JP2014137303A5 - - Google Patents

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Publication number
JP2014137303A5
JP2014137303A5 JP2013006617A JP2013006617A JP2014137303A5 JP 2014137303 A5 JP2014137303 A5 JP 2014137303A5 JP 2013006617 A JP2013006617 A JP 2013006617A JP 2013006617 A JP2013006617 A JP 2013006617A JP 2014137303 A5 JP2014137303 A5 JP 2014137303A5
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JP
Japan
Prior art keywords
opening
light source
interferometer system
laser light
interferometer
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Application number
JP2013006617A
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English (en)
Japanese (ja)
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JP6071572B2 (ja
JP2014137303A (ja
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Priority to JP2013006617A priority Critical patent/JP6071572B2/ja
Priority claimed from JP2013006617A external-priority patent/JP6071572B2/ja
Priority to US14/153,538 priority patent/US9804510B2/en
Publication of JP2014137303A publication Critical patent/JP2014137303A/ja
Publication of JP2014137303A5 publication Critical patent/JP2014137303A5/ja
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Publication of JP6071572B2 publication Critical patent/JP6071572B2/ja
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JP2013006617A 2013-01-17 2013-01-17 干渉計システム、リソグラフィー装置、それを用いた物品の製造方法 Active JP6071572B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013006617A JP6071572B2 (ja) 2013-01-17 2013-01-17 干渉計システム、リソグラフィー装置、それを用いた物品の製造方法
US14/153,538 US9804510B2 (en) 2013-01-17 2014-01-13 Interferometer system, lithography apparatus, and article manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013006617A JP6071572B2 (ja) 2013-01-17 2013-01-17 干渉計システム、リソグラフィー装置、それを用いた物品の製造方法

Publications (3)

Publication Number Publication Date
JP2014137303A JP2014137303A (ja) 2014-07-28
JP2014137303A5 true JP2014137303A5 (cg-RX-API-DMAC7.html) 2016-02-25
JP6071572B2 JP6071572B2 (ja) 2017-02-01

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ID=51164883

Family Applications (1)

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JP2013006617A Active JP6071572B2 (ja) 2013-01-17 2013-01-17 干渉計システム、リソグラフィー装置、それを用いた物品の製造方法

Country Status (2)

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US (1) US9804510B2 (cg-RX-API-DMAC7.html)
JP (1) JP6071572B2 (cg-RX-API-DMAC7.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3208680U (ja) * 2015-12-11 2017-02-02 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ フォトグラフィプロセスのためのシステムの環境制御
CN107576265B (zh) * 2017-08-07 2019-11-12 北京理工大学 一种激光干涉仪自动对光的测量方法
US12196672B2 (en) 2020-05-07 2025-01-14 Hand Held Products, Inc. Apparatuses, systems, and methods for sample testing
US12498328B2 (en) 2020-05-07 2025-12-16 Hand Held Products, Inc. Apparatuses, systems, and methods for sample testing
US11846574B2 (en) 2020-10-29 2023-12-19 Hand Held Products, Inc. Apparatuses, systems, and methods for sample capture and extraction
KR102740948B1 (ko) * 2021-12-28 2024-12-11 세메스 주식회사 조사 모듈 및 이를 포함하는 기판 처리 장치

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5575279A (en) * 1978-12-04 1980-06-06 Olympus Optical Co Ltd Laser oscillator
JPH0785112B2 (ja) * 1987-02-16 1995-09-13 キヤノン株式会社 ステージ装置
US4765741A (en) * 1987-03-20 1988-08-23 Hewlett-Packard Company Wavelength tracking compensator for an interferometer
AT390325B (de) * 1988-03-11 1990-04-25 Tabarelli Werner Interferometrische einrichtung zur messung von lageaenderungen eines beweglichen bauteiles
AT397307B (de) * 1990-03-02 1994-03-25 Tabarelli Werner Interferometer insbesondere zur längenmessung
US5469260A (en) * 1992-04-01 1995-11-21 Nikon Corporation Stage-position measuring apparatus
US5325177A (en) * 1992-10-29 1994-06-28 Environmental Research Institute Of Michigan Optical, interferometric hole gauge
JP3508240B2 (ja) * 1994-09-13 2004-03-22 株式会社ニコン レーザー干渉距離測定装置
US5552888A (en) * 1994-12-02 1996-09-03 Nikon Precision, Inc. Apparatus for measuring position of an X-Y stage
JPH1144506A (ja) 1997-07-29 1999-02-16 Nikon Corp 干渉計測定装置
JP3202183B2 (ja) * 1997-10-16 2001-08-27 株式会社ミツトヨ レーザ光を用いたスケール及び測長方法
JP3400393B2 (ja) * 1999-10-13 2003-04-28 株式会社ミツトヨ レーザ干渉装置
JP2001280931A (ja) * 2000-03-31 2001-10-10 Nikon Corp 干渉計、形状測定装置及び方法、並びに露光装置
WO2002103766A1 (en) * 2001-06-13 2002-12-27 Nikon Corporation Scanning exposure method and scanning exposure system, and device production method
WO2006080513A1 (ja) * 2005-01-31 2006-08-03 Nikon Corporation レーザ光源の制御方法、レーザ光源装置、及び露光装置
US20080198369A1 (en) * 2007-02-14 2008-08-21 Nikon Corporation Interferometer air-fluctuation monitors and systems comprising same
US7876452B2 (en) * 2007-03-05 2011-01-25 Nikon Corporation Interferometric position-measuring devices and methods

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