JP2014150019A - Device and method for manufacturing organic el device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a device or a method for manufacturing an organic EL device in which film formation is possible in a stable rate and with uniform film thickness even by using a material which is liable to be fluctuated in rate due to abrupt boiling and which has high productivity and quality.SOLUTION: In a film formation using a material which is liable to induce rate fluctuation in a device for manufacturing an organic EL device, abrupt boiling is suppressed by using a crucible which has a porous material loaded inside thereof, or a crucible in which a part or the whole thereof or a part or the whole of the upper lid is constituted of a porous material and supplying fine bubbles to a film forming material filled in the crucible, and rate fluctuation is avoided.

Description

  The present invention relates to an organic EL (Electro Luminescence) device manufacturing apparatus and an organic EL device manufacturing method, and more particularly to an organic EL device manufacturing apparatus and an organic EL device manufacturing method suitable for stable rate control using a crystal resonator.

An organic EL device used for an FPD (Flat Panel Display) or a lighting device is obtained by sandwiching a thin film of a multilayer organic compound between a pair of electrodes made of metal or oxide. There are various methods for forming an organic EL device, and a vacuum deposition method is often used.
In the film formation method by the vacuum evaporation method, a metal or ceramic container (crucible) is filled with a sublimation or melting film formation material, and a high vacuum (for example, 10 ⁻³ [Pa] to 10 ⁻⁵ [Pa] is used. ]) The material is heated and vaporized in the vacuum chamber of the vacuum deposition apparatus (organic EL device manufacturing apparatus). The vaporized material is cooled and condensed on a film formation substrate (hereinafter referred to as a substrate) through an opening (nozzle) provided in the crucible, and is formed into a film.

  In order to improve the light-emitting characteristics of organic EL devices, it is important to maintain the uniformity of the thickness of the thin film formed on the substrate (in-plane uniformity). The amount of material vapor per unit time (rate) is calculated as a detection rate by a film thickness monitoring device consisting of a crystal resonator installed in the vacuum chamber, and calculated so that the material vapor amount is always constant. A method (rate control) is used in which the detected detection rate is fed back and the heating state of the crucible is feedback-controlled based on the calculated detection rate.

However, when the temperature of the material passes the melting point and reaches the boiling point in the film-forming process in the above-described vacuum deposition method, the material suddenly boils, and the detection rate greatly fluctuates and the rate control becomes inefficient. May become stable. Under the influence of the rate fluctuation due to the bumping phenomenon, the crucible heating control is interlocked, so that it is easy to fall into a vicious circle in which the rate fluctuation occurs again. In addition, the in-plane uniformity is remarkably low in the substrate formed in such a state that rate fluctuation is likely to occur.
Further, at the time of bumping, material droplets may scatter from the crucible and adhere to the substrate. As a result, there is a risk that nonuniformity and defects of the film formed on the substrate may occur.
Therefore, in order to stably control the rate and maintain the in-plane uniformity, it is essential to suppress bumping.

Patent Document 1 discloses that a crucible is filled with a large number of contaminants made of metal or ceramic having a high thermal conductivity together with a film-forming material made of an organic material, thereby uniformly heating the film-forming material to prevent rate fluctuations. Manufacturing methods have been proposed.
Patent Document 2 discloses a substantially cylindrical ampoule-shaped vacuum vapor deposition material unit in which a thin film material used for a vacuum vapor deposition apparatus or a vacuum vapor deposition method for vaporizing a thin film material to form a thin film on a substrate surface is stored. In addition to the thin film raw material, a bumping suppression member that suppresses bumping when the thin film raw material evaporates is housed and hermetically sealed together with an inert gas or dry air.
Providing a vacuum vapor deposition source unit, a vacuum vapor deposition source and a vacuum vapor deposition system that can stably store organic compounds, suppress the occurrence of bumping phenomenon during vacuum vapor deposition, and form a thin film stably. To do.

  As is well known in Patent Document 1, etc., heating the film-forming material uniformly is effective for stable rate control. However, the film forming material includes a sublimation material that becomes a gas directly from a solid and a melt material that becomes a gas from a solid to a liquid, and particularly in the case of a melt material, bumping occurs due to the reasons described below. Occur. Therefore, suppression of bumping is an important issue when performing rate control.

First, the case of gentle boiling that is not bumping will be described. When the melted object is heated and the liquid temperature of the object rises, vaporization occurs from the liquid surface (evaporation). When the liquid temperature eventually reaches the boiling point, fine bubbles are generated triggered by the wall surface of the container. Furthermore, by continuing the heating, fine bubbles grow and detach from the liquid (boiling).
Since the thermal energy of the liquid is consumed as the heat of evaporation due to the separation of the bubbles, the liquid temperature does not exceed the boiling point as long as boiling continues.

Next, the principle of occurrence of bumping will be described. If fine bubbles are not generated even when the liquid temperature reaches the boiling point, heat energy that should be consumed as heat of evaporation is accumulated in the liquid, and the temperature continues to rise (overheated state).
The superheated liquid has a high vapor pressure and easily generates bubbles, but is in an unstable state in which even very fine bubbles grow at an accelerated rate. Then, the fine bubbles generated by the sudden trigger rapidly grow (sudden boiling) and jump out of the liquid.
Due to the above cause, the amount of vapor from the nozzle of the crucible protrudes, so a large fluctuation appears in the detection rate, and the rate control becomes unstable. In addition, bumping consumes a large amount of heat of evaporation, so that the vapor pressure decreases and converges. However, the liquid temperature rises due to heating, and rebumping may occur.

Japanese Patent Laid-Open No. 2005-082872 JP 2007-327088 A

A first object of the present invention is to provide a manufacturing method for stably vaporizing a film forming material in a crucible.
The second object is to provide a uniform manufacturing method that enables accurate rate control necessary to achieve the above object.
A third object is to provide an organic EL manufacturing apparatus or an organic EL device manufacturing method capable of suppressing bumping and avoiding rate fluctuations by continuously supplying minute bubbles to a molten film forming material. It is to be.

  In order to solve the above problems, an organic EL device manufacturing apparatus of the present invention includes a crucible in which a porous material is mounted and filled with a film forming material, a heater for heating the crucible, and power to the heater. Based on the heater power to be supplied, a film thickness monitor device for calculating a material vapor amount (rate) per unit time of the film forming material vaporized from the nozzle of the crucible by heating the heater, and the calculated rate A first feature is that a controller for controlling the power supplied from the heater power source is provided, and a film is formed on a film formation substrate in a vacuum chamber.

  In the organic EL device manufacturing apparatus according to the first aspect of the present invention, the film thickness monitor calculates a detection rate based on a film thickness monitor including a crystal resonator and a signal output from the film thickness monitor. A second feature is that it comprises a rate detector.

  In the organic EL device manufacturing apparatus according to the first feature or the second feature of the present invention, the porous material is a material having a higher melting point than the material of the crucible, and a higher melting point than the boiling point of the film forming material. A third characteristic is that the material is a material that does not react chemically.

  In the organic EL device manufacturing apparatus according to any one of the first to third features of the present invention, the vacuum chamber includes the crucible, the heater, and the film thickness monitor. The fourth feature.

  In the organic EL device manufacturing apparatus according to any one of the first to fourth features of the present invention, a fifth feature is that the crucible is partially or entirely made of a porous material.

  In the organic EL device manufacturing apparatus according to any one of the first to fourth features of the present invention, the crucible is characterized in that a part or the whole of the upper lid is a porous material. .

  In the organic EL device manufacturing apparatus according to any one of the first to sixth features of the present invention, the seventh feature is that the porous material is reused.

  In order to solve the above problems, an organic EL device manufacturing method of the present invention includes a crucible in which a porous material is mounted and filled with a film forming material, a heater for heating the crucible, and the heater. A heater power source for supplying electric power, a film thickness monitor device for calculating a material vapor amount (rate) per unit time of the film forming material vaporized from the nozzle of the crucible by heating of the heater, and the calculated rate And a controller for controlling the power supplied from the heater power source, and a method of forming a film on a film formation substrate in a vacuum chamber, wherein the porous material is in contact with the film formation material in the crucible. An eighth feature is that the film forming material in the crucible can be stably converted into vapor.

  In the organic EL device manufacturing method according to the eighth aspect of the present invention, the film thickness monitoring device calculates a detection rate based on a signal output by a film thickness monitor including a crystal resonator, and the controller includes: A ninth feature is that the electric power supplied from the heater power source is controlled based on the calculated rate.

According to the present invention, the film forming material filled in the crucible according to the above-described means can avoid the non-uniform film forming temperature due to the overheated state due to the pore structure of the porous substance.
Since the film forming material easily forms fine bubbles, bumping is suppressed, a stable rate is secured, and uniform film formation can be performed on the film formation substrate.
Furthermore, since the material surface in the crucible is lowered and the material in contact with the porous material evaporates, the porous material can be used repeatedly.

It is a block diagram which shows typically one Example of the structure of the organic EL device manufacturing apparatus of this invention. It is sectional drawing which shows one Example of a structure of the crucible which concerns on the organic EL device manufacturing apparatus and organic EL device manufacturing method of this invention. It is a figure which shows the detection rate in one Example of the film-forming process in the structure of FIG.1 and FIG.2. It is a figure which shows the detection rate in the conventional crucible structure which does not mount a porous substance. It is sectional drawing which shows one Example of a structure of the crucible which concerns on the organic EL device manufacturing apparatus and organic EL device manufacturing method of this invention. It is sectional drawing which shows one Example of a structure of the crucible which concerns on the organic EL device manufacturing apparatus and organic EL device manufacturing method of this invention. It is a perspective view which shows one Example of a structure of the crucible which concerns on the organic EL device manufacturing apparatus and organic EL device manufacturing method of this invention.

Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
In addition, the following description is for describing one embodiment of the present invention, and does not limit the scope of the present invention. Accordingly, those skilled in the art can employ embodiments in which these elements or all of the elements are replaced with equivalent ones, and these embodiments are also included in the scope of the present invention.
In the description of each drawing, the same reference numerals are assigned to components having the same function, and the description is omitted as much as possible to avoid duplication.

  As a first embodiment of the present invention, an example in which the present invention is applied to an organic EL device manufacturing apparatus and an organic EL device manufacturing method will be described.

(Configuration of organic EL device manufacturing equipment)
With reference to FIG. 1, the overall configuration of an embodiment of the organic EL device manufacturing apparatus of the present invention will be described. FIG. 1 is a block diagram schematically showing an embodiment of the configuration of the organic EL device manufacturing apparatus of the present invention. 10 is an organic EL device manufacturing apparatus, 11 is a vacuum chamber, 12 is a crucible, 13 is a heater, 14 is a mask, 15 is a substrate (deposition substrate), 16 is a thermocouple, 17 is a vacuum gauge, and 18 is a film thickness monitor. , 19 is a rate detector, 20 is a temperature detector, 21 is a heater power supply, and 22 is a controller.
In FIG. 1, an organic EL device manufacturing apparatus 10 used in a film forming process includes a dry pump (not shown) capable of evacuating a vacuum chamber 11 to about 10 [Pa], and 10 [Pa] to 10 ⁻⁶ [. Pa], a cryopump (not shown) that can be evacuated to a high vacuum region is provided, and the vacuum chamber 11 can be made into a high vacuum by these vacuum pumps.

The vacuum chamber 11 includes a crucible 12 filled with a film forming material, a heater 13 for heating the crucible 12, a mask 14 for defining a film forming pattern, and a substrate 15 in close contact with the mask 14. Yes. The vacuum chamber 11 includes a thermocouple 16 that measures the temperature of the crucible 12, a vacuum gauge 17 that measures the degree of vacuum in the vacuum chamber 11, and a film thickness monitor 18 that includes a crystal resonator.
The crucible 12 is further mounted with a porous substance that is partially or entirely immersed or buried in the film forming material filled inside.

Further, a rate detector 19, a temperature detector 20, a heater power source 21, and a controller 22 are provided outside the vacuum chamber 11.
The rate detector 19 calculates a detection rate based on the signal output from the film thickness monitor 18. The temperature detector 20 converts the signal output from the thermocouple 16 into temperature. The heater power supply 21 controls the output of the heater 13. Furthermore, the controller 22 controls the heater power supply 21 in conjunction with the film thickness and temperature.

In the organic EL device manufacturing apparatus 10 of FIG. 1, the controller 22 reduces the pressure in the vacuum chamber 11 to about 10 ⁻⁴ [Pa] to 10 ⁻⁶ [Pa] using a dry pump and a cryopump. The controller 22 acquires data on the degree of vacuum measured by the vacuum gauge 17 and monitors the degree of vacuum in the vacuum chamber 11.
Thereafter, the controller 22 controls the heater power supply 21 to supply power to the heater 13, and the film forming material filled in the crucible 12 is heated and controlled by the heater 13 to vaporize the film forming material and pass through the nozzle. The film is deposited on the substrate 15 and formed on the substrate 15. The controller 22 performs heating control of the heater 13 by feedback control using a rate value detected by the film thickness monitor 17, and scans the crucible 12 in a direction perpendicular to the mask 14 and the substrate 15 (in the direction of the arrow 23). To form a film. Note that the configuration necessary for scanning is well known and is irrelevant to the problems of the present invention and the means for solving the problems.

(Example of loading a porous material on the bottom of the crucible)
2 and 3, an example of the structure of the crucible 12 according to the organic EL device manufacturing apparatus and the organic EL device manufacturing method of the present invention will be described. FIG. 2 is a cross-sectional view showing an embodiment of the structure of the crucible 12 according to the organic EL device manufacturing apparatus and the organic EL device manufacturing method of the present invention. FIG. 3 is a diagram showing a detection rate in one embodiment of the film forming process in the configuration of FIGS. 1 and 2. 31 is a porous material, 32 is a film forming material, and 33 is a nozzle of the crucible 12.

In FIG. 2, a porous substance 31 is mounted on the bottom of the crucible 12 and filled with a film forming material 32. For easy understanding, the horizontal direction in FIG. 2 is referred to as the X direction, and the vertical direction is referred to as the Z direction (vertical direction). A direction perpendicular to both the X direction and the Z direction is referred to as a Y direction.
In FIG. 2, the heater 13 heats the film forming material 32 to a predetermined temperature, for example, 200 [° C.] to 500 [° C.]. The temperature of the heated molten film forming material 32 exceeds the melting point and reaches the vicinity of the boiling point, and the molten film forming material 32 starts to vaporize gradually. The vaporized film forming material is formed on the substrate 15 disposed opposite to the nozzle 33.
Due to the pore structure of the porous material 31, the film-forming material 32 in the liquid state in the crucible 12 can easily form bubbles 34. For this reason, in this invention, the film-forming material 32 in the crucible 12 can be stably converted into vapor, and bumping does not occur. That is, in the organic EL device manufacturing apparatus and the organic EL device manufacturing method of the present invention, since no bumping occurs, a stable rate can be secured and uniform film formation can be performed.
As a result, as shown in FIG. 3, a stable detection rate value can be obtained in the crucible 12 on which the porous material 31 is mounted. In FIG. 3, the horizontal axis represents time (unit: [h]), and the vertical axis represents the film formation rate (unit: [Å / s]).

For comparison with FIG. 3, FIG. 4 is a diagram illustrating a detection rate when the porous material 31 is not mounted in the crucible 12 as in the prior art. The vertical scale and the horizontal scale in FIG. 4 are exactly the same as the vertical and horizontal scales in FIG. Also in FIG. 4, as in FIGS. 2 and 3, the film forming material 32 is heated to a predetermined temperature by the heater 13 to perform film formation.
In this case, as shown in FIG. 4, the detection rate value greatly fluctuates in a crucible not equipped with the porous material 31. That is, the temperature of the heated molten film-forming material 32 passes through the melting point and reaches the vicinity of the boiling point. However, compared with the case where the film-forming material 32 is loaded with the porous material 31, bubbles that trigger the formation of a large number of bubbles 34 are less likely to be generated. Occur. As a result, the rate is not stable, the rate control is insufficient, and the film thickness becomes uneven.

Here, the crucible 12 is preferably made of a material having a melting point higher than the boiling point of the film forming material 32 and does not react chemically. For example, a metal material such as tungsten (W), molybdenum (Mo), tantalum (Ta), or titanium (Ti), or an oxide material such as alumina (Al ₂ O ₃ ) or zirconia (ZrO ₂ ) can be used. Further, for example, a nitride material such as silicon nitride (Si ₃ N ₄ ) or boron nitride (BN) can be used.
The shape of the crucible 12 is not particularly limited as in the second embodiment shown in FIG. 2, and may be other shapes such as a cylindrical shape and a boat shape in addition to the rectangle shown in FIG.
The material of the porous substance 31 is preferably a material having a higher thermal conductivity than the film forming material 32, a material having a melting point higher than the boiling point of the film forming material 32, and a material that does not react chemically. . The porous substance 31 preferably has a porous structure and is a molded body such as a nitride, a carbide, or a metal oxide. For example, alumina _{(Al 2 O} 3), silica (SiO _2), and the like.
In FIG. 2, the shape of the porous material 31 is described as a comb blade shape, but the shape and size of the porous material 31 are not particularly limited, and the volume of the crucible 12 and the filling volume of the film forming material 32 are not limited. You may decide in consideration of. Further, the direction of the comb blade may extend in the X direction or in the Y direction, or may be a direction deviated from the X, Y, or Z direction by a predetermined angle.
Moreover, the porous material 31 may be mounted on the bottom of the crucible 12 or may be fixed.
According to the above-described embodiment of the present invention, the liquid level in the crucible 12 is lowered with the progress of vaporization, and the film forming material 32 that has entered the pores of the porous substance 31 is also evaporated. For this reason, the porous material 31 can be used repeatedly.

According to Example 1 described above, in an organic EL device manufacturing apparatus and an organic EL device manufacturing method that control film thickness with a film thickness monitor using a crystal resonator, film formation with a uniform film thickness is performed on a substrate. Can do.
Moreover, in the organic EL device manufacturing apparatus and the organic EL device manufacturing method described above, the rate can be stably controlled by a crucible that can avoid an overheated state by a crucible provided with a porous substance therein.
Furthermore, in the organic EL device manufacturing apparatus and the organic EL device manufacturing method described above, since the deposited film material can be completely vaporized by heating the porous material, the crucible provided with the porous material inside. Can be reused.

(Example in which a porous material is mounted on the crucible upper lid)
In the crucible configuration shown in FIG. 2 in the first embodiment of the present invention, a porous material is provided on the inner bottom of the crucible. However, as in the second embodiment of the present invention described below, a structure in which a porous material is provided on the upper lid side of the crucible may be used.
Hereinafter, a second embodiment of the present invention will be described with reference to FIG. FIG. 5: is sectional drawing which shows one Example of a structure of the crucible which concerns on the organic EL device manufacturing apparatus and organic EL device manufacturing method of this invention. 51 is a porous material, 52 is a crucible, and 53 is a porous upper lid of the crucible 52.

In FIG. 5, the crucible 52 includes a nozzle 33 and a porous upper lid 53, and the porous material 51 is attached to the porous upper lid 53 inside the crucible 52. In addition, the crucible 52 is filled with the film forming material 32 and is evaporated, and the porous material 51 is evaporated until the remaining amount of the film forming material 32 is reduced and the liquid level is lowered to reach a state where the rate cannot be controlled. Is in contact. Alternatively, when the remaining amount of the film forming material 32 is reduced and the liquid level of the film forming material 32 reaches a state where it does not come into contact with the porous material 51, the film forming process is stopped and the film forming process is stopped. The material 32 is replenished. Note that the porous upper lid 53 and the porous substance 51 may be integrally formed of the same material or the like.
In the second embodiment, as described above, the porous material is provided on the upper lid side. At this time, the parts other than the crucible in FIG. 5 have the same configuration as in FIG. That is, also in the present embodiment, the configuration of the organic EL device manufacturing apparatus is the same as that in FIG.
In the configuration of FIG. 5, the crucible 52 is provided with a porous upper lid 53, and a porous material is fixedly attached to the upper portion of the crucible 52. With such a configuration, even if the type of film forming material in the crucible and the film forming conditions change, it can be replaced with a porous material having the optimum material and shape according to the type, so the variety of film forming processes It is possible to realize an organic EL device manufacturing apparatus and an organic EL device manufacturing method that can cope with the above.

That is, according to Example 2 described above, in an organic EL device manufacturing apparatus and an organic EL device manufacturing method that control film thickness with a film thickness monitor using a crystal resonator, a film having a uniform film thickness is formed on a substrate. It can be carried out.
Moreover, in the organic EL device manufacturing apparatus and the organic EL device manufacturing method described above, the rate can be stably controlled by a crucible that can avoid an overheated state by a crucible partially including a porous material.
Furthermore, in the organic EL device manufacturing apparatus and the organic EL device manufacturing method described above, since the deposited film material can be completely vaporized by heating the porous material, the crucible provided with the porous material inside. Can be reused.
Moreover, in the above-mentioned organic EL device manufacturing apparatus and organic EL device manufacturing method,
The rate can be stably controlled by a crucible that can avoid an overheated state by a crucible having a top cover that is partially porous.

(Example in which the crucible itself is a porous material)
FIG. 6: is sectional drawing which shows one Example of a structure of the crucible which concerns on the organic EL device manufacturing apparatus and organic EL device manufacturing method of this invention. 62 is a crucible, and 61 is a part of the porous material of the crucible 62.
As shown in FIG. 6, the entire porous crucible 62 is composed of a porous material, and the porous material 61 inside and the inner wall of the porous crucible 62 are configured to be in contact with the film forming material 32. In FIG. 6, the porous material 61 is formed at the bottom of the porous crucible 62 as in FIG. 2, but may be integrally formed with the upper lid portion of the crucible 61 as in FIG. .

  In the first embodiment and the second embodiment of the present invention, the porous material is provided in the crucible as in the crucible configuration shown in FIG. However, in the third embodiment of the present invention, as shown in FIG. 6, the crucible itself is a porous material. The parts other than the crucible in FIG. 6 have the same configuration as in FIG. That is, also in the present embodiment, the configuration of the organic EL device manufacturing apparatus is the same as that in FIG.

That is, according to Example 3 described above, in an organic EL device manufacturing apparatus and an organic EL device manufacturing method that control film thickness with a film thickness monitor using a crystal resonator, a film having a uniform film thickness is formed on a substrate. It can be carried out.
Moreover, in the organic EL device manufacturing apparatus and the organic EL device manufacturing method described above, the rate can be stably controlled by a crucible that can avoid an overheated state by a crucible that is entirely provided with a porous material.
Furthermore, in the above-described organic EL device manufacturing apparatus and organic EL device manufacturing method, all the deposited film-forming materials can be vaporized by heating the porous material, so that the crucible provided with the porous material can be reused. Is available.
Moreover, in the above-mentioned organic EL device manufacturing apparatus and organic EL device manufacturing method,
The rate can be stably controlled by a crucible capable of avoiding an overheated state by a crucible having an upper lid that is entirely porous.

  In the first to third embodiments of the present invention described above, the porous material has a structure in which a plurality of cylinders having a plurality of square cross sections are in close contact with each other. However, an object of the present invention is to make the surface of the porous substance come into contact with the film forming material as much as possible. Therefore, any shape can be used as long as the object can be achieved. For example, instead of a rectangular tube, it may be a polygonal or circular tube such as a honeycomb shape or a structure in which they are mixed.

FIG. 7 is a perspective view showing an embodiment of the shape of the porous material mounted in the crucible used in the organic EL device manufacturing apparatus and the organic EL device manufacturing method of the present invention. Reference numerals 71 to 77 are porous substances.
For example, as shown in FIG. 5, the porous material of FIG. 7 may be configured so that the porous material is mounted on the crucible upper lid.
Further, as shown in FIG. 6, the entire crucible may be made of a porous material, and the porous materials 71 to 77 inside and the porous inner wall of the crucible may be in contact with the film forming material 32.
Of course, a plurality of stages may be crossed or overlapped in the same direction. Furthermore, you may mount at what angle with respect to the nozzle direction of a crucible.

  FIG. 7A shows a cylindrical porous material 71, which is an example of a lump shape. Of course, a plurality may be mounted. FIG. 7B shows a porous material 72 having a shape in which the upper portion of the shape of FIG. FIG. 7C shows a porous material 73 having a shape in which a hole is provided inside the cylinder. The hole may be a through hole, a plurality of holes, or a combination thereof. FIG.7 (d) is the porous material 74 which mounted FIG.7 (c) sideways. Thus, the mounting angle of the cylinder is arbitrary regardless of whether there is a hole or no hole. Further, the cross-sectional shape may be a polygon instead of a cylinder. FIG. 7E shows a rectangular porous material 76 having a plurality of holes therein. FIG. 7F shows a spring-like porous material 76. FIG. 7G shows a porous material 77 having a shape in which the spring-like porous material 76 of FIG.

As described above, although common to the first to fourth embodiments, the configuration of FIG. 2, FIG. 5, FIG. 6, or FIG. 7 does not need to be uniform or symmetric in the Y direction. Further, a structure in which a single square cylinder is stacked in a plurality of stages, or a structure different in each stage may be used. For example, in FIG. 2, the shape of the porous material 31 has been described as a comb blade shape, but the shape and dimensions of the porous material are not particularly limited also in the configurations of FIGS. 5, 6, and 7. It may be determined in consideration of the crucible volume and the filling volume of the film forming material 32.
Furthermore, the porous material may be configured in a net shape, or may have a structure in which a net shape and a square tube or a circular tube are mixed.
Further, the position in the crucible may be arranged so as to be biased toward the side close to the nozzle, or may be mounted so as to be biased toward the side far from the nozzle.
Further, since the heat of the heater is more efficiently transferred to the inside of the film forming material in the crucible, a porous material having a material having better thermal conductivity than the material of the crucible may be used.

  FIG. 7 is a perspective view showing an embodiment of the shape of the porous material mounted in the crucible used in the organic EL device manufacturing apparatus and the organic EL device manufacturing method of the present invention. Reference numerals 71 to 77 are porous substances.

That is, according to Example 4 described above, in an organic EL device manufacturing apparatus and an organic EL device manufacturing method that control film thickness with a film thickness monitor using a crystal resonator, a film having a uniform film thickness is formed on a substrate. It can be carried out.
Moreover, in the organic EL device manufacturing apparatus and the organic EL device manufacturing method described above, the rate can be stably controlled by a crucible that can avoid an overheating state by a crucible partially or entirely provided with a porous material.
Furthermore, in the above-described organic EL device manufacturing apparatus and organic EL device manufacturing method, all the deposited film-forming materials can be vaporized by heating the porous material, so that the crucible provided with the porous material can be reused. Is available.
Moreover, in the organic EL device manufacturing apparatus and the organic EL device manufacturing method described above, the rate can be stably controlled by a crucible capable of avoiding an overheated state by a crucible having an upper lid that is partially or entirely porous. .

As described above, in the above-described embodiments in Examples 1 to 4, the vacuum chamber is described as a single configuration. However, a plurality of vacuum chambers may be connected by a gate valve or the like, and a line-shaped configuration provided with a transport mechanism may be employed.
Similarly, a crystal resonator is used as the film thickness monitor, but if it is a monitor that can calculate the rate in real time, it need not be a crystal resonator.
The present invention is not limited to the above-described form. For example, when the film formation substrate 15 is formed in a state where the film formation substrate 15 is tilted horizontally, the crucible side is fixed and the substrate side is moved. Even if it is effective.

  10: Organic EL device manufacturing apparatus, 11: Vacuum chamber, 12: Crucible, 13: Heater, 14: Mask, 15: Substrate (film formation substrate), 16: Thermocouple, 17: Vacuum gauge, 18: Film thickness monitor , 19: Rate detector, 20: Temperature detector, 21: Heater power supply, 22: Controller, 31: Porous material, 32: Film-forming material, 33: Nozzle, 34: Bubble, 51: Porous material, 52 : Crucible, 53: porous top cover, 61: porous material, 62: porous crucible, 71-77: porous material.

Claims (9)

  A crucible loaded with a porous material inside and filled with a film forming material, a heater for heating the crucible, a heater power supply for supplying electric power to the heater, and vaporizing from the nozzle of the crucible by heating the heater A film thickness monitor device for calculating a material vapor amount (rate) per unit time of the film forming material, and a controller for controlling electric power supplied from the heater power source based on the calculated rate, An organic EL device manufacturing apparatus, wherein a film is formed on a film formation substrate.   2. The organic EL device manufacturing apparatus according to claim 1, wherein the film thickness monitoring device includes a film thickness monitor including a crystal resonator and a rate detector that calculates a detection rate based on a signal output from the film thickness monitor. An organic EL device manufacturing apparatus characterized by comprising.   The organic EL device manufacturing apparatus according to claim 1 or 2, wherein the porous material is a material having a melting point higher than that of the crucible, and a material having a melting point higher than the boiling point of the film forming material, And the organic EL device manufacturing apparatus characterized by being a material which does not react chemically.   The organic EL device manufacturing apparatus according to any one of claims 1 to 3, wherein the vacuum chamber includes the crucible, the heater, and the film thickness monitor therein. manufacturing device. In the organic EL device manufacturing apparatus according to any one of claims 1 to 4,
An apparatus for manufacturing an organic EL device, wherein the crucible is partially or entirely made of a porous material. In the organic EL device manufacturing apparatus according to any one of claims 1 to 4,
The crucible is an organic EL device manufacturing apparatus, wherein a part or the whole of the upper lid is a porous material.   7. The organic EL device manufacturing apparatus according to claim 1, wherein the porous material is reused. A crucible loaded with a porous material inside and filled with a film forming material, a heater for heating the crucible, a heater power supply for supplying electric power to the heater, and vaporizing from the nozzle of the crucible by heating the heater A film thickness monitor device for calculating a material vapor amount (rate) per unit time of the film forming material, and a controller for controlling electric power supplied from the heater power source based on the calculated rate, In an organic EL device manufacturing method for forming a film on a deposition target substrate,
An organic EL device manufacturing method comprising a porous substance in contact with the film-forming material in the crucible, and capable of stably converting the film-forming material in the crucible into vapor. In the organic EL device manufacturing method according to claim 8,
The film thickness monitoring device calculates a detection rate based on a signal output by a film thickness monitor composed of a crystal resonator,
The said controller controls the electric power which the said heater power supply supplies based on the calculated rate, The organic EL device manufacturing method characterized by the above-mentioned.

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