15 and the second electrode wiring. Connection failure with the portion 17 is not caused.

以上の説明は本発明を例示するものであって、その要旨を逸脱しない範囲で種々の変更、変形(構成要素の削除を含む)が可能であることはもちろんである。本発明においては、第一電極12が陰極であり、第二電極15が陽極であってもよい。また、第一電極配線部16が支持基板11上の角部に複数設けられ、第二電極配線部17が支持基板11の端部の略中央領域に複数設けられる構成であってもよい。また、第一電極配線部16及び第二電極配線部17上(特に封止部材18から外部に露出する外部電源との接続部上)に、Al、モリブデン(Mo)、チタン(Ti)、銀(Ag)、銅(Cu)、クロム(Cr)、ニッケル(Ni)等の低抵抗金属材料あるいはこれらの合金の単層あるいは積層からなる補助配線を形成してもよい。また、第一電極12上に上述の低抵抗金属材料あるいはこれらの合金の単層あるいは積層からなる補助電極を部分的に(例えば格子状に)形成してもよい。また、本発明は、支持基板11の背面側(発光部10aが形成される側)から光を出射するいわゆるトップエミッション型の有機ELパネルにも適用可能である。   The above description exemplifies the present invention, and it is needless to say that various changes and modifications (including deletion of components) are possible without departing from the scope of the invention. In the present invention, the first electrode 12 may be a cathode and the second electrode 15 may be an anode. Further, a configuration in which a plurality of first electrode wiring portions 16 are provided at corners on the support substrate 11 and a plurality of second electrode wiring portions 17 are provided in a substantially central region at an end portion of the support substrate 11 may be employed. Further, Al, molybdenum (Mo), titanium (Ti), silver on the first electrode wiring portion 16 and the second electrode wiring portion 17 (particularly on the connection portion with an external power source exposed to the outside from the sealing member 18). You may form the auxiliary wiring which consists of a low resistance metal material, such as (Ag), copper (Cu), chromium (Cr), nickel (Ni), or a single layer or these layers of these alloys. Moreover, you may form partially (for example, lattice shape) the auxiliary electrode which consists of the above-mentioned low-resistance metal material or the single layer of these alloys, or laminated | stacked on the 1st electrode 12. The present invention is also applicable to a so-called top emission type organic EL panel that emits light from the back side of the support substrate 11 (the side where the light emitting unit 10a is formed).

本発明は、主として面発光光源に用いられる有機ELパネルに好適である。   The present invention is suitable for an organic EL panel mainly used for a surface emitting light source.

10 有機ELパネル
11 支持基板
12 第一電極
13 絶縁膜
14 有機層
15 第二電極
16 第一電極配線部
17 第二電極配線部
18 封止部材
DESCRIPTION OF SYMBOLS 10 Organic EL panel 11 Support substrate 12 1st electrode 13 Insulating film 14 Organic layer 15 2nd electrode 16 1st electrode wiring part 17 2nd electrode wiring part 18 Sealing member

Claims (2)

支持基板と、前記支持基板上に配置され第一電極と少なくとも発光層を含む有機層と第二電極とを順に積層形成してなる発光部と、前記支持基板上に配置され前記第一電極と接続される第一電極配線部と、少なくとも前記第一電極の端部と前記第一電極配線部の一部とを覆うように形成される絶縁膜と、前記支持基板上に配置され前記第二電極と接続される第二電極配線部と、を備え、前記第一電極配線部と前記第二電極配線部とが前記発光部を囲むようにそれぞれ複数配置されてなる有機ELパネルであって、
前記第二電極はその端部が前記第二電極配線部と重なるように形成され、また、前記有機層と前記第二電極とは前記第一電極配線部と前記第二電極配線部との間で互いの端部が交差するように形成され、前記第一電極配線部上において前記有機層の端部が前記第二電極の端部よりも外側に突出してなることを特徴とする有機ELパネル。
A support substrate, a light emitting portion formed by sequentially stacking a first electrode, an organic layer including at least a light emitting layer, and a second electrode disposed on the support substrate; and the first electrode disposed on the support substrate; A first electrode wiring portion to be connected; an insulating film formed to cover at least an end of the first electrode and a part of the first electrode wiring portion; and the second electrode disposed on the support substrate. An organic EL panel comprising: a second electrode wiring portion connected to an electrode; and a plurality of the first electrode wiring portion and the second electrode wiring portion arranged so as to surround the light emitting portion,
The second electrode is formed such that an end thereof overlaps the second electrode wiring portion, and the organic layer and the second electrode are between the first electrode wiring portion and the second electrode wiring portion. The organic EL panel is formed so that the ends of the organic layer intersect with each other, and the end of the organic layer protrudes outward from the end of the second electrode on the first electrode wiring portion. .
前記有機層の端部と前記第二電極との端部とは、前記第一電極配線部と前記第二電極配線部の前記第二電極との接続個所との間の略中央で交差してなることを特徴とする請求項1に記載の有機ELパネル。   The end portion of the organic layer and the end portion of the second electrode intersect at a substantially center between the first electrode wiring portion and the connection portion of the second electrode wiring portion with the second electrode. The organic EL panel according to claim 1, wherein
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